Aikawa Shinya

Faculty of Engineering Department of Electrical and Electronic EngineeringProfessor

  • E-Mail: aikawacc.kogakuin.ac.jp

Career

  • Apr. 2024 - Present
    Kogakuin University
  • Apr. 2014 - Present
    Visiting Researcher (International Center for Materials Nanoarchitectonics, National Institute for Materials Science)
  • Apr. 2019 - Mar. 2024
    Associate Professor (Department of Electrical and Electronic Engineering, Kogakuin University)
  • Apr. 2018 - Mar. 2019
    Designated Associate Professor (Department of Electrical and Electronic Engineering, Kogakuin University)
  • Apr. 2016 - Mar. 2018
    Associate Professor (Research Institute for Science and Technology, Kogakuin University)
  • Apr. 2014 - Mar. 2016
    Assistant Professor (Research Institute for Science and Technology, Kogakuin University)
  • Sep. 2012 - Mar. 2014
    Postdoctoral Researcher (International Center for Materials Nanoarchitectonics, National Institute for Materials Science)
  • Apr. 2012 - Aug. 2012
    Postdoctoral Researcher (School of Engineering, The University of Tokyo)
  • Apr. 2009 - Mar. 2012
    JSPS Research Fellow (DC1)

Educational Background

  • Apr. 2009 - Mar. 2012
    Tokyo University of Science, Department of Electrical Engineering
  • Apr. 2007 - Mar. 2009
    Tokyo University of Science, Department of Electrical Engineering
  • Apr. 2003 - Mar. 2007
    Tokyo University of Science, Department of Electrical Engineering (Division II)

Degree

  • Mar. 2007
    学士(工学), Tokyo University of Science
  • Mar. 2009
    修士(工学), Tokyo University of Science
  • Mar. 2012
    博士(工学), Tokyo University of Science

Affiliated academic society

  • Nov. 2018 - Present
    電気学会
  • Jan. 2008 - Present
    応用物理学会

IDs

  • Identifiers

    研究者番号:40637899
    researchmap会員ID:B000236702
    J-Global ID:201401006817454654

Research Field

  • Nanotechnology/Materials, Nano/micro-systems, Micro/Nanodevice
  • Nanotechnology/Materials, Thin-film surfaces and interfaces, Thin Film and Surface Interface Physical Properties
  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electronic devices and equipment, Electronic Device/Electronic Equipment
  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Thermal engineering

Books and other publications

Paper

MISC

  • Effect of In2O3 Channel Thickness in TFT Gas Sensor for CO2 Sensing Characteristics
    A. Nodera; R. Kobayashi; S. Yamadera; K. Kibishi; T. Kobayashi; S. Aikawa
    2023 International Microprocesses and Nanotechnology Conference Digest Papers, 2023, [Reviewed]
    Last, Corresponding
  • Depth profiling of SnO2:N thin films fabricated by RF magnetron sputtering in N2 atmosphere
    T. Kawaguchi; T. Kobayashi; S. Aikawa
    2023 International Microprocesses and Nanotechnology Conference Digest Papers, 2023, [Reviewed]
    Last, Corresponding
  • Reduction of remaining hysteresis in unannealed B-doped In2O3 TFTs by O2 plasma
    S. Yamadera; K. Kibishi; A. Nodera; S. Aikawa
    2023 International Microprocesses and Nanotechnology Conference Digest Papers, 2023, [Reviewed]
    Last, Corresponding
  • La concentration dependence of CO2 sensitivity in solution-processed La-doped In2O3 thin-film transistors
    R. Kobayashi; A. Nodera; S. Aikawa
    2023 International Microprocesses and Nanotechnology Conference Digest Papers, 2023, [Reviewed]
    Last, Corresponding
  • Co-doping of hydrogen and boron in In2O3 toward highly flexible and transparent conducting oxide film
    K. Kibishi; S. Yamadera; T. Kobayashi; I. Takano; S. Aikawa
    2023 International Microprocesses and Nanotechnology Conference Digest Papers, 2023, [Reviewed]
    Last, Corresponding
  • Indium oxide-based thin film transistor with high CO2 sensitive (400) plane
    A. Nodera; S. Mori; S. Aikawa
    Extended Abstract of 2022 International Conference on Solid State Devices and Materials, 2022
    Corresponding
  • Room-temperature processable highly amorphous transparent B-doped In2O3 for use as a flexible conductive film
    S. Mori; A. Nodera; K. Watanabe; K. Murano; S. Aikawa
    Extended Abstract of 2022 International Conference on Solid State Devices and Materials, 2022
    Corresponding
  • Nitrogen incorporation in SnO2 matrix for passivation of oxygen vacancy and hole generation
    K. Watanabe; T. Kawaguchi; S. Aikawa
    Extended Abstract of 2022 International Conference on Solid State Devices and Materials, 2022
    Corresponding
  • Comparative study of room-temperature deposited ITO and B-doped In2O3 on PET for flexible transparent electrode application
    S. Mori; K. Kibishi; S. Yamadera; A. Nodera; K. Watanabe; I. Takano; S. Aikawa
    2022 International Microprocesses and Nanotechnology Conference Digest Papers, 2022, [Reviewed]
    Last, Corresponding
  • Optimization of N2 concentration in Ar/N2 sputtering deposition for p-type N-doped SnOx thin-film
    T. Kawaguchi; K. Watanabe; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    2022 International Microprocesses and Nanotechnology Conference Digest Papers, 2022, [Reviewed]
    Last, Corresponding
  • Experimental investigation of the local bonding states of nitrogen-doped SnOx thin-film
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    2022 International Microprocesses and Nanotechnology Conference Digest Papers, 2022, [Reviewed]
    Last, Corresponding
  • Crystal-plane dependence of CO2 sensitivity on In2O3-based thin-film transistors
    A. Nodera; S. Mori; S. Aikawa
    2022 International Microprocesses and Nanotechnology Conference Digest Papers, 2022, [Reviewed]
    Last, Corresponding
  • Post-deposition N2 annealing of n-type SnOx thin-films for carrier-type conversion
    K. Watanabe; S. Aikawa
    Extended Abstract of 2021 International Conference on Solid State Devices and Materials, 2021
    Corresponding
  • Role of Ca in CaF2 incorporated In2O3 transparent conductive films
    K. Oe; S. Mori; K. Watanabe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    2021 International Microprocesses and Nanotechnology Conference Digest Papers, 2021, [Reviewed]
    Last, Corresponding
  • Improvement of noble metal-free ReRAM characteristics by insertion of thin SiOx layer at the ZrOx/electrode interfaces
    K. Toyama; R. Akiyama; K. Yuki; S. Aikawa
    2021 International Microprocesses and Nanotechnology Conference Digest Papers, 2021, [Reviewed]
    Last, Corresponding
  • Demonstration of flexible transparent conductive film using B-doped In2O3
    S. Mori; Y. Ichinoseki; K. Watanabe; K. Murano; K. Oe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    2021 International Microprocesses and Nanotechnology Conference Digest Papers, 2021, [Reviewed]
    Last, Corresponding
  • Charge transfer and conduction type conversion in n-type SnO2 thin films by nitrogen annealing
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    2021 International Microprocesses and Nanotechnology Conference Digest Papers, 2021, [Reviewed]
    Last, Corresponding
  • B-doped In2O3 Transparent Electrode for Si-based Schottky Barrier Solar Cell Application
    S. Aikawa; Y. Shibata; Y. Morinaga
    Proceedings of the 20th IEEE International Conference on Nanotechnology, 2020, [Reviewed]
    Lead, Corresponding
  • Comparative characterization of Si Schottky solar cells using B‐doped In2O3 and ITO transparent electrodes
    S. Aikawa; Y. Shibata; Y. Morinaga
    2020 International Microprocesses and Nanotechnology Conference Digest Papers, 2020, [Reviewed]
    Lead, Corresponding
  • Investigation of CaF2 doping on electrical and optical properties of In2O3 transparent conductive film
    K. Oe; S. Aikawa
    2020 International Microprocesses and Nanotechnology Conference Digest Papers, 2020, [Reviewed]
    Last, Corresponding
  • Influence of SiOx interlayer on electrical properties of noble metal-free ZrOx-based resistive switching memory devices
    K. Toyama; D. Naniwa; S. Aikawa
    2020 International Microprocesses and Nanotechnology Conference Digest Papers, 2020, [Reviewed]
    Last, Corresponding
  • ヘテロ界面での自己酸化還元反応に基づくp型酸化物半導体へのキャリア注入制御
    2020
    Lead, Corresponding
  • Investigation of measurement environmental sensitivity in amorphous indium oxide-based thin-film transistors
    K. Nakamura; K. Sasaki; Y. Shibata; K. Oe; S. Aikawa
    2019 International Microprocesses and Nanotechnology Conference Digest Papers, 2019, [Reviewed]
  • Hydrophobic Fluoropolymer Interlayer between In2O3 Semiconductor and SiO2 Gate Insulator for Improvement of Thin-Film Transistor Performance
    K. Sasaki; K. Nakamura; Y. Shibata; S. Aikawa
    2019 International Microprocesses and Nanotechnology Conference Digest Papers, 2019, [Reviewed]
  • SnOx 薄膜の伝導型制御に向けたスパッタ成膜条件の検討
    2018
  • SnOx 薄膜へのキャリア注入制御に向けたショットキーダイオード試作
    2018
  • 酸化物半導体/絶縁膜界面での加熱不要な局所電荷ドーピング
    2018
    Lead, Corresponding
  • 低温プロセスで作製した酸化インジウム系薄膜トランジスタの安定化に向けた高結合解離エネルギードーパントの導入
    2017
    Lead, Corresponding
  • Hydrogen Exposure Effects on Anodically Etched GaAs Nanowires in Liquid Electrolyte
    S. Aikawa; K. Yamada; H. Hashimoto; H. Asoh; S. Ono
    Proceedings of the 16th IEEE International Conference on Nanotechnology, 2016
  • 連続形成積層半導体チャネルを用いた酸化薄膜トランジスタの電気特性バラつき制御
    2016
    Lead, Corresponding
  • Electrical and Structural Characterization of Anodically Etched GaAs Nanowires Towards Functional Electronic Devices
    S. Aikawa; K.Yamada; H. Asoh; H. Hashimoto; Y.-I. Kim; E. Nishikawa; S. Ono
    2015 International Microprocesses and Nanotechnology Conference Digest Papers, 2015
  • Influence of electrical properties for IGZO TFT with Al2O3 gate insulators by PE-ALD method
    K. Kurishima; T. Nabatame; M. Shimizu; S. Aikawa; K. Tsukagoshi; A. Ohi; T. Chikyo; A. Ogura
    Proceedings of the 14th International Conference on Atomic Layer Deposition 2014, 2014
  • 超フレキシブルで透明なカーボンナノチューブトランジスタ
    2013
  • Influence of Polymer Coating on Device Properties of Carbon Nanotube Field-Effect Transistors
    S. Aikawa; T. Inoue; E. Einarsson; S. Chiashi; S. Maruyama
    Extended Abstract of 2012 International Conference on Solid State Devices and Materials, 2012
  • Thermal Conductivity of Single-Walled Carbon Nanotube Suspensions in Ethylene Glycol: Experimental Results and Theoretical Limits
    S. Harish; K. Ishikawa; E. Einarsson; S. Aikawa; M. Watanabe; S. Chiashi; J. Shiomi; S. Maruyama
    Proceedings of the 4th International Symposium on Heat Transfer and Energy Conservation, 2012
  • 透明なカーボンナノチューブフレキシブルトランジスタ
    2012
  • As-Grown単層CNTを用いた薄膜トランジスタ作製
    2012
  • One-Step Encapsulation of Metal Particle with High-Melting into Carbon Nanotubes by Pulsed Arc Discharge in Water
    K. Takekoshi; T. Kizu; S. Aikawa; E. Nishikawa
    The proceedings of ISSS-6, 2011
  • Simple Synthesis Method for Carbon Nanotubes from Aromatic Compounds by Liquid-Phase Arc Plasma
    T. Kizu; K. Takekoshi; S. Aikawa; E. Nishikawa
    The proceedings of ISSS-6, 2011
  • Fabrication of flexible thin film transistors using single-walled carbon nanotubes and graphene
    S.J. Kim; S. Aikawa; B. Hou; E. Einarsson; S. Chiashi; S. Maruyama
    2011 International Microprocesses and Nanotechnology Conference Digest Papers, 2011
  • Extremely Flexible All-Carbon Nanotube Field-Effect Transistors Without Device Degradation
    S. Aikawa; E. Einarsson; S. Chiashi; E. Nishikawa; S. Maruyama
    2011 International Microprocesses and Nanotechnology Conference Digest Papers, 2011
  • Ambipolar Conversion of Polymer-Coated All Single-Walled Carbon Nanotube Field-Effect Transistors
    S. Aikawa; E. Einarsson; S. Chiashi; E. Nishikawa; S. Maruyama
    Extended Abstract of 2011 International Conference on Solid State Devices and Materials, 2011
  • Carbon Nanotubes Synthesis in Liquid Xylene by Low-frequency Pulsed Arc Discharge Using Copper Electrodes: An Effect of Current Waveform
    T. Kizu; S. Aikawa; K. Takekoshi; E. Nishikawa
    The proceedings of ISPlasma 2011, 2011
  • As-grownの単層カーボンナノチューブを用いた電界効果トランジスタアレイの簡易作製法
    2011
  • All-SWNT電界効果トランジスタの容易な作製
    2011
  • Characterization of field-effect transistors using high-quality as-grown SWNTs from alcohol CVD
    S. Aikawa; R. Xiang; E. Einarsson; S. Chiashi; J. Shiomi; E. Nishikawa; S. Maruyama
    The proceedings of AsiaNano 2010, 2010
  • Diameter controlled CVD synthesis of single-walled carbon nanotubes
    T. Thurakitseree; E. Einarsson; R. Xiang; S. Aikawa; S. Chiashi; J. Shiomi; S. Maruyama
    The proceedings of AsiaNano 2010, 2010
  • Simple Fabrication Technique for an Array of Field-effect Transistors Using High-quality as-grown Single-walled Carbon Nanotubes from Dip-coated Catalyst by Substrate Surface Modification
    S. Aikawa; R. Xiang; E. Einarsson; S. Chiashi; J. Shiomi; E. Nishikawa; S. Maruyama
    Extended Abstract of 2010 International Conference on Solid State Devices and Materials, 2010
  • Carbon nanotubes synthesis in liquid xylene by low-frequency pulsed arc discharge using metal electrodes: An effect of inrush current
    T. Kizu; S. Aikawa ; K. Takekoshi; E. Nishikawa
    The proceedings of the ICCG-16, 2010
  • 単層カーボンナノチューブの直径制御合成
    2010
  • Graphitization of an Amorphous Carbon Film under Electron Beam Irradiation Catalysed by Metal Particles
    S. Aikawa; T. Kizu; E. Nishikawa
    Proceedings of 7th International Symposium on Atomic Level Characterizations for New Materials and Devices '09, 2009
  • Carbon Nanotubes Synthesis in Water by Arc Discharge Using Metal Electrodes
    T. Kizu; S. Aikawa; E. Nishikawa
    Proceedings of 7th International Symposium on Atomic Level Characterizations for New Materials and Devices '09, 2009
  • Carbon nanomaterial synthesis from o-xylene using arc discharge method with copper electrodes
    T. Kizu; Y. Kim; S. Aikawa; E. Nishikawa
    Proceedings of the 26th Symposium on Plasma Processing, 2009

Lectures, oral presentations, etc.

  • Investigation of Annealing treatment for Improving Subthreshold in Amorphous p-type TeOx-based TFT
    K. Ishi, T. Kobayashi, D. Watanabe, S. Yamadera, S. Aikawa
    19th International Thin-Film Transistor Conference (ITC 2025), 24 Mar. 2025
  • 低温でCO2検知可能なIn2O3薄膜トランジスタガスセンサー
    18 Mar. 2025, [Invited]
  • InCl3を用いたMist CVD法極薄膜In2O3成膜
    16 Mar. 2025
  • 結晶構造に着目したIn2O3系透明導電膜の柔軟性劣化
    15 Mar. 2025
  • 低温溶液プロセスによるp型SnO薄膜の作製と評価
    15 Mar. 2025
  • スパッタ条件調整による極性In2O3(100)面の優先成長
    15 Mar. 2025
  • p型TaドープSnO薄膜の作製および薄膜トランジスタ応用
    15 Mar. 2025
  • 室温プロセスでバイアスストレス安定性の高いアモルファスIn2O3系TFT
    15 Mar. 2025
  • SnO2ターゲットを用いて還元スパッタ成膜したp型SnOの表面観察
    15 Mar. 2025
  • ITO透明導電膜によるSiC/SiO2界面単一光子源の発光強度制御
    14 Mar. 2025
  • B添加In2O3フレキシブル透明導電膜におけるフレキシブル性の基板依存
    14 Mar. 2025
  • Cu含有PVAフィルムを用いた抵抗変化素子の作製と特性評価
    14 Mar. 2025
  • Strong amorphization in In2O3-based flexible transparent conductive films by hydrogen incorporation and higher sputtering pressure
    K. Kibishi, S. Yamadera, T. Kobayashi, I. Takano, S. Aikawa
    International Symposium on Semiconductor Manufacturing 2024 (ISSM 2024), 10 Dec. 2024
  • UV exposure in an oxygen atmosphere at room temperature as a new method for improvement of amorphous oxide TFT characteristics
    S. Yamadera, K. Kibishi, S. Aikawa
    International Symposium on Semiconductor Manufacturing 2024 (ISSM 2024), 10 Dec. 2024
  • Fabrication of SnSO4 transparent thin-films using simultaneous oxidation and sulfurization annealing
    K. Moriya, D. Watanabe, T. Ogawa, T. Yamaguchi, S. Aikawa
    International Symposium on Semiconductor Manufacturing 2024 (ISSM 2024), 10 Dec. 2024
  • Optimization of post-deposition annealing conditions for p-type SnO fabrication by low-concentration hydrogen sputtering using SnO2 sputtering target
    T. Kobayashi, K. Kibishi, S. Aikawa
    International Symposium on Semiconductor Manufacturing 2024 (ISSM 2024), 10 Dec. 2024
  • アモルファスp型TeOxTFTの特性向上に向けたアニール処理の検討
    29 Nov. 2024
  • 高温アニールに代わるアモルファス酸化物TFTへの室温UV照射処理
    29 Nov. 2024
  • CuSO4とPVAの混合物を用いた抵抗変化素子の作製と評価
    29 Nov. 2024
  • 堅牢なSnO2ターゲットを用いた還元雰囲気スパッタリングと成膜後アニーリングによるSnO製作の最適化
    29 Nov. 2024
  • 溶液プロセスp型SnO薄膜トランジスタに向けた溶液調整の検討および薄膜作製
    28 Nov. 2024
  • Ar/H2スパッタ成膜したIn2O3系透明導電膜の屈曲時抵抗変化と成膜時圧力の関係理解
    28 Nov. 2024
  • ITO透明導電膜を用いたSiC/SiO2界面単一光子源の電界制御
    25 Nov. 2024
  • Toward thin In2O3 film growth on SiO2/Si substrate by Mist CVD method
    R. Ishikawa, T. Yamamoto, Y. Hayashi, S. Aikawa, T. Onuma, T. Honda, T. Yamaguchi
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • Fabrication of SnSO4 transparent thin-films using simultaneous oxidation and sulfurization annealing
    K. Moriya, D. Watanabe, T. Ogawa, T. Yamaguchi, S. Aikawa
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • Electrical and Optical Properties of Ti-doped ZnO Thin Films
    N. Utsu, S. Aikawa, I. Takano
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • α-In2O3のMistCVD結晶成長とMOSFET製作時におけるチャネル層膜厚調整方法の検討
    18 Nov. 2024
  • Improvement of hysteresis in non-annealed IBO TFTs by room-temperature UV exposure in oxygen atmosphere
    S. Yamadera, K. Kibishi, S. Aikawa
    37th International Microprocesses and Nanotechnology Conference (MNC 2024), 15 Nov. 2024
  • Effect of oxygen pressure on crystal orientation and bonding states of SnSO4 thin films
    K. Moriya, D. Watanabe, T. Ogawa, T. Yamaguchi, S. Aikawa
    37th International Microprocesses and Nanotechnology Conference (MNC 2024), 15 Nov. 2024
  • Fabrication of p-type SnO thin film using robust SnO2 target by sputtering and annealing in low-concentration reducing H2 atmosphere
    T. Kobayashi, K. Kibishi, S. Aikawa
    37th International Microprocesses and Nanotechnology Conference (MNC 2024), 15 Nov. 2024
  • Improvement of amorphous nature of In2O3-based transparent conductive films by H-doping
    K. Kibishi, S. Yamadera, T. Kobayashi, I. Takano, S. Aikawa
    37th International Microprocesses and Nanotechnology Conference (MNC 2024), 15 Nov. 2024
  • Evaluation of Optical Properties of Ti-doped ZnO Transparent Conductive Thin Films
    N. Utsu, S. Aikawa, I. Takano
    The 10th International Symposium on Surface Science (ISSS-10), 21 Oct. 2024
  • Dependence of Hydrochloric Acid Concentration Adding to Source Solution in Mist CVD Growth of In2O3 Films on Amorphous SiO2
    03 Oct. 2024
  • 硫化アニールによるSnS薄膜作製:硫黄原料粉末仕込み量による高純度化の検討
    20 Sep. 2024
  • 硫黄蒸気アニールにより作製したSnSO4の結合状態評価
    20 Sep. 2024
  • 還元雰囲気スパッタリングと成膜後アニーリングによるSnO2ターゲットからのSnO製作最適化
    20 Sep. 2024
  • α-Al2O3上及びアモルファスSiO2上へのIn2O3膜Mist CVD成長における原料溶液添加塩酸濃度依存性
    19 Sep. 2024
  • アニーリングによるTiドープZnO透明導電薄膜の特性評価
    19 Sep. 2024
  • CO2センサー応用に向けた溶液プロセスLaドープIn2O3 TFTのバイアスストレス評価
    18 Sep. 2024
  • 酸素雰囲気下での室温UV照射によるIBO TFTのヒステリシス改善
    18 Sep. 2024
  • HドーピングによるIn2O3系透明導電膜の弾性率低下
    18 Sep. 2024
  • Cuイオン含有PVAを抵抗変化層に用いたReRAMの溶液濃度依存性
    16 Sep. 2024
  • Mist CVD法サファイア基板上α-Ga2O3, β-Ga2O3薄膜の電気的特性基礎検討
    31 Aug. 2024
  • Formation of silica films with low dielectric constant using molecular precursor method
    Y. Murakami, K. Moriya, S. Aikawa, M. Sato, H. Nagai
    The 10th International Symposium on Functional Materials (ISFM2024), 04 Aug. 2024
  • Enhancement of CO2 Gas Sensitivity in In2O3 Thin Film Transistor with a Polar Surface
    A. Nodera; S. Aikawa
    18th International Thin-Film Transistor Conference (ITC 2024), 28 Mar. 2024
  • 低蛍光強度の透明導電膜を用いたNVセンタの電荷制御
    25 Mar. 2024
  • 金属Snを硫化アニールし作製したSnSO4の評価:硫化中の酸素圧力依存
    24 Mar. 2024
  • SnO2スパッタターゲットを用いたSnO製作:Ar/H2および真空中ポストアニールの比較
    24 Mar. 2024
  • 金属Sn薄膜の硫化時圧力に依存するSnS表面形態の評価
    24 Mar. 2024
  • SnO層間へのNH3分子インターカレーションの試み
    24 Mar. 2024
  • RFマグネトロンスパッタ法で作製したSnO2:N薄膜のバルク内酸素空孔低減及びバルク内組成の評価
    24 Mar. 2024
  • PVA抵抗変化メモリにおけるNaCl添加の作用
    24 Mar. 2024
  • In2O3系透明導電膜へのHドーピングによる柔軟性劣化機構
    24 Mar. 2024
  • 低温Deep UV照射処理されたB-doped In2O3 TFT
    24 Mar. 2024
  • p型アモルファスTaSnOの電気特性に及ぼすスパッタ成膜条件探索
    05 Mar. 2024
  • スパッタ成膜したスズ酸化物と電極間の界面抵抗評価
    05 Mar. 2024
  • Toward CO2 sensors based on In2O3 thin-film transistors
    A. Nodera; S. Aikawa
    International Symposium of the Vacuum Society of the Philippines (ISVSP), 18 Jan. 2024, [Invited]
  • Fabrication of Tin Oxide/nitrogen-doped Titanium Dioxide Heterojunction Thin Films
    M. Martinez; M. Vasquez Jr.; T. Yamaguchi; S. Aikawa
    International Symposium of the Vacuum Society of the Philippines (ISVSP), 18 Jan. 2024
  • Investigation of Sulfurization Temperature of Metal Sn Thin-Film for High-Quality SnS Synthesis
    D. Watanabe; K. Moriya; S. Aikawa
    MRM2023/IUMRS-ICA2023, 15 Dec. 2023
  • Improvement of hysteresis on as-deposited B-doped In2O3 TFTs under O2 plasma exposure
    S. Yamadera; K. Kibishi; S. Aikawa
    MRM2023/IUMRS-ICA2023, 13 Dec. 2023
  • Electrical property improvement of Pt-free TiOx-based ReRAM devices using ultrathin SiOx interlayers
    H. Osawa; Y. Iwasawa; S. Aikawa
    MRM2023/IUMRS-ICA2023, 12 Dec. 2023
  • Correlation between CO2 sensitivity and Zn concentration in InZnO thin-film transistors
    A. Nodera; R. Kobayashi; T. Kobayashi; S. Aikawa
    MRM2023/IUMRS-ICA2023, 12 Dec. 2023
  • Fabrication of SnO Thin Film by Sputtering in Low-Concentration Reducing H2 Atmosphere
    T. Kobayashi; T. Kawaguchi; K. Kibishi; S. Aikawa
    MRM2023/IUMRS-ICA2023, 12 Dec. 2023
  • N2雰囲気中RFマグネトロンスパッタリングで作製したSnO2:N薄膜の特性評価
    23 Nov. 2023
  • 溶液プロセスで作製したLaドープIn2O3薄膜トランジスタのCO2センシング特性
    23 Nov. 2023
  • 硫黄蒸気輸送アニールを用いた金属Sn薄膜の硫化とその評価
    23 Nov. 2023
  • 低濃度水素雰囲気中スパッタとアニールを用いたSnO2ターゲットからのSnO製作
    23 Nov. 2023
  • InZnO TFT CO2ガスセンサーにおけるZn濃度と膜厚の影響
    22 Nov. 2023
  • B含有In2O3へ水素ドーピングによる機械的柔軟性への効果
    22 Nov. 2023
  • Effect of In2O3 Channel Thickness in TFT Gas Sensor for CO2 Sensing Characteristics
    A. Nodera; R. Kobayashi; S. Yamadera; K. Kibishi; T. Kobayashi; S. Aikawa
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), 17 Nov. 2023
  • Depth profiling of SnO2:N thin films fabricated by RF magnetron sputtering in N2 atmosphere
    T. Kawaguchi; T. Kobayashi; S. Aikawa
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), 17 Nov. 2023
  • Reduction of remaining hysteresis in unannealed B-doped In2O3 TFTs by O2 plasma
    S. Yamadera; K. Kibishi; A. Nodera; S. Aikawa
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), 17 Nov. 2023
  • La concentration dependence of CO2 sensitivity in solution-processed La-doped In2O3 thin-film transistors
    R. Kobayashi; A. Nodera; S. Aikawa
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), 17 Nov. 2023
  • Co-doping of hydrogen and boron in In2O3 toward highly flexible and transparent conducting oxide film
    K. Kibishi; S. Yamadera; T. Kobayashi; I. Takano; S. Aikawa
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), 17 Nov. 2023
  • Sn-doped α-Ga2O3 Films Grown Using Sn Source Solutions with Different Aging Times and Their Electrical Properties
    Ko. Yamada; T. Yamamoto; R. Yamada; Ka. Yamada; H. Nagai; S. Aikawa; T. Onuma; T. Honda; T. Yamaguchi
    The 22nd International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Fabrication of top-down and bottom-up MOSFET using α-In2O3 films grown by Mist CVD
    Y. Hayashi; A. Taguchi; S. Yamadera; T. Yamamoto; S. Aikawa; T. Onuma; H. Honda; T. Yamaguchi
    The 22nd International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • SiOx層挿入によるTiOx系ReRAMの動作安定化
    22 Sep. 2023
  • 還元雰囲気中スパッタによるSnO2ターゲットからのSnO製作
    19 Sep. 2023
  • HドープがIn2O3系アモルファス透明導電膜の柔軟性に与える影響
    19 Sep. 2023
  • 溶液プロセスで作製したLaドープIn2O3薄膜トランジスタのCO2ガス感度ドーパント濃度依存
    19 Sep. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるバルク内N2の評価
    19 Sep. 2023
  • CO2ガスセンシング特性に及ぼすInZnO TFTのZn濃度の影響
    19 Sep. 2023
  • 室温製作されたB-doped In2O3 TFTへのO2 plasma処理
    19 Sep. 2023
  • N2 および Ar/H2 アニールによる SnOx 薄膜の還元状態の比較
    17 Mar. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
    17 Mar. 2023
  • Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
    16 Mar. 2023
  • コスパッタ材料としてCaOおよびCaF2を用いたCa添加In2O3 TFTの作製と評価
    17 Mar. 2023
  • N2およびAr/H2アニールによるSnOx薄膜の還元状態の比較
    17 Mar. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
    17 Mar. 2023
  • Ar/H2雰囲気中でスパッタ成膜したSnO2薄膜の特性評価
    17 Mar. 2023
  • LaドープIn2O3薄膜トランジスタ特性の測定環境依存
    17 Mar. 2023
  • 熱処理不要なIn2O3系TFT実現に向けたBドーピング
    17 Mar. 2023
  • 硫黄蒸気輸送アニールを用いたSnS薄膜の作製と評価
    17 Mar. 2023
  • PET基板上に室温スパッタ成膜したBドープIn2O3透明導電膜の酸素分圧最適化
    16 Mar. 2023
  • TiOx系ReRAM特性におけるアニール温度の影響
    16 Mar. 2023
  • BドープIn2O3透明導電膜への水素ドーピングによる電気特性向上
    16 Mar. 2023
  • Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
    16 Mar. 2023
  • EB照射および熱処理によるC60ナノワイヤの電気・構造的変化
    15 Mar. 2023
  • Improvement of mechanical flexibility using completely amorphous B-doped In2O3 transparent conductive thin films
    S. Mori; K. Watanabe; K. Murano; S. Aikawa
    7th International Conference on Advances in Functional Materials (AFM 2022), 11 Jan. 2023
  • N2 concentration dependence of electrical conduction in partially nitrided SnOx thin-films deposited by reactive RF magnetron sputtering
    T. Kawaguchi; K. Watanabe; S. Aikawa
    7th International Conference on Advances in Functional Materials (AFM 2022), 11 Jan. 2023
  • CO2 gas sensing using thin-film transistors with co-sputtered In2O3/CaO reactive channel
    A. Nodera; S. Mori; S. Aikawa
    7th International Conference on Advances in Functional Materials (AFM 2022), 10 Jan. 2023
  • Hole generation mechanism in n-type SnOx after N2 post-deposition annealing
    K. Watanabe; T. Kawaguchi; A. Nodera; Y. Kumamoto; S. Mori; S. Aikawa
    7th International Conference on Advances in Functional Materials (AFM 2022), 10 Jan. 2023
  • CO2 Gas Sensing by In2O3-Based Thin-Film Transistors
    A. Nodera; S. Mori; S. Aikawa
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Partial reduction of weakly-bonded oxygen in SnOx thin films by dissociated nitrogen atoms
    K. Watanabe; T. Kawaguchi; S. Aikawa
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Room-temperature deposited flexible B-doped In2O3 transparent conductive film
    S. Mori; K. Kibishi; S. Yamadera; A. Nodera; K. Watanabe; I. Takano; S. Aikawa
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • XPS analysis of the binding states in nitrogen-doped SnOx thin-films deposited by RF magnetron sputtering in N2 atmosphere
    T. Kawaguchi; K. Watanabe; S. Aikawa
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Deposition of nitrogen-doped titanium dioxide thin films via rf magnetron sputtering
    M. Martinez; T. Onuma; H. Nagai; T. Honda; S. Aikawa; T. Yamaguchi; M. Vasquez Jr.
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Comparative study of room-temperature deposited ITO and B-doped In2O3 on PET for flexible transparent electrode application
    S. Mori; K. Kibishi; S. Yamadera; A. Nodera; K. Watanabe; I. Takano; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Optimization of N2 concentration in Ar/N2 sputtering deposition for p-type N-doped SnOx thin-film
    T. Kawaguchi; K. Watanabe; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Experimental investigation of the local bonding states of nitrogen-doped SnOx thin-film
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Crystal-plane dependence of CO2 sensitivity on In2O3-based thin-film transistors
    A. Nodera; S. Mori; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Indium oxide-based thin film transistor with high CO2 sensitive (400) plane
    A. Nodera; S. Mori; S. Aikawa
    2022 International Conference on Solid State Devices and Materials (SSDM 2022), 28 Sep. 2022
  • Nitrogen incorporation in SnO2 matrix for passivation of oxygen vacancy and hole generation
    K. Watanabe; T. Kawaguchi; S. Aikawa
    2022 International Conference on Solid State Devices and Materials (SSDM 2022), 28 Sep. 2022
  • Room-temperature processable highly amorphous transparent B-doped In2O3 for use as a flexible conductive film
    S. Mori; A. Nodera; K. Watanabe; K. Murano; S. Aikawa
    2022 International Conference on Solid State Devices and Materials (SSDM 2022), 27 Sep. 2022
  • 窒素アニール還元反応によるSnOx薄膜の局所結合状態
    21 Sep. 2022
  • Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOx­­­の特性評価
    21 Sep. 2022
  • In2O3結晶相転移によるTFT型CO2ガスセンサーの特性向上
    23 Sep. 2022
  • Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOxの特性評価
    21 Sep. 2022
  • 窒素アニール還元反応によるSnOx薄膜の局所結合状態
    21 Sep. 2022
  • PET基板上に成膜したITOおよびBドープIn2O3のフレキシブル透明導電膜としての特性比較
    20 Sep. 2022
  • ZrOx系ReRAMにおける電極界面へのSiOx層挿入効果
    25 Mar. 2022
  • In2O3系TFTを用いたCO2ガス検知
    23 Mar. 2022
  • 窒素雰囲気スパッタリングおよびアニールしたSnOx薄膜の部分的窒化の影響
    23 Mar. 2022
  • p型窒素ドープSnOxにおけるホール生成の起源
    23 Mar. 2022
  • アモルファスBドープIn2O3透明導電膜における機械的柔軟性の膜厚依存
    23 Mar. 2022
  • Hole移動度向上に向けたSnOx薄膜上へのCYTOP塗布
    23 Mar. 2022
  • In2O3:CaF2透明導電膜の結晶構造および結合状態解析
    23 Mar. 2022
  • 低蛍光強度の透明導電膜の形成
    23 Mar. 2022
  • p-type conversion of n-type SnOx thin-films by post-deposition N2 annealing
    K. Watanabe; T. Kawaguchi; N. Wakabayashi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    Material Research Meeting 2021 (MRM2021), 14 Dec. 2021
  • Remarkable mechanical flexibility of intentionally strain-induced amorphous B-doped In2O3 transparent conductive film
    S. Mori; Y. Ichinoseki; K. Watanabe; K. Murano; K. Oe; S. Aikawa
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Trade-off relation of F concentration in CaF2 co-sputtered In2O3-based transparent conductive film
    K. Oe; S. Mori; K. Watanabe; S. Aikawa
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • p-type behavior of lattice-expanded SnOx by post-deposition N2 annealing
    K. Watanabe; T. Kawaguchi; S. Aikawa
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Understanding the switching mechanism of stacked ZrO2-based ReRAM by insertion of SiOx thin layer at the electrode interfaces
    K. Toyama; R. Akiyama; K. Yuki; S. Aikawa
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • 歪み導入したアモルファスBドープIn2O3透明導電膜の機械的柔軟性
    18 Nov. 2021
  • 反応性スパッタにより作製したn型SnOx薄膜へのN2アニールによる結合状態と電気特性への影響
    18 Nov. 2021
  • CaF2とコスパッタ成膜したIn2O3透明導電薄膜の光学的および電気的特性評価
    18 Nov. 2021
  • Role of Ca in CaF2 incorporated In2O3 transparent conductive films
    K. Oe; S. Mori; K. Watanabe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Demonstration of flexible transparent conductive film using B-doped In2O3
    S. Mori; Y. Ichinoseki; K. Watanabe; K. Murano; K. Oe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Improvement of noble metal-free ReRAM characteristics by insertion of thin SiOx layer at the ZrOx/electrode interfaces
    K. Toyama; R. Akiyama; K. Yuki; S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 26 Oct. 2021
  • Charge transfer and conduction type conversion in n-type SnO2 thin films by nitrogen annealing
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 26 Oct. 2021
  • CaF2ドープIn2O3透明導電膜における表面ラフネスおよび導電率のドーパント濃度依存性
    12 Sep. 2021
  • BドープIn2O3透明導電膜における微量不純物濃度での移動度向上
    12 Sep. 2021
  • 窒素アニールによるn型SnO2薄膜の電荷移動と伝導型変換
    12 Sep. 2021
  • Post-deposition N2 annealing of n-type SnOx thin-films for carrier-type conversion
    K. Watanabe; S. Aikawa
    2021 International Conference on Solid State Devices and Materials (SSDM 2021), 07 Sep. 2021
  • 窒素アニールによるn型SnOx薄膜の伝導型変換
    03 Sep. 2021
  • CaF2ドープ In2O3透明導電膜におけるCaとFの効果
    03 Sep. 2021
  • BドープIn2O3透明導電膜におけるドーパント濃度の依存性
    02 Sep. 2021
  • SiOx層挿入によるZrOx系ReRAMの動作サイクル改善
    19 Mar. 2021
  • In2O3系透明導電膜におけるFの有効ドーピング濃度
    19 Mar. 2021
  • 高性能p型SnO TFTに向けた窒素アニール条件の検討
    17 Mar. 2021
  • PET基板上ITO透明導電膜へのストレス印加による電気的・形態的変化
    17 Mar. 2021
  • ホウ素ドープ酸化インジウム透明導電膜に対するアニール条件の比較
    17 Mar. 2021
  • In2O3 TFTバックチャネルへの絶縁膜溶液塗布の影響
    17 Mar. 2021
  • Enhancement of electrical stability of ZrOx-based ReRAM by insertion of SiOx interlayers
    K. Toyama; D. Naniwa; S. Aikawa
    MANA International Symposium 2021, 02 Mar. 2021
  • Optimization of fluorine concentration in In2O3 transparent conductive film
    K. Oe; S. Aikawa
    MANA International Symposium 2021, 02 Mar. 2021
  • Si-based Schottky barrier solar cells using boron incorporated In2O3 transparent electrode
    S. Aikawa; Y. Shibata; Y. Morinaga
    21st International Union of Materials Research Societies- International Conference in Asia (IUMRS-ICA 2020), 26 Feb. 2021
  • Electrical characterization of ReRAM using ZrOx/SiOx resistive switching layer
    K. Toyama; S. Aikawa
    21st International Union of Materials Research Societies- International Conference in Asia (IUMRS-ICA 2020), 25 Feb. 2021
  • Fabrication and characterization of In2O3 transparent conductive films co-sputtered with CaF2
    K. Oe; S. Aikawa
    21st International Union of Materials Research Societies- International Conference in Asia (IUMRS-ICA 2020), 25 Feb. 2021
  • Electrical characterization of Zr-based ReRAM with a sandwiched resistive switching layer
    K. Toyama; D. Naniwa; S. Aikawa
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Fluorine concentration dependence on electrical and optical properties of In2O3 transparent film
    K. Oe; S. Aikawa
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Comparative characterization of Si Schottky solar cells using B‐doped In2O3 and ITO transparent electrodes
    S. Aikawa; Y. Shibata; Y. Morinaga
    33rd International Microprocesses and Nanotechnology Conference (MNC 2020), 09 Nov. 2020
  • Investigation of CaF2 doping on electrical and optical properties of In2O3 transparent conductive film
    K. Oe; S. Aikawa
    33rd International Microprocesses and Nanotechnology Conference (MNC 2020), 09 Nov. 2020
  • Influence of SiOx interlayer on electrical properties of noble metal-free ZrOx-based resistive switching memory devices
    K. Toyama; D. Naniwa; S. Aikawa
    33rd International Microprocesses and Nanotechnology Conference (MNC 2020), 09 Nov. 2020
  • B-doped In2O3 Transparent Electrode for Si-based Schottky Barrier Solar Cell Application
    S. Aikawa; Y. Shibata; Y. Morinaga
    IEEE NANO 2020: the 20th IEEE International Conference on Nanotechnology, 30 Jul. 2020
  • 修飾ゲート絶縁膜表面の濡れ性がアモルファスIn2O3TFTの電気的特性に及ぼす影響
    15 Mar. 2020
  • CaF2をコスパッタした酸化インジウム透明導電膜の作製と評価
    15 Mar. 2020
  • ZrOx/SiOx二層抵抗変化層を用いたReRAMの電気特性評価
    13 Mar. 2020
  • Light-isolation of micro-LED pixels integrated in Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi; T. Honda
    The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019), 11 Nov. 2019
  • Hydrophobic Fluoropolymer Interlayer between In2O3 Semiconductor and SiO2 Gate Insulator for Improvement of Thin-Film Transistor Performance
    K. Sasaki; K. Nakamura; Y. Shibata; S. Aikawa
    32nd International Microprocesses and Nanotechnology Conference (MNC 2019), 31 Oct. 2019
  • Investigation of measurement environmental sensitivity in amorphous indium oxide-based thin-film transistors
    K. Nakamura; K. Sasaki; Y. Shibata; K. Oe; S. Aikawa
    32nd International Microprocesses and Nanotechnology Conference (MNC 2019), 29 Oct. 2019
  • Electrical properties of In2O3 thin-film transistors under vacuum and inert environments
    K. Nakamura; K. Sasaki; Y. Shibata; K. Oe; S. Aikawa
    AVS 66th International Symposium & Exhibition, 24 Oct. 2019
  • Fabrication of LED pixels of 16 x 16 array structure using Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi; T. Honda
    The 13th International Conference on Nitride Semiconductors 2019 (ICNS-13), 09 Jul. 2019
  • Fabrication of micro-LED display of 16 x 16 array structure using Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi; T. Honda
    The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'19), 24 Apr. 2019
  • TFT素子安定化に向けたアモルファスInSiO薄膜
    30 Mar. 2018, [Invited]
  • Fabrication of TFT using amorphous In2O3 thin film by mist CVD
    T. Kobayashi; K. Sawamoto; S. Aikawa; T. Yamaguchi; T. Onuma; T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 01 Nov. 2017
  • Si-Incorporated Amorphous Indium Oxide-Based Thin-Film Transistors for Stable Operation
    S. Aikawa
    BIT’s 7th Annual World Congress of Nano Science & Technology – 2017, 24 Oct. 2017, [Invited]
  • 急峻なサブスレッショルドスロープを持つALD-AlOxゲート絶縁膜アモルファスInSiO TFT
    07 Sep. 2017
  • ALDで形成した薄膜InOx高移動度TFT
    07 Sep. 2017
  • Unipolar n-type conversion of carbon nanotube field-effect transistors passivated by positively charged polymer
    S. Aikawa
    IUMRS-ICAM 2017: The 15th International Conference on Advanced Materials, 30 Aug. 2017, [Invited]
  • 酸化物透明導電膜およびアモルファス酸化物TFTに向けた実用材料開発
    13 Jul. 2017
  • Incorporation of high bond-dissociation energy dopants for low-temperature processable stable InOx-based thin-film transistors
    S. Aikawa
    CCMR 2017: Collaborative Conference on Materials Research 2017, 29 Jun. 2017, [Invited]
  • 逆電解処理によるGaAsナノワイヤTFTの移動度向上
    14 Sep. 2016
  • Hydrogen Exposure Effects on Anodically Etched GaAs Nanowires in Liquid Electrolyte
    S. Aikawa; K. Yamada; H. Hashimoto; H. Asoh; S. Ono
    IEEE NANO 2016: 16th INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY, 23 Aug. 2016
  • Mist-CVD-Grown Crystalline In2O3 Thin-Film Transistors with Low Off-State Current
    S. Aikawa; K. Tanuma; T. Kobayashi; T. Yamaguchi; T. Onuma; T. Honda
    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18), 11 Aug. 2016
  • 製造プロセスに鈍感な新元素構成アモルファス酸化物薄膜トランジスタ
    12 Jul. 2016
  • アノードエッチングにより作製したGaAsナノワイヤの電気特性に対する湿式水素曝露効果
    20 Mar. 2016
  • 二層InSiO薄膜トランジスタの水素還元とオゾン酸化効果
    19 Mar. 2016
  • Electrical and Structural Characterization of Anodically Etched GaAs Nanowires Towards Functional Electronic Devices
    S. Aikawa; K.Yamada; H. Asoh; H. Hashimoto; Y.-I. Kim; E. Nishikawa; S. Ono
    28th International Microprocesses and Nanotechnology Conference (MNC 2015), 12 Nov. 2015
  • Low-temperature Processable Amorphous In-W-O Thin-film Transistors
    T. Kizu; S. Aikawa; N. Mitoma; M. Shimizu; X. Gao; M-F. Lin; T. Nabatame; K. Tsukagoshi
    The 9th International Conference on the Science and Technology for Advanced Ceramics (STAC-9) & The 9th Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9), 20 Oct. 2015
  • アノードエッチングで作製したGaAsナノワイヤの電気伝導特性
    15 Oct. 2015
  • 二層InSiO構造を用いた薄膜トランジスタ
    15 Sep. 2015
  • 過剰酸素の抑制による真空環境で安定なIn-Si-O TFT
    13 Sep. 2015
  • アノードエッチングで作製したGaAsナノワイヤの表面構造と物性評価
    12 Sep. 2015
  • アモルファス酸化インジウム薄膜トランジスタにおける電荷密度および移動度の添加元素依存性
    11 Mar. 2015
  • 低温プロセスで高移動度かつ高安定なa-InWO TFT
    18 Sep. 2014
  • シリコン添加により制御された酸化インジウム薄膜トランジスタ
    18 Sep. 2014
  • Influence of electrical properties for IGZO TFT with Al2O3 gate insulators by PE-ALD method
    K. Kurishima; T. Nabatame; M. Shimizu; S. Aikawa; K. Tsukagoshi; A. Ohi; T. Chikyo; A. Ogura
    14th International Conference on Atomic Layer Deposition 2014 (ALD 2014), 17 Jun. 2014
  • Fabrication and Characterization of Nitrogen-Induced Single-Walled Carbon Nanotubes Field-Effect Transistors
    S. Kim; T. Thurakitseree; S. Aikawa; T. Inoue; S. Chiashi; S. Maruyama
    The Fifteenth International Conference on the Science and Application of Nanotubes, 04 Jun. 2014
  • Influence of Al2O3 Gate Dielectric on Transistor Properties for Igzo Thin Film Transistor
    Kazunori Kurishima; Toshihide Nabatame; Maki Shimizu; Shinya Aikawa; Kazuhito Tsukagoshi; Akihiko Ohi; Toyohiro Chikyow; Atsushi Ogura
    225th ECS Meeting, 14 May 2014
  • PE-ALD法で作製したAl2O3絶縁膜を用いたIGZO-TFTの電気特性
    19 Mar. 2014
  • PE-ALD法で作製したAl2O3絶縁膜を用いたIGZO-TFTの電気特性の変化
    24 Jan. 2014
  • Transport characteristics for nitrogen-doped horizontally aligned single-walled carbon nanotubes
    Sungjin Kim; Theerapol Thurakitseree; Shinya Aikawa; Taiki Inoue; Shohei Chiashi; Shigeo Maruyama
    4th A3 Symposium on Emerging Materials: Nanomaterials for Energy and Electronics, 13 Nov. 2013
  • Highly Stable n-Doped Graphene Field-Effect Transistors via Polyvinyl Alcohol Films
    Sungjin Kim; Pei Zhao; Shinya Aikawa; Erik Einarsson; Shohei Chiashi; Shigeo Maruyama
    5th International Conferences on Recent Progress in Graphene Research, 12 Sep. 2013
  • InOx-based metal oxide semiconductors for TFT applications
    S. Aikawa
    Workshop on Molecular Thermal Engineering, 05 Jul. 2013
  • Fabrication of Flexible Graphene Field-Effect Transistors with Single-Walled Carbon Nanotube Electrodes
    Sungjin Kim; Shinya Aikawa; Pei Zhao; Bo Hou; Erik Einarsson; Shohei Chiash; Shigeo Maruyama
    2012 MRS Fall Meeting, 29 Nov. 2012
  • Single-walled Carbon Nanotube/Silicon Heterojunction Photovoltaic Cell
    Kehang Cui; Shuichiro Omiya; Pei Zhao; Theerapol Thurakitseree; Shinya Aikawa; Shohei Chiashi; Shigeo Maruyama
    2012 MRS Fall Meeting, 29 Nov. 2012
  • Influence of Polymer Coating on Device Properties of Carbon Nanotube Field-Effect Transistors
    Shinya Aikawa; Taiki Inoue; Erik Einarsson; Shohei Chiashi; Shigeo Maruyama
    2012 International Conference on Solid State Devices and Materials (SSDM 2012), 26 Sep. 2012
  • Optimization of Single-Walled Carbon Nanotube/Silicon Heterojunction Solar Cells
    12 Sep. 2012
  • 水中アーク放電を用いた金属内包カーボンナノチューブ合成における陰極金属の沸点の影響
    11 Sep. 2012
  • Development of Carbon Nanotube Flexible Transistors
    28 Jul. 2012
  • Tailored Synthesis of Single-walled Carbon Nanotubes for Applications
    Erik Einarsson; Theerapol Thurakitseree; Shinya Aikawa; Christian Kramberger; Shohei Chiashi; Eiichi Nishikawa; Shigeo Maruyama
    International Conference of Young Researchers on Advanced Materials (ICYRAM 2012), 04 Jul. 2012
  • Characterization of single-walled carbon nanotubes and graphene-based field-effect transistors
    Sungjin Kim; Shinya Aikawa; Pei Zhao; Erik Einarsson; Shohei Chiashi; Shigeo Maruyama
    2nd International Symposium on Terahertz Nanoscience, 04 Jul. 2012
  • CVD synthesis of small-diameter nitrogen-doped single-walled carbon nanotubes using acetonitrile
    Erik Einarsson; Theerapol Thurakitseree; Christian Kramberger; Pei Zhao; Shinya Aikawa; Shohei Chiashi; Shigeo Maruyama
    Thirteenth International Conference on the Science and Application of Nanotubes, 24 Jun. 2012
  • Influence of nitrogen incorporation on the diameter of single-walled carbon nanotubes
    Theerapol Thurakitseree; Christian Kramberger; Pei Zhao; Shinya Aikawa; Sivasankaran Harish; Shohei Chiashi; Erik Einarsson; Shigeo Maruyama
    Thirteenth International Conference on the Science and Application of Nanotubes, 24 Jun. 2012
  • Deformable carbon nanotube transistor using polyvinyl alcohol dielectrics
    S. Aikawa
    International Workshop on Carbon Nanotubes and Graphene, 15 Jun. 2012
  • Ambipolar Behavior in All-Carbon-Nanotube Field-Effect Transistors by Poly(Vinyl Alcohol) Coating
    Shinya Aikawa; Taiki Inoue; Erik Einarsson; Theerapol Thurakitseree; Shohei Chiashi; Shigeo Maruyama
    CNTNE2012: International Symposium on Carbon Nanotube Nanoelectronics, 12 Jun. 2012
  • Characterization of single-walled carbon nanotube and graphene composite devices
    Sungjin Kim; Shinya Aikawa; Pei Zhao; Erik Einarsson; Shohei Chiashi; Shigeo Maruyama
    CNTNE2012: International Symposium on Carbon Nanotube Nanoelectronics, 12 Jun. 2012
  • 透明なカーボンナノチューブフレキシブルトランジスタ
    01 Jun. 2012
  • Deformable Transparent All-Carbon-Nanotube Transistors
    S. Aikawa
    Aalto-Tokyo International Workshop of Carbon Nanotubes, 27 Mar. 2012
  • Reducing the diameter of vertically aligned single-walled carbon nanotubes by nitrogen doping: synthesis and spectroscopy study
    27 Mar. 2012
  • 変形可能な透明オールナノチューブトランジスタ
    27 Mar. 2012
  • Reducing the diameter of vertically aligned single walled carbon nanotubes by Nitrogen doping: Synthesis and Spectroscopy study
    T. Thurakitseree; C. Kramberger; P. Zhao; S. Aikawa; S. Harish; S. Chiashi; E. Einarsson; S. Maruyama
    26th International Winterschool on Electronic Properties of Novel Materials (IWEPNM 2012), 08 Mar. 2012
  • as-grown単層CNTを用いた薄膜トランジスタの作製と特性評価
    08 Mar. 2012
  • アセトニトリルを用いた小径・窒素ドープ単層CNTのCVD合成
    06 Mar. 2012
  • Toward graphene and single-walled carbon nanotube composite devices
    06 Mar. 2012
  • Thermal Conductivity of Single-Walled Carbon Nanotube Suspensions in Ethylene Glycol: Experimental Results and Theoretical Limits
    S. Harish; K. Ishikawa; E. Einarsson; S. Aikawa; M. Watanabe; S. Chiashi; J. Shiomi; S. Maruyama
    4th International Symposium on Heat Transfer and Energy Conservation (ISHTEC 2012), 07 Jan. 2012
  • Increasing the Thermal Conductivity of Fluids by adding Single-Walled Carbon Nanotubes encapsulated in Sodium Deoxycholate
    S. Harish; K. Ishikawa; E. Einarsson; T. Inoue; S. Aikawa; P. Zhao; S. Chiashi; J. Shiomi; S. Maruyama
    7th US-Japan Joint Seminar on Nanoscale Transport Phenomena - Science and Engineering -, 12 Dec. 2011
  • Simple Synthesis Method for Carbon Nanotubes from Aromatic Compounds by Liquid-Phase Arc Plasma
    Takio Kizu; Kentaro Takekoshi; Shinya Aikawa; Eiichi Nishikawa
    6th International Symposium on Surface Science (ISSS-6), 12 Dec. 2011
  • One-Step Encapsulation of Metal Particle with High-Melting into Carbon Nanotubes by Pulsed Arc Discharge in Water
    Kentaro Takekoshi; Takio Kizu; Shinya Aikawa; Eiichi Nishikawa
    6th International Symposium on Surface Science (ISSS-6), 12 Dec. 2011
  • Fabrication of flexible thin film transistors using single-walled carbon nanotubes and graphene
    S.J. Kim; S. Aikawa; B. Hou; E. Einarsson; S. Chiashi; and S. Maruyama
    24th International Microprocesses and Nanotechnology Conference (MNC 2011), 27 Oct. 2011
  • Extremely Flexible All-Carbon Nanotube Field-Effect Transistors Without Device Degradation
    Shinya Aikawa; Erik Einarsson; Shohei Chiashi; Eiichi Nishikawa; Shigeo Maruyama
    24th International Microprocesses and Nanotechnology Conference (MNC 2011), 26 Oct. 2011
  • Synthesis of small-diameter single-walled carbon nanotubes from acetonitrile
    Theerapol Thurakitseree; Christian Kramberger; Pei Zhao; Shinya Aikawa; S. Harish; Shohei Chiashi; Erik Einarsson; Shigeo Maruyama
    A3 Symposium of Emerging Materials: Nanomaterials for Energy & Environments, 13 Oct. 2011
  • Toward the Realization of Narrow Diameter Distribution in As-Grown Single-Walled Carbon Nanotubes
    T. Thurakitseree; C. Kramberger; S. Aikawa; P. Zhao; S. Harish; S. Chiashi; E. Einarsson; S. Maruyama
    TeraNano PIRE Kick-Off Meeting, 07 Oct. 2011
  • Ambipolar Conversion of Polymer-Coated All Single-Walled Carbon Nanotube Field-Effect Transistors
    Shinya Aikawa; Erik Einarsson; Shohei Chiashi; Eiichi Nishikawa; Shigeo Maruyama
    2011 International Conference on Solid State Devices and Materials (SSDM 2011), 29 Sep. 2011
  • 液中金属間パルスアーク法によるカーボンナノチューブ合成と電極表面の時間変化観察
    21 Sep. 2011
  • 水中パルスアーク放電による金属内包カーボンナノチューブの一段合成:充填率のパルス幅依存性
    21 Sep. 2011
  • 変形可能なオールナノチューブ両極性トランジスタ
    15 Sep. 2011
  • 貼り合わせ法で作製されたオールナノチューブフレキシブルトランジスタの特性評価
    07 Sep. 2011
  • 液中金属間アーク法によるカーボンナノチューブ合成と液中プラズマの発光分析
    07 Sep. 2011
  • 水中パルスアーク放電を用いた金属内包カーボンナノチューブのワンステップ合成
    07 Sep. 2011
  • アセトニトリルからの(6,5)単層カーボンナノチューブの選択的合成
    06 Sep. 2011
  • 液中パルスアーク法によるキシレンからのカーボンナノチューブ合成
    31 Aug. 2011
  • 水中パルスアーク放電による金属内包カーボンナノチューブの一段合成
    31 Aug. 2011
  • 変形可能なオールカーボンナノチューブ両極性トランジスタ
    30 Aug. 2011
  • Flexible, Transparent, and Metal-Free Single-Walled Carbon Nanotube Field-Effect Transistors
    Shinya Aikawa; Erik Einarsson; Taiki Inoue; Shohei Chiashi; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    NT11: International Conference on the Science and Application of Nanotubes, 11 Jul. 2011
  • 柔軟で透明,金属不要な単層カーボンナノチューブトランジスタ
    03 Jun. 2011
  • 極めて柔軟な all-SWNT 電界効果トランジスタ
    26 Mar. 2011
  • Effect of catalyst preparation on diameter of single-walled carbon nanotubes synthesized by alcohol CVD
    Theerapol Thurakitseree; Erik Einarsson; Rong Xiang; Shinya Aikawa; Shohei Chiashi; Junichiro Shiomi; Shigeo Maruyama
    APS March Meeting 2011, 23 Mar. 2011
  • 非常に柔軟なAll-SWNT電界効果トランジスタ
    08 Mar. 2011
  • Carbon Nanotubes Synthesis in Liquid Xylene by Low-frequency Pulsed Arc Discharge Using Copper Electrodes: An Effect of Current Waveform
    Takio Kizu; Shinya Aikawa; Kentarou Takekoshi; Eiichi Nishikawa
    ISPlasma 2011: 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 07 Mar. 2011
  • Highly Flexible All-SWNT Field-Effect Transistors
    04 Mar. 2011
  • High-precision localized growth of single-walled carbon nanotubes and its applications
    R. Xiang; S. Aikawa; E. Einarsson; S. Maruyama
    The 2010 International Chemical Congress of Pacific Basin Societies (Pacifichem), 20 Dec. 2010
  • Carbon nanotubes synthesis in liquid xylene by low-frequency pulsed arc discharge using metal electrodes
    Takio Kizu; Shinya Aikawa; Masakazu Okabe; Eiichi Nishikawa
    The 2010 International Chemical Congress of Pacific Basin Societies (Pacifichem), 17 Dec. 2010
  • Precisely localized synthesis of single-walled carbon nanotubes for applications
    E. Einarsson; S. Aikawa; R. Xiang; S. Chiashi; J. Shiomi; E. Nishikawa; S. Maruyama
    The 2010 International Chemical Congress of Pacific Basin Societies (Pacifichem), 17 Dec. 2010
  • 収束電子線照射でスパッタされたニッケル微粒子によるアモルファスカーボン薄膜のグラファイト化
    02 Dec. 2010
  • One-Step Fabrication of High-Performance All-SWNT Field-Effect Transistors by Patterned Growth Technique
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Shohei Chiashi; Shigeo Maruyama
    A3 Symposium on Emerging Materials : Nanocarbons and Nanowires for Energy, 09 Nov. 2010
  • Horizontally-alignment growth of single-walled carbon nanotubes on quartz substrates
    Shohei Chiashi; Taiki Inoue; Theerapol Thurakitseree; Shinya Aikawa; Rong Xiang; Junichiro Shiomi; Shigeo Maruyama
    A3 Symposium on Emerging Materials : Nanocarbons and Nanowires for Energy, 09 Nov. 2010
  • Liquid-based site-selective deposition of catalyst for SWNT growth : Mechanism and applications
    Rong Xiang; Shinya Aikawa; Erik Einarsson; Taiki Inoue; Shohei Chiashi; Zi Kang Tang; Shigeo Maruyama
    A3 Symposium on Emerging Materials : Nanocarbons and Nanowires for Energy, 09 Nov. 2010
  • 液相アーク放電によるキシレンからのカーボンナノチューブ合成と生成物の突入電流依存性
    06 Nov. 2010
  • 液中アーク放電法による酸化ナトリウムナノワイヤーの合成
    06 Nov. 2010
  • 水中アーク放電を用いたカーボンナノチューブ合成における放電安定化と生成物の評価
    06 Nov. 2010
  • スクロース溶液中でのアーク放電における生成物の濃度依存
    06 Nov. 2010
  • Characterization of field-effect transistors using high-quality as-grown SWNTs from alcohol CVD
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Shohei Chiashi; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    AsiaNANO 2010, 02 Nov. 2010
  • Diameter controlled CVD synthesis of single-walled carbon nanotubes
    Theerapol Thurakitseree; Erik Einarsson; Rong Xiang; Shinya Aikawa; Shohei Chiashi; Junichiro Shiomi; Shigeo Maruyama
    AsiaNANO 2010, 01 Nov. 2010
  • 単層カーボンナノチューブの直径制御CVD合成
    15 Oct. 2010
  • Nano-DDSへの応用を考慮した金属内包CNTの合成
    15 Oct. 2010
  • 単層CNTのパターン合成による高性能FET簡易作製
    14 Oct. 2010
  • Simple Fabrication Technique for an Array of Field-effect Transistors Using High-quality as-grown Single-walled Carbon Nanotubes from Dip-coated Cat-alyst by Substrate Surface Modification
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Shohei Chiashi; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    2010 International Conference on Solid State Devices and Materials (SSDM 2010), 23 Sep. 2010
  • 単層カーボンナノチューブの水晶基板上における水平成長メカニズム
    16 Sep. 2010
  • 高性能all-SWNT電界効果トランジスタの作製と特性評価
    07 Sep. 2010
  • R面(101)水晶基板上でのSWNT水平配向成長
    07 Sep. 2010
  • Carbon nanotubes synthesis in liquid xylene by low-frequency pulsed arc discharge using metal electrodes: An effect of inrush current
    Takio Kizu; Shinya Aikawa; Kentarou Takekoshi; Eiichi Nishikawa
    The 16th International Conference on Crystal Growth(ICCG-16), 12 Aug. 2010
  • R面水晶基板上でのカーボンナノチューブの水平配向成長
    02 Aug. 2010
  • Characterization of Thin Film Transistor Using As-grown Single-walled Carbon Nanotubes from Dip-coated Catalyst by Patterned Removal of Self-assembled Monolayer
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Asahi Kitabatake; Shohei Chiashi; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    Eleventh International Conference on the Science and Application of Nanotubes, 01 Jul. 2010
  • 基板の表面改質を利用した選択的触媒担持法によるas-grown単層カーボンナノチューブFETの作製と特性評価
    14 May 2010
  • Patterned CVD Growth of Single-Walled Carbon Nanotubes for a Thin-Film Transistor
    Shigeo Maruyama; Rong Xiang; Shinya Aikawa; Erik Einarsson; Shohei Chiashi; Junichiro Shiomi
    2010 MRS Spring Meeting, 08 Apr. 2010
  • 収束電子線照射で生成されたニッケルナノ粒子によるアモルファスカーボン薄膜のグラファイト化
    19 Mar. 2010
  • 液相アーク放電によるキシレンからのカーボンナノチューブ合成においてアークプラズマの特性が合成物へ与える影響
    19 Mar. 2010
  • 単層カーボンナノチューブのパターン成長法を用いた薄膜トランジスタの作製と特性評価
    18 Mar. 2010
  • One-step Fabrication of Single-Walled Carbon Nanotubes Thin Film Transistor by Patterned Growth
    02 Mar. 2010
  • 溶液を炭素原子供給源 を炭素原子供給源とする液中アーク放電による,カーボンナノチューブの合成
    03 Feb. 2010
  • Graphitization of an Amorphous Carbon Film under Electron Beam Irradiation Catalysed by Metal Particles
    S. Aikawa; T. Kizu; E. Nishikawa
    7th International Symposium on Atomic Level Characterizations for New Materials and Devices '09, 08 Dec. 2009
  • Carbon Nanotubes Synthesis in Water by Arc Discharge Using Metal Electrodes
    T. Kizu; S. Aikawa; E. Nishikawa
    7th International Symposium on Atomic Level Characterizations for New Materials and Devices '09, 08 Dec. 2009
  • 水中アーク放電法をベースとした金属電極間放電によるスクロース溶液からの多層カーボンナノチューブの合成
    14 Nov. 2009
  • 液相アーク放電によるキシレンからのカーボンナノチューブ合成において電極材料が合成物へ与える影響
    14 Nov. 2009
  • スクロース溶液の濃度を変化させた場合における液中アーク放電の特性とその生成物
    14 Nov. 2009
  • Patterned Growth of SWNTs for Facile Fabrication of Field Effect Transistor Device
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    The 6th Korea-Japan Symposium on Carbon Nanotube, 27 Oct. 2009
  • Optimization of catalyst deposition by spin-coating for synthesis of vertically-aligned single-walled carbon nanotube arrays
    15 Oct. 2009
  • High Precision Site-selective Growth of SWNTs and its Applications
    03 Sep. 2009
  • Carbon Nanotubes Synthesis in Liquid Xylene by Arc Discharge Using Metal Electrodes
    03 Sep. 2009
  • Facile Fabrication and characterization of a Field Effect Transistor using As-grown Single-Walled Carbon Nanotubes
    02 Sep. 2009
  • Precisely Localized As-grown Single-Walled Carbon Nanotubes for Facile Fabrication of a Field Effect Transistor Device
    Shinya Aikawa; Rong Xiang; Erik Einarsson; Junichiro Shiomi; Eiichi Nishikawa; Shigeo Maruyama
    10th International Conference on the Science and Application of Nanotubes (NT09), 25 Jun. 2009
  • Carbon nanomaterial synthesis from o-xylene using arc discharge method with copper electrodes
    02 Feb. 2009
  • 水中アーク放電法による異種電極材料を用いたカーボンナノマテリアルの合成
    02 Sep. 2008
  • スクロースからのカーボン・ナノマテリアルの合成
    29 Mar. 2008
  • 水中アーク放電法による異種電極材料を用いたカーボンナノマテリアルの合成
    05 Sep. 2007

Works

  • 柔軟・室温形成可能な従来材料よりも透明な導電薄膜
    Aug. 2021 - Sep. 2021, Others
  • 移動度と動作安定性を同時に向上させた2層薄膜トランジスタ
    Aug. 2019 - Aug. 2019, Others
  • 現行プロセスに完全コンパチブルな新開発透明導電膜
    Aug. 2018 - Aug. 2018, Others
  • 既存材料ITOを凌駕する超透明な酸化物導電膜
    Oct. 2017 - Oct. 2017, Others
  • 既存材料ITOを凌駕する超透明な酸化物導電膜
    Aug. 2017 - Sep. 2017, Others
  • 酸化物透明導電膜およびアモルファス酸化物TFTに向けた実用材料開発
    Jul. 2017 - Jul. 2017, Others
  • 有機ELディスプレイの高効率化に貢献できる高仕事関数を有する透明導電膜
    Aug. 2016 - Aug. 2016, Others
  • 製造条件に左右されない高安定なアモルファス酸化薄膜トランジスタ
    Aug. 2015 - Aug. 2015, Others

Industrial Property Rights

  • 特願2020-030951, 透明導電膜の形成方法、透明導電膜、導電膜付基板、及びタッチパネル
  • 特許登録第6440169号, 特願2015-508772, 有機EL素子及びその製造方法
  • 特許登録第6308583号, 特願2014-016635, 薄膜トランジスタ、薄膜トランジスタの製造方法および半導体装置
  • 特許登録第6296463号, 特願2016-213693, 薄膜トランジスタおよびその製造方法
  • 特許登録第6273606号, 特願2014-016633, 固定電荷を内部に誘起したゲート絶縁膜
  • 特許登録第6261125号, 特願2014-016630, 酸化物薄膜トランジスタおよびその製造方法
  • 特許登録第6260992号, 特願2014-016634, 薄膜トランジスタおよびその製造方法
  • 特許登録第6252903号, 特願2014-016273, 薄膜トランジスタおよびその製造方法
  • 特許登録第6252904号, 特願2014-016631, 酸化物半導体およびその製法
  • 9825180, 15/248567, THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
    T. Nabatame; K. Tsukagoshi; S. Aikawa; T. Chikyo
  • 特許登録第6241848号, 特願2014-016632, 薄膜トランジスタの構造、薄膜トランジスタの製造方法および半導体装置
  • 9741864, 14/889919, THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
    T. Nabatame; K. Tsukagoshi; S. Aikawa
  • 特願2017-119702, 透明導電膜、透明導電膜つき透明基板、透明導電膜つき透明基板の製造方法、タッチパネル
  • 特許登録第6120386号, 特願2015-515874, 薄膜トランジスタおよびその製造方法
  • 特願2016-244357, メガネ型装具
  • 特願2016-094691, ドーピング方法、導電性構造体の製造方法、繊維状構造の製造方法、及び薄膜トランジスタの製造方法
  • 特許登録第5846563号, 特願2014-521410, 薄膜トランジスタ、薄膜トランジスタの製造方法および半導体装置
  • PCT/JP2015/051845, 薄膜トランジスタ、酸化物半導体、およびその製造方法
  • PCT/JP2014/062188, 薄膜トランジスタおよびその製造方法
  • PCT/JP2014/059190, 有機EL素子及びその製造方法
  • 特願2014-016266, 薄膜トランジスタおよびその製造方法
  • 特願2013-139425, 薄膜トランジスタおよびその製造方法
  • PCT/JP2013/066384, 薄膜トランジスタ、薄膜トランジスタの製造方法および半導体装置
  • 10-2014-7012459, 薄膜トランジスタ、薄膜トランジスタの製造方法および半導体装置
  • 特願2013-099284, 薄膜トランジスタおよびその製造方法
  • 特願2013-067782, 有機EL素子
  • 特願2013-067801, 有機EL素子及びその製造方法
  • 特願2013-068164, 有機EL素子及びその製造方法
  • 特願2008-97578, カーボンナノ粒子及びカーボンナノチューブ製造方法

Award

  • Jan. 2024
    Fabrication of Tin Oxide/Nitrogen-doped Titanium Dioxide Heterojunction Thin Films
    5th International Symposium of the Vacuum Society of the Philippines (ISVSP2024), Best Paper Presenter
    Melanie Martinez;Magdelano Vasquez Jr.;Tomohiro Yamaguchi;Shinya Aikawa, International society
  • Oct. 2020
  • Jul. 2013
  • Mar. 2007
  • Dec. 2006

Research Themes

Member History

  • Jul. 2023 - Mar. 2025
    エコシステム材料技術調査専門委員会委員
  • Apr. 2023 - Mar. 2025
    客員研究者
  • Apr. 2021 - Mar. 2023
    エマージングフレキシブルデバイス材料技術調査専門委員会委員
  • Jun. 2019 - May 2021
    東京支部協議委員
  • Apr. 2020 - Mar. 2021
    学生発表会ワーキンググループ
  • Dec. 2020 - Present
    Nanomaterials’ Reviewer Board