Yamaguchi Tomohiro

School of Advanced Engineering Department of Applied PhysicsProfessor

Career

  • Apr. 2021 - Present
    工学院大学
  • Apr. 2015 - Mar. 2021
    工学院大学
  • Jul. 2019 - Sep. 2019
    Paul-Drude-Institut für Festkörperelektronik (PDI), Berlin, Germany, Guest Researcher
  • Apr. 2011 - Mar. 2015
    工学院大学
  • Apr. 2011 - Mar. 2012
    立命館大学
  • Apr. 2010 - Mar. 2011
    立命館大学
  • Apr. 2007 - Mar. 2010
    立命館大学
  • Jan. 2004 - Mar. 2007
    University of Bremen(Germany), Institute of Solid State Physics, Prof. Hommel's Laboratory, PD

Affiliated academic society

  • Jul. 2009 - Present
    応用物理学会 結晶工学分科会
  • Sep. 2001 - Present
    応用物理学会
  • May 2000 - Present
    日本結晶成長学会

IDs

  • Identifiers

    研究者番号:50454517
    researchmap会員ID:6000028444
    J-Global ID:201101019043058621

Research Field

  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electric/electronic material engineering, Electron/Electric Material Engineering
  • Nanotechnology/Materials, Crystal engineering, Crystal engineering

Research theme

  • 01 Aug. 2017 - Present
  • 01 Apr. 2012 - Present
  • 01 Apr. 2011 - Present

Books and other publications

  • Indium Nitride and Related alloys (eds. T. D. Veal,C. F. McConville and W. J. Schaff) Chap. 1
    Y. Nanishi; T. Araki and T. Yamaguchi, Joint work
    CRC Press Taylor & Francis Group, Aug. 2009
  • Indium Nitride and Related alloys (eds. T. D. Veal,C. F. McConville and W. J. Schaff) Chap. 1
    2009
  • Vacuum Science and Technology: Nitrides as seen by the technology 2002 (Eds.: T. Paskova and B. Monema) Chap. 17
    2003
  • Vacuum Science and Technology: Nitrides as seen by the technology 2002 (Eds.: T. Paskova and B. Monema) Chap. 17
    Y. Nanishi; Y. Saito and T. Yamaguchi, Joint work
    Research Sigpost, Jan. 2003

Paper

MISC

Lectures, oral presentations, etc.

  • Deposition of transparent conducting oxide thin films using pressed powder targets
    M. R. Vasquez Jr.; R. G. B. Madera; T. Yamaguchi
    7th Asia-Pacific Conference on Plasma Physics, 13 Nov. 2023
  • ナノコラムLEDにおける連続的なITO電極形成技術
    22 Sep. 2023
  • (10-11)上GaInN/GaInN MQWs成長による高効率赤色発光
    21 Sep. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長-GaInNの成長温度依存性-
    21 Sep. 2023
  • 各種In系材料を出発原料に用いたMist CVD成長におけるα-In2O3薄膜の電気的特性に関する評価
    21 Sep. 2023
  • 高Mg組成岩塩構造MgZnO薄膜のミストCVD成長
    21 Sep. 2023
  • Mist CVD法によるα-GIO混晶成長とα線検出応用に向けた検討
    21 Sep. 2023
  • Mist CVD法Sn-doped α-Ga2O3薄膜成長におけるSn溶液の静置時間変化
    21 Sep. 2023
  • III族不純物ドープMgO薄膜の正孔捕獲中心
    20 Sep. 2023
  • Growth of AZO thin films from pressed-sintered powder targets under subatmospheric conditions
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr.
    20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 03 Aug. 2023
  • Growth of GaInN/GaInN MQWs on nanocolumns with thick GaInN buffer layer using RF-MBE
    H. Akagawa; J. Yamada; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; K. Kishino
    20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 31 Jul. 2023
  • Far UV optical properties of MgO homoepitaxial and Zn doped MgO films prepared by mist chemical vapor deposition method
    T. Onuma; W. Kosaka; H. Kusaka; K. Ogawa; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
    The 6th International Workshop on Ultraviolet Materials and Devices (IWUMD2023), 06 Jun. 2023, [Invited]
  • Sub-bandgap Transition in β-Ga2O3 Crystals Measured by Photoluminescence Excitation Spectroscopy
    T. Onuma; R. Adachi; K. Shoji; T. Yamaguchi; K. Sasaki; A. Kuramata; T. Honda; M. Higashiwaki
    Compound Semiconductor Week 2023 (CSW 2023), 01 Jun. 2023
  • 発光径Φ5μmのナノコラム発光デバイスの作製
    17 Mar. 2023
  • N2 および Ar/H2 アニールによる SnOx 薄膜の還元状態の比較
    17 Mar. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
    17 Mar. 2023
  • Mist CVD法による各種In系粉末を出発原料に用いたα-In2O3の成長機構に関する検討
    16 Mar. 2023
  • Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
    16 Mar. 2023
  • 窒素RFパワー変化によるナノコラム結晶のGaInNバッファ層形状均一化の検討
    15 Mar. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長における格子緩和過程観察
    15 Mar. 2023
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル(II)
    15 Mar. 2023
  • ミストCVD法によるIII族ドープ岩塩構造MgZnO薄膜成長
    15 Mar. 2023
  • Crystal growth of Cu3N by mist CVD with ethylenediamine
    S. Yoshida; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth of ZnO thin films via magnetron sputtering using a custom-made sintered target
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Study for composition control in mist CVD growth of α-GIO alloys
    K. Yamada; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Investigation on the stability of source solution for the α-In2O3 growth by mist CVD
    T. Yamamoto; A. Taguchi; R. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Roles of In doping in rocksalt-structured MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Realization of high mobility in α-In2O3 film grown by mist CVD with different concentration of In2O3 powder as source precursor
    A. Taguchi; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • TEM evaluation of in-situ nitrogen plasma irradiated GaInN
    A. Tokushige; S. Ohno; Y. Hayakawa; T. Honda; T. Onuma; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Electrical property and valence band offset in conductive MgNiO on sapphire substrates
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth and characterization of AlGaN and multiple quantum wells with varying III/V ratios by RF-MBE
    M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Structural analysis in epitaxial growth of GaInN by RF-MBE using XRD-RSM
    J. Takeuchi; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Twin-free α-Ga2O3 films grown by mist CVD on (0001) α-Al2O3 substrates
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 24 Nov. 2022
  • Fabrication of monolithic blue micro-LED pixels and investigation of full colorization
    H. Chikui; S. Takeda; T Onuma; T. Yamaguchi; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 17 Nov. 2022
  • Roles of In doped in MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Photocurrent spectra of rocksalt-structured MgZnO films in vacuum UV spectral range
    H. Kusaka; W. Kosaka; K. Ogawa; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Realization of near-band-edge cathodoluminescence in 190 nm wavelength range by rocksalt-structured MgZnO epitaxial films
    T. Onuma; K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Impact of gas type on formation of twin structure in the growth of a-Ga2O3 by mist chemical vapor deposition
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Growth and optical characteristics of high-Al content AlGaN on AlN templates by RF-MBE,under metal-rich conditions
    M. Hayasaki; N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Local composition distribution in high Al content AlGaN/AlN quantum wells grown by RF-MBE
    M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Mist CVD 法により成長した酸化インジウムの高移動度化に伴う新機能開拓
    12 Nov. 2022
  • Mist CVD 法 α-Ga2O3成長時に形成される双晶抑制に関する研究
    12 Nov. 2022
  • Mist CVD 法 α-In2O3 成長における原料溶液中の反応に関する検討
    12 Nov. 2022
  • RF-MBE による GaInN 成長における歪み緩和制御
    12 Nov. 2022
  • 岩塩構造 MgZnO/MgO ヘテロ接合の製作とバンドアライメント解析
    12 Nov. 2022
  • RF-MBE による β-Ga2O3(-201)基板上への AlN 及び GaN 成長において成長前処理が成長層に及ぼす影響
    12 Nov. 2022
  • Mist CVD 法を用いた Cu3N 成長における原料溶液の検討
    12 Nov. 2022
  • 顕微フォトルミネッセンス分光による β-Ga2O3 結晶の微細構造の可視化検討
    12 Nov. 2022
  • in-situ 窒素プラズマ照射された MBE 成長 GaInN の TEM 評価
    12 Nov. 2022
  • Fabrication of Nitrogen-doped TiO2 thin films
    12 Nov. 2022
  • Growth of ZnO thin films via magnetron sputtering using isostatically pressed-sintered powder targets
    12 Nov. 2022
  • RF-MBE 成長した Ga 極性及び N 極性 GaN 薄膜の比較検討
    12 Nov. 2022
  • ナノコラム成長における GaInN/GaInN MQWs のⅤ-Ⅲ族比依存性
    12 Nov. 2022
  • Experimental investigation of the local bonding states of nitrogen-doped SnOx thin-film
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Optimization of N2 concentration in Ar/N2 sputtering deposition for p-type N-doped SnOx thin-film
    T. Kawaguchi; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; S. Aikawa
    35th International Microprocesses and Nanotechnology Conference (MNC 2022), 10 Nov. 2022
  • Microstructural characterization of β-Ga2O3,crystals by photoluminescence mapping measurements
    K. Shoji; M. Nakanishi; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • Impact of RF power on electrical property of NiO films grown by RF magnetron spattering
    Akito Ishikawa; M. Murayama; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • RF-MBE growth of Mg doped GaN on β-Ga2O3,(-201) substrates
    T. Yamaguchi; M. Hayasaki; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • P-type conductivity in MgxNi1-xO films deposited on sapphire substrates by RF magnetron sputtering
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • Growth of α-In2O3 films with different concentrations of In2O3 powder used as source precursor by mist CVD
    A. Taguchi; K. Kaneko; K. Goto; T. Onuma; T. Honda; Y. Kumagai; S. Fujita; T. Yamaguchi
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • Temperature dependence of carrier concentration and Hall mobility in alpha-In2O3 films grown by mist CVD method
    A. Taguchi; T. Onuma; K. Goto; K. Kaneko; Y. Kumagai; T. Honda; S. Fujita; T. Yamaguchi
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Analyses of Band Alignment in Rocksalt-structured MgZnO/MgO Interface Grown by Mist CVD
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Importance of dissolving source precursor of Ga(C5H7O2)3 with HCl in mist CVD for α-Ga2O3 growth
    R. Yamada; A. Sekiguchi; T. Onuma; T. Honda; T. Yamaguchi
    2022 International Conference on Solid State Devices and Materials (SSDM202), 27 Sep. 2022
  • ナノコラム形状制御技術を用いた赤色発光ナノコラムμ-LED構造の成長と作製
    23 Sep. 2022
  • ミスト化学気相成長法コランダム構造酸化ガリウム薄膜のガス種による双晶形成への影響
    23 Sep. 2022
  • ミストCVD法によるInドープMgZnO薄膜の成長
    23 Sep. 2022
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル
    23 Sep. 2022
  • InドープMgO薄膜の発光特性
    23 Sep. 2022
  • その場XRD-RSM を用いたRF-MBE GaInNヘテロエピタキシャル成長における緩和過程観察
    22 Sep. 2022
  • RF-MBEによるInN緩衝層を用いたGaInNの格子緩和制御
    22 Sep. 2022
  • THVPE法におけるInGaN薄膜成長の膜厚制御性とヘテロ構造の検討
    21 Sep. 2022
  • Mist CVD法を用いたCu3N成長における安定した原料供給の検討
    21 Sep. 2022
  • 窒素アニール還元反応によるSnOx薄膜の局所結合状態
    21 Sep. 2022
  • Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOx­­­の特性評価
    21 Sep. 2022
  • Mist CVD法により成長したα-In2O3薄膜のキャリア濃度とホール移動度の温度依存性
    21 Sep. 2022
  • RF-MBE成長赤色発光MQWにおけるGaInN下地層挿入の効果
    20 Sep. 2022
  • 赤色ナノコラム成長におけるGaInNバッファ層のⅤ/Ⅲ族比依存性
    20 Sep. 2022
  • Mist CVD法による(Ga1-xInx)2O3混晶成長の組成制御に向けた検討
    20 Sep. 2022
  • Mist CVD 法における原料溶液中の反応がα-In2O3成長に与える影響
    20 Sep. 2022
  • 岩塩構造MgZnOの結晶成長とサブ200 nmの発光特性評価
    03 Jun. 2022, [Invited]
  • Vacuum UV emission property of Zn-doped MgO films grown by mist chemical vapor deposition method
    W. Kosaka; K. Ogawa; K. Kusaka; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    The 5th International Workshop on Ultraviolet Materials and Devices (IWUMD5), 03 Jun. 2022
  • Vacuum UV Emission Property of Zn-doped MgO films
    W. Kosaka; K. Ogawa; H. Kusaka; 1 K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda; T. Onuma
    International Conference on Light-Emitting Devices and Their Industrial Applications ’22 (LEDIA ’22), 21 Apr. 2022
  • Electrical Property and Band-offset in MgxNi1-xO Films Deposited on Sapphire Substrates by RF Magnetron Sputtering
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    International Conference on Light-Emitting Devices and Their Industrial Applications ’22 (LEDIA ’22), 21 Apr. 2022
  • ミストCVD成長した岩塩構造MgZnO薄膜の室温真空紫外線発光
    26 Mar. 2022
  • 時間分解PL測定による岩塩構造MgZnOの発光特性の評価
    26 Mar. 2022
  • 岩塩構造MgZnO/MgO界面におけるバンドアライメント解析
    26 Mar. 2022
  • 出発原料にIn2O3パウダーおよびIn(acac)3を用いたMist CVD法によるα-In2O3成長と電気的特性評価
    25 Mar. 2022
  • β-Ga2O3(-201)基板へのAlNとGaNのRF-MBE成長.
    25 Mar. 2022
  • RF-MBE法による高Al組成AlGaN/AlN量子井戸成長と発光特性の評価
    24 Mar. 2022
  • RF-MBEによる多層膜緩衝層を用いた低転位密度GaInNの製作
    24 Mar. 2022
  • TEMによるMist CVD法α-Al2O3基板上α-In2O3の結晶構造解析
    24 Mar. 2022
  • 赤色発光MQWsを有するInGaN系ナノコラムにおけるAlGaN障壁層のAl組成依存性
    23 Mar. 2022
  • Impact of Ga1-xInxN underlayer for growth of Ga1-yInyN/Ga1-xInxN MQW,structure
    T. Yamaguchi; K. Tahara; J. Yamada; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; Y. Nanishi; and K. Kishino
    The 9th Advanced Functional Materials & Devices (AFMD) & The 4th Symposium for Collaborative Research on Energy Science and Technology (SCREST), 05 Mar. 2022, [Invited]
  • Fabrication of far-UV emitter around 200 nm ,using ultrawide bandgap semiconductor,structure
    T. Onuma; W. Kosaka; M. Hashimoto; M. Hayasaki; T. Yamaguchi; and T. Honda
    The 9th Advanced Functional Materials & Devices (AFMD) & The 4th Symposium for Collaborative Research on Energy Science and Technology (SCREST), 05 Mar. 2022, [Invited]
  • Spatially resolved cathodoluminescence studies on alpha-In2O3 films,grown by mist CVD method
    A. Taguchi; K. Shima; M. Matsuda; T. Onuma; T. Honda; S. F. Chichibu; and T. Yamaguchi
    The 9th Advanced Functional Materials & Devices (AFMD) & The 4th Symposium for Collaborative Research on Energy Science and Technology (SCREST), 05 Mar. 2022, [Invited]
  • Far-UV emission around 200 nm in rocksalt-structured MgZnO
    T. Onuma; W. Kosaka; S. Hoshi; K. Kudo; K. Ishii; M. Ono; Y. Ota; K. Ogawa; I. Serizawa; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    The 3rd International Workshop on Materials Science and Advanced Electronics Created by Singularity (IWSingularity 2022) and The 2nd International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation (ISWGPDs 2022), 13 Jan. 2022
  • RFマグネトロンスパッタ中の酸素プラズマの状態が酸化ニッケルの抵抗率に与える影響
    23 Dec. 2021
  • RF-MBEによる格子緩和制御層上高In組成GaInN MQWの成長と評価
    23 Dec. 2021
  • Mist CVD成長a-In2O3薄膜の電気的特性評価
    23 Dec. 2021
  • 真空紫外域で発光する岩塩構造MgZnO薄膜のミストCVD成長
    23 Dec. 2021
  • ミストCVD法により成長したRS-MgZnOにおける深紫外PL寿命の評価
    09 Dec. 2021
  • Growth and optical characteristics of high-AlN content AlGaN on AlN templates by RF-MBE under metal-rich conditions
    M. Hayasaki; N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Yamaguchi; T. Honda; and T. Onuma
    2021 MRS Fall Meeting, 08 Dec. 2021
  • Al flux control in growth of AlN on AlN templates by RF-MBE under metal-rich conditions
    T. Yamaguchi; N. Tachibana; M. Hashimoto; M. Hayasaki; T. Yamaguchi; T. Honda; and T. Onuma
    2021 MRS Fall Meeting, 08 Dec. 2021
  • 出発原料に酸化インジウムパウダーを用いたMist CVD法による酸化インジウム薄膜成長
    04 Dec. 2021
  • ミストCVDにおけるGa2O3薄膜の成長特性
    04 Dec. 2021
  • Mist CVD法によるalpha-In2O3成長に及ぼす 原料溶液混合経過時間の影響
    04 Dec. 2021
  • 石英ガラス基板上岩塩構造MgZnOにおける殺菌用UVC発光
    04 Dec. 2021
  • 赤色発光LEDの製作に向けた RF-MBEによる緩和制御層上GaInN周期構造の成長と評価
    04 Dec. 2021
  • Mist CVDを用いたGTO薄膜成長におけるSnドープ量変化の影響
    03 Dec. 2022
  • Mist CVDβ型酸化ガリウム成長に塩酸が与える影響
    03 Dec. 2022
  • RF-MBE法によるAlGaN/AlNヘテロ構造と量子井戸構造の成長と評価
    03 Dec. 2022
  • ミストCVD法により成膜したInドープMgO薄膜の発光特性
    03 Dec. 2022
  • RF-MBEによるβ-Ga2O3(-201)基板へのMgドープGaNヘテロ構造の製作
    03 Dec. 2022
  • InドープMgZnO薄膜のミストCVD成長
    03 Dec. 2022
  • micro-LED集積化における側面の制御による電極の形成
    03 Dec. 2022
  • 岩塩構造酸化マグネシウム亜鉛MSM型真空紫外センサーの受光感度の温度依存性
    03 Dec. 2022
  • Carrier gas type dependence of Ga2O3 thin film grown by mist Chemical Vapor Deposition
    R. Yamada; S. Takahashi; A. Sekiguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 20th International Symposium on Advanced Technology (ISAT-20), 24 Nov. 2021
  • Growth of GaInN multi quantum well on strain-controlled layer by RF-MBE toward realization of light emitting diodes operating in red spectral region
    M. Matsuda; R. Yoshida; K. Tahara; T. Yamaguchi; T. Onuma; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 24 Nov. 2021
  • Improvement of Electrical Property of α-In2O3 Films Grown by Mist Chemical Vapor Deposition Using In2O3 Powder as Source Precursor
    A. Taguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Residual strain in GaN nanocolumns grown on Si(111)
    N. Goto; Y. Hosoya; T. Onuma; T. Yamaguchi; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Identification of Killer Defects in β-Ga2O3 Schottky Barrier Diodes by Raman Mapping Measurements
    M. Nakanishi; K. Shoji; S. Masuya; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Relationship between resistivity of NiO thin films and oxygen plasma condition at different deposition pressures
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Well width dependence on residual strain in high In composition GaInN/GaInN MQW by RF-MBE
    K. Tahara; J. Yamada; T. Yamaguchi; Y. Nanishi; T. Onuma; T. Honda; and K. Kishino
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Emission Properties of Rocksalt-structured MgZnO Microcrystals for VUV Light Emitter
    W. Kosaka; S. Hoshi; K. Kanta; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Impact on InN Buffer Layer Inserted into GaInN/GaN Interfaces By RF-MBE
    D. Itabashi; R. Yoshida; T. Yamaguchi; T. Onuma; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Impacts of hydrochloric acid concentration and growth temperature on mist chemical vapor deposition growth of Ga2O3
    R. Yamada; S. Takahashi; A. Sekiguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 6th International Conference on Advanced Electromaterials (ICAE 2021), 11 Nov. 2021
  • Role of Ca in CaF2 incorporated In2O3 transparent conductive films
    K. Oe; S. Mori; K. Watanabe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Demonstration of flexible transparent conductive film using B-doped In2O3
    S. Mori; Y. Ichinoseki; K. Watanabe; K. Murano; K. Oe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Charge transfer and conduction type conversion in n-type SnO2 thin films by nitrogen annealing
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 26 Oct. 2021
  • Evaluation of radiation detection characteristics by α-Ga2O3
    H. Nakagawa; R. Yamada; M. Hashimoto; T. Yamaguchi; T. Onuma; T. Honda; T. Nakano; T. Aoki
    The 19th International Conference on Global Research and Education inter-Academia 2021, 21 Oct. 2021
  • Impact of oxygen plasma condition on resistivity of RF magnetron sputtered NiO thin films
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    40th Electronic Materials Symposium, 11 Oct. 2021
  • Evaluation of Microstructures in β-Ga2O3 Crystals Using Raman Mapping
    M. Nakanishi; K. Shoji; S. Masuya; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    40th Electronic Materials Symposium, 11 Oct. 2021
  • 緩和制御層上GaInN周期構造のRF-MBE成長と評価
    23 Sep. 2021
  • 緑色発光を用いたβ-Ga2O3結晶の微細構造評価
    21 Sep. 2021
  • ミスト化学気相成長法における塩酸と成長温度が酸化ガリウム成長に与える影響
    13 Sep. 2021
  • Mist CVD法による酸化インジウムパウダーを用いたα-In2O3成長
    13 Sep. 2021
  • (0001)および(10-11)面 InGaN/GaN ナノコラム上 InGaN/AlGaN MQWs の発光特性
    13 Sep. 2021
  • ZnドープMgO薄膜の発光特性
    12 Sep. 2021
  • MgO単結晶の真空紫外励起子スペクトル
    12 Sep. 2021
  • 窒素アニールによるn型SnO2薄膜の電荷移動と伝導型変換
    12 Sep. 2021
  • 195 nmで発光する岩塩構造MgZnO薄膜のミストCVD成長
    12 Sep. 2021
  • BドープIn2O3透明導電膜における微量不純物濃度での移動度向上
    12 Sep. 2021
  • CaF2ドープIn2O3透明導電膜における表面ラフネスおよび導電率のドーパント濃度依存性
    12 Sep. 2021
  • ハニカム配列GaInN/GaNナノコラムLEDの製作プロセス
    12 Sep. 2021
  • RF-MBE法によるGaInN/GaInN多重量子井戸成長と評価
    10 Sep. 2021
  • CaF2ドープ In2O3透明導電膜における Ca と F の効果
    03 Sep. 2021
  • 窒素アニールによる n 型 SnOx薄膜の伝導型変換
    03 Sep. 2021
  • B ドープ In2O3透明導電膜におけるドーパント濃度の依存性
    02 Sep. 2021
  • VUV Emission Properties Of Rocksalt-structured MgZnO Microcrystals Prepared On Quartz Glass Substrates
    W. Kosaka; S. Hoshi; K. Kudo; Y. Igari; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • Growth of AlGaN on AlN template by RF-MBE and deep UV sensor characteristics
    M. Hashimoto; N. Tachibana; M. Nakanishi; J. Cho; T. Yamaguchi; T. Honda; and T. Onuma
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • Mist CVD growth of alpha-In2O3 films using indium oxide powder as source precursor
    A. Taguchi; S. Takahashi; T. Yamaguchi; T. Onuma; T. Honda; K. Kaneko; and S. Fujita
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • Energy conversion efficiency under different input electrical power conditions in visible-LED-based OWPT system
    H. Yokoyama; N. Yosuke; T. Yamaguchi; T. Miyamoto; T. Onuma; and T. Honda
    The 3rd Optical Wireless and Fiber Power Transmission Conference (OWPT2021), 20 Apr. 2021
  • Deep UV optical properties of high-Mg-content rocksalt-structured MgZnO
    T. Onuma; K. Kudo; K. Ishii; M. Ono; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    Materials Research Society, 2021 Spring Meeting, 18 Apr. 2021, [Invited]
  • 顕微ラマンマッピング測定による酸化ガリウム結晶の微細構造評価
    19 Mar. 2021
  • 酸化物半導体結晶Ga2O3およびIn2O3の準安定相発現機構の検討
    18 Mar. 2021
  • GaN系ナノコラムにおけるn-GaN平坦層がInGaN/AlGaN MQWs発光層に与える影響
    18 Mar. 2021
  • GaN上GaInN膜成長初期のSi層挿入数に対する格子緩和過程の変化
    18 Mar. 2021
  • 合成石英基板上に成長した岩塩構造 MgZnO 微結晶の真空紫外域での発光特性
    18 Mar. 2021
  • モノリシック青色マイクロLEDピクセルの製作とフルカラー化の検討
    17 Mar. 2021
  • TEMによるMist CVD法 (0001)α-Al2O3基板上α-In2O3の欠陥解析
    16 Mar. 2021
  • Developments of Semiconductor-based UVC Emitters and Sensors for Sterilization
    T. Onuma; T. Yamaguchi; and Tohru Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021, [Invited]
  • Impact of indium oxide powder as source precursor on α-In2O3 films grown by mist CVD
    A. Taguchi; S. Takahashi; T. Yamaguchi; T. Onuma; T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • Impact of hydrochloric acid on the Mist CVD growth of Ga2O3
    R. Yamada; S. Takahashi; T. Yamaguchi; T. Onuma; T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • Characterization of GaInN multi-layers grown on strain-controlled layer by RF-MBE
    M. Matsuda; R. Yoshida; K. Tahara; T. Yamaguchi; T. Onuma; T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • In situ XRD RSM measurements in MBE growth of GaInN film with low‐temperature GaInN buffer layer
    T. Yamaguchi; T. Sasaki; T. Kiguchi; S. Ohno; H. Hirukawa; R. Yoshida; T. Onuma; T. Honda; and M. Takahasi; T. Araki; and Y. Nanishi
    The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8), 02 Mar. 2021
  • Epitaxial mist chemical vapor deposition growth and characterization of α-In2O3 films on α-Al2O3 substrates
    T. Yamaguchi; T. Nagata; S. Takahashi; T. Kiguchi; A. Sekiguchi; T. Onuma; T. Honda; K. Goto; Y. Kumagai; K. Kaneko; and S. Fujita
    The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8), 02 Mar. 2021
  • 殺菌応用を目指した真空・深紫外線半導体発光材料の開発
    27 Jan. 2021, [Invited]
  • Fabrication of monolithic blue μ-LED pixels and their color conversion by phosphors
    S. Takeda; T. Yamaguchi; T. Onuma; and T. Honda
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Radiation patterns of MgO and AlN evaluated by angle-resolved cathodoluminescence measurements
    Y. Igari; K. Kudo; W. Kosaka; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Parametric study of fabrication processes of micro-LEDs array and characterization of emission properties
    H. Chikui; S. Takeda; T. Abe; T. Onuma; T. Yamaguchi; and T. Honda
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • RF-MBE法による高In組成GaInN/GaInN周期構造の成長と評価
    23 Dec. 2020
  • Mist CVD法における(0001)α-Al2O3基板上In2O3成長に塩酸が与える影響
    23 Dec. 2020
  • 窒素イオン注入による酸化ガリウム結晶の光電流スペクトルの変化
    23 Dec. 2020
  • ICP-RIEによるモノリシック青色μ-LEDピクセルの製作
    23 Dec. 2020
  • AlNテンプレート上のAlGaNの分極電場と深紫外線センサー特性の関係
    23 Dec. 2020
  • Designing Optically Isolated LED Arrays Embedded in Si Micro-cup Substrates
    K. Sato; Y. Iwata; T. Onuma; T. Yamaguchi; T. Honda
    International Display Workshops 2020, 10 Dec. 2020
  • 放射光を活用したGaInN結晶成長のその場観察
    31 Oct. 2020
  • Comparison of Microstructures in alpha-Ga2O3 and alpha-In2O3 Films Grown on alpha-Al2O3 Substrates by Mist CVD
    Y. Hayakawa; S. Ohno; T. Yamaguchi; T. Kiguchi; S.Takahashi; H. Yokoo; T. Onuma; and T. Honda
    39th Electronic Materials Symposium, 08 Oct. 2020
  • Growth of AlGaN on AlN Template by RF-MBE and Their Spectral Responsivity in Deep UV Spectral Region
    M. Hashimoto; N. Tachibana; M. Nakanishi; T. Yamaguchi; T. Honda; and T. Onuma
    39th Electronic Materials Symposium, 08 Oct. 2020
  • Relationship between crystallinity and emission property in RF-MBE growth of GaN
    N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Honda; and T. Onuma
    39th Electronic Materials Symposium, 08 Oct. 2020
  • RF-MBE growth and characterization of high-In-content GaInN/GaInN multiple layers
    K. Tahara; R. Yoshida; H. Hirukawa; T. Yamaguchi; T. Onuma; and T. Honda
    39th Electronic Materials Symposium, 07 Oct. 2020
  • Deep and Vacuum UV Emission Properties in Rocksalt-structured MgZnO
    T. Onuma; K. Kudo; K. Ishii; M. Ono; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    39th Electronic Materials Symposium, 07 Oct. 2020
  • GaNのRF-MBE成長における結晶性と発光特性の関係
    11 Sep. 2020
  • 溶媒キャスト法を用いたLED素子分離用透明ポリイミド絶縁膜の形成
    11 Sep. 2020
  • GaInN/GaN成長時の格子緩和に対するSiアンチサーファクタントの効果
    11 Sep. 2020
  • RF-MBE成長した高In組成GaInN/ GaInN多重量子井戸における障壁層のIn組成と周期数が発光特性へ及ぼす影響
    11 Sep. 2020
  • 酸化ガリウム結晶への窒素イオン注入が分光感度特性に及ぼす影響
    09 Sep. 2020
  • 岩塩構造MgZnO薄膜における深紫外PL寿命の評価
    09 Sep. 2020
  • Fabrication process of GaInN/GaN honeycomb array nanocolumn LEDs for integration of surface plasmonic resonance,scheme
    A. Ueno; G. Imamura; K. Yoshida; K. Takimoto; I. Nomura; R. Togashi; T. Yamaguchi; T. Honda; K. Kishino
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Optical characteristics of high–indium-content GaInN MQWs grown on different templates by RF–MBE
    R. Yoshida; H. Hirukawa; K. Tahara; T. Yamaguchi; T. Onuma; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Structural analyses of α-In2O3 grown on α-Al2O3 substrates by mist CVD
    Y. Hayakawa; S. Ohno; T. Yamaguchi; T. Kiguchi; H. Yokoo; T. Onuma; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Fabrication of μ-LED pixels and evaluation,of luminescent characteristics
    H. Chikui; S. Takeda; K. Sato; T. Onuma; T. Yamaguchi; M. Shimizu; T. Takahashi; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Growth of AlGaN films on AlN template by,RF-plasma assisted molecular beam epitaxy
    M. Hashimoto; N. Tachibana; T. Honda; T. Yamaguchi; T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Power Supply Efficiency of Optical Wireless Power Transmission Systems Using Visible LEDs and Silicon Solar Cells
    H. Yokoyama; T. Yamaguchi; Y. Ushida; H. Hirukawa; T. Onuma; T. Honda
    The 2nd Optical Wireless and Fiber Power Transmission Conference (OWPT2020), 21 Apr. 2020
  • RF-MBEサファイア基板窒化時にPBN放電管が与える影響
    15 Mar. 2020
  • ポリイミド薄膜を用いたLED素子分離の検討
    14 Mar. 2020
  • GaInN/GaN 規則配列ナノコラム結晶における活性層の構造と光学特性の関係
    13 Mar. 2020
  • 窒素イオン注入酸化ガリウム結晶の光電流スペクトル
    13 Mar. 2020
  • 岩塩構造MgZnO薄膜の時間分解フォトルミネッセンス分光
    12 Mar. 2020
  • Epitaxial relationship of Cu3N grown on YSZ(001) substrate by mist CVD method
    N. Wakabayashi; R. Takigasaki; T. Yamaguchi; T. Honda and T. Onuma
    47th Conference on the Physics & Chemistry of Surfaces & Interfaces, 22 Jan. 2020
  • RF-MBE Growth of Mg-Doped InN Films Using Droplet Elimination by Radical Beam Irradiation Method
    T. Yamaguchi; T. Araki and Y. Nanishi
    The 3rd International Symposium of the Vacuum Society of the Philippines (ISVSP2020), 08 Jan. 2020
  • Optical characteristics of high-In-incorporated GaInN MQWs grown by RF-MBE
    R. Yoshida; Y. Nakajima; H. Hirukawa; S. Ohno; T. Yamaguchi; T. Onuma; and T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Microstructural analysis using TEM in GaInN film grown by RF-MBE
    S. Ohno; H. Hirukawa; R. Yoshida; T. Yamaguchi; T. Kiguchi; H. Hashimoto; T. Onuma and T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • LED miniaturization for monolithic μ-LED using ICP etching
    S. Takeda; T. Yamaguchi; T. Onuma and T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Structural characterization of epitaxial GaInN films by X-ray diffraction
    H. Hirukawa; R. Yoshida; T. Yamaguchi; T. Onuma and T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Toward the Realization of Optical Wireless Power Transmission System Using Visible Light
    T. Yamaguchi; H. Hirukawa; H. Yokoyama; S. Ohno; Y. Ushida; T. Onuma and T. Honda
    2019 International Symposium on Novel and Sustainable Technology (2019 ISNST), 12 Dec. 2019
  • Mist CVD法によるGa2O3成長に塩酸が与える影響
    07 Dec. 2019
  • 可視光発光ダイオードおよびシリコン太陽電池を用いた光無線給電システムの効率検討
    07 Dec. 2019
  • 太陽電池を用いた可視光通信システムの確立に向けて
    07 Dec. 2019
  • RF-MBE法によるGaNテンプレート上へのAlGaN成長におけるGaNバッファ層のⅤ/Ⅲ比依存性の検討
    20 Nov. 2019
  • VUV Exciton Emission Spectra of MgO Single Crystals
    K. Kudo; S. Hoshi; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    The 9th Asia-Pacific Workshop on Widegap Semiconductors(APWS2019), 12 Nov. 2019
  • Optical-isolation of micro-LED pixels integrated in Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi and T. Honda
    The 9th Asia-Pacific Workshop on Widegap Semiconductors(APWS2019), 11 Nov. 2019
  • InGaN/GaN ハニカム構造ナノコラ結晶の成長と評価
    31 Oct. 2019
  • RF-MBEによるGaInN薄膜の成長温度特性
    29 Oct. 2019
  • Optical characteristics of high In composition GaInN MQWs grown by RF-MBE
    R. Yoshida; Y. Nakajima; H. Hirukawa; S. Ohno; T. Yamaguchi; T. Onuma and T. Honda
    38th Electronic Materials Symposium, 10 Oct. 2019
  • Epitaxial relationship Cu3N layer grown on c-plane sapphire substrate by Mist CVD
    N. Wakabayashi; M. Takahashi; T. Yamaguchi; H. Nagai; M. Sato; T. Onuma and T. Honda
    38th Electronic Materials Symposium, 10 Oct. 2019
  • Impact of hydrochloric acid on mist CVD growth of GIO ternary alloys
    S.Takahashi; K. Rikitake; T. Yamaguchi; H. Nagai; M. Sato; T. Onuma and T. Honda
    38th Electronic Materials Symposium, 09 Oct. 2019
  • Comparative study on DUV emission properties of Rocksalt structured MgxZn1-xO alloys
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    38th Electronic Materials Symposium, 09 Oct. 2019
  • 高In組成GaInN周期構造の光学特性
    18 Sep. 2019
  • MgO単結晶の真空紫外線領域のカソードルミネセンススペクトル
    18 Sep. 2019
  • In-situ XRD RSM Measurements in MBE Growth of GaInN at Different Temperatures
    T. Yamaguchi; T. Sasaki; M. Takahasi; S. Ohno; T. Araki; Y. Nanishi; T. Onuma and T. Honda
    The 13th International Conference on Nitride Semiconductors 2019 (ICNS-13), 11 Jul. 2019
  • Structural analyses of GaInN films grown at different temperatures on (0001)GaN/α-Al2O3 templates by RF-MBE
    S. Ohno; T. Yamaguchi; H. Hirukawa; T. Araki; H. Hashimoto; T. Onuma and T. Honda
    13th International Conference on Nitride Semiconductors 2019 (ICNS-13), 08 Jul. 2019
  • Fabrication of LED pixels of 16×16 array structure using Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi and T. Honda
    13th International Conference on Nitride Semiconductors 2019 (ICNS-13), 08 Jul. 2019
  • Strain Relaxation in Al-rich AlxGa1-xN Films Growth by RF plasma-assisted Molecular Beam Epitaxy
    N. Tachibana; T. Yamaguchi; T. Honda and T. Onuma
    13th International Conference on Nitride Semiconductors 2019 (ICNS-13), 08 Jul. 2019
  • Mist CVD法によるGIO混晶成長に塩酸が与える影響
    14 Jun. 2019
  • ミストCVD法によるCu3N成長
    14 Jun. 2019
  • VUV Cathodoluminescence Spectra of ,Rocksalt-structured MgZnO/MgO Quantum Wells
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    Compound Semiconductor Week 2019(CSW2019), 21 May 2019
  • Electrical and structural properties of Sn-doped a-Ga2O3 thin films grown by mist chemical vapor deposition
    S. Mochizuki; T. Yamaguchi; K. Rikitake; T. Onuma and T. Honda
    Compound Semiconductor Week 2019(CSW2019), 21 May 2019
  • Structural analyses using TEM and XRD of,GaInN films grown on GaN templates by RF-MBE
    S. Ohno; T. Yamaguchi; H. Hirukawa; T. Araki; H. Hashimoto; T. Onuma and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Fabrication of micro-LED display of 16×16 array structure using Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Cathodoluminescence properties of Rocksalt-structured MgZnO/MgO Quantum Wells for VUV Light Emitter
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Prototype optical wireless power transmission system using blue LD as light source and LED as photovoltaic receiver
    H. Hirukawa; T. Yamaguchi; Y. Ushida; T. Onuma and T. Honda
    The 1st Optical Wireless and Fiber Power Transmission Conference (OWPT2019), 24 Apr. 2019
  • Growth of AlxGa1-xN Films by Plasma-assisted Molecular Beam Epitaxy for Deep UV Optical Devices
    N. Tachibana; T. Yamaguchi; T. Honda and T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • 光熱偏向分光法によるGaN自立基板上ホモエピタキシャル層の評価
    12 Mar. 2019
  • RF-MBEより成長した高In組成GaInNの成長温度特性
    11 Mar. 2019
  • 岩塩構造MgZnO/MgO量子井戸における量子閉じ込め効果
    11 Mar. 2019
  • RF-MBE法GaInNヘテロエピタキシャル成長における放射光その場X線回折測定
    11 Mar. 2019
  • 規則配列InGaNナノコラムを用いた赤色発光LED結晶
    11 Mar. 2019
  • 総合討論 結晶工学×放射光シンポジウム
    11 Mar. 2019
  • 酸化ガリウム結晶における電界変調反射スペクトルの観測
    11 Mar. 2019
  • Carbon nanotube dispersed Ga2O3 films fabricated by molecular precursor,method
    T. Honda; Y. Takahashi; R. Yoshida; C. Mochizuki; H. Nagai; T. Onuma; T. Yamaguchi and M. Sato
    The 1st Symposium for Collaborative Research on Energy Science and Technology (SCREST-1st), 10 Jan. 2019
  • Toward fabrication of GaInN-based devices: Epitaxial growth and characterization of GaInN by RF-MBE
    T. Yamaguchi; Y. Nakajima; H. Hirukawa; R. Yoshida; T. Onuma; and T. Honda
    The 1st Symposium for Collaborative Research on Energy Science and Technology (SCREST-1st), 10 Jan. 2019
  • マイクロLEDディスプレイの実現のためのブラックマトリクス原料の比較検討
    08 Dec. 2018
  • Relationship between Relaxation ratio and growth temperature of GaInN by RF-MBE
    Y. Nakajima; T. Honda; T. Yamaguchi; and T. Onuma
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 05 Dec. 2018
  • Effect of α-(AlxGa1-x)2O3 Overgrowth on MSM-Type α-Ga2O3,Ultraviolet Photodetectors Grown by Mist CVD
    K. Rikitake; T. Yamaguchi; T. Onuma; and T. Honda
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 05 Dec. 2018
  • Carbon-nanotube Dispersed Ga2O3 Films for UV Transparent Electrodes Fabricated by Molecular Precursor Method
    T. Honda; Y. Takahashi; R. Yoshida; C. Mochizuki; H. Nagai; T. Onuma; T. Yamaguchi; and M. Sato
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 03 Dec. 2018
  • μ-LEDディスプレイの実現に向けたμ-LEDアレイ構造の製作
    29 Nov. 2018
  • 各種基板上に成長したIn2O3の結晶構造と電気的特性評価
    29 Nov. 2018
  • Epitaxial growth of Cu3N films on (0001)Al2O3 substrates by mist chemical vapor deposition
    T. Yamaguchi; H. Itoh; M. Takahashi; H. Nagai; T. Onuma; T. Honda and M. Sato
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Fabrication of µ-LED arrays toward future realization of µ-LED display
    R. Nawa; S. Takeda; Y. Kamei; T. Onuma; T. Yamaguchi; and T. Honda
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Analysis of Deep Ultraviolet Emission Properties in Rocksalt-structured MgxZn1-xO Films
    M. Ono; K. Ishii; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Study on wavelength matching for optical wireless power transmission for visible light
    H. Hirukawa; T. Yamaguchi; T. Onuma; and T. Honda
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Photoluminescense measurements of GaInN grown at different temperatures by RF-MBE
    R. Yoshida; Y. Nakajima; H. Hirukawa; T. Yamaguchi; T. Onuma; and T. Honda
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Growth and Characterization of Single Crystalline alpha-Ga2O3 Film on c-plane Sapphire Substrates by Mist CVD
    K. Rikitake; T. Yamaguchi; T. Onuma; and T. Honda
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • GaInN growth by RF-MBE for underlying layers in red LEDs
    Y. Nakajima; K. Uehara; T. Yamaguchi; T. Onuma and T. Honda
    International Workshop on Nitride Semiconductors (IWN 2018), 13 Nov. 2018
  • Evaluation of Al2O3/n-, p-GaN samples by photothermal deflection spectroscopy
    K. Fukuda; Y. Asai; L. Sang; A. Yoshigoe; A. Uedono; T. Onuma; T. Yamaguchi; T. Honda; and M. Sumiya
    International Workshop on Nitride Semiconductors (IWN 2018), 13 Nov. 2018
  • Systematic investigation of surface and bulk electronic structures of unintentionally-doped InxGa1-xN (0=
    M. Imura; S. Tsuda; T. Nagata; R. G. Banal; H. Yoshikawa; A. Yang; Y. Yamashita; K. Kobayashi; Y. Koide; T. Yamaguchi; M. Kaneko; T. Araki; and Y. Nanishi
    International Workshop on Nitride Semiconductors (IWN 2018), 12 Nov. 2018
  • 可視光電力伝送の可能性探索~プロトタイプ製作と問題点抽出~
    01 Nov. 2018
  • PDS measurement for III-V nitride samples ~InxGa1-xN, ion-implanted GaN and MOS structure~
    K. Fukuda; T. Onuma; T. Yamaguchi; T. Honda; and M. Sumiya
    37th Electronic Materials Symposium, 12 Oct. 2018
  • Fabrication of double schottky type photodetector using corundum-structured gallium oxide
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    37th Electronic Materials Symposium, 11 Oct. 2018
  • Surface and bulk electronic structures of unintentionally-doped InGaN epilayers by hard X-ray photoelectron spectroscopy
    M. Imura; S. Tsuda; T. Nagata; H. Yoshikawa; Y. Yamashita; K. Kobayashi; Y. Koide; T. Yamaguchi; T. Araki; and Y. Nanishi
    37th Electronic Materials Symposium, 11 Oct. 2018
  • Growth of Cu3N Films by mist Chemical Vapor Deposition
    T. Yamaguchi; H. Itoh; M. Takahashi; T. Onuma; H. Nagai; T. Honda; and M. Sato
    2018 International Symposium on Novel and Sustainable Technology (ISNST2018), 05 Oct. 2018
  • 光熱偏向分光法によるMgイオン注入GaN層の評価
    19 Sep. 2018
  • Al2O3/n-, p-GaN構造の光熱偏向分光法による評価
    19 Sep. 2018
  • Bandgap fluctuation in rocksalt-structured MgxZn1-xO alloys
    T. Onuma; M. Ono; K. Ishii; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    The 10th International Workshop on ZnO and Related Materials (IWZnO 2018), 13 Sep. 2018
  • Excitation density and temperature dependence of deep ultraviolet cathodoluminescence in rocksalt-structured MgxZn1-xO
    M. Ono; K. Ishii; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 10th International Workshop on ZnO and Related Materials (IWZnO 2018), 11 Sep. 2018
  • In situ XRD RSM Measurements in MBE Growth of GaInN on InN
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Onuma; T. Honda; T. Araki; and Y. Nanishi
    20th International Conference on Molecular Beam Epitaxy (ICMBE 2018), 04 Sep. 2018
  • Recent Progress and Challenges of InN and In-rich InGaN growth by RF-MBE,using DERI process
    Y. Nnanishi; T. Yamaguchi; S. Mouri; T. Araki; T. Sasaki; and M. Takahasi
    20th International Conference on Molecular Beam Epitaxy (ICMBE 2018), 04 Sep. 2018
  • 光熱偏向分光法によるイオン注入したGaNの評価
    30 Aug. 2018
  • 岩塩構造MgxZn1-xO薄膜における深紫外線発光メカニズム
    29 Aug. 2018
  • 水溶液スプレー法によるZnO薄膜製作検討
    29 Aug. 2018
  • 赤色LED製作に向けたRF-MBE法によるSi基板上自己形成GaNナノコラム構造の製作検討
    29 Aug. 2018
  • 10×10アレイ構造Siマイクロカップ基板を用いたμ-LEDディスプレイの製作
    29 Aug. 2018
  • ミストCVD法によるα-In2O3の結晶成長と電気的特性評価
    29 Aug. 2018
  • RF-MBE法を用いたGaInNの成長温度と緩和率の関係検討
    28 Aug. 2018
  • 深紫外光検出器のためのGa2O3薄膜のミストCVD成長
    28 Aug. 2018
  • Evaluation of Structural Disorder and In-Gap States of III-V nitrides by Photothermal Deflection Spectroscopy
    M. Sumiya; K. Fukuda; Y. Nakano; S. Ueda; T. Yamaguchi; T. Onuma; and T. Honda
    The 7th International Symposium on Growth of III-Nitrides (ISGN-7), 09 Aug. 2018
  • Structural disorder and in-gap states of Mg-implanted GaN films evaluated by photothermal deflection spectroscopy
    M. Sumiya; K. Fukuda; S. Takashima; T. Yamaguchi; T. Onuma; T. Honda; and A. Uedono
    The 19th International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE-19), 07 Jun. 2018
  • Blue Luminescence Quenching in beta-Ga2O3 Epitaxial Films by Nitrogen Doping
    T. Onuma; Y. Nakata; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata; S. Yamakoshi and M. Higashiwaki
    Compund Semiconductor Week 2018 (CSW 2018), 01 Jun. 2018
  • Spectroscopic Ellipsometry Study on P-Type NiO Films
    M. Ono; K. Sasaki; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; T. Honda; and T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’18 (LEDIA ’18), 27 Apr. 2018
  • Fabrication of 10×10 array structure of micro-LED display using Si micro-cup substrate
    R. Nawa; T. Onuma; T. Yamaguchi; J. -S. Jang; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’18 (LEDIA ’18), 26 Apr. 2018
  • III-V族窒化物の価電子帯構造およびギャップ内準位の評価
    20 Mar. 2018
  • 岩塩構造MgxZn1-xOの吸収端の観測と電子状態計算
    20 Mar. 2018
  • イオン注入したGaNの光熱偏向分光法による評価
    20 Mar. 2018
  • 岩塩構造MgxZn1-xOにおける深紫外線カソードルミネセンスの温度および励起密度依存性
    20 Mar. 2018
  • 窒素ドープ酸化ガリウム薄膜における青色発光の強度変化
    20 Mar. 2018
  • 10×10 Siマイクロカップ基板でのμ-LED集積化
    20 Mar. 2018
  • alpha-Ga2O3を用いたダブルショットキー型光検出器の製作
    19 Mar. 2018
  • 放射光X線回折測定を用いたGaInN/InN成長のその場観察~InN解離温度領域での振る舞い~
    18 Mar. 2018
  • Mg ドーピングによる高 In 組成 InGaN の表面-バルク電子状態変化
    17 Mar. 2018
  • 産学連携教育システム実現への可能性
    14 Mar. 2018
  • 放射光を活用したIn 系窒化物半導体成長中のその場観察
    12 Mar. 2018
  • Influence of interface state and band bending on In and N polar InN from Angle-resolved XPS
    Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
    45th Conference on the Physics & Chemistry of Surfaces & Interfaces (PCSI 45), 15 Jan. 2018
  • ミストCVD法により成長したIn2O3薄膜を用いたTFT製作検討
    09 Dec. 2017
  • コランダム構造酸化ガリウムソーラーブラインド光検出器の開発
    09 Dec. 2017
  • Growth of Ga2-xSnxO3 films by mist chemical vapor deposition
    K.Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, 30 Nov. 2017
  • Crystal Structure Control in Epitaxial Growth of In2O3 by Mist CVD
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, 30 Nov. 2017
  • Relationship between Temperature and Growth Rate of Ga2O3, In2O3 and Their Alloys in the Growth of Mist CVD
    T. Yamaguchi; K. Tanuma; T. Kobayashi; H. Nagai; M. Sato; T. Onuma and T. Honda
    4th International Conference on Advanced Electromaterials (ICAE2017), 24 Nov. 2017
  • XPS spectra of Ga2O3, In2O3 and their alloys fabricated by molecular precursor method
    T. Honda; Y. Takahashi; T. Onuma; T. Yamaguchi; H. Nagai and M. Sato
    24th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 24), 24 Nov. 2017
  • Deep-UV emission properties of rocksalt-structured MgxZn1-xO Films Grown on MgO (001) Substrates
    M. Ono; K. Ishii; T. Uchida; R. Jinno; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    36th Electronic Materials Symposium, 09 Nov. 2017
  • Angle-resolved XPS spectra of InN/GaN grown by DERI method
    Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
    36th Electronic Materials Symposium, 09 Nov. 2017
  • MSM-type solar-blind photodetector with alpha-Ga2O3 film grown by mist CVD
    K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    36th Electronic Materials Symposium, 08 Nov. 2017
  • Effect of low temperature buffer layer in mist CVD growth of In2O3 on alfa-Al2O3 substrate
    T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    36th Electronic Materials Symposium, 08 Nov. 2017
  • Near surface band bending in InN films grown by DERI method
    Y. Nakajima; K. Uehara; T. Onuma; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Fabrication of Si micro-cup substrate and its application for integration of,μ-LEDs
    R. Nawa; T. Onuma; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Origin of free holes and visible light absorption in p-type NiO films
    M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Bandgap Engineering of α-Ga2O3 Films Grown by Mist Chemical Vapor,Deposition
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Fabrication of TFT using amorphous In2O3 thin film by mist CVD
    T. Kobayashi; K. Sawamoto; S. Aikawa; T. Yamaguchi; T. Onuma; and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Formation of Black Matrix for Realization of Micro-LED Display
    Y. Chunobayashi; R. Nawa; Y. Takahashi; H. Matsuura; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Unintentionally Doped Impurities in GaN Layer Grown by RF-MBE
    D. Taka; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Photothermal Deflection Spectra of Gallium indium nitride layers grown,by MOVPE
    K. Fukuda; T. Onuma; L. Sang; T. Yamaguchi; T. Honda and M. Sumiya
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Impact of mask materials on dry etching of GaN using ICP-RIE
    H. Matsuura; T. Onuma; T. Honda and T. Yamaguchi
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Near-the surface Fermi level measured In2O3 and Ga2O3 thin films by,molecular precursor method
    Y. Takahashi; T. Onuma; H. Nagai; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Outstanding capability of In-situ Monitoring Techniques in RF-MBE Growth of InN and GaInN
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
    2017 International Symposium on Novel and Sustainable Technology (ISNST2017), 19 Oct. 2017
  • GaN growth on Al template by MBE for the fabrication of micro displays
    T. Honda; Y. Hoshikawa; K. Uehara; T. Onuma and T. Yamaguchi
    11th International Symposium on Semiconductor Light Emitting Devices (ISSLED2017), 12 Oct. 2017
  • Compositional Pulling Effect in Epitaxial Growth of GaInN by RF-MBE
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
    International Conference on Solid State Devices and Materials (SSDM2017), 21 Sep. 2017
  • Fabrication of MSM-Type Photodetector Using Sn-Doped alpha-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    International Conference on Solid State Devices and Materials (SSDM2017), 20 Sep. 2017
  • Photoresponsivity of alpha-Ga2O3-based deep UV photodetector grown by mist CVD
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    2nd International Workshop on Gallium Oxide and Related Materials, 14 Sep. 2017
  • Cathodoluminescence spectra of Si-doped and Si-implanted β-Ga2O3 single crystals
    T. Onuma; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
    2nd International Workshop on Gallium Oxide and Related Materials, 14 Sep. 2017
  • 低温In2O3バッファ層を用いたa-Al2O3基板上In2O3のミストCVD成長
    08 Sep. 2017
  • Ga2-xSnxO膜のミストCVD成長
    08 Sep. 2017
  • シリコンマイクロカップ基板の製作とµ-LEDの集積化の検討
    08 Sep. 2017
  • GaN上およびInN上GaInN成長における成長初期過程の観察
    07 Sep. 2017
  • SiドープとSiイオン注入単結晶酸化ガリウム結晶の光学的特性
    07 Sep. 2017
  • 光熱偏向分光法によるGa1-xInxN薄膜の評価
    06 Sep. 2017
  • ミストCVD法によるSn添加Ga2O3成長とそのデバイス応用
    09 Aug. 2017
  • ミストCVD法によるIn2O3薄膜の結晶構造制御
    09 Aug. 2017
  • 第一原理計算とX線光電子分光法によるp形NiO薄膜の電子構造の解析
    09 Aug. 2017
  • 赤色LEDに向けたDERI法によるGaInN薄膜のRF-MBE成長検討
    09 Aug. 2017
  • RF-MBE法により成長したGaN薄膜中の不純物に関する考察
    09 Aug. 2017
  • 分子プレカーサー法により形成した金属酸化物薄膜の表面近傍フェルミ準位の測定
    09 Aug. 2017
  • 光熱偏向分光法を用いたGa1-xInxN薄膜における非発光再結合の検討
    09 Aug. 2017
  • RF-MBE法を用いたDERI法によるInN薄膜成長における極性が与える影響
    09 Aug. 2017
  • 素子分離のためのICP-RIEによるエッチング垂直性の検討
    09 Aug. 2017
  • ICP-RIEによるGaNテンプレートのアレイエッチングの製作検討
    09 Aug. 2017
  • In-situ X-ray Reciprocal Space Mapping Measurements in GaInN growth on GaN and InN by RF-MBE
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Onuma; T. Honda and Y. Nanishi
    12th International Conference On Nitride Semiconductors (ICNS-12), 26 Jul. 2017
  • Optical Properties of Ga2O3 Films and Crystals
    T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
    Compund Semiconductor Week 2017 (CSW 2017), 14 May 2017
  • Relation between electrical and optical properties of p-type NiO films
    M. Ono; T. Onuma; R. Goto; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
    Compund Semiconductor Week 2017 (CSW 2017), 14 May 2017
  • Mist CVD growth of Sn-doped Ga2O3 thin films and its device application
    K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma; T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Charge transfer transitions in p-type NiO films studied by optical measurements and X-ray photoelectron spectroscopy
    M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Comparison of III-polar and N-polar GaInN films grown by RF-MBE
    Y. Nakajima; K. Uehara; T. Honda; T. Yamaguchi; T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Fabrication of µ-LED array structures using ICP dry-etching
    R. Nawa; T. Onuma; T. Yamaguchi; J. -S. Jang; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • 単斜晶酸化ガリウム結晶における光学遷移過程
    15 Mar. 2017
  • p形NiO薄膜における電気的特性と光学的特性の関係
    14 Mar. 2017
  • beta-Ga2O3結晶における光学的異方性の解析
    13 Jan. 2017
  • (0001)alpha-Al2O3基板上へのGa2-xSnxO3薄膜のミストCVD成長
    03 Dec. 2016
  • ミストCVD法を用いたNiO結晶成長
    03 Dec. 2016
  • ミストCVD法を用いたCu3N成長
    03 Dec. 2016
  • Growth and characterization of In2O3 on various substrates by mist CVD
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma; T. Honda
    2016 Materials Research Society Fall Meeting & Exhibit(2016 MRS Fall Meeting), 30 Nov. 2016
  • Demonstration of monolithic GaN Based UV MOS-LEDs for Flat-Panel Display
    H. Matsuura; K. Serizawa; T. Onuma; T. Yamaguchi; T. Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Fabrication of CNT-doped Ga2O3 Thin Films by Molecular Precursor Method
    Y. Takahashi; T. Onuma; H. Nagai; T. Yamaguchi; M. Sato; T. Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Growth and characterization of bixbite-type In2O3 thin films by mist CVD
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma; T. Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Characterization of GaN layers grown on Al templates by RF-MBE
    K. Uehara; Y. Hoshikawa; T. Yamaguchi; T. Onuma; T. Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Toward the Growth of Cu3N by mist CVD
    M. Takahashi; H. Ito; T. Yamaguchi; H. Nagai; T. Onuma; M. Sato; T. Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • In-situ monitoring in RF-MBE growth of In-based nitrides
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda; Y. Nanishi
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Temperature-Dependent Cathodoluminescence Spectra of Rocksalt MgxZn1-xO films grown by Mist Chemical Vapor Deposition Method
    T. Onuma; K. Tsumura; K. Kaneko; R. Nawa; M. Ono; T. Uchida; R. Jinno; T. Yamaguchi; S. Fujita; T. Honda
    The 9th International Workshop on ZnO and Related Materials (IWZnO2016), 31 Oct. 2016
  • Study on Mist CVD Growth of In2O3
    T. Yamaguchi; T. Kobayashi; K. Tanuma; H. Nagai; T. Onuma; M. Sato; T. Honda
    2016 international Symposium on Novel and Sustainable Technology (2016ISNST), 06 Oct. 2016
  • Surface and Bulk Electronic Structures of Heavily Mg-Doped InN Epilayer by Hard X-Ray Photoelectron Spectroscopy
    M. Imura; S. Tsuda; T. Nagata; A. Yang; Y. Yamashita; H. Yoshikawa; Y. Koide; K. Kobayashi; T. Yamaguchi; M. Kaneko; N. Uematsu; K. Wang; T. Araki; Y. Nanishi
    International Workshop on Nitride Semiconductors (IWN 2016), 04 Oct. 2016
  • Fabrication of Vertical-Injection Type GaN-Based MIS Diodes with Near UV Transparent Oxide Electrodes
    T. Honda; S. Fujioka; T. Onuma; T. Yamaguchi; H. Nagai; M. Sato
    International Workshop on Nitride Semiconductors (IWN 2016), 02 Oct. 2016
  • RF-MBE Growth of InGaN Ternary Alloys Using in-situ Monitoring Techniques
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda; Y. Nanishi
    2016 International Conference on Solid State Devices and Materials (SSDM2016), 28 Sep. 2016
  • Impact of buffer layer thickness and annealing time for the optical and structural properties of GaN epilayers grown on sapphire substrate
    H. Matsuura; L. Sang; M. Sumiya; T.Yamaguchi; T. Honda
    European Materials Research Society, 2016 Fall Meeting (2016 E-MRS), 20 Sep. 2016
  • Deep-ultraviolet luminescence in rocksalt-structured Mg1-xZnxO thin films on MgO substrates
    K. Kaneko; K. Tsumura; T. Onuma; T. Uchida; R. Jinno; T. Yamaguchi; T. Honda; S. Fujita
    European Materials Research Society, 2016 Fall Meeting (2016 E-MRS), 19 Sep. 2016
  • β-Ga2O3薄膜と単結晶の光学定数の比較
    16 Sep. 2016
  • RF-MBE法による低温GaN緩衝層を挿入したAl薄膜上GaN成長検討
    16 Sep. 2016
  • 岩塩構造Mg1−xZnxO薄膜の深紫外発光
    15 Sep. 2016
  • Observation of exciton-LO-phonon interaction in β-Ga2O3 single crystals
    T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata; M. Higashiwaki
    German-Japanese Gallium Oxide Technology Meeting 2016 (GJGOTM2016), 07 Sep. 2016
  • Impact of GaN low-temperature buffer layer on GaN growth on Al templates
    Y. Hoshikawa; Y. Suzuki; K. Uehara; T. Onuma; T. Yamaguchi; T. Honda
    19th International Conference on Molecular Beam Epitaxy (ICMBE 2016), 04 Sep. 2016
  • Mist-CVD-Grown Crystalline In2O3 Thin-Film Transistors with Low Off-State Current
    S. Aikawa; K. Tanuma; T. Kobayashi; T. Yamaguchi; T. Onuma; T. Honda
    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18), 11 Aug. 2016
  • プラズマ生成条件を考慮したRF-MBE法によるAlInN薄膜成長
    09 Aug. 2016
  • 分子プレカーサー法を用いたMgO添加GIO薄膜製作検討
    09 Aug. 2016
  • MOVPE法で成長したGaN薄膜におけるバッファ層堆積後の昇温時間とバッファ層膜厚の影響
    09 Aug. 2016
  • RF-MBE法を用いたAl薄膜上GaN成長における低温GaNバッファ層挿入の影響
    09 Aug. 2016
  • 銀分散亜鉛薄膜によるプラズモン共鳴放出
    09 Aug. 2016
  • ミストCVD法を用いたCu2O薄膜成長
    09 Aug. 2016
  • Mist CVD法によるIn2O3薄膜の結晶成長
    09 Aug. 2016
  • Strain Relaxation Analysis Using In-situ X-ray Reciprocal Space Mapping Measurements in RF-MBE Growth of GaInN
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Onuma; T. Honda; Y. Nanishi
    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18), 09 Aug. 2016
  • Rock salt型MgZnO薄膜の成長とその深紫外発光特性
    30 Jul. 2016
  • Deep-ultraviolet luminescence in rocksalt- structured Mg1-xZnxO thin films
    K. Kaneko; K. Tsumura; T. Onuma; T. Uchida; R. Jinno; T. Yamaguchi; T. Honda; S. Fujita
    35th Electronic Materials Symposium (EMS-35), 08 Jul. 2016
  • Mist CVD growth of In2O3 on various substrates
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma; T. Honda
    35th Electronic Materials Symposium (EMS-35), 08 Jul. 2016
  • Effects of GaN low-temperature buffer layer on GaN surface flatness grown on Al templates
    Y. Hoshikawa; Y. Suzuki; K. Uehara; T. Onuma; T. Yamaguchi; T. Honda
    35th Electronic Materials Symposium (EMS-35), 07 Jul. 2016
  • Surface plasmon resonant emission from Ag dispersed ZnO films fabricated by molecular precursor method
    D. Taka; T. Onuma; T. Shibukawa; H. Nagai; T. Yamaguchi; J.-S. Jang; M. Sato; T. Honda
    The 43rd International Symposium on Compound Semiconductors (ISCS 2016), 26 Jun. 2016
  • Anisotropic optical constants in b-Ga2O3 single crystal
    T. Onuma; S. Saito; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata; M. Higashiwaki
    58th Electronic Materials Conference (EMC-58), 22 Jun. 2016
  • Mist CVD growth of In2O3 films on (0001)alfa-Al2O3 substrates and (0001)GaN templates
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’16 (LEDIA ’16), 19 May 2016
  • Optical properties of ZnO films dispersed with Ag nanocrystals fabricated by molecular precursor method
    D. Taka; T. Onuma; T. Shibukawa; H. Nagai; T. Yamaguchi; J.-S. Jang; M. Sato; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’16 (LEDIA ’16), 19 May 2016
  • (0001)alpha-Al2O3基板上および(0001)GaNテンプレート上へのIn2O3膜のミストCVD成長
    19 Mar. 2016
  • 分子プレカーサー法を用いたIn-Ga-Mg-O薄膜製作検討
    19 Mar. 2016
  • 分子プレカーサー法で製作した銀分散ZnO薄膜の光学的特性
    19 Mar. 2016
  • beta-Ga2O3結晶における励起子-LOフォノン相互作用
    19 Mar. 2016
  • Dislocation Passivation by Positive Usage of Phase Separation During InGaN Growth by DERI Method
    Y. Nanishi; T. Yamaguchi and T. Araki
    The Collaborative Conference on Crystal Growth 2015 (3CG 2015), 15 Dec. 2015
  • Epitaxial growth of GaInN by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy
    T. Yamaguchi; T. Honda; T. Onuma; T. Sasaki; M. Takahasi; T. Araki and Y. Nanishi
    第25回日本MRS年次大会, 09 Dec. 2015
  • Study of nitridation conditions of Al layer for GaN growth by RF-MBE", Materials Research Society
    Y. Hoshikawa; T. Onuma; T. Yamaguchi and T. Honda
    2015 Materials Research Society Fall Meeting & Exhibit(2015 MRS Fall Meeting), 03 Dec. 2015
  • Growth temperature dependence of Ga2O3 and In2O3 growth rates in Mist CVD
    K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
    2015 Materials Research Society Fall Meeting & Exhibit(2015 MRS Fall Meeting), 02 Dec. 2015
  • Technical issues of GaInN growth with high indium composition for LEDs
    T. Honda; T. Yamaguchi and T. Onuma
    The Collaborative Conference on Crystal Growth 2015 (3CG 2015), Dec. 2015
  • Valence band structure of monoclinic gallium oxide studied by polarized optical measurements
    T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda and M. Higashiwaki
    The Collaborative Conference on Crystal Growth 2015 (3CG 2015), Dec. 2015
  • Dislocation Passivation by Positive Usage of Phase Separation During RF-MBE Growth of InGaN
    Y. Nanishi; T. Yamaguchi and T. Araki
    The 3rd International Conference on Advanced Electromaterials (ICAE2015), 18 Nov. 2015
  • Defect characterization in GaInN on compressive and strain-free GaN underlying layer
    N. Toyomitsu; Y. Harada; J. Wang; L. Sang; T. Yamaguchi; T. Honda; Y. Nakano; and M. Sumiya
    6th International Symposium on Growth of III-Nitrides (ISGN-6), 11 Nov. 2015
  • Impact of nitridation on GaN growth on (0001)sapphire with an Al layer as a release layer by RF-MBE
    Y. Hoshikawa; S. Osawa; Y. Matsumoto; T. Onuma; T. Yamaguchi and T. Honda
    6th International Symposium on Growth of III-Nitrides (ISGN-6), 10 Nov. 2015
  • パルスインジェクショ法を用いたCu2O結晶成長
    07 Nov. 2015
  • Al薄膜上GaN成長における低温GaN緩衝層挿入の影響
    07 Nov. 2015
  • Optical Anisotropy in (010) Plane of beta-Ga2O3 Single Crystals
    T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda and M. Higashiwaki
    1st International Workshop on Gallium Oxide and Related Materials, 06 Nov. 2015
  • Growth of α-(AlGa)2O3 by mist CVD and evaluation of its thermal stability
    M. Takahashi; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Growth temperature dependence of Ga2O3 growth rate by mist CVD
    K. Tanuma; T. Onuma; T. Yamaguchi and T. Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Fabrication of p-type NiO thin films by molecular precursor method
    R. Goto; T. Onuma; T. Yamaguchi; H. Nagai; M. Sato and T. Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Impact of nitridation on GaN growth on sapphire with an Al layer as a sacrifice layer by RF-MBE
    Y. Hoshikawa; S. Osawa; Y. Matsumoto; T. Onuma; T. Yamaguchi and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • AR-XPS measurement of AlOx/AlN/GaN heterostructures
    D. Isono; S. Takahashi; Y. Sugiura; T. Onuma; T. Yamaguchi and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Discussion of ZnO based film by mist CVD method using molecular precursor solution
    R. Goto; K. Tanuma; T. Hatakeyama; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Correlation between green fluorescent emission and pits formed on surface of GaInN films
    N. Toyomitsu; Y. Harada; J. Wang; L. Sang; T. Yamaguchi; T. Honda; Y. Nakano and M. Sumiya
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Comprehensive study on GaN and InN etching by inductively coupled plasma reactive ion etching
    K. Narutani; T. Yamaguchi; T. Araki; Y. Nanishi; T. Onuma and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Fundamental Study on Local Surface Plasmons in Ag-nanocrystallites ZnO films toward Future Applications in Nitride-based LEDs
    D. Taka; T. Onuma; T. Shibukawa; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Mist-CVD Growth of In2O3
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Study on the Phase Transition Temperature of α-(AlGa)2O3 Grown by Mist CVD
    M. Takahashi; T. Hayakeyama; T. Onuma; T. Yamaguchi and T. Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • ICP-RIEによるGaN,GaInN,InNエッチングとGaInN系LED製作への応用
    29 Oct. 2015
  • In-situ X-ray Reciprocal Space Mapping Measurements in GaInN Growth on GaN by RF-MBE
    T. Yamaguchi; T. Sasaki; K. Narutani; M. Sawada; R. Deki; T. Onuma; T. Honda; M. Takahasi and Y. Nanishi
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • Comprehensive study on inductively coupled plasma reactive ion etching of GaN and InN
    K. Narutani; T. Yamaguchi; T. Araki; Y. Nanishi; T. Onuma and T. Honda
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • Thermal stability of α-(AlGa)2O3 grown by mist CVD
    M. Takahashi,T. Hatakeyama,T. Onuma,T. Yamaguchiand T. Honda
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • β-Ga2O3結晶の(010)面における光学的異方性
    15 Sep. 2015
  • MgZnO growth on (0001)sapphire by mist chemical vapor deposition
    R. Goto; H. Nagai; T. Yamaguchi; T. Onuma; M. Sato and T. Honda
    17th International Conference on II-VI Compounds and Related Materials, 14 Sep. 2015
  • RF-MBE法によるGaN上GaInN成長におけるその場X線逆格子マッピング測定
    14 Sep. 2015
  • ミストCVD法により製作したα-(AlGa)2O3の熱的安定性
    13 Sep. 2015
  • α-Ga2O3 and α-(AlGa)2O3 Buffer Layers in Growth of GaN
    T. Yamaguchi; T. Hatakeyama; K. Tanuma; T. Hirasaki; H. Murakami; T. Onuma and T. Honda
    11th International Conference On Nitride Semiconductors (ICNS-11), 01 Sep. 2015
  • Correlation between Deep-level Optical Spectroscopy and Cathodoluminescence on Pits Formed on Surface of GaInN Films
    N. Toyomitsu; Y. Harada; J. Wang; L. Sang; T. Sekiguchi; T. Yamaguchi; T. Honda; Y. Nakano and M.Sumiya
    11th International Conference On Nitride Semiconductors (ICNS-11), 01 Sep. 2015
  • Fabrication of (Ga, In)2O3-x films on GaN-based LED structures by molecular precursor method for near-UV transparent electrodes
    T. Honda; H. Nagai; S. Fujioka; R. Goto; T. Onuma; T. Yamaguchi and M.Sato
    The 22nd International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC22), 14 Aug. 2015
  • Fabrication of copper thin films using the molecular precursor method
    H. Nagai; T. Yamaguchi; T. Onuma; I. Takano; T. Honda and M. Sato
    The 22nd International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC22), 14 Aug. 2015
  • Study on spontaneous emission in nitride-based LEDs with Ag-nanocrystallites ZnO films fabricated by molecular precursor method
    T. Onuma; T. Shibukawa; D. Taka; K. Serizawa; E. Adachi; H. Nagai; T. Yamaguchi; J.-S. Jang; M. Sato and T. Honda
    The 22nd International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC22), 14 Aug. 2015
  • Growth of Group-III Oxides by Mist Chemical Vapor Deposition and Discussion on Thier Growth Mechanisms
    T. Yamaguchi; K. Tanuma; H. Nagai; T. Onuma; T. Honda and M. Sato
    The 22nd International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC22), 14 Aug. 2015
  • 分子プレカーサー水溶液を用いたミスト化学気相成長による酸化亜鉛薄膜製作
    09 Aug. 2015
  • ミストCVD法により製作したa-(AlGa)2O3の熱的安定性
    09 Aug. 2015
  • ICP-RIEによるInNおよびGaN温度依存性エッチング
    09 Aug. 2015
  • RF-MBE法によるSapphire基板上Al犠牲層の窒化処理によるGaN成長の影響
    09 Aug. 2015
  • ミストCVD法を用いたGa2O3成長における成長速度の温度依存性
    09 Aug. 2015
  • RF-MBE法を用いたSapphire基板上GaN成長
    09 Aug. 2015
  • RF-MBE法によるGaN上GaInN成長におけるその場X線逆格子マッピング測定
    08 Aug. 2015
  • AR-XPS法を用いたAlOx/AlN/GaN構造のバンド構造解析
    08 Aug. 2015
  • MOCVD法を用いて成長したGaInN薄膜の欠陥評価
    08 Aug. 2015
  • Inductively coupled plasma reactive ion etching of GaN and InN
    K. Narutani; T. Yamaguchi; T. Araki; Y. Nanishi; T. Onuma and T. Honda
    34th Electronic Materials Symposium (EMS-34), 16 Jul. 2015
  • Growth condition dependence of Ga-In-O films by mist-CVD
    K. Tanuma; R. Goto; T. Onuma; T. Yamaguchi and T. Honda
    34th Electronic Materials Symposium (EMS-34), 15 Jul. 2015
  • vate Dislocations by Positive Usage of Phase Separation in InGaN
    Y. Nanishi; T. Yamaguchi and T. Araki
    Workshop on Frontier Photonic and Electronic Materials and Devices, 14 Jul. 2015
  • The Role of Impurities in Raman Scattering of InN: from Thin Films to Nanowires
    N. Domènech-Amador; R. Cuscó; R. Calarco; T. Yamaguchi; Y. Nanishi and L.Artús
    Compound Semiconductor Week 2015, 29 Jun. 2015
  • Determination of Direct and Indirect Bandgap-Energies of b-Ga2O3 by Polarized Transmittance and Reflectance Spectroscopy
    T. Onuma; S. Saito; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda and M. Higashiwaki
    57th Electronic Materials Conference (EMC-57), 24 Jun. 2015
  • Photoelectron spectra of AlN/GaN heterostructure observed by AR-XPS
    D. Isono; S. Takahashi; Y. Sugiura; T. Yamaguchi and T. Honda
    The 7th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2015), 18 May 2015
  • Correlation between green fluorescence and impurities on pits formed on surface of InGaN
    N. Toyomitsu; Y. Harada; J. Wang; L. Sang; T. Sekiguchi; T. Yamaguchi; T. Honda; Y. Nakano and M. Sumiya
    The 5th Asia-Arab Sustainable Energy Forum & 7th Int. Workshop on SSB (5AASEF), 12 May 2015
  • Growth mechanisms of InN and its alloys using droplet elimination by radical beam irradiation
    T. Yamaguchi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
    EMN droplet, 09 May 2015
  • 誘導結合型プラズマ反応性イオンエッチングによるInN エッチング
    07 May 2015
  • 光デバイス用GaInN結晶のXPS測定評価
    30 Apr. 2015
  • MBE成長InGaN受光・発光素子の現状と展望
    30 Apr. 2015
  • 酸化物/窒化物構造の成長プロセスと光物性
    30 Apr. 2015
  • Fundamental study on growth of α-(AlGa)2O3 alloys by mist CVD-A study on growth rate of α-Al2O3 compared with α-Ga2O3
    M. Takahashi; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    The 3rd International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'15), 23 Apr. 2015
  • Aluminum growth on sapphire substrate with surface nitridation by RF-MBE
    Y. Hoshikawa; S. Osawa; Y. Matsumoto; T. Yamaguchi; T. Onuma and T. Honda
    The 3rd International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'15), 23 Apr. 2015
  • Optical Anisotropy in beta-Ga2O3 Crystals Grown by Melt-Growth Methods
    T. Onuma; S. Saito; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda and M. Higashiwaki
    The 3rd International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'15), 23 Apr. 2015
  • 窒化ガリウム系発光ダイオードにおける「グリーンギャップ」問題
    17 Mar. 2015
  • 分子プレカーサー水溶液を用いたミストCVD法によるZnO薄膜製作
    14 Mar. 2015
  • ミストCVDによるalpha-(AlGa)2O3混晶成長の基礎検討 ―alpha-Ga2O3と比較したalpha-Al2O3の成長速度の検討―
    13 Mar. 2015
  • Ga-In-O薄膜のウェットエッチングプロセス検討
    13 Mar. 2015
  • InGaN薄膜表面に形成されたピットのCLと不純物との相関
    12 Mar. 2015
  • RF-MBE法による窒化サファイア基板上アルミニウム薄膜成長
    12 Mar. 2015
  • beta-Ga2O3結晶の透過と反射スペクトルの偏光依存性
    12 Mar. 2015
  • Growth and doping of In-based nitride semiconductors using DERI method
    T. Yamaguchi; T. Araki; T. Onuma; T. Honda and Y. Nanishi (招待講演)
    The 2015 Materials Challenges in Alternative and Renewable Energy Conference (MCARE 2015), 25 Feb. 2015
  • Progress in InGaN Growth by RF-MBE and Development to Optical Device Fabrication
    T. Yamaguchi; T. Araki; T. Onuma; T. Honda and Y. Nanishi (招待講演)
    SPIE Photonic West, 09 Feb. 2015
  • Fabrication of alpha-(AlGa)2O3 on sapphire substrate by mist CVD
    T. Hatakeyama; K. Tanuma; S. Osawa; Y. Sugiura; T. Onuma T. Hirasaki; H. Murakami; T. Yamaguchi and T. Honda
    10th International Symposium on Semiconductor Light Emitting Devices (ISSLED2014), 16 Dec. 2014
  • Cathode luminescence at 520 nm related on fluorescence green emission from pits formed on surface of GaInN films
    N. Toyomitsu; L. Sang; Wang Jianyu; T. Yamaguchi; T. Honda and M. Sumiya
    10th International Symposium on Semiconductor Light Emitting Devices (ISSLED2014), 15 Dec. 2014
  • Properties of near-UV transparent Ga-In-O electrode in GaN-based MOS-LED
    S. Fujioka; T. Yasuno; T. Onuma; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    10th International Symposium on Semiconductor Light Emitting Devices (ISSLED2014), 15 Dec. 2014
  • AR-XPS spectra and band-bending properties of +c, -c and m-GaN surfaces
    D. Isono; S. Fujioka; Y. Sugiura; T. Onuma; T. Yamaguchi and T. Honda
    2014 Materials Research Society Fall Meeting & Exhibit(2014 MRS Fall Meeting), 02 Dec. 2014
  • Raman scattering study of -Ga2O3 single-crystal films grown by mist CVD
    L. Artus; N. Domenech-Amador; R. Cusco; T. Hatakeyama; T. Yamaguchi and T. Honda
    2014 Materials Research Society Fall Meeting & Exhibit(2014 MRS Fall Meeting), 01 Dec. 2014
  • New Approach to Fabricate Green, Red and IR Light Sources Based on Nitride Semiconductors by DERI Method
    Y. Nanishi; T. Yamaguchi and T. Araki (招待講演)
    31st International Korea-Japan Seminar on Ceramics, 27 Nov. 2014
  • Growth and characterization of Ga-In-O by mist CVD
    K. Tanuma; T. Hatakeyama; R. Goto; T. Onuma; T. Yamaguchi and T. Honda
    The 13th International Symposium on Advanced Technology (ISAT-13), 14 Nov. 2014
  • Growth of oxide thin films by mist chemical vapor deposition -Application of corundum-structured oxides for growth of GaN-
    T. Hatakeyama; K. Tanuma; S. Osawa; Y. Sugiura; T. Onuma; T. Yamaguchi and T. Honda
    The 13th International Symposium on Advanced Technology (ISAT-13), 14 Nov. 2014
  • 下地GaN層の歪の異なるGaInN薄膜表面ピット形成と蛍光特性
    13 Nov. 2014
  • 六方晶GaN中に挿入した一分子層InNの構造完全性による影響
    13 Nov. 2014
  • RF-MBE Growth of InGaN Alloys and Fabrication of Optical Device Structures
    T. Yamaguchi; T. Araki; T. Onuma; T. Honda and Y. Nanishi (招待講演)
    The Collaborative Conference on Crystal Growth (3CG), 05 Nov. 2014
  • Influence of Surface Oxides for Band Bending of N-Type GaN
    Y. Sugiura; D. Isono; T. Yamaguchi and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Mist chemical vapor deposition growth of alpha-(AlGa)2O3
    T. Hatakeyama; K. Tanuma; S. Osawa; Y. Sugiura; T. Onuma T. Hirasaki; H. Murakami; T. Yamaguchi and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Characterization of fluorescence emission of GaInN films
    N. Toyomitsu; L. Sang; T. Yamaguchi; T. Honda and M. Sumiya
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Characterization of GaN thin film grown on pseudo Al template by radio-frequency plasma-assisted molecular beam epitaxy
    Y. Watanabe; S. Osawa; D. Tajimi; T. Hatakeyama; T. Yamaguchi and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Thickness Dependence of Pseudo Aluminum Templates in Growth of GaN by RF-MBE
    S. Osawa; T. Onuma; T. Yamaguchi and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Fabrication of ZnO thin film by molecular precursor method
    R. Goto; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Mist Chemical Vapor Deposition Growth of Ga-In-O films
    K. Tanuma; T. Hatakeyama; R. Goto; T. Onuma; T. Yamaguchi and T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • X-ray photoelectron spectroscopy of C+, C- and M-GaN surfaces
    D. Isono; Y. Sugiura; T. Yamaguchi; T. Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE-1), 02 Nov. 2014
  • Mist Chemical Vapor Deposition Growth of Group-III Oxides And Its Growth Mechanism
    T. Yamaguchi; T. Hatakeyama; K. Tanuma; M. Sugimoto; H. Nagai; T. Onuma; M. Sato and T. Honda (招待講演)
    The 21st International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC21), 01 Nov. 2014
  • Optical characterization of gallium-indium-oxide wide bandgap semiconductors for future device applications
    T. Onuma; C. Mochizuki; H. Nagai; T. Yamaguchi; M. Sato; T. Honda (招待講演)
    The 21st International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium (SPACC21), 01 Nov. 2014
  • Ga2O3基板の光学的特性評価
    26 Sep. 2014
  • Growth of InGaN Alloys using DERI Method and Fabrication of LED structures
    T. Yamaguchi; T. Araki; T. Onuma; T. Honda and Y. Nanishi (招待講演)
    Energy Materials Nanotechnology open access week (EMN open access week), 24 Sep. 2014
  • AlOx/AlN/GaNヘテロ構造の発光特性
    20 Sep. 2014
  • RF-MBE 法を用いたGaN 成長が疑似Al 基板に与える影響
    19 Sep. 2014
  • 疑似Al基板上GaN薄膜のフォトルミネッセンス評価
    19 Sep. 2014
  • n-GaN結晶のXPSスペクトルにおける内殻準位ピーク非対称性の検討
    19 Sep. 2014
  • Mist CVD法を用いて製作した-Al2O3基板上Ga-In-O薄膜の評価
    18 Sep. 2014
  • Growth of pn-GaInN structures by RF-MBE and fabrication of homojunction-type light emitting diodes
    K. Narutani; T. Yamaguchi; K. Wang; T. Araki; Y. Nanishi; L. Sang; M. Sumiya; S. Fujioka; T. Onuma; T. Honda
    18th International Conference on Molecular Beam Epitaxy (ICMBE 2014), 11 Sep. 2014
  • Growth of alpha-Ga2O3 on alpha-Al2O3 substrate by mist CVD and growth of GaN on alpha-Ga2O3 buffer layer by RF-MBE
    T. Yamaguchi; T. Hatakeyama; D. Tajimi; T. Onuma and T. Honda
    18th International Conference on Molecular Beam Epitaxy (ICMBE 2014), 11 Sep. 2014
  • Pressure Dependence of the Refractive Index in Wurtzite and Rocksalt InN
    R. Oliva; J. Ibañez; A. Segura; T. Yamaguchi; Y. Nanishi and L. Artus
    52th European High Pressure Research Group International Meeting, 09 Sep. 2014
  • Kelvin force microscopic study on GaN layers grown on (111)Al templates by RF-MBE
    T. Honda; T. Yamaguchi; Y. Sugiura; D. Isono; Y. Watanabe; S. Osawa; D. Tajimi; T. Iwabuchi; S. Kuboya; T. Tanikawa; R. Katayama and T. Matsuoka
    18th International Conference on Molecular Beam Epitaxy (ICMBE 2014), 09 Sep. 2014
  • RF-MBE Growth of InN and InGaN Ternary Alloys Using DERI
    T. Araki; T. Yamaguchi and Y. Nanishi (招待講演)
    19th International Conference on Ternary and Multinary Compounds (ICTMC-19), 05 Sep. 2014
  • 光デバイス応用に向けたIn系窒化物半導体MBE成長~DERI法の紹介と様々な応用展開~
    05 Sep. 2014
  • Thickness Dependence of Pseudo Aluminum Templates in Growth of GaN by RF-MBE
    S. Osawa; T. Onuma; T. Yamaguchi and T. Honda
    The International Workshop on Nitride Semiconductors 2014 (IWN2014), 26 Aug. 2014
  • Study on structure perfection of one-monolayer thick InN in hexagonal GaN using XRD techniques
    N. Watanabe; D. Tajimi; N. Hashimoto; K. Kusakabe; K. Wang; T. Yamaguchi; A. Yoshikawa and T. Honda
    The International Workshop on Nitride Semiconductors 2014 (IWN2014), 26 Aug. 2014
  • Optical properties of GaInN p-n homojunction blue-green light-emitting-diodes
    T. Onuma; K. Narutani; S. Fujioka; T. Yamaguchi; K. Wang; T. Araki; Y. Nanishi; L. Sang; M. Sumiya and T. Honda (招待講演)
    International Union of Materials Research Societies, International Conference in Asia 2014 (IUMRS-ICA 2014), 25 Aug. 2014
  • GaN層のケミカルリフトオフに向けたAlの膜厚検討
    10 Aug. 2014
  • GaInNからの蛍光発光と結晶性との相関
    10 Aug. 2014
  • 厚膜GaInN成長とホモ接合型青緑LEDsの製作
    10 Aug. 2014
  • Mist CVD法を用いて成長したalpha-Al2O3基板上Ga-In-O薄膜の評価
    10 Aug. 2014
  • n-GaN結晶のXPSにおける内部電界強度とピーク非対称性の検討
    10 Aug. 2014
  • 分子プレカーサー法によるZnO薄膜製作のための熱処理温度検討
    10 Aug. 2014
  • in-situ RF-MBE法を用いたAlOx/AlN/GaNヘテロ構造の製作
    10 Aug. 2014
  • Mist CVD法を用いた酸化物薄膜成長
    09 Aug. 2014
  • GaN系MOS-LEDを用いたGa-In-O近紫外透明電極の評価
    09 Aug. 2014
  • 疑似Al基板上に成長したGaN薄膜の特性評価
    09 Aug. 2014
  • RF-MBE growth of GaInN films using DERI method and fabrication of homojunction-type LED structures
    T. Yamaguchi; K. Narutani; T. Onuma; T. Araki; T. Honda; Y. Nanishi(招待講演)
    The 6th International Symposium on Functional Materials (ISFM 2014), 07 Aug. 2014
  • Plasma Induced Point Defects in InN During RF-MBE Growth and Those Reduction by DERI Method
    Y. Nanishi; T. Yamaguchi; T. Araki; A. Uedono and T. Palacios
    Defects in Semiconductors Gordon Research Conference, 05 Aug. 2014
  • RF-MBE 法によるGaInN 厚膜成長とpn ホモ接合型青緑色LED の製作
    26 Jul. 2014
  • RF-MBE法を用いた膜厚の異なるAlテンプレート上GaN 成長
    26 Jul. 2014
  • Recent Material Studies of III-Nitride Semiconductors for Next Generation Devices
    Y. Nanishi; T. Yamaguchi and T. Araki (招待講演)
    The Professor Harry C. Gatos Lecture and Prize/The Age of Silicon Symposium, 25 Jul. 2014
  • Impact of UV transparent Ga-In-O electrode in vertical-type GaN-based metal oxide semiconductor light-emitting diodes
    S. Fujioka; T. Yasuno; A. Sato; T. Onuma; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    33rd Electronic Materials Symposium (EMS-33), 11 Jul. 2014
  • Investigation of Ga-In-O films grown on alpha-Al2O3 substrates by Mist CVD
    K. Tanuma; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    33rd Electronic Materials Symposium (EMS-33), 10 Jul. 2014
  • Blue-green light emitting diodes using pn-GaInN homojunction-type structure
    K. Narutani; T. Yamaguchi; K. Wang; T. Araki; Y. Nanishi; L. Sang; M. Sumiya; S. Fujioka; T. Onuma and T. Honda
    33rd Electronic Materials Symposium (EMS-33), 10 Jul. 2014
  • Impact of perfection on one-monolayer thick InN in hexagonal GaN
    N. Watanabe; D. Tajimi; T. Onuma; T. Yamaguchi and T. Honda
    33rd Electronic Materials Symposium (EMS-33), 09 Jul. 2014
  • AR-XPS spectra of c- and m- plane n-GaN crystals
    D. Isono; R. Amiya; T. Yamaguchi and T. Honda
    33rd Electronic Materials Symposium (EMS-33), 09 Jul. 2014
  • RF-MBE growth of group-III nitrides and mist CVD growth of group-III oxides
    T. Yamaguchi; T. Onuma; H. Nagai; C. Mochizuki; M. Sato; T. Honda; T. Araki and Y. Nanishi (招待講演)
    Third International Conference on Materials Energy and Environments (ICMEE 2014), 03 Jul. 2014
  • Fabrication of copper thin films using the solution based method
    H. Nagai; T. Nakano; S. Mita; T. Yamaguchi; I. Takano; T. Honda and M. Sato (招待講演)
    Third International Conference on Materials Energy and Environments (ICMEE 2014), 03 Jul. 2014
  • DERI Method; Possible Approach to Longer Wavelength Light Emitters Based on Nitride Semiconductors
    Y. Nanishi; T. Yamaguchi and T. Araki (招待講演)
    6th Forum on New Materials (CIMTEC2014), 18 Jun. 2014
  • Mist CVD growth of Ga-In-O films grown on alpha-Al2O3 substrates
    K. Tanuma; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    International Union of materials Research Societies-International Conference on Electronic Materials 2014 (IUMRS-ICEM’2014), 12 Jun. 2014
  • Spin-coating fabrication of In-doped ZnO films by molecular precursor method
    R. Goto; T. Yasuno; T. Hatakeyama; H. Hara; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    International Union of materials Research Societies-International Conference on Electronic Materials 2014 (IUMRS-ICEM’2014), 12 Jun. 2014
  • Influence of Surface Oxides for Band Bending of N-Type GaN
    Y. Sugiura; R. Amiya; D. Isono; T. Yamaguchi and T. Honda
    5th International Symposium on Growth of III-Nitrides (ISGN-5), 22 May 2014
  • Fabrication of Pseudo Aluminum Templates on 4H-SiC and Growth of GaN on Pseudo Aluminum Templates by RF-MBE
    Y. Watanabe; S. Osawa; D. Tajimi; T. Hatakeyama; T. Yamaguchi and T. Honda
    5th International Symposium on Growth of III-Nitrides (ISGN-5), 19 May 2014
  • Mist Chemical Vapor Deposition Growth of Ga2O3, In2O3 and Their Alloys
    T. Yamaguchi; K. Tanuma; T. Hatakeyama; T. Onuma and T. Honda
    The 41st International Symposium on Compound Semiconductor (ISCS2014), 12 May 2014
  • RF-MBE growth of GaInN ternary alloys using DERI method and fabrication of pn-GaInN LEDs
    T. Yamaguchi; K. Narutani; T. Onuma; T. Honda; T. Araki and Y. Nanishi (招待講演)
    2014International Workshop on Future Energy Materials and Devices (IWFEMD 2014), 02 May 2014
  • Characterization of Dark Spots on GaInN Films by Using Fluorescence Microscope and Secondary Ion Mass Spectroscopy
    N. Toyomitsu; L. Sang; T. Yamaguchi; T. Honda and M. Sumiya
    Conference on LED and Its Industrial Application (LEDIA’14), 24 Apr. 2014
  • RF-MBE Growth of pn-GaInN Structure and Fabrication of Blue-Green Homojunction-Type Light Emitting Diode
    K. Narutani; T. Yamaguchi; K. Wang; T. Araki; Y. Nanishi; L. Sang; M. Sumiya; S. Fujioka; T. Onuma and T. Honda
    Conference on LED and Its Industrial Application (LEDIA’14), 24 Apr. 2014
  • Fabrication of Vertical-Type GaN-Based Metal Oxide Semiconductor Light-Emitting Diodes
    S. Fujioka; T. Yasuno; A. Sato; T. Onuma; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    Conference on LED and Its Industrial Application (LEDIA’14), 24 Apr. 2014
  • Effect of Pseudo Aluminum Templates in RF-MBE Growth of GaN on 4H-SiC
    Y. Watanabe; S. Osawa; D. Tajimi; T. Yamaguchi and T. Honda
    Conference on LED and Its Industrial Application (LEDIA’14), 24 Apr. 2014
  • Optical Properties of Ga-In-O Polycrystalline Films Fabricated by Molecular Precursor Method
    T. Onuma; T. Yasuno; S. Takano; R. Goto; S. Fujioka; T. Hatakeyama; H. Hara; C. Mochizuki; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    Conference on LED and Its Industrial Application (LEDIA’14), 23 Apr. 2014
  • Light emission properties of ultra thin InN in the GaN matrix
    T. Honda; T. Yamaguchi; T. Onuma; D. Tajimi; N. Watanabe; N. Hashimoto; K. Kusakabe and A. Yoshikawa (招待講演)
    International Conference on Metamaterials and Nanophysics (Metanano2014), Apr. 2014
  • GaInNのRF-MBE成長とpn ホモ接合型青緑色LEDの製作
    20 Mar. 2014
  • ミストCVD法を用いたGa2O3結晶成長における成長速度の温度依存性
    18 Mar. 2014
  • 分子プリカーサー法で製作したGa-In-O多結晶薄膜の発光特性
    17 Mar. 2014
  • 蛍光顕微鏡と2次イオン質量分析を用いたGaInN薄膜の不均一評価
    17 Mar. 2014
  • DERI Method; Possible Approach to Green, Red and IR Light Emitters Based on Nitride Semiconductors
    Y. Nanishi; T. Yamaguchi; T. Araki and E. Yoon (招待講演)
    SPIE Photonics West 2014, 04 Feb. 2014
  • DERI Method; Possible Approach to Green, Red and IR Light Emitters Based on Nitride Semiconductors
    2014
  • Mist CVD growth of alpha-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on alpha-Ga2O3/sapphire templates
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; R. Amiya; T. Onuma and T. Honda
    The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013
  • Ga2O3 and In2O3 growth by mist CVD
    K. Tanuma; T. Yamaguchi; T. Hatakeyama; T. Onuma and T. Honda
    The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013
  • Growth of InN and Related Alloys using DERI Method toward Fabrication of Optoelectronics Devices
    T. Yamaguchi; K. Wang; T. Honda; E. Yoon; T. Araki; Y. Nanishi
    The 2nd International Conference on Advanced Electromaterials (ICAE2013), 13 Nov. 2013
  • RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
    S. Ohsawa; D. Tajimi; T. Yamaguchi; T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE2013), 13 Nov. 2013
  • Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi; T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE2013), 13 Nov. 2013
  • Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
    R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi; T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE2013), 13 Nov. 2013
  • Ga2O3上GaN成長とGaN上Ga2O3成長
    07 Nov. 2013
  • ミストCVD法を用いたGa2O3及びIn2O3成長
    07 Nov. 2013
  • MBE Growth of Thick InN and InGaN Films using DERI Method
    T. Araki; T. Yamaguchi; E. Yoon; Y. Nanishi
    2013 JSPS-MRS Joint Symposia, 18 Sep. 2013
  • GaN系ショットキー型発光ダイオードにおける(Al,Ga)Ox/GaN界面準位の影響
    17 Sep. 2013
  • 硬X線光電子分光法を用いたMg-InN のエネルギーバンド分布評価
    17 Sep. 2013
  • ミストCVD法を用いたGaN基板上へのGa2O3成長
    16 Sep. 2013
  • beta-Ga2O3結晶における青色発光強度と抵抗率の相関
    16 Sep. 2013
  • RF-MBEを用いたInGaN成長の膜厚依存性
    16 Sep. 2013
  • 4H-SiC上の疑似Al基板製作と疑似基板上へのGaN RF-MBE成長
    16 Sep. 2013
  • 表面酸化物のGaN表面フェルミ準位と表面バンド曲がりに及ぼす影響
    16 Sep. 2013
  • Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
    2013 JSPS-MRS Joint Symposia, 16 Sep. 2013
  • Fabrication of Ga-In-O films by Molecular Precursor Method and Their Future Application of UV Transparent Electrodes
    T. Yasuno; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato; T. Honda
    The 16th International Conference on II-VI Compounds and Related Materials (II-VI 2013), 11 Sep. 2013
  • RF-MBE Growth and Characterization of GaN Films on alpha-Ga203/Sapphire Template
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
    10th International Conference on Nitride Semiconductors 2013 (ICNS-10), 27 Aug. 2013
  • RF-MBE Growth of InGaN Ternally Alloys: Advantage of DERI method
    T. Yamaguchi; K. Wang; T. Honda; E. Yoon; T. Araki; Y. Nanishi (招待講演)
    The 16th Canadian Semiconductor Science and Technology Conference (CSSTC2013), 15 Aug. 2013
  • RF-MBE growth of GaN films on nitridated alpha-Ga2O3 buffer layer
    T. Yamaguchi; T. Hatakeyama; D. Tajimi; Y. Sugiura; T. Onuma; T. Honda
    17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 14 Aug. 2013
  • Message for Future Research and Development of Opto-Electronic Devices Based on Nitride Semiconductors
    Y. Nanishi; T. Yamaguchi; T. Araki and E. Yoon (招待講演)
    The 8th LED Semiconductor Lightings Conference, 13 Aug. 2013
  • Polarized Raman Spectra in beta-Ga2O3 Crystals
    T. Onuma; S. Fujioka; T. Yamaguchi; M. Higashiwaki; K. Sasaki; T. Masui; T. Honda
    17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 13 Aug. 2013
  • RF-MBE法による疑似Al基板を用いたGaN成長
    10 Aug. 2013
  • Alpha-Ga2O3上へのGaN RF-MBE成長
    10 Aug. 2013
  • GaN基板上へのショットキーダイオード製作における表面改質の基礎検討
    10 Aug. 2013
  • 分子プレカーサ法を用いた(0001)Sapphire基板上Ga-In-O薄膜の製作
    10 Aug. 2013
  • RF-MBE法によるAlN/GaN構造上AlOx薄膜の結晶成長
    10 Aug. 2013
  • 表面酸化物によるGaN表面フェルミ準位と表面バンド曲がりの変化
    10 Aug. 2013
  • Recent Progress and Issues of InN and InGaN Growth for Future Optoelectronic Devices
    Y. Nanishi; T. Yamaguchi; T. Araki and E. Yoon (招待講演)
    The WCU Korea-China Workshop on Nitride Semiconductors 2013, 22 Jul. 2013
  • Effects of surface modification on emission property of GaN Schottky diodes
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 11 Jul. 2013
  • RF-MBE growth of GaN films on alpha-Ga2O3/sapphire template
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 11 Jul. 2013
  • The GaN growth on psude Aluminum templates by molecular beam epitaxy
    S. Osawa; T. Hatakeyama; D. Tajimi; T. Yamaguchi; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 11 Jul. 2013
  • Characterization of Ga-In-O films fabricated by molecular precursor method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 11 Jul. 2013
  • Influence of native surface oxide on GaN surface band bending
    R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 11 Jul. 2013
  • RF-MBE growth of AlOx/AlN/GaN heterostructures
    Y. Sugiura; T. Yamaguchi; T. Honda; M. Higashiwaki
    32nd Electronic Materials Symposium (EMS-32), 10 Jul. 2013
  • Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
    D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi; T. Honda
    32nd Electronic Materials Symposium (EMS-32), 10 Jul. 2013
  • RF-MBE法による疑似Al基板上へのGaN成長
    22 Jun. 2013
  • 表面酸化物によるGaN表面フェルミ準位に及ぼす影響
    22 Jun. 2013
  • DERI法を応用したRF-MBEによるInGaN成長と評価
    22 Jun. 2013
  • Compressively strained GaN growth on (0001) 4H-SiC with Al buffer by MBE
    S. Osawa; D. Tajimi; T. Yamaguchi; T. Honda
    E-MRS 2013 Spring Meeting, 28 May 2013
  • Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
    T. Yamaguchi; D. Tajimi; M. Hayashi; T. Igaki; Y. Sugiura; T. Honda
    The 40th International Symposium on Compound Semiconductors (ISCS2013), 20 May 2013
  • Aluminum layers grown on (0001) 4H-SiC for the GaN growth by molecular beam epitaxy
    S. Osawa; D. Tajimi; T. Yamaguchi; T. Honda
    The 40th International Symposium on Compound Semiconductors (ISCS2013), 20 May 2013
  • In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
    Y. Sugiura; T. Yamaguchi; T. Honda; M. Higashiwaki
    The 40th International Symposium on Compound Semiconductors (ISCS2013), 20 May 2013
  • Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
    D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi; T. Honda
    The 6th Asia-Pacific Workshop on Widegap Semiconductor (APWS2013), 14 May 2013
  • InN および In-rich InGaN をベースとした窒化物半導体による長波長発光デバイス開発への挑戦
    27 Apr. 2013
  • Temperature Dependent Cathodo-Luminescence Spectraof beta-Ga2O3Crystals
    T. Onuma; S. Fujioka; T. Yamaguchi; M. Higashiwaki; K. Sasaki; T. Masui; T. Honda
    Conference on LED and Its Industrial Application (LEDIA’13), 25 Apr. 2013
  • Fabrication of Ga-In-O Films by Molecular Precursor Method
    T. Yasuno; T. Oda; H.Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato; T. Honda
    Conference on LED and Its Industrial Application (LEDIA’13), 24 Apr. 2013
  • Formation of Aluminum Templates Grown on(0001)4H-SiC for the GaN Growth by RF-MBE
    S. Osawa; D. Tajimi; T. Yamaguchi; T. Honda
    Conference on LED and Its Industrial Application (LEDIA’13), 24 Apr. 2013
  • Growth of GaN on alpha-Ga2O3/Sapphire Template by RF-MBE
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
    Conference on LED and Its Industrial Application (LEDIA’13), 24 Apr. 2013
  • Surface Modification of GaN Crystals and Its Effectson Optical Properties
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi; T. Honda
    Conference on LED and Its Industrial Application (LEDIA’13), 24 Apr. 2013
  • Recent Progress on InN and InGaN Growth for Future Optoelectronic Devices
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki and E. Yoon (招待講演)
    Conference on LED and Its Industrial Application (LEDIA’13), 23 Apr. 2013
  • 硬X線光電子分光法を用いたMgドープIn0.70Ga0.30Nの表面-バルク電子状態評価
    28 Mar. 2013
  • 表面酸化物によるGaN表面フェルミ準位の変化
    28 Mar. 2013
  • beta-Ga2O3結晶の偏光ラマンスペクトル
    28 Mar. 2013
  • In-situ RF-MBE法によるAlOx/AlN/GaN構造のヘテロ成長
    28 Mar. 2013
  • Application of DERI method to InN/InGaN MQW, thick InGaN and InGaN/InGaN MQW structure growth
    T. Yamaguchi; K. Wang; T. Araki; T. Honda; E. Yoon; Y. Nanishi(招待講演)
    SPIE Photonic West, 04 Feb. 2013
  • Growth of ultra-thin InN/GaN quantum well with super-weak waveguide by RF-MBE
    T. Honda; D. Tajimi; Y. Sugiura; T. Onuma; T. Yamaguchi
    Euro-MBE 2013, Feb. 2013
  • Recent Development of Growth and Characterization of InN, In-rich InGaN and Those Nano-structures
    15 Jan. 2013
  • Fabrication of Ga-In-O Films by Molecular Precursor Method
    2013
  • In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
    2013
  • Aluminum layers grown on (0001) 4H-SiC for the GaN growth by molecular beam epitaxy
    2013
  • Effects of surface modification on emission property of GaN Schottky diodes
    2013
  • Message for Future Research and Development of Opto-Electronic Devices Based on Nitride Semiconductors
    2013
  • Growth of InN and Related Alloys using DERI Method toward Fabrication of Optoelectronics Devices
    2013
  • Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
    2013
  • Mist CVD growth of alpha-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on alpha-Ga2O3/sapphire templates
    2013
  • Growth of GaN on alpha-Ga2O3/Sapphire Template by RF-MBE
    2013
  • Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
    2013
  • Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
    2013
  • RF-MBE growth of AlOx/AlN/GaN heterostructures
    2013
  • Influence of native surface oxide on GaN surface band bending
    2013
  • Characterization of Ga-In-O films fabricated by molecular precursor method
    2013
  • Recent Progress and Issues of InN and InGaN Growth for Future Optoelectronic Devices
    2013
  • RF-MBE Growth of InGaN Ternally Alloys: Advantage of DERI method
    2013
  • RF-MBE Growth and Characterization of GaN Films on alpha-Ga203/Sapphire Template
    2013
  • Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
    2013
  • MBE Growth of Thick InN and InGaN Films using DERI Method
    2013
  • Ga2O3 and In2O3 growth by mist CVD
    2013
  • Growth of ultra-thin InN/GaN quantum well with super-weak waveguide by RF-MBE
    2013
  • Recent Progress on InN and InGaN Growth for Future Optoelectronic Devices
    2013
  • Formation of Aluminum Templates Grown on(0001)4H-SiC for the GaN Growth by RF-MBE
    2013
  • Temperature Dependent Cathodo-Luminescence Spectraof beta-Ga2O3Crystals
    2013
  • Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
    2013
  • Compressively strained GaN growth on (0001) 4H-SiC with Al buffer by MBE
    2013
  • RF-MBE growth of GaN films on alpha-Ga2O3/sapphire template
    2013
  • Polarized Raman Spectra in beta-Ga2O3 Crystals
    2013
  • RF-MBE growth of GaN films on nitridated alpha-Ga2O3 buffer layer
    2013
  • Fabrication of Ga-In-O films by Molecular Precursor Method and Their Future Application of UV Transparent Electrodes
    2013
  • Application of DERI method to InN/InGaN MQW, thick InGaN and InGaN/InGaN MQW structure growth
    2013
  • Surface Modification of GaN Crystals and Its Effectson Optical Properties
    2013
  • The GaN growth on psude Aluminum templates by molecular beam epitaxy
    2013
  • Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
    2013
  • RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
    2013
  • DERI法を用いたInGaN系量子ナノ構造のRF-MBE成長
    30 Nov. 2012
  • Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
    T. Honda; T. Onuma; Y. Sugiura; T. Yamaguchi
    2012 Materials Research Society (MRS) Fall Meeting, 29 Nov. 2012
  • GaNの表面処理による表面フェルミ準位変化の推定
    29 Nov. 2012
  • Fabrication of Ga2O3 Films by Molecular Precursor Method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato; T. Honda
    2012 Materials Research Society (MRS) Fall Meeting, 28 Nov. 2012
  • RF-MBE法による交互供給緩衝層をSi基板上に導入したGaN薄膜の残留歪評価
    08 Nov. 2012
  • クロストーク低減へ向けたultra-thin InN/GaN単一量子井戸の製作
    08 Nov. 2012
  • Recent Development of Growth and Characterization of InN, In-rich InGaN and Those Nano-structures
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; E. Yoon(招待講演)
    IEEE International Conference on Solid-State and Integrated Circuit Technology, 31 Oct. 2012
  • Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
    R. Amiya; T. Yamaguchi; D. Tajimi; Y. Sugiura; J. Sakaguchi; T. Araki; Y. Nanishi; T. Honda
    The 11th International Symposium on Advanced Technology (ISAT-11), 30 Oct. 2012
  • Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
    Y. Sugiura; R. Amiya; D. Tajimi; T. Onuma; T. Yamaguchi; H. Honda
    The 11th International Symposium on Advanced Technology (ISAT-11), 30 Oct. 2012
  • Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
    T. Onuma; S. Fujioka; F. Tomori; T. Yamaguchi; T. Honda
    The 11th International Symposium on Advanced Technology (ISAT-11), 30 Oct. 2012
  • Growth and Characterization of InN-based Materials
    T. Yamaguchi; T. Araki; T. Honda; Y. Nanishi
    The 11th International Symposium on Advanced Technology (ISAT-11), 30 Oct. 2012
  • Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato; T. Honda
    The 11th International Symposium on Advanced Technology (ISAT-11), 30 Oct. 2012
  • Growth of InN and related materials using DERI method
    T. Yamaguchi; T. Araki; T. Honda; Y. Nanishi(招待講演)
    Intensive Discussion on Growth of Nitride Semiconductors, 22 Oct. 2012
  • Strong correlation between oxygen donor and nearsurface electron accumulation in non-polar mplane (10-10) InN film
    A. Yang; Y. Yamashita; H Yoshikawa; T. Yamaguchi; M. Imura; M. Kaneko; O. Sakata; Y. Nanishi; K. Kobayashi
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 18 Oct. 2012
  • Toward Longer Wavelength and Higher Speed -Challenge to Utilize Full Span of Nitride Semiconductors’ Band gap-
    Y. Nanishi; T.Yamaguchi; K.Wang; T.Araki; E. Yoon(招待講演)
    2012 Fall Meeting of the Korean Ceramic Society, 18 Oct. 2012
  • Injection-activated defect-governed recombination rate in InN
    S. Nargelas; K. Jarasiunas; M. Vengris; T. Yamaguchi; Y. Nanishi
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 18 Oct. 2012
  • T-dependence of local vibrational modes of Mg-H complexes in InN:Mg
    R. Cusco; N. Domenech-Amador; L. Artus; K. Wang; T. Yamaguchi; Y. Nanishi
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 18 Oct. 2012
  • Angled-resolved XPS measurements of InN films grown by RF-MBE
    R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki; Y. Nanishi
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 18 Oct. 2012
  • Surface and Bulk Electronic Structure of Mg-doped InN Analyzed by Hard X-ray Photoelectron Spectroscopy
    M. Imura; S. Tsuda; T. Nagata; Y. Koide; A. Yang; Y. Yamashita; H. Yoshikawa; K. Kobayashi; M. Kaneko; T. Yamaguchi; N. Uematsu; T. Araki; Y. Nanishi
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 16 Oct. 2012
  • HVPE growth of InN on InN/sapphire (0001) templates prepared by MBE
    R. Imai; S. Yamamoto; R. Togashi; H. Murakami; Y. Kumagai; T. Yamaguchi; T. Araki; Y. Nanishi; A. Koukitu
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 16 Oct. 2012
  • Fabrication of RGB pixels using integrated GaN based Schottky-type light-emitting diodes
    T. Honda; T. Yamaguchi; N. Sakai; S. Fujioka; Y. Sugiura
    The International Workshop on Nitride Semiconductors 2012 (IWN2012), 15 Oct. 2012
  • GaN growth on (111)Al by molecular beam epitaxy
    T. Honda; T. Tajimi; N. Shinohara; Y. Sugiura; M. Hayashi; T. Yamaguchi
    17th International Conference on Molecular Beam Epitaxy (MBE2012), 28 Sep. 2012
  • Growth of thick InGaN films with entire alloy composition using DERI method
    T. Yamaguchi; N. Uematsu; T. Araki; T. Honda; E. Yoon; Y. Nanishi
    17th International Conference on Molecular Beam Epitaxy (MBE2012), 28 Sep. 2012
  • Interface Control of III-Oxide/Nitride Composite Structures
    M. Higashiwaki; S. Chowdhury; B. R. Swenson; U.K. Mishra; T. Igaki; T. Yamaguchi; T. Honda
    2012 International Coference on Solid State Devices and Materials (SSDM2012), 25 Sep. 2012
  • 硬X線光電子分光法を用いたInNの表面電子状態評価
    13 Sep. 2012
  • ZnO単結晶の電子線入射角度依存カソードルミネセンス測定
    13 Sep. 2012
  • 酸化ガリウムのCLスペクトルの温度依存性
    13 Sep. 2012
  • Polarity determination of InN films by hard X-ray photoelectron diffraction
    12 Sep. 2012
  • Growth of InGaN-based heterostructures using DERI by RF-MBE
    T. Araki; N. Uematsu; J. Sakaguchi; K. Wang; T. Yamaguchi; E. Yoon; Y. Nanishi
    2012年(平成24年) 秋季 第73回応用物理学会学術講演会, 11 Sep. 2012
  • Angled-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
    R. Amiya; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Araki; Y. Nanishi; T. Honda
    2012年(平成24年) 秋季 第73回応用物理学会学術講演会, 11 Sep. 2012
  • X-Ray photoelectron spectroscopy measurements around the valence-band of Ga- and N-face (0001) GaN
    Y. Sugiura; D. Tajimi; R. Amiya; T. Yamaguchi; T. Honda
    39th International Symposium on Compound Semiconductor (ISCS2012), 27 Aug. 2012
  • Incident angle resolved cathodoluminescence study of ZnO single crystals
    T. Onuma; T. Yamaguchi; T. Honda
    39th International Symposium on Compound Semiconductor (ISCS2012), 27 Aug. 2012
  • Frontier Research of Nitride Semiconductors toward Longer Wavelength and Higher Speed
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; E. Yoon(招待講演)
    2nd Solid-State Systems Symposium – VLSIs and Semiconductor Related Technologies, 22 Aug. 2012
  • RF-MBE法を用いたSi基板上GaN成長へのASF緩衝層の効果
    07 Aug. 2012
  • 短波長領域動作GaInN系太陽電池の基礎検討
    07 Aug. 2012
  • 分子プレカーサー法を用いた(0001)Sapphire基板上Ga2O3薄膜の製作
    06 Aug. 2012
  • RF-MBE法により成長したInNの角度分解XPS測定
    06 Aug. 2012
  • Toward strain control of GaN grown on Si by RF-MBE
    T. Yamaguchi; D. Tajimi; T. Igaki; Y. Sugiura and T. Honda
    The 9th International Symposium on Semiconductor Light Emitting Devices (ISSLED2012), 24 Jul. 2012
  • Fabrication of c-axis orientated Ga-doped MgZnO-based transparent electrodes by molecular precursor method for GaN-based UV LED
    T. Honda; T.Yasuno; T. Oda; N. Sakai; T. Yamaguchi; H. Nagai; M. Sato
    The 9th International Symposium on Semiconductor Light Emitting Devices (ISSLED2012), 24 Jul. 2012
  • Growth of InN, InGaN and those Nano-structures by DERI Method
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; E. Yoon(招待講演)
    2012 German-Japanese-Spanish Joint Workshop on Frontier Photonics and Electronic Materials and Devices, 21 Jul. 2012
  • Surface acoustic waves and elastic constants of InN epilayers determined by Brillouin scattering
    R. J. Jiménez Riobóo; N. Domènech-Amador; R. Cuscó; C. Prieto; T. Yamaguchi; Y. Nanishi; L. Artús
    The Forth International Symposium on Growth of III-Nitrides (ISGN-4), 19 Jul. 2012
  • In-situ RF-MBE growth of AlOx/n-GaN composite structures
    M. Higashiwaki; T. Igaki; T. Yamaguchi; and T. Honda
    The Forth International Symposium on Growth of III-Nitrides (ISGN-4), 17 Jul. 2012
  • In-situ monitoring of InGaN growth using DERI method
    T. Araki; N. Uematsu; M. Yutani; T. Saito; J. Sakaguchi; T. Yamaguchi; T. Fujishima; E. Matioli; T. Palacios; Y. Nanishi
    The Forth International Symposium on Growth of III-Nitrides (ISGN-4), 17 Jul. 2012
  • GaN layers growth on pseudo (111)Al substrates by RF-MBE andtheir chemical lift-off technique
    T. Honda; M. Hayashi; Y. Sugiura; I. Takezawa; and T. Yamaguchi
    The Forth International Symposium on Growth of III-Nitrides (ISGN-4), 17 Jul. 2012
  • Angled-resolved XPS measurements of In-polar and N-polar InN films
    R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki; Y. Nanishi
    31st Electronic Materials Symposium (EMS-31), 12 Jul. 2012
  • Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
    T. Yamaguchi; N. Uematsu; K. Wang; T. Araki; T. Honda; E. Yoon; Y. Nanishi
    31st Electronic Materials Symposium (EMS-31), 12 Jul. 2012
  • X-ray photoelectron spectroscopy spectra of Ga- and N-face (0001)GaN around the valence-band binding energy
    Y. Sugiura; D. Tajimi; R. Amiya; T. Yamaguchi; T. Honda
    31st Electronic Materials Symposium (EMS-31), 12 Jul. 2012
  • Surface and Bulk Electronic Structure of Mg-doepd InN Analyzed by Hard X-ray Photoelectron Spectroscopy
    M. Imura; S. Tsuda; T. Nagata; Y. Koide; A. Yang; Y. Yamashita; H. Yoshikawa; K. Kobayashi; M. Kaneko; T. Yamaguchi; N. Uematsu; R. Iwamoto; T. Araki; Y. Nanishi
    31st Electronic Materials Symposium (EMS-31), 12 Jul. 2012
  • Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
    D. Tajimi; T. Igaki; Y. Sugiura; T. Yamaguchi; T. Honda
    31st Electronic Materials Symposium (EMS-31), 11 Jul. 2012
  • The strain-controlled GaN growth on Si by RF-MBE
    D. Tajimi; T. Igaki; Y. Sugiura; T. Yamaguchi; T. Honda
    The 17th OptoElectronics and Communication Conference (OECC2012), 05 Jul. 2012
  • Angle-resolved XPS measurements of GaN and InN grown by RF-MBE
    T. Yamaguchi; R. Amiya; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; N. Uematsu; T. Araki; Y. Nanishi
    The 17th OptoElectronics and Communication Conference (OECC2012), 05 Jul. 2012
  • Investigation of near-surface structures of polar InN films by chemical-state-discriminated hard X-ray photoelectron diffraction
    A. L. Yang; Y. Yamashita; M. Kobata; T. Matsushita; H. Yoshikawa; I. Píš; M. Imura; T. Yamaguchi; O. Sakata; Y. Nanishi; K. Kobayashi
    The 6th International Conference on the Science and Technology for Advanced Ceramics, 26 Jun. 2012
  • Growth of InGaN/InGaN MQW structures using DERI by RF-MBE
    T. Araki; N. Uematsu; K. Wang; T. Yamaguchi; E. Yoon; Y. Nanishi
    The Electronic Materials Conference 2012 (EMC2012), 22 Jun. 2012
  • DERI法InGaN成長におけるラジカルモニタリング技術応用
    28 Apr. 2012
  • DERI法を応用したInGaN/InGaN量子井戸構造の作製
    17 Mar. 2012
  • ラジカルモニタリング技術を応用したDERI法InGaN成長の検討
    17 Mar. 2012
  • InN Overgrowth Through in Situ A1N Nano-Mask on Sapphire Substrate
    王科、荒木努、武内道一、山口智広、名西憓之
    2012年 (平成24年) 春季 第59回応用物理学関係連合講演会, 17 Mar. 2012
  • A Natural PN Junction in Mg-Doped In-Polar InN Film Directly Detected by High Resolution Angle-Resolved Hard X-Ray Photoelectron Spectroscopy
    16 Mar. 2012
  • AlおよびAlOx膜堆積が極性GaNのPL強度に与える影響
    16 Mar. 2012
  • Al緩衝層を用いた化合物原料MBE法による(0001)4H-SiC上GaN薄膜の製作
    16 Mar. 2012
  • RF-MBE法による (GaN/AlN)交互供給緩衝層上GaN薄膜のX線回折測定
    16 Mar. 2012
  • n-GaN上へのAlOx薄膜のin-situ RF-MBE成長
    16 Mar. 2012
  • 窒化物半導体新領域開拓にむけての材料技術最近の展開
    15 Mar. 2012
  • 極性・非極性バルクZnO表面におけるCLスペクトルの比較
    15 Mar. 2012
  • Free Holes in Mg Doped InN Confirmed by Thermopower Experiments
    K. Wang; T. Yamaguchi; T. Araki; Y. Nanishi; N. Miller; M. Mayer; J. W. Ager; K. M. Yu; W. Walukiewicz
    Fourth International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2012), Nagoya, Japan, 08 Mar. 2012
  • Importance of Advanced Plasma for Frontier Nitride Semiconductor Technologies
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; E. Yoon(招待講演)
    Fourth International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2012), Nagoya, Japan, 05 Mar. 2012
  • Application of DERI Method to thick InGaN and InN/InGaN MQW structure Growth
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; E. Yoon(招待講演)
    KAUST-UCSB-NSF Workshop on Solid-State Lighting, 13 Feb. 2012
  • Reduction of Threading Dislocation Density by Regrowth on In-Polar InN
    T. Araki; T. Sakamoto; A. Miki; N. Uematsu; Y. Takamatsu; T. Yamaguchi; Y. Eoon and Y. Nanishi
    SPIE Photonic West 2011, San Francisco, USA, 23 Jan. 2012
  • 分子線エピタキシー(MBE)による結晶成長
    20 Jan. 2012
  • InNおよびInGaN成長の最近の進展-DERI法の結果が示唆すること-
    12 Jan. 2012
  • Application of DERI Method to thick InGaN and InN/InGaN MQW structure Growth
    2012
  • Free Holes in Mg Doped InN Confirmed by Thermopower Experiments
    2012
  • Growth of InGaN/InGaN MQW structures using DERI by RF-MBE
    2012
  • The strain-controlled GaN growth on Si by RF-MBE
    2012
  • Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
    2012
  • Surface acoustic waves and elastic constants of InN epilayers determined by Brillouin scattering
    2012
  • Growth of InN, InGaN and those Nano-structures by DERI Method
    2012
  • Growth of thick InGaN films with entire alloy composition using DERI method
    2012
  • HVPE growth of InN on InN/sapphire (0001) templates prepared by MBE
    2012
  • Injection-activated defect-governed recombination rate in InN
    2012
  • Angled-resolved XPS measurements of InN films grown by RF-MBE
    2012
  • Growth and Characterization of InN-based Materials
    2012
  • Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
    2012
  • Reduction of Threading Dislocation Density by Regrowth on In-Polar InN
    2012
  • Angle-resolved XPS measurements of GaN and InN grown by RF-MBE
    2012
  • GaN layers growth on pseudo (111)Al substrates by RF-MBE andtheir chemical lift-off technique
    2012
  • Frontier Research of Nitride Semiconductors toward Longer Wavelength and Higher Speed
    2012
  • Angled-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
    2012
  • Fabrication of RGB pixels using integrated GaN based Schottky-type light-emitting diodes
    2012
  • Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
    2012
  • Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
    2012
  • Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
    2012
  • Importance of Advanced Plasma for Frontier Nitride Semiconductor Technologies
    2012
  • InN Overgrowth Through in Situ A1N Nano-Mask on Sapphire Substrate
    2012
  • X-ray photoelectron spectroscopy spectra of Ga- and N-face (0001)GaN around the valence-band binding energy
    2012
  • In-situ monitoring of InGaN growth using DERI method
    2012
  • In-situ RF-MBE growth of AlOx/n-GaN composite structures
    2012
  • Toward strain control of GaN grown on Si by RF-MBE
    2012
  • Growth of InGaN-based heterostructures using DERI by RF-MBE
    2012
  • Surface and Bulk Electronic Structure of Mg-doped InN Analyzed by Hard X-ray Photoelectron Spectroscopy
    2012
  • Toward Longer Wavelength and Higher Speed -Challenge to Utilize Full Span of Nitride Semiconductors’ Band gap-
    2012
  • Growth of InN and related materials using DERI method
    2012
  • Recent Development of Growth and Characterization of InN, In-rich InGaN and Those Nano-structures
    2012
  • Investigation of near-surface structures of polar InN films by chemical-state-discriminated hard X-ray photoelectron diffraction
    2012
  • Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
    2012
  • Angled-resolved XPS measurements of In-polar and N-polar InN films
    2012
  • Surface and Bulk Electronic Structure of Mg-doepd InN Analyzed by Hard X-ray Photoelectron Spectroscopy
    2012
  • Fabrication of c-axis orientated Ga-doped MgZnO-based transparent electrodes by molecular precursor method for GaN-based UV LED
    2012
  • X-Ray photoelectron spectroscopy measurements around the valence-band of Ga- and N-face (0001) GaN
    2012
  • Incident angle resolved cathodoluminescence study of ZnO single crystals
    2012
  • Interface Control of III-Oxide/Nitride Composite Structures
    2012
  • GaN growth on (111)Al by molecular beam epitaxy
    2012
  • Strong correlation between oxygen donor and nearsurface electron accumulation in non-polar mplane (10-10) InN film
    2012
  • T-dependence of local vibrational modes of Mg-H complexes in InN:Mg
    2012
  • Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
    2012
  • Fabrication of Ga2O3 Films by Molecular Precursor Method
    2012
  • Application of DERI Method to InGaN Growth and Mg Doping
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki and E. Yoon(招待講演)
    Advanced Workshop on 'Frontiers in Electronics' (WOFE 2011), 21 Dec. 2011
  • InNおよびGaN成長における原子脱離過程その場観察
    15 Dec. 2011
  • (GaN/AlN)多重緩衝層を用いたRF-MBE法によるSi基板上GaN薄膜成長
    15 Dec. 2011
  • In-plane epitaxial relationship of (0001) sapphire grown by compound-source MBE
    Y. Sugiura; T. Oda; T. Onuma; T. Yamaguchi; and T. Honda
    2011 Materials Research Society (MRS) Fall Meeting, Boston, USA, 01 Dec. 2011
  • Low temperature of GaN on psudo (111)Al substrates by RF-MBE
    M. Hayashi; T. Goto; T. Yamaguchi; T. Igaki; and T. Honda
    2011 Materials Research Society (MRS) Fall Meeting, Boston, USA, 01 Dec. 2011
  • X-ray diffraction pattern of ZnO layer grown by compound source MBE
    R. Amiya; Y. Sugiura; T. Yamaguchi; and T. Honda
    The 10th International Symposium on Advanced Technology (ISAT-10), 17 Nov. 2011
  • Ozone treatment of the substrates for the ZnO deposition by molecular precursor method
    T. Oda; H. Hara; Y. Sugiura; T. Yasuno; T. Yamaguchi; M. Sato; and T. Honda
    The 10th International Symposium on Advanced Technology (ISAT-10), 17 Nov. 2011
  • ECR-MBE法を用いたA面InNナノ構造の配列制御選択成長
    04 Nov. 2011
  • HVPE法によるInN/sapphire(0001)MBEテンプレート上へのInN成長の検討
    03 Nov. 2011
  • DERI法を用いたA面GaNテンプレート上A面InNの作成
    30 Oct. 2011
  • 極性および非極性GaN表面における表面再結合過程
    01 Sep. 2011
  • 六方晶GaNとZnOにおける表面再結合の比較
    01 Sep. 2011
  • 化合物原料MBE法を用いたZnO薄膜の結晶成長とその評価
    31 Aug. 2011
  • RF-MBE 法による(GaN/AlN)交互供給緩衝層上GaN 薄膜成長
    30 Aug. 2011
  • InN/sapphire(0001)MBEテンプレート上へのInN HVPEにおける成長速度の影響
    30 Aug. 2011
  • In極性InN上への再成長による貫通転位密度低減
    30 Aug. 2011
  • Built-in Potential Along the C-axis in MBE-grown,GaN Layers Observed by Angle Resolved X-ray Photoelectron Spectroscopy
    T. Honda; T. Igaki; T. Yamaguchi; Y. Kumagai and A. Koukitu
    28th North American Molecular Beam Epitaxy Conference (NAMBE2011), 16 Aug. 2011
  • Growths of InN/InGaN Periodic Structure and Thick InGaN Film using Droplet Elimination Process by Radical-beam Irradiation
    T. Yamaguchi; T. Araki; T. Honda; E. Yoon and Y. Nanishi
    28th North American Molecular Beam Epitaxy Conference (NAMBE2011), 16 Aug. 2011
  • Comparative Study of Surface Recombination in Hexagonal GaN and ZnO Surfaces
    T. Onuma; N. Sakai; T. Igaki; T. Yamaguchi; A. A. Yamaguchi and T. Honda
    28th North American Molecular Beam Epitaxy Conference (NAMBE2011), 15 Aug. 2011
  • RF-MBE法によるInNおよび関連混晶の成長と量子ナノ構造の形成
    03 Aug. 2011
  • Mgドープp型InNの結晶成長と物性評価
    03 Aug. 2011
  • DERI法を用いたInNおよびInGaN混晶の結晶成長
    03 Aug. 2011
  • DERI法によるIn系窒化物半導体の結晶成長
    22 Jul. 2011
  • Strong luminescence from self-assembled InN nanocolumns with few dislocations grown by molecular beam epitaxy
    K. Wang; T. Araki; T. Yamaguchi; E. Yoon and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 15 Jul. 2011
  • Fabrication of Nanostructure of A-plane InN on Patterned A-plane GaN Template by ECR-MBE
    T. Araki; S. Yamashita; T. Yamaguchi; E. Yoon and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 14 Jul. 2011
  • Hydrogen in InN with polar, nonpolar and semipolar surface orientations
    V. Darakchieva; K. Lorenz; S. Ruffenach; M. -Y. Xie; E. Alves; M. Moret; O. Briot; W. J. Schaff; C. L. Hsiao; L. C. Chen; L. W. Tu; T. Yamaguchi and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 14 Jul. 2011
  • PN junction measurement in InN
    E. A. Llado; M. Mayer; N. Miller; T. Yamaguchi; K. Wang; E. Haller; Y. Nanishi and J. W. Ager
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 14 Jul. 2011
  • Proposal of thick InGaN film growth using advanced droplet elimination process by radical-beam irradiation
    T. Yamaguchi; N. Uematsu; R. Iwamoto; T. Araki; E. Yoon and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 13 Jul. 2011
  • Anharmonic phonon decay in InN thin films
    N. Domenech-Amador; R. Cusco; L. Artus; T. Yamaguchi and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 13 Jul. 2011
  • Investigation of InN Nanocolumns Grown on GaN Templates by Molecular Beam Epitaxy
    K. Wang; T. Yamaguchi; T. Araki; E. Yoon and Y. Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 13 Jul. 2011
  • Growth of Position-controlled InN Nanocolumns Grown by RF-MBE on Nano-imprinted Sapphire Substrates
    M. H. Kim; T. Araki; K. S. Joo; Y. Nanishi; E. Yoon and T. Yamaguchi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 13 Jul. 2011
  • Evaluation of P-type InN Using Temperature Dependence of I-V Characteristics
    H. Sakurai; J. Kikawa; R. Iwamoto; K. Wang; T. Yamaguchi; T. Araki and Nanishi
    The 9th International Conference on Nitride Semiconductors (ICNS 2011), Glasgow, Scottland, 13 Jul. 2011
  • In situ monitoring techniques by DERI method
    T. Yamaguchi; K. Wang; T. Araki; T. Honda; E. Yoon and Y. Nanishi
    30th Electronic Materials Symposium (EMS-30), 01 Jul. 2011
  • Temperature Dependence of I-V Characteristics of p-type InN grown by RF-MBE
    H. Sakurai; J. Kikawa; R. Iwamoto; K. Wang; T. Yamaguchi; T. Araki and Y. Nanishi
    30th Electronic Materials Symposium (EMS-30), 01 Jul. 2011
  • Thick InGaN growth using DERI method
    N. Uematsu; T. Yamaguchi; R. Iwamoto; T. Sakamoto; T. Fujishima; T. Araki and Y. Nanishi
    30th Electronic Materials Symposium (EMS-30), 01 Jul. 2011
  • Study on DERI growth of InN -Role of indium droplet-
    T. Katsuki; T. Yamaguchi; T. Araki and Y. Nanishi
    30th Electronic Materials Symposium (EMS-30), 01 Jul. 2011
  • Recent Progress of DERI Process for Growth of InN and Related Alloys
    Y. Nanishi; T.Yamaguchi; T.Araki and E. Yoon(招待講演)
    40th "Jaszowiec" International School and Conference on the Physics of Semiconductors, 29 Jun. 2011
  • Recombination dynamics in polar and nonpolar GaN surfaces
    N. Sakai; T. Igaki; T. Onuma; A. A. Yamaguchi; T Yamaguchi and T. Honda
    30th Electronic Materials Symposium (EMS-30), 29 Jun. 2011
  • Molecular Beam Epitaxial Growth and Characterization of InN Nanocolumns on GaN
    K. Wang; T. Yamaguchi; T. Araki; E. Yoon and Y. Nanishi
    Electronic Materials Conference 2011(EMC2011), 22 Jun. 2011
  • HVPE法によるInN/sapphire(0001)テンプレート上InN高速成長の検討
    Jun. 2011
  • Growth of InN Nanocolumns on GaN Templates and Sapphire by RF-MBE
    K. Wang; T. Yamaguchi; T. Araki; E. Yoon and Y. Nanishi
    5th Asia-Pacific Workshop on Widegap Semiconductors, 22 May 2011
  • Recent Progress of InN and Related Alloys Grown by DERI Method
    Y. Nanishi; T.Yamaguchi; K.Wang; T.Araki and E. Yoon(招待講演)
    2011 E‐MRS Spring Meeting, 11 May 2011
  • Unintentional Incorporation of Hydrogen in InN with Different Surface Orientations
    V. Darakchieva; K. Lorenz; M.-Y. Xie; N. P. Barradas; E. Alves; W. J. Schaff; C.L. Hsiao; L.C. Chen; L.W. Tu; T. Yamaguchi and Y. Nanishi
    2011 E‐MRS Spring Meeting, 10 May 2011
  • N極性及びIn極性のInN-MIS構造の作製と評価
    Mar. 2011
  • 電流‐電圧特性の温度依存性評価によるp型InNの検証
    Mar. 2011
  • Recent progress in Growth and characterization of InN and related alloys and those nano-structures
    Y. Nanishi; T. Yamaguchi; K. Wang and T. Araki(招待講演)
    Workshop on frontier photonic and electronic materials and devices, 2011 German-Japanese-Spanish joint workshop, Granada, Spain, Mar. 2011
  • Development of Radical Beam Monitoring Techniques in RF-MBE Growth of InN
    T. Yamaguchi; T. Fujishima; T. Araki; E. Yoon and Y. Nanishi
    Third International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2011), Nagoya, Japan, Mar. 2011
  • TEM Study on Microstructure of Mg-doped InN Grown by RF-MBE Using DERI Method
    T. Araki; T. Sakamoto; R. Iwamto; T. Yamaguchi; E. Yoon and Y. Nanishi
    Third International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2011), Nagoya, Japan, Mar. 2011
  • Recent Progress in Growth and Characterization of InN and Related Alloys and Those Nano-structures
    Y. Nanishi; T.Yamaguchi; K. Wang and T.Araki
    Workshop on Frontier Photonic and Electronic Materials and Devices 2011 German-Japanese-Spanish Joint Workshop, Mar. 2011
  • Growth of InN Nanocolumns on GaN Templates and Sapphire by RF-MBE
    2011
  • Recent Progress of DERI Process for Growth of InN and Related Alloys
    2011
  • Study on DERI growth of InN -Role of indium droplet-
    2011
  • Growth of Position-controlled InN Nanocolumns Grown by RF-MBE on Nano-imprinted Sapphire Substrates
    2011
  • PN junction measurement in InN
    2011
  • Strong luminescence from self-assembled InN nanocolumns with few dislocations grown by molecular beam epitaxy
    2011
  • Comparative Study of Surface Recombination in Hexagonal GaN and ZnO Surfaces
    2011
  • Growths of InN/InGaN Periodic Structure and Thick InGaN Film using Droplet Elimination Process by Radical-beam Irradiation
    2011
  • Built-in Potential Along the C-axis in MBE-grown GaN Layers Observed by Angle Resolved X-ray Photoelectron Spectroscopy
    2011
  • X-ray diffraction pattern of ZnO layer grown by compound source MBE
    2011
  • In-plane epitaxial relationship of (0001) sapphire grown by compound-source MBE
    2011
  • Low temperature of GaN on psudo (111)Al substrates by RF-MBE
    2011
  • Application of DERI Method to InGaN Growth and Mg Doping
    2011
  • Growth and fabrication of InN-based III-nitride structure using droplet elimination process by radical beam irradiation
    2011
  • TEM Study on Microstructure of Mg-doped InN Grown by RF-MBE Using DERI Method
    2011
  • Recent Progress in Growth and Characterization of InN and Related Alloys and Those Nano-structures
    2011
  • Molecular Beam Epitaxial Growth and Characterization of InN Nanocolumns on GaN
    2011
  • Thick InGaN growth using DERI method
    2011
  • Evaluation of P-type InN Using Temperature Dependence of I-V Characteristics
    2011
  • Built-in Potential Along the C-axis in MBE-grown GaN Layers Observed by Angle Resolved X-ray Photoelectron Spectroscopy
    28th North American Molecular Beam Epitaxy Conference (NAMBE2011), 2011
  • Recent progress in Growth and characterization of InN and related alloys and those nano-structures
    2011
  • Development of Radical Beam Monitoring Techniques in RF-MBE Growth of InN
    2011
  • In situ monitoring techniques by DERI method
    2011
  • Investigation of InN Nanocolumns Grown on GaN Templates by Molecular Beam Epitaxy
    2011
  • Fabrication of Nanostructure of A-plane InN on Patterned A-plane GaN Template by ECR-MBE
    2011
  • Unintentional Incorporation of Hydrogen in InN with Different Surface Orientations
    2011
  • Recent Progress of InN and Related Alloys Grown by DERI Method
    2011
  • Recombination dynamics in polar and nonpolar GaN surfaces
    2011
  • Temperature Dependence of I-V Characteristics of p-type InN grown by RF-MBE
    2011
  • Proposal of thick InGaN film growth using advanced droplet elimination process by radical-beam irradiation
    2011
  • Anharmonic phonon decay in InN thin films
    2011
  • Hydrogen in InN with polar, nonpolar and semipolar surface orientations
    2011
  • Ozone treatment of the substrates for the ZnO deposition by molecular precursor method
    2011
  • Growth and fabrication of InN-based III-nitride structure using droplet elimination process by radical beam irradiation
    T. Yamaguchi and Y. Nanishi (招待講演)
    SPIE Photonic West 2011, San Francisco, USA, Jan. 2011
  • MBE法を用いたA面GaNテンプレート上A面InN選択成長
    Nov. 2010
  • 窒化物半導体光半導体未踏領域への挑戦 -InNと関連混晶の新しい成長技術と評価
    Nov. 2010
  • RF-MBE法を用いたr面サファイア基板上A面InN結晶高品質化に関する検討
    Nov. 2010
  • DERI法InGaN成長を用いた厚膜化への試み
    Sep. 2010
  • InNデバイス作製プロセスへのウエットエッチングの適用
    Sep. 2010
  • Droplet elimination process by radical beam irradiation for the growth of InN-based III-nitrides and its application to device structure
    T. Yamaguchi and Y. Nanishi (招待講演)
    2010 International Coference on Solid State Devices and Materials (SSDM2010), Tokyo, Japan, Sep. 2010
  • Dry etching of In- and N- polar InN using inductively-coupled plasma
    T. Fujishima; S. Takahashi; K. Morimoto; R. Iwamoto; N. Uematsu; M. Yutani; T. Yamaguchi; T. Araki and Y. nanisih
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • Unintentional Incorporation of Hydrogen in InN: Diffusion Kinetics and Effect of Surface Orientation
    V. Darakchieva; K. Lorenz; S. Miranda; N. Barradas; E. Alves; D. Rogala; H.-W. Becker; S. Ruffenach; O. Briot; W. Schaff; C.-L. Hsiao; L.-C. Chen; L.-W. Tu; T. Yamaguchi and Y. Nanishi
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • DERI法を用いたInGaN成長と組成制御への試み
    Sep. 2010
  • Evidence of Rectification in InN
    N. Miller; J. W. Ager; E. Haller; W. Walukiewicz; K. Wang; R. Iwamoto; T. Yamaguchi; K. Kagawa; T. Araki and Y. Nanishi(招待講演)
    The International Workshop on Nitride semiconductors (IWN2010), Florida, USA, Sep. 2010
  • Free Hole Concentration and Mobility in InN:Mg
    N. Miller; J. W. Ager; E. Haller; W. Walukiewicz; K. Wang; R. Iwamoto; T. Yamaguchi; K. Kagawa; T. Araki and Y. Nanishi
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • Wet Etching Process for InN Device Fabrication
    A. Miki; K. Morimoto; N. Maeda; T. Yamaguchi; T. Araki and Y. Nanishi
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • Growth of InN and related alloys using droplet elimination by radical beam irradiation
    Y. Nanishi; T. Yamaguchi; K. Wang; T. Araki; M. Kaneko; E. Yoon; N. Miller; J. W. AgerⅢ; K. M. Yu and W. Walukiewicz (招待講演)
    The International Workshop on Nitride semiconductors (IWN2010), Florida, USA, Sep. 2010
  • Surface Kinetics of Indium Adlayers and Droplets and Their Roles in InN Growth by Molecular Beam Epitaxy
    K. Wang; T. Yamaguchi; T. Araki; E. Yoon and Y. Nanishi
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • Potential of Nitride Photocatalyst for Water Splitting
    K. Ohkawa; T. Koyama; F. Sano; A. Hirako; T. Yamaguchi and Y. Nanishi
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • TEMを用いたDERI法ドープInNの極微構造評価
    Sep. 2010
  • Mg Doped InN and Search For Holes
    K. Wang; R. Iwamoto; T. Yamaguchi; K. Kagawa; T. Araki; Y. Nanishi; N. Miller; M. Mayer; J. W. Ager III; K. M. Yu and W.
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, Sep. 2010
  • InGaN growth using droplet elimination by radical-beam irradiation method
    T. Yamaguchi; K. Wang; T. Araki; E. Yoon and N. Yasushi
    16th International Conference on Molecular Beam Epitaxy (MBE2010), Berlin, Germany, Aug. 2010
  • Potential, Present Status and Future Challenges of InN and Related Alloys for Device Applications
    Y. Nanishi; T. Yamaguchi and E. Yoon (招待講演)
    The second LED domestic conference, Seoul, Korea, Aug. 2010
  • Effect of low-temperature InN buffer on A-plane InN growth on nitridated r-plane sapphire by RF-MBE
    T. Araki; K. Kawashima; T. Yamaguchi and Y. Nanishi (招待講演)
    The 16th International Conference on Crystal Growth (ICCG16), Beijing, China, Aug. 2010
  • Evidence of Free Holes in Mg Doped InN
    K. Wang; R. Iwamoto; T. Yamaguchi; K. Kagawa; T. Araki; Y. Nanishi; N. Miller; M. Mayer; J. W. Ager; K. M. Yu and W. Walukiewicz
    The Third International Symposium on Growth of Ⅲ-Nitrides (ISGN-3), Montpellier、France, Jul. 2010
  • Investigation on InN mole fraction fluctuation in InGaN films grown by RF-MBE
    T. Kimura; E. Fukumoto; T. Yamaguchi; K. Wang; M. Kaneko; T. Araki; E. Yoon and Y. Nanishi
    The Third International Symposium on Growth of Ⅲ-Nitrides (ISGN-3), Montpellier、France, Jul. 2010
  • High-pressure optical absorption and Raman scattering in InN thin films grown by molecular beam epitaxy
    F. J. Manjon; J. Ibanez; A. Segura; R. Cusco; L. Artus; T. Yamaguchi and Y. Nanishi
    The 48th European High Pressure Research Group Conference (EHPRG), Jul. 2010
  • Various application of DERI (droplet elimination by radical-beam irradiation) method in growth of RF-MBE
    T. Yamaguchi; H. Umeda; T. Sakamoto; T. Araki; E. Yoon and Y. Nanishi
    29th Electronic Materials Symposium (EMS-29), Jul. 2010
  • Wet etching by KOH for InN device fabrication
    A. Miki; K. Morimoto; N. Maeda; T. Yamaguchi; T. Araki and Y. Nanishi
    29th Electronic Materials Symposium (EMS-29), Jul. 2010
  • Characterization of contact resistance of Ti/Al/Ti/Au ohmic metal on N-polar and In-polar InN films grown by RF-MBE
    K. Morimoto; S. Kikuchi; N. Maeda; T. Yamaguchi and Y. Nanishi
    29th Electronic Materials Symposium (EMS-29), Jul. 2010
  • RF-MBE Growth of InN/InGaN MQW Structures by DERI and Their Characterization
    T. Araki; H. Umeda; T. Yamaguchi; T. Sakamoto; E. Yoon and Y. Nanishi
    22th Indium Phosphide and Related Materials Conference, Jun. 2010
  • Hydrogen in InN: ubiquitous phenomena in molecular beam epitaxy grown material
    V. Darakchieva; K. Lorenz; N. P. Barradas; E. Alves; M.-Y. Xie; B. Monemar; M. Schubert; W.J. Schaff; C.L. Hsiao; L.C. Chen; L.W. Tu; T. Yamaguchi and Y. Nanishi
    12th International Conference on Modern Materials and Technologies (CIMTEC2010), Tuscany, Italy, Jun. 2010
  • Mg doped InN and search for p-type InN
    K. Wang; R. Iwamoto; T. Yamaguchi; K. Kagawa; T. Araki; Y. Nanishi; N. Miller; M. Mayer; W. Walukiewicz
    Electronic Materials Conference 2010, Jun. 2010
  • Growth, monitoring and InN/InGaN MQW structure fabrication by DERI method
    Y. Nanishi and T. Yamaguchi (招待講演)
    IX International Conference of Polish Society for Crystal Growth, Gdansk-Sobieszewo, Poland, May 2010
  • DERI法を用いたIn系窒化物半導体の結晶成長とデバイス構造作製への応用
    May 2010
  • DERI法のRHEED強度その場観察手法を用いたラジカルセル診断
    May 2010
  • Undoped and Mg-doped InN grown using droplet elimination by radical-beam irradiation method
    T. Yamaguchi; K. Wang; R. Iwamoto; N. Miller; M. Mayer; J. W. Ager III; K. M. Yu; W. Walukiewicz; T. Araki and Y. Nanishi
    The 8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010), May 2010
  • Free-charge carrier properties and doping mechanisms of thin films of InN and related alloys
    V. Darakchieva; M. Schubert; K. Lorenz; N. P. Barradas; E. Alves; T. Hofmann; B. Monemar; W. J. Schaff; C. L. Hsiao; L. C. Chen; L. W. Tu; T. Yamaguchi and Y. Nanishi
    5th International Conference on Spectroscopic Ellipsometry (ICSE-V), May 2010
  • Optical hall effect in InN: bulk doping mechanism and surface electron accumulation properties
    V. Darakchieva; M. Schubert; T. Hofmann; B. Monemar; W. J. Schaff; C. L. Hsiao; L. C. Chen; L. W. Tu; T. Yamaguchi and Y. Nanishi
    The International Conference Physics of Light-Matter Coupling in Nanostructures (PLMCN10), Apr. 2010
  • A面 InN 成長のための低温 InN バッファ層最適成長条件の検討
    Mar. 2010
  • In situ monitoring of InN grown by RF-MBE
    K. Wang; T. Yamaguchi; T. Araki; E. Yoon and Y. Nanishi
    Second International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2010), Nagoya, Japan, Mar. 2010
  • LiAlO2 (100)基板上 M 面 InN 低温バッファ層利用に向けた M 面 GaN 下地層の有効性
    Mar. 2010
  • In組織揺らぎのメカニズム解明に向けた RF-MBE 成長 InGaN のCL 測定評価
    Mar. 2010
  • C 面、A 面、M 面 InN の表面化学状態の解析
    Mar. 2010
  • Fabrication of InN/InGaN Multi Quantum Well Structures by Droplet Elimination by Radical-beam Irradiation
    H. Umeda; T. Yamaguchi; T. Sakamoto; T. Araki; E. Yoon and Y. Nanishi
    Second International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2010), Nagoya, Japan, Mar. 2010
  • Adsorption and Desorption of Indium Adlayer on GaN Surface
    王科、山口智広、荒木努、名西憓之
    2010年 (平成22年) 春季 第57回応用物理学関係連合講演会, Mar. 2010
  • DERI法を用いたIn系窒化物半導体結晶成長
    NIMS The 93rd QDR Seminar, Mar. 2010
  • 硬 X 線光電子分光による InN バルク評価
    Mar. 2010
  • Free-charge carrier properties and doping mechanisms of thin films of InN and related alloys
    2010
  • High-pressure optical absorption and Raman scattering in InN thin films grown by molecular beam epitaxy
    2010
  • Mg doped InN and search for p-type InN
    2010
  • Wet etching by KOH for InN device fabrication
    2010
  • Potential, Present Status and Future Challenges of InN and Related Alloys for Device Applications
    2010
  • Evidence of Rectification in InN
    2010
  • Growth of InN and related alloys using droplet elimination by radical beam irradiation
    2010
  • Potential of Nitride Photocatalyst for Water Splitting
    2010
  • Optical hall effect in InN: bulk doping mechanism and surface electron accumulation properties
    2010
  • Characterization of contact resistance of Ti/Al/Ti/Au ohmic metal on N-polar and In-polar InN films grown by RF-MBE
    2010
  • InGaN growth using droplet elimination by radical-beam irradiation method
    2010
  • Surface Kinetics of Indium Adlayers and Droplets and Their Roles in InN Growth by Molecular Beam Epitaxy
    2010
  • Mg Doped InN and Search For Holes
    2010
  • Wet Etching Process for InN Device Fabrication
    2010
  • Raman scattering study of the temperature dependence of phonons in InN
    The International Workshop on Nitride Semiconductors 2010 (IWN2010), Florida, USA, 2010
  • In situ monitoring of InN grown by RF-MBE
    2010
  • Undoped and Mg-doped InN grown using droplet elimination by radical-beam irradiation method
    2010
  • Hydrogen in InN: ubiquitous phenomena in molecular beam epitaxy grown material
    2010
  • RF-MBE Growth of InN/InGaN MQW Structures by DERI and Their Characterization
    2010
  • Various application of DERI (droplet elimination by radical-beam irradiation) method in growth of RF-MBE
    2010
  • Effect of low-temperature InN buffer on A-plane InN growth on nitridated r-plane sapphire by RF-MBE
    2010
  • Dry etching of In- and N- polar InN using inductively-coupled plasma
    2010
  • Raman scattering study of the temperature dependence of phonons in InN
    2010
  • High-pressure optical absorption and Raman scattering in InN thin films grown by molecular beam epitaxy
    2010 Europian Materials Research Society (E-MRS) Spring Meeting, Strasbourg, France, 2010
  • Fabrication of InN/InGaN Multi Quantum Well Structures by Droplet Elimination by Radical-beam Irradiation
    2010
  • Adsorption and Desorption of Indium Adlayer on GaN Surface
    2010
  • Growth, monitoring and InN/InGaN MQW structure fabrication by DERI method
    2010
  • Investigation on InN mole fraction fluctuation in InGaN films grown by RF-MBE
    2010
  • High-pressure optical absorption and Raman scattering in InN thin films grown by molecular beam epitaxy
    2010
  • Evidence of Free Holes in Mg Doped InN
    2010
  • Droplet elimination process by radical beam irradiation for the growth of InN-based III-nitrides and its application to device structure
    2010
  • Unintentional Incorporation of Hydrogen in InN: Diffusion Kinetics and Effect of Surface Orientation
    2010
  • Free Hole Concentration and Mobility in InN:Mg
    2010
  • N Raman scattering by LO-phonon-plasmon coupled modes in InN epilayers: dependence on the excitation laser intensity and wavelength
    R. Cuscó; J. Ibáñez; E. Alarcón-Lladó; T. Yamaguchi; Y. Nanishi and L. Artús
    2009 Materials Research Society (MRS) Fall Meeting, Boston, USA, Dec. 2009
  • RF-MBE法における新規高品質InN結晶成長手法の提案とInGaN結晶成長への応用
    Nov. 2009
  • DERI法を用いたRF-MBE InN結晶成長と各種その場観察評価
    Nov. 2009
  • RF-MBE法を用いた高品質InN結晶成長-配列制御InNナノコラム成長について-
    Nov. 2009
  • InN へのMg ドーピングにおける成長条件依存性
    Nov. 2009
  • DERI法を用いた InN/InGaN 量子井戸構造の作製
    Nov. 2009
  • RF-MBE 法を用いたLiAlo2(100)基板上へのInNの結晶成長
    Nov. 2009
  • InNナノウォールの作製と評価
    Nov. 2009
  • RF-MBE 法によるr面(10-12)Sapphire 基板上 InN の結晶成長
    Nov. 2009
  • Droplet Elimination Process by Radical Beam Irradiation for the Growth of InN-based III-nitrides
    T. Yamaguchi and Y. Nanishi (招待講演)
    Satellite Workshop on Nitride Semiconductors, Seoul, Korea, Oct. 2009
  • RF-MBE growth and characterization of M-plane InN on LiAlO2 with C-plane phase inclusion
    T. Araki; H. Nozawa; Y. Takagi; A. Takeda; T. Sakamoto; K. Kagawa; T. Yamaguchi and Y. Nanishi
    The 8th International Conference on Nitride Semiconductors (ICNS 2009), Jeju, Korea, Oct. 2009
  • Photoexcited carriers in InN layers observed by Raman scattering
    R. Cuscó; E. Alarcón-Lladó; J. Ibáñez; T. Yamaguchi; Y. Nanishi and L. Artús
    The 8th International Conference on Nitride Semiconductors (ICNS 2009), Jeju, Korea, Oct. 2009
  • Observation of surface potential on polar and nonpolar InN by Kelvin-probe force microscopy
    M. Kaneko; Y. Takagi; K. Kawashima; T. Yamaguchi and Y. Nanishi
    The 8th International Conference on Nitride Semiconductors (ICNS 2009), Jeju, Korea, Oct. 2009
  • Proposal of droplet elimination process by radical beam irradiation for reproducible growth of high-quality InN and InGaN
    T. Yamaguchi; A. Uedono; T. Suski and Y. Nanishi (招待講演)
    The 8th International Conference on Nitride Semiconductors (ICNS 2009), Jeju, Korea, Oct. 2009
  • Polarized photoluminescence from polar and nonpolar InN films
    K. Wang; T. Yamaguchi; T. Araki and Y. Nanishi
    The 8th International Conference on Nitride Semiconductors (ICNS 2009), Jeju, Korea, Oct. 2009
  • 電気化学的手法を用いたInNのバンド端位置の決定
    Sep. 2009
  • 高品質 InN 上薄膜 AlN 成長構造の作成と電気的特性の評価
    Sep. 2009
  • RF-MBE InN 結晶成長におけるDERI 法の提案
    Sep. 2009
  • Present status and new challenges of nitride semiconductors for advanced electronic devices
    Y. Nanishi and T. Yamaguchi (招待講演)
    2009 Europian Materials Research Society (E-MRS) Fall Meeting, Warsaw, Poland, Sep. 2009
  • Growth of InN and Related Alloys Using Droplet Elimination by Radical Beam Irradiation
    T. Yamaguchi and Y. Nanishi (招待講演)
    2009 Europian Materials Research Society (E-MRS) Fall Meeting, Warsaw, Poland, Sep. 2009
  • カソードルミネッセンス法によるr面サファイア基板上InN薄膜の光学的評価
    Sep. 2009
  • DERI法により作製されたInNの光反射率その場観察
    Sep. 2009
  • CTLM法によるIn極性及びN極性の高品質InN薄膜へのコンタクト抵抗評価
    Sep. 2009
  • 極性及び無極性InNの表面電位評価
    Sep. 2009
  • RF-MBE InN 成長における DERI 法の有用性
    Sep. 2009
  • Al薄膜堆積によるC面InNの表面改質効果
    Sep. 2009
  • Proposal of new RF-MBE method capable for reproducible, high-quality InN growth
    Y. Nanishi and T. Yamaguchi (招待講演)
    17th American Conference on Crystal Growth and Epitaxy (ACCGE-17), Wisconsin, USA, Aug. 2009
  • Plarized photoluminescence from polar and nonpolar InN films
    K. Wang; T. Yamaguchi; T. Araki and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Simple and Reproducible Growth of High-Quality InN by DERI
    T. Yamaguchi; R. Iwamoto; N. Maeda; T. Araki and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • V/III ratiodependence on M-plane InN growth on LiAlO2(100) substrates by RF-MBE
    K. Kagawa; Y. Takagi; T. Yamaguchi; T. Araki and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Structural characterization of M-plane InN grown on LiAlO2 substrate with C-plane phase inclusion
    T. Araki; H. Nozawa; Y. Takagi; A. Takeda; K. Kagawa; T. Yamaguchi and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Evaluation of surface Fermi level of MBE-grown InN by Kelvin-probe force microscopy
    M. Kaneko; T. Yamaguchi and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Mg doping of In-rich InGaN grown by RF-MBE
    E. Fukumoto; T. Yamaguchi; T. Araki and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Characterization of Metal Contact Resistance Using Al, Ti, and Ni on High-quality InN Films grown by RF-MBE
    S. Kikuchi; N. Maeda; T. Yamaguchi and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Indium Incorporation Behavior in InGaN Growth by RF-MBE
    T. Yamaguchi; T. Araki and Y. Nanishi
    28th Electronic Materials Symposium (EMS-28), Jul. 2009
  • Characterization of contact resistance of Al, Ti and Ni in high-quality InN films grown by RF-MBE
    S. Kikuchi; N. Maeda; T. Yamaguchi and Y. Nanishi
    Electronic Materials Conference 2009 (EMC-2009), Pennsylvanis, USA, Jun. 2009
  • Raman scattering and phonon-plasmon coupled modes in InN: a free-electron density study
    R. Cuscó; E. Alarcón-Lladó; J. Ibáñez; T. Yamaguchi; Y. Nanishi and L. Artús
    2009 Europian Materials Research Society (E-MRS) Spring Meeting, Strasbourg, France, Jun. 2009
  • Proposal of new RF-MBE growth method for reproducible and high-quality InN and InGaN
    Y. Nanishi and T. Yamaguchi (招待講演)
    15th Semiconducting and Insulating Materials Conference (SIMC-15), Vilnius, Lithuania, Jun. 2009
  • Potential and challenges of InN and related alloys for advanced electronic devices
    Y. Nanishi; N. Maeda; T. Yamaguchi and M. Kaneko(招待講演)
    67th Device Research Conference (DRC-67), Pennsylvania, USA, Jun. 2009
  • New MBE growth method for high quality InN and related alloys using in situ monitoring technology
    T. Yamaguchi and Y. Nanishi (招待講演)
    2009 Europian Materials Research Society (E-MRS) Spring Meeting, Strasbourg, France, Jun. 2009
  • Proposal and potential of simple, reproducible, thick and high quality InN growth method by MBE
    Y. Nanishi and T. Yamaguchi (招待講演)
    The 4th Asia-Pacific Workshop on Wide gap Semiconductors (APWS2009), Hunan, China, May 2009
  • Photoluminescence and Raman Spectroscopy Study of InN Films Grown by RF-MBE
    K. Wang; T. Yamaguchi; A. Takeda; D. Muto; M. Kaneko; T. Araki and Y. Nanishi
    第1回窒化物半導体結晶成長講演会, May 2009
  • MBE法によるGaN加工基板上配列制御InNナノコラムの作製
    May 2009
  • Recent progress and challenges of InN and related alloys for device applications
    Y. Nanishi and T. Yamaguchi (招待講演)
    33rd Workshop on Compound Semiconductor Devices and Integrated Circuits (WOCSDICE2009), Malaga, Spain, May 2009
  • Photoluminescence and Raman spectroscopy study of InN films grown by RF-MBE
    K. Wang; T. Yamaguchi; A. Takeda; D. Muto; M. Kaneko; T. Araki and Y. Nanishi
    The 4th Asia-Pacific Workshop on Wide gap Semiconductors (APWS2009), Hunan, China, May 2009
  • 段差AlGaN/GaN基板上へのInN再成長構造の作製と電気的特性評価
    Mar. 2009
  • KFMによるInN表面電位の直接評価
    Mar. 2009
  • RF-MBE法を用いたメタルリッチ条件下でのInGaN成長
    Mar. 2009
  • 低温InNバッファ層を用いた高品質A面(11-20)InNの結晶成長
    Mar. 2009
  • LiAlO2基板上C面混在M面InN薄膜の構造評価
    Mar. 2009
  • CTLM法によるAl, Ti, Ni, のInNへのコンタクト抵抗評価
    Mar. 2009
  • AlN/InNヘテロ構造の作製と評価
    Mar. 2009
  • Proposal and Potential of simple, reproducible, thick and high quality InN growth method by MBE
    Y. Nanishi and T. Yamaguchi(招待講演)
    First International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya, Japan, Mar. 2009
  • Fabrication of Position-Controlled InN Nanocolumns by ECR-MBE
    2009
  • Proposal and potential of simple, reproducible, thick and high quality InN growth method by MBE
    2009
  • Mg doping of In-rich InGaN grown by RF-MBE
    2009
  • Characterization of Metal Contact Resistance Using Al, Ti, and Ni on High-quality InN Films grown by RF-MBE
    2009
  • Plarized photoluminescence from polar and nonpolar InN films
    2009
  • Proposal of new RF-MBE method capable for reproducible, high-quality InN growth
    2009
  • Proposal of droplet elimination process by radical beam irradiation for reproducible growth of high-quality InN and InGaN
    2009
  • Polarized photoluminescence from polar and nonpolar InN films
    2009
  • Photoluminescence and Raman spectroscopy study of InN films grown by RF-MBE
    2009
  • Photoluminescence and Raman Spectroscopy Study of InN Films Grown by RF-MBE
    2009
  • New MBE growth method for high quality InN and related alloys using in situ monitoring technology
    2009
  • Raman scattering and phonon-plasmon coupled modes in InN: a free-electron density study
    2009
  • Simple and Reproducible Growth of High-Quality InN by DERI
    2009
  • Present status and new challenges of nitride semiconductors for advanced electronic devices
    2009
  • Droplet Elimination Process by Radical Beam Irradiation for the Growth of InN-based III-nitrides
    2009
  • Observation of surface potential on polar and nonpolar InN by Kelvin-probe force microscopy
    2009
  • Photoexcited carriers in InN layers observed by Raman scattering
    2009
  • Fabrication of Position-Controlled InN Nanocolumns by ECR-MBE
    T. Araki; D. Fukuoka; H. Tamiya; S. Harui; T. Yamaguchi; H. Miyake; K. Hiramatsu and Y. Nanishi
    International Society for Optical Engineering Photonic West 2009 (SPIE Photonic West 2009)、San Francisco、USA, Jan. 2009
  • Proposal of new RF-MBE growth method for reproducible and high-quality InN and InGaN
    2009
  • V/III ratiodependence on M-plane InN growth on LiAlO2(100) substrates by RF-MBE
    2009
  • Structural characterization of M-plane InN grown on LiAlO2 substrate with C-plane phase inclusion
    2009
  • Evaluation of surface Fermi level of MBE-grown InN by Kelvin-probe force microscopy
    2009
  • Indium Incorporation Behavior in InGaN Growth by RF-MBE
    2009
  • Growth of InN and Related Alloys Using Droplet Elimination by Radical Beam Irradiation
    2009
  • RF-MBE growth and characterization of M-plane InN on LiAlO2 with C-plane phase inclusion
    2009
  • Proposal and Potential of simple, reproducible, thick and high quality InN growth method by MBE
    2009
  • Recent progress and challenges of InN and related alloys for device applications
    2009
  • Potential and challenges of InN and related alloys for advanced electronic devices
    2009
  • Characterization of contact resistance of Al, Ti and Ni in high-quality InN films grown by RF-MBE
    2009
  • N Raman scattering by LO-phonon-plasmon coupled modes in InN epilayers: dependence on the excitation laser intensity and wavelength
    2009
  • RF-MBE法によるR面(10-12)Sapphire基板上、半極性面InNの結晶成長
    Nov. 2008
  • RF-MBE法を用いたLiAlO2基板上無極性M面InNの結晶成長および構造評価
    Nov. 2008
  • RF-MBE法を用いた高In組成InGaNに対するMg doping の検討
    Nov. 2008
  • Improved capping layer growth towards increased stability of InGaN quantum dots
    C. Tessarek; T. Yamaguchi; S. Figge and D. Hommel
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • TEM characterization of M-plane InN grown on (100) LiAlO2 substrate by RF-MBE
    H. Nozawa; Y. Takagi; S. Harui; D. Muto; T. Yamaguchi; T. Araki and Y. Nanishi
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • Recent progress of InN and InGaN growth for device applications
    Y. Nanishi; T. Araki; T. Yamaguchi and D. Muto (招待講演)
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • Growth of M-plane(10-10) InN on LiAlO2(100) substrate
    Y. Takagi; D. Muto; T. Yamaguchi; T. Araki and Y. Nanishi
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • Low-temperature growth of InGaN/GaN nano-islands investigated by grazing-incidence X-ray diffraction
    Th. Schmidt; J. I. Flege; M. Siebert; S. Figge; T. Yamaguchi; D. Hommel and J. Falta
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • Novel InN growth method under In-rich condition on GaN/Al2O3(0001) templates
    T. Yamaguchi; D. Muto; T. Araki; N. Maeda and Y. Nanishi
    International Workshop on Nitride semiconductors (IWN2008), Montreux, Switzerland, Oct. 2008
  • LiAlO2(100)基板上MgドープM面(10-10)InNの結晶成長
    Sep. 2008
  • GaN/InNヘテロ構造の成長と評価
    Sep. 2008
  • GaNテンプレート上InN成長におけるRHEEDその場観察法を用いた実効的V/III比制御
    Sep. 2008
  • CTLM法によるInNオーミックコンタクト抵抗の評価
    Sep. 2008
  • TEM を用いたM面(10-10)InN の極微構造評価
    Sep. 2008
  • Growth of position-controlled InN nanocolumns by ECR-MBE on hole-patterned GaN template
    T. Araki; D. Fukuoka; H. Tamiya; S. Harui; T. Yamaguchi; H. Miyake; K. Hiramatsu; Y. Nanishi
    27th Electronic Materials Symposium (EMS27), Jul. 2008
  • Potential, achievements and issues of InN and related alloys for device applications
    Y. Nanishi; D. Muto; M. Noda; S. Harui; T. Yamaguchi and T. Araki (招待講演)
    International Conference on Optical, Optoelectronic and Photonic Materials Applications 2008 (ICOOPMA 08), Edmonton, Canada, Jul. 2008
  • GaN and InN intermixing during RF-MBE growth observed by XRD
    D. Muto; T. Yamaguchi; S. Sawada; T. Araki and Y. Nanishi
    50th Electronic Materials Conference (EMC-50), Santa Barbara, USA, Jun. 2008
  • Influence of piezoelectric fields on excitonic complexes in InGaN quantum dots
    K. Sebald; J. Kalden; S. Herlufsen; H. Lohmeyer; C. Tessarek; T. Yamaguchi; S. Figge; D. Hommel and J. Gutowski
    Fourth International Conference on Semiconductor Quantum Dots (QD2008), Gyeongyu, Korea, May 2008
  • Study on Initial Growth Process of Position-Controlled InN Nanocolumns by ECR-MBE
    T. Araki; D. Fukuoka; H. Tamiya; S. Harui; T. Yamaguchi; H. Miyake; K. Hiramatsu and Y. Nanishi
    The Second International Symposium on Growth of Ⅲ-Nitrides (ISGN-2), Shizuoka, Japan, May 2008
  • Growth and characterization of N-polar and In-polar InN films by RF-MBE
    T. Yamaguchi; D. Muto; T. Araki and Y. Nanishi
    The Second International Symposium on Growth of Ⅲ-Nitrides (ISGN-2), Shizuoka, Japan, May 2008
  • M面(10-10)InN結晶成長および電気的特性の評価
    Mar. 2008
  • TEMを用いたN極性MgドープInNの極微構造評価
    Mar. 2008
  • X線光電子分光法によるMgドープInNの表面評価
    Mar. 2008
  • Growth and structural investigation of high-In-composition InGaN/GaN Nanostructures
    T. Yamaguchi; A. Pretorius; A. Rosenauer; D. Hommel; T. Araki and Y. Nanishi
    Workshop on Frontier Photonic and Electronic Materials and Devices -2008 Japanese-German-Spanish joint Workshop-, Mar. 2008
  • GaN/InN界面におけるInとGaのインターミキシング
    Mar. 2008
  • A面(11-20)InNに対するMgドーピングの効果
    Mar. 2008
  • GaN and InN intermixing during RF-MBE growth observed by XRD
    2008
  • Low-temperature growth of InGaN/GaN nano-islands investigated by grazing-incidence X-ray diffraction
    2008
  • Improved capping layer growth towards increased stability of InGaN quantum dots
    2008
  • TEM characterization of M-plane InN grown on (100) LiAlO2 substrate by RF-MBE
    2008
  • Novel InN growth method under In-rich condition on GaN/Al2O3(0001) templates
    2008
  • Growth and structural investigation of high-In-composition InGaN/GaN Nanostructures
    2008
  • Potential, achievements and issues of InN and related alloys for device applications
    2008
  • Growth of position-controlled InN nanocolumns by ECR-MBE on hole-patterned GaN template
    2008
  • Recent progress of InN and InGaN growth for device applications
    2008
  • Study on Initial Growth Process of Position-Controlled InN Nanocolumns by ECR-MBE
    2008
  • Growth and characterization of N-polar and In-polar InN films by RF-MBE
    2008
  • Influence of piezoelectric fields on excitonic complexes in InGaN quantum dots
    2008
  • Growth of M-plane(10-10) InN on LiAlO2(100) substrate
    2008
  • Mg ドープA面(11-20)InNの結晶成長と電気的特性評価
    Nov. 2007
  • RF-MBE法による(100)LiAlO2基板上M面(10-10)InNの結晶成長
    Nov. 2007
  • 水素・窒素混合プラズマ照射によるInNの表面エッチングに関する検討
    Sep. 2007
  • ECV方を用いたA面InNの表面電荷蓄積層の評価
    Sep. 2007
  • P形MgドープInNの結晶成長とその電気的特性評価
    Sep. 2007
  • Optical properties of single and multi-layer InGaN quantum dots
    K. Sebald; H. Lohmeyer; S. Herlufsen; J. Kalden; J. Gutowski; C. Tessarek; T. Yamaguchi and D. Hommel
    5th International Conference on Nitride Semiconductors, Sep. 2007
  • Wide-bandgap quantum dot based microcavity VCSEL structures
    K. Sebald; H. Lohmeyer; J. Gutowski; R. Kröger; C. Kruse; T. Yamaguchi; A. Gust; D. Hommel; J. Wiersig and F. Jahnke(招待講演)
    The Spring Meeting of the German Physical Society Condensed Matter Division, Mar. 2007
  • Growth condition dependence of MOVPE InGaN quantum dots
    The Spring Meeting of the German Physical Society Condensed Matter Division, Mar. 2007, C. Tessarek, T. Yamaguchi, J. Dennemarck, S. Figge and D. Hommel
  • Optical properties of single InGaN quantum dots
    S. Herlufsen; K. Sebald; H. Lohmeyer; J. Gutowski; T. Yamaguchi and D. Hommel
    The Spring Meeting of the German Physical Society Condensed Matter Division, Mar. 2007
  • Growth condition dependence of MOVPE InGaN quantum dots
    2007
  • Optical properties of single InGaN quantum dots
    2007
  • Optical properties of single and multi-layer InGaN quantum dots
    2007
  • Wide-bandgap quantum dot based microcavity VCSEL structures
    2007
  • Progress and perspectives for InGaN quantum dots and monolithic nitride cavities
    K. Sebald; H. Lohmeyer; J. Gutowski; T. Yamaguchi; C. Kruse and D. Hommel
    2006 Materials Research Society Fall Meeting, Nov. 2006
  • Composition determination of semiconductor nanostructures
    A. Rosenauer; A. Pretorius; M. Schowalter; K. Müller; T. Yamaguchi; D. Hommel; D. Litvinov and D. Gerthsen(招待講演)
    Nederlandse Vereniging voor Microscopie fall meeting 2006, Nov. 2006
  • Two-step growth of InGaN quantum dots and application to light emitters
    T. Yamaguchi; J. Dennemarck; C. Tessarek; K. Sebald; S. Gangopadhyay; J. Falta; J. Gutowski; S. Figge and D. Hommel
    International Workshop on Nitride Semiconductors 2006, Oct. 2006
  • On the way to InGaN quantum dots embedded into monolithic nitride cavities
    K. Sebald; H. Lohmeyer; J. Gutowski; T. Yamaguchi; C. Kruse; D. Hommel; J. Wiersig and F. Jahnke
    International Workshop on Nitride Semiconductors 2006, Oct. 2006
  • Concentration Evaluation in Nanometre-Sized InGaN Islands Using Transmission Electron Microscopy
    A Pretorius; K Müller; T. Yamaguchi; R Kröger; D Hommel and A Rosenauer
    16th International Microscopy Congress, Sep. 2006
  • MOVPE-grown self organized InGaN nano-islands on GaN(0001)/Sapphire templates
    S. Gangopadhyay; Th. Schmidt; T. Yamaguchi; S. Einfeldt; K. Sebald; J. Gutowski; D. Hommel and J. Falta
    2006 Europian Materials Research Society Spring Meeting, Jun. 2006
  • A novel approach for the growth of InGaN quantum dots
    T. Yamaguchi; K. Sebald; H. Lohmeyer; S. Gangopadhyay; J. Falta; J. Gutowski; S. Figge and D. Hommel
    Fourth International Conference on Semiconductor Quantum Dots 2006, May 2006
  • Micro-photoluminescence studies of InGaN/GaN quantum dots up to 150 K
    K. Sebald; H. Lohmeyer; J. Gutowski; T. Yamaguchi and D. Hommel
    Fourth International Conference on Semiconductor Quantum Dots 2006, May 2006
  • On the way to InGaN quantum dots embedded into monolithic nitride cavities
    2006
  • Composition determination of semiconductor nanostructures
    2006
  • Micro-photoluminescence studies of InGaN/GaN quantum dots up to 150 K
    2006
  • Concentration Evaluation in Nanometre-Sized InGaN Islands Using Transmission Electron Microscopy
    2006
  • Progress and perspectives for InGaN quantum dots and monolithic nitride cavities
    2006
  • A novel approach for the growth of InGaN quantum dots
    2006
  • MOVPE-grown self organized InGaN nano-islands on GaN(0001)/Sapphire templates
    2006
  • Two-step growth of InGaN quantum dots and application to light emitters
    2006
  • Surface morphology and island shape of MOVPE grown InGaN nano-island ensembles studied by STM
    S. Gangopadhyay; Th. Schmidt; S. Einfetdt; T. Yamaguchi; D. Hommel and J. Falta
    2005 Materials Research Society Fall Meeting, Nov. 2005
  • Epitaxal growth of InGaN quantum dots grown by MOVPE: Effect of capping process on the structural and optical properties
    T. Yamaguchi; K. Sebald; S. Figge; J. Gutowski and D. Hommel
    2005 Materials Research Society Fall Meeting, Nov. 2005
  • Growth and formation of InGaN and GaN nano-structures studied by STM
    S. Gangopadhyay; Th. Schmidt; S. Einfeldt; T. Yamaguchi; D. Hommel and J. Falta
    International Symposium on Surface Science and Nanotechnology, Nov. 2005
  • Comparative investigation of quantum-dot-like localization centers in InGaN quantum well and quantum dot structures
    K. Sebald; H. Lohmeyer; J. Gutowski; T. Yamaguchi and D. Hommel
    2005 Materials Research Society Fall Meeting, Nov. 2005
  • Synthesis of c-GaN on the surface of beta-Ga2O3 single crystalline using N2 exited ECR plasma
    S. Ohira; J. Wada; C. Morioka; K. Fujiwara; T. Yamaguchi; T. Araki; Y. Nanishi and T. Shishido
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Grazing incidence x-ray characterization of InGaN/GaN nano-islands
    Th. Schmidt; M. Siebert; J. I. Flege; S. Figge; T. Yamaguchi; D. Hommel and J. Falta
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • TEM analyses of wurtzite InGaN islands grown by MOVPE and MBE
    A. Pretorius; T. Yamaguchi; C. Kübel; R. Kröger; D. Hommel and A. Rosenauer
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Growth and morphology of MOVPE grown InGaN/GaN islands
    S. Gangopadhyay; Th. Schmidt; S. Einfeldt; T. Yamaguchi; D. Hommel and J. Falta
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Analysis of the local structure of InN with a bandgap energy of 0.8 and 1.9 eV and annealed InN using X-ray absorption fine structure measurements
    T. Miyajima; Y. Kudo; A. Wakahara; T. Yamaguchi; T. Araki and Y. Nanishi
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Optical properties of single InGaN quantum dots up to 150 K
    K. Sebald; H. Lohmeyer; J. Gutowski; R. Kröger; T. Yamaguchi and D. Hommel
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Diffraction anomalous fine structure investigation of InGaN quantum dots
    E. Piskorska; V. Holý; M. Siebert; B. Krause; T. H. Metzger; Th. Schmidt; J. Falta; T. Yamaguchi and D. Hommel
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Two to three dimensional transitions of InGaN and the impact of GaN overgrowth
    T. Yamaguchi; S. Einfeldt; S. Gangopadhyay; A. Pretorius; A. Rosenauer; J. Falta and D. Hommel
    5th International Conference on Nitride Semiconductors, Sep. 2005
  • Growth, structure and properties of InN, InGaN and InN/InGaN quantum wells by RF-MBE
    Y. Nanishi; H. Naoi; T. Araki; M. Kurouchi; D. Muto; T. Miyajima; T. Yamaguchi and Y. Kumagai (招待講演)
    6th International Conference on Nitride Semiconductors, Aug. 2005
  • Formation of c-GaN on the surface of β-Ga2O3 single crystalline using N2 plasma generated by ECR
    S. Ohira; N. Suzuki; J. Wada; C. Morioka; K. Fujiwara; T. Yamaguchi; T. Araki; Y. Nanishi and T. Shishido
    21th Electronic Materials Symposium, Jul. 2005
  • InNの光学的特性の結晶品質依存性
    May 2005
  • InNの構造および特性の、基板結晶および成長条件依存性
    May 2005
  • Investigation of InxGa1-xN islands with electron microscopy
    A. Pretorius; T. Yamaguchi; M. Schowalter; R. Kröger; C. Kübel; D. Hommel and A. Rosenauer
    Microscopy of Semiconducting Materials 2005, Apr. 2005
  • Synthesis of c-GaN on the surface of beta-Ga2O3 single crystalline using N2 exited ECR plasma
    2005
  • Grazing incidence x-ray characterization of InGaN/GaN nano-islands
    2005
  • Optical properties of single InGaN quantum dots up to 150 K
    2005
  • Diffraction anomalous fine structure investigation of InGaN quantum dots
    2005
  • Surface morphology and island shape of MOVPE grown InGaN nano-island ensembles studied by STM
    2005
  • Investigation of InxGa1-xN islands with electron microscopy
    2005
  • Two to three dimensional transitions of InGaN and the impact of GaN overgrowth
    2005
  • Formation of c-GaN on the surface of β-Ga2O3 single crystalline using N2 plasma generated by ECR
    2005
  • Growth, structure and properties of InN, InGaN and InN/InGaN quantum wells by RF-MBE
    2005
  • Growth and morphology of MOVPE grown InGaN/GaN islands
    2005
  • Comparative investigation of quantum-dot-like localization centers in InGaN quantum well and quantum dot structures
    2005
  • Epitaxal growth of InGaN quantum dots grown by MOVPE: Effect of capping process on the structural and optical properties
    2005
  • Analysis of the local structure of InN with a bandgap energy of 0.8 and 1.9 eV and annealed InN using X-ray absorption fine structure measurements
    2005
  • TEM analyses of wurtzite InGaN islands grown by MOVPE and MBE
    2005
  • Growth and formation of InGaN and GaN nano-structures studied by STM
    2005
  • On the dynamics of InGaN dot formation by RF-MBE growth
    T. Yamaguchi; S. Einfeldt; S. Figge; C. Kruse; C. Roder and D. Hommel
    2004 Materials Research Society Fall Meeting, Dec. 2004
  • How do InGaN Quantum Dots Form During MOVPE Growth?
    S. Einfeldt; T. Yamaguchi; C. Roder; A. Tausendfreund; S. Figge and D. Hommel
    2004 Materials Research Society Fall Meeting, Dec. 2004
  • Growth and Band-Gaps of InN and InGaN by RF-MBE
    Y. Nanishi; H. Naoi; T. ArakiM. Kurouchi and T. Yamaguchi(招待講演)
    2004年日韓拠点大学交流事業セミナー, Nov. 2004
  • MBE法による窒化Ga2O3基板上立方晶GaN成長(1)基板窒化処理の効果
    Sep. 2004
  • MBE法による窒化Ga2O3基板上立方晶GaN成長(2)GaN成長温度依存性
    Sep. 2004
  • Growth of In-rich InGaN on InN template by radio-frequency plasma assisted molecular beam epitaxy
    M. Kurouchi; T. Yamaguchi; H. Naoi; A. Suzuki; T. Araki and Y. Nanishi
    The 14th International Conference on Crystal Growth, Aug. 2004
  • Growth, structure and properties of InN and InGaN alloys by MBE
    Y. Nanishi; T. Yamaguchi; M. Kurouchi; T. Araki; H. Naoi and A. Suzuki (招待講演)
    The 13th International Conference on Molecular Beam Epitaxy, Aug. 2004
  • Growth of high-quality InN films by insertion of high-temperature InN buffer layer
    T. Yamaguchi; M. Kurouchi; H. Naoi; A. Suzuki; T. Araki and Y. Nanishi
    The 14th International Conference on Crystal Growth, Aug. 2004
  • Improvement of In-rich InGaN crystalline quality by using InN template
    Y. Nanishi; M. Kurouchi; T. Yamaguchi; H. Naoi; A. Suzuki and T. Araki (招待講演)
    2004 Europian Materials Research Society Spring Meeting, Jun. 2004
  • Improvement of In-rich InGaN Crystalline Quality by using InN Template
    M. Kurouchi; T. Yamaguchi; H. Naoi; A. Suzuki; T. Araki and Y. Nanishi
    2004 Europian Materials Research Society Spring Meeting, May 2004
  • Epitaxial growth of InGaN nano-islands grown by MOVPE and MBE
    T. Yamaguchi; S. Einfeldt; S. Figge; C. Roder; A. Tausendfreund and D. Hommel
    XXXIII International school on Physics of Semiconducting Compounds, May 2004
  • RF-MBE法によるInNテンプレートを用いた高In組成InGaNの成長
    Mar. 2004
  • Growth and properties of In-rich InGaN films grown on (0001) sapphire by RF-MBE
    M. Kurouchi; T. Araki; H. Naoi; T. Yamaguchi; A. Suzuki and Y. Nanishi
    The 5th International Symposium on Blue Laser and Light Emitting Diodes, Mar. 2004
  • Epitaxial growth of InGaN nano-islands grown by MOVPE and MBE
    2004
  • Improvement of In-rich InGaN crystalline quality by using InN template
    2004
  • Growth of high-quality InN films by insertion of high-temperature InN buffer layer
    2004
  • Growth and properties of In-rich InGaN films grown on (0001) sapphire by RF-MBE
    2004
  • Improvement of In-rich InGaN Crystalline Quality by using InN Template
    2004
  • Growth of In-rich InGaN on InN template by radio-frequency plasma assisted molecular beam epitaxy
    2004
  • Growth and Band-Gaps of InN and InGaN by RF-MBE
    2004
  • How do InGaN Quantum Dots Form During MOVPE Growth?
    2004
  • Growth, structure and properties of InN and InGaN alloys by MBE
    2004
  • Growth of high quality InN epitaxial films and their properties
    Y. Nanishi; Y. Saito; T. Yamaguchi; M. Kurouchi; T. Araki and H. Naoi (招待講演)
    31st conference on the physics and chemistry of semiconductor interfaces, Jan. 2004
  • Growth of high quality InN epitaxial films and their properties
    2004
  • On the dynamics of InGaN dot formation by RF-MBE growth
    2004
  • Band-gap energy and physical properties of InN grown by RF-molecular beam epitaxy
    Y. Nanishi; Y. Saito; T. Yamaguchi; F. Matsuda; T. Araki; A. Suzuki; H. Harima and T. Miyajima (招待講演)
    2003 Materials Research Society Fall Meetings, Dec. 2003
  • Characterization of photovoltaic cells using n-InN/p-Si grown by RF-MBE
    C. Morioka; T. Yamaguchi; H. Naoi; T. Araki; A. Suzuki and Y. Nanishi
    2003 Materials Research Society Fall Meeting, Dec. 2003
  • Recent development of InN RF-MBE growth and its structural and property characterization
    Y. Nanishi; Y. Saito; T. Yamaguchi; T. Araki and T. Miyajima (招待講演)
    3rd Conference on Physics of Light-Matter Coupling in Nanostructures, Oct. 2003
  • RF-MBE成長低温InNバッファ層の極微構造評価
    Sep. 2003
  • RF-MBE成長した高In組成InGaNの逆格子マッピングによる評価
    Sep. 2003
  • RF-MBE法を用いて作製したInN/Siによるpn接合の光起電力特性
    Sep. 2003
  • AlNバッファ層導入によるSi(111)基板上高品質InN結晶成長
    Sep. 2003
  • 分光学的手法によるInN結晶中の欠陥研究
    Sep. 2003
  • Growth of InN and InGaN on Si Substrate for Solar Cell Applications
    T. Yamaguchi; C. Morioka; K. Mizuno; M. Hori; T. Araki; A. Suzuki and Y. Nanishi
    30th International Symposium on Compound Semiconductors, Aug. 2003
  • MBE成長InN薄膜の透過電子顕微鏡観察
    Aug. 2003
  • 高温InNバッファ層導入による高品質InN膜の実現
    Aug. 2003
  • RF-MBE growth of high quality InN and its band gap energy
    Y. Nanishi; Y. Saito; T. Yamaguchi and T. Araki (招待講演)
    The 4th Korea-Japan Joint Workshop on Advanced Semiconductor Processes and Equipments, Aug. 2003
  • RF-MBE法を用いたSi(100)基板上におけるInNの結晶成長
    Aug. 2003
  • High In-composition InGaN growth by using MEE-InN buffer layer
    M. Kurouchi; F. Matsuda; M. Hori; T. Yamaguchi; Y. Saito; A. Suzuki; T. Araki and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Growth of high quality InN film on Si substrate with AlN buffer layer
    T. Yamaguchi; Y. Saito; T. Araki; A. Suzuki and Y. Nanishi
    The 2003 International Meeting for Future Electron Devices, Kansai, Jul. 2003
  • Structural characterization of InN films grown by RF-MBE
    T. Araki; S. Ueta; C. Morioka; T. Yamaguchi; Y. Saito and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Band offset of InN/Si hetero-junctions grown by RF-MBE
    A. Hinoki; T. Noguchi; K. Yorozu; T. Yamaguchi; C. Morioka; T. Araki and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Influences of substrate polarity on the growth of InN by RF-MBE
    F. Matsuda; Y. Saito; T. Muramatsu; T. Yamaguchi; Y. Matsuo; A. Koukitu; A. Suzuki; T. Araki and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Effects of initial growth processes for the growth of InN on sapphire substrate by RF-MBE
    T. Yamaguchi; Y. Saito; M. Kurouchi; F. Matsuda; T. Araki; A. Suzuki and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Crystal growth of InN on Si(100) substrates by RF-MBE
    C. Morioka; K. Mizuo; T. Yamaguchi; Y. Saito; T. Araki; A. Suzuki and Y. Nanishi
    22th Electronic Materials Symposium, Jul. 2003
  • Effect of AlN buffer layer on the growth of InN epitaxial film on Si substrate
    E. Kurimoto; H. Harima; Y. Yamamoto; H. Wei; M. Yoshimoto; T. Yamaguchi; Y. Saito and Y. Nanishi
    5th International Conference on Nitride Semiconductors, May 2003
  • MBE-Growth, characterization and properties of InN and InGaN
    Y. Nanishi; Y. Saito; T. Yamaguchi; M. Hori; F. Matsuda; T. Araki; A. Suzuki and T. Miyajima (招待講演)
    5th International Conference on Nitride Semiconductors, May 2003
  • TEM characterization of InN films grown by RF-MBE
    T. Araki; S. Ueta; K. Mizuo; T. Yamaguchi; Y. Saito and Y. Nanishi
    5th International Conference on Nitride Semiconductors, May 2003
  • Influence of substrate polarity on growth of InN films by RF-MBE
    F. Matsuda; Y. Saito; T. Muramatsu; T. Yamaguchi; Y. Matsuo; A. Koukitu; T. Araki and Y. Nanishi
    5th International Conference on Nitride Semiconductors, May 2003
  • Optical detection of major defects in InN
    E. Kurimoto; H. Harima; Y. Yamamoto; H. Wei; M. Yoshimoto; T. Yamaguchi; Y. Saito and Y. Nanishi
    5th International Conference on Nitride Semiconductors, May 2003
  • GaN基板上InN成長条件の基板極性依存性
    Mar. 2003
  • RF-MBE法を用いたシリコン基板上窒化インジウムの結晶成長に関する研究
    Mar. 2003
  • Sapphire基板上RF-MBE成長InNのエッチングによる極性評価
    Mar. 2003
  • RF-MBE法によるSi(111)および(100)基板上InN結晶成長
    Mar. 2003
  • 石英ガラス基板上GaN、InN RF-MBE成長における基板窒化の効果
    Mar. 2003
  • RF-MBE成長InNのTEMによる評価
    Mar. 2003
  • RF-MBEによる高In組成InGaNの結晶成長と光学的評価
    Jan. 2003
  • Optical detection of major defects in InN
    2003
  • Influence of substrate polarity on growth of InN films by RF-MBE
    2003
  • Growth of high quality InN film on Si substrate with AlN buffer layer
    2003
  • Crystal growth of InN on Si(100) substrates by RF-MBE
    2003
  • Influences of substrate polarity on the growth of InN by RF-MBE
    2003
  • High In-composition InGaN growth by using MEE-InN buffer layer
    2003
  • Effects of initial growth processes for the growth of InN on sapphire substrate by RF-MBE
    2003
  • Characterization of photovoltaic cells using n-InN/p-Si grown by RF-MBE
    2003
  • Growth of InN and InGaN on Si Substrate for Solar Cell Applications
    2003
  • Recent development of InN RF-MBE growth and its structural and property characterization
    2003
  • RF-MBE法を用いたInN膜の成長とその特性評価
    2003
  • MBE-Growth, characterization and properties of InN and InGaN
    2003
  • TEM characterization of InN films grown by RF-MBE
    2003
  • Band offset of InN/Si hetero-junctions grown by RF-MBE
    2003
  • Band-gap energy and physical properties of InN grown by RF-molecular beam epitaxy
    2003
  • InN、InGaNのRF-MBE成長と電気・光学的評価
    Jan. 2003
  • Effect of AlN buffer layer on the growth of InN epitaxial film on Si substrate
    2003
  • Structural characterization of InN films grown by RF-MBE
    2003
  • RF-MBE growth of high quality InN and its band gap energy
    2003
  • Electrical and Optical Properties of InN/Si Heterostructure
    K. Mizuo; T. Yamaguchi; Y. Saito; T. Araki and Y. Nanishi
    2002 Materials Research Society Fall Meeting, Dec. 2002
  • Single crystalline InN films grown on Si substrates by using a brief substrate nitridation process
    T. Yamaguchi; K. Mizuo; Y. Saito; T. Noguchi; T. Araki; Y. Nanishi; T. Miyajima and Y. Kudo
    2002 Materials Research Society Fall Meeting, Dec. 2002
  • RF-MBE growth and properties of InN and InGaN alloys with entire alloy composition
    Y. Nanishi; Y. Saito; T. Yamaguchi; M. Hori and T. Araki (招待講演)
    The 3rd Korea-Japan Joint Workshop on Advanced Semiconductor Processes and Equipments, Oct. 2002
  • Single crystalline InN films grown on Si (111) substrates
    T. Yamaguchi; K. Mizuo; Y. Saito; T. Araki and Y. Nanishi
    29th International Symposium on Compound Semiconductors, Oct. 2002
  • RF-MBE法により作成したInN/Siヘテロ接合の電気的・光学的特性評価
    Sep. 2002
  • RF-MBE法を用いたSi基板上単結晶InN薄膜成長 -短時間基板窒化の効果-
    Sep. 2002
  • RF-MBE法を用いたSiC基板上InN膜成長 -成長温度の基板極性依存-
    Sep. 2002
  • RF-MBE法で成長した高In組成InGaNの光学的特性
    Sep. 2002
  • サファイア基板上InN成長での回転ドメインの存在
    Aug. 2002
  • 窒化物半導体の新展開
    Y. Nanishi; H. Naoi; T. ArakiM. Kurouchi and T. Yamaguchi(招待講演)
    第32回結晶成長国内会議, Aug. 2002
  • RF-MBE成長したInN/ (0001)Sapphireの極微構造観察
    Aug. 2002
  • Optical properties of InxGa1 - xN with entire alloy composition on InN buffer layer grown by RF-MBE
    M. Hori; K. Kano; T. Yamaguchi; Y. Saito; T. Araki; Y. Nanishi; N. Teraguchi and A. Suzuki
    International Workshop on Nitride Semiconductors 2002, Jul. 2002
  • Growth temperature dependence of indium nitride crystalline quality grown by RF-MBE
    Y. Saito; H. Harima; E. Kurimoto; T. Yamaguchi; N. Teraguchi; A. Suzuki; T. Araki and Y. Nanishi
    International Workshop on Nitride Semiconductors 2002, Jul. 2002
  • Influence of growth condition on superconducting characteristics of InN on sapphire (0001)
    T. Inushima; T. Takenobu; M. Motokawa; K. Koide; A. Hashimoto; A. Yamamoto; Y. Saito; T. Yamaguchi and Y. Nanishi
    International Workshop on Nitride Semiconductors 2002, Jul. 2002
  • Growth and optical properties of In1-xGaxN with entire alloy composition grown on InN buffer layer by RF-MBE
    T. Araki; M. Hori; K. Kano; T. Yamaguchi; Y. Saito; Y. Nanishi; N. Teraguchi and A.Suzuki
    21th Electronic Materials Symposium, Jun. 2002
  • Growth of InN on Si (111) substrates by RF-MBE
    T. Yamaguchi; K. Mizuo; Y. Saito; T. Araki; N. Teraguchi; A. Suzuki and Y. Nanishi
    21th Electronic Materials Symposium, Jun. 2002
  • RF-MBE成長単結晶InN膜の光学特性
    May 2002
  • The c-Axis and a-Axis Orientations in InN Grown Directly on (0001) Sapphire Substrate by RF-MBE
    T. Yamaguchi; Y. Saito; K. Kano; T. Araki; N. Teraguchi; A. Suzuki and Y. Nanishi
    14th Indium Phosphide and Related Materials Conference, May 2002
  • RF-MBE法を用いた高In組成InxGa1-xNの結晶成長と特性評価
    May 2002
  • RF-MBE成長したサファイア基板上InN薄膜のTEM観察
    Mar. 2002
  • RF-MBE成長InN結晶性の成長温度依存性
    Mar. 2002
  • RF-MBE法InN成長における低温InNバッファ層の効果
    Mar. 2002
  • Growth of InN on Si (111) substrates by RF-MBE
    2002
  • Single crystalline InN films grown on Si substrates by using a brief substrate nitridation process
    2002
  • The c-Axis and a-Axis Orientations in InN Grown Directly on (0001) Sapphire Substrate by RF-MBE
    2002
  • Growth and optical properties of In1-xGaxN with entire alloy composition grown on InN buffer layer by RF-MBE
    2002
  • Optical properties of InxGa1 - xN with entire alloy composition on InN buffer layer grown by RF-MBE
    2002
  • RF-MBE growth and properties of InN and InGaN alloys with entire alloy composition
    2002
  • Electrical and Optical Properties of InN/Si Heterostructure
    2002
  • Growth temperature dependence of indium nitride crystalline quality grown by RF-MBE
    2002
  • Influence of growth condition on superconducting characteristics of InN on sapphire (0001)
    2002
  • Single crystalline InN films grown on Si (111) substrates
    2002
  • Growth condition dependence of InN film a-axis directions on sapphire (0001) substrate
    T. Yamaguchi; T. Araki; Y. Saito; T. Maruyama; Y. Nanishi; N. Teraguchi and Y. Nanishi
    28th International Symposium on Compound Semiconductors, Oct. 2001
  • サファイア(0001)基板上InN薄膜のa軸方位と成長条件の関係
    Sep. 2001
  • RF-MBE法による窒化処理なしサファイア基板上InN薄膜二段階成長
    Sep. 2001
  • RF-MBE法による高In組成InGaN結晶成長に関する検討
    Sep. 2001
  • CAICISSを用いたRF-MBE成長InNの極性評価
    Sep. 2001
  • Growth of high-quality InN using low-temperature intermediate layers by RF-MBE
    Y. Saito; T. Yamaguchi; H. Kanazawa; K. Kano; T. Araki; Y. Nanishi; N. Teraguchi and A. Suzuki
    The 13th Internationals Conference on Crystal Growth in conjunction with The 11th International Conference on Vapor Growth and Epitaxy, Aug. 2001
  • Effect of sapphire substrate nitridation on determining rotation domain in GaN growth
    T. Yamaguchi; T. Araki; Y. Saito; K. Kano; H. Kanazawa; Y. Nanishi; N. Teraguchi and A. Suzuki
    The 13th Internationals Conference on Crystal Growth in conjunction with The 11th International Conference on Vapor Growth and Epitaxy, Aug. 2001
  • Study of Epitaxial Relationship in InN grown on sapphire (0001) by RF-MBE
    T. Yamaguchi; Y. Saito; K. Kano; T. Araki; N. Teraguchi; A. Suzuki and Y. Nanishi
    4th International Conference on Nitride Semiconductors, Jul. 2001
  • Polarity of high-quality indium nitride grown by RF molecular beam epitaxy
    Y. Saito; Y. Tanabe; T. Yamaguchi; N. Teraguchi; A. Suzuki; T. Araki and Y. Nanishi
    4th International Conference on Nitride Semiconductors, Jul. 2001
  • Effect of nitridation of sapphire (0001) substrates on InN growth by RF-MBE
    T. Yamaguchi; Y. Saito; K. Kano; N. Teraguchi; A. Suzuki; T. Araki and Y. Nanishi
    20th Electronic Materials Symposium, Jun. 2001
  • RF-MBE成長InN膜のキャリア濃度と移動度の関係
    Apr. 2001
  • RF-MBE法によるInN成長におけるサファイア基板窒化の効果
    Mar. 2001
  • Study of Epitaxial Relationship in InN grown on sapphire (0001) by RF-MBE
    2001
  • Polarity of high-quality indium nitride grown by RF molecular beam epitaxy
    2001
  • Growth of high-quality InN using low-temperature intermediate layers by RF-MBE
    2001
  • Growth condition dependence of InN film a-axis directions on sapphire (0001) substrate
    2001
  • Effect of nitridation of sapphire (0001) substrates on InN growth by RF-MBE
    2001
  • Effect of sapphire substrate nitridation on determining rotation domain in GaN growth
    2001
  • Electrical properties of InN grown by RF-MBE
    Y. Saito; N. Teraguchi; A. Suzuki; T. Yamaguchi; T. Araki and Y. Nanishi
    2000 Materials Research Society Fall Meeting, Nov. 2000
  • RF-MBE成長InNにおけるサファイヤ基板窒化の効果
    Nov. 2000
  • RF-MBE法によるSiC基板上GaN成長における水素添加効果
    Oct. 2000
  • RF-MBE法を用いて成長したInN膜の電気的特性
    Oct. 2000
  • RF-MBE法によるInN膜の電気的特性
    Sep. 2000
  • 水素・窒素混合プラズマを用いたRF-MBE法によるGaN/SiC成長
    Sep. 2000
  • Growth of AlN films on SiC substrates by RF-MBE and RF-MEE
    N. Teraguchi; A. Suzuki; Y. Saito; T. Yamaguchi; T. Araki and Y. Nanishi
    4th European GaN Workshop, Jul. 2000
  • RF-MBE法によるInNの低温成長-アニール効果
    Mar. 2000
  • Growth of AlN films on SiC substrates by RF-MBE and RF-MEE
    2000
  • Electrical properties of InN grown by RF-MBE
    2000

Industrial Property Rights

  • 5343274, 2010-267888, 2009-119315, 窒化物半導体薄膜の製造方法
  • 4895228, 2010-034425, 2008-197106, 局所加圧分子線エピタキシー装置と分子線エピタキシー装置の運転方法
  • 4476691, 2005-327851, 2004-143535, 酸化ガリウム単結晶複合体及びその製造方法並びに酸化ガリウム単結晶複合体を用いた窒化物半導体膜の製造方法
  • 10 2005 057 253, 10 2005 057 253, Verfahren zur Herstellung eines Halbleiterbauelementes
    T. Yamaguchi and D. Hommel

Award

  • Dec. 2023
    International society
  • Oct. 2017
  • Oct. 2016
  • Oct. 2015
  • Jul. 2010
    Japan
  • Oct. 2009
    Japan
  • Oct. 2003
    Japan
  • Nov. 2000
    Japan

Research Themes

Member History

  • Jan. 2023 - Dec. 2023
    Program Committee, 2023 International Conference on Solid State Devices and Materials
  • Jan. 2023 - Apr. 2023
    Program Committee, The 5th Oprical Wireless and Fiber Transmission Conference
  • Jan. 2022 - Dec. 2022
    Program Committee, 2022 International Conference on Solid State Devices and Materials
  • Sep. 2021 - Oct. 2022
    Local arrangements committee (Vice chair), The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022)
  • Jan. 2022 - Apr. 2022
    Program Committee, The 4th Oprical Wireless and Fiber Transmission Conference
  • Jan. 2021 - Dec. 2021
    Program Committee, 2021 International Conference on Solid State Devices and Materials
  • Jan. 2021 - Apr. 2021
    Program Committee, The 3rd Oprical Wireless and Fiber Transmission Conference
  • Apr. 2021 - Present
    総務委員
  • Jun. 2020 - Mar. 2021
    庶務幹事
  • Jan. 2020 - Dec. 2020
    Program Committee, 2020 International Conference on Solid State Devices and Materials
  • Jan. 2020 - Apr. 2020
    Program Committee, The 2nd Oprical Wireless and Fiber Transmission Conference
  • Jun. 2018 - Mar. 2020
    出版委員会 庶務, The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019)
  • Jan. 2019 - Dec. 2019
    Program Committee, 2019 International Conference on Solid State Devices and Materials
  • May 2018 - May 2019
    Local Steering Committee, The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'19)
  • May 2018 - May 2019
    Program Committee, The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'19)
  • Jan. 2019 - Apr. 2019
    Program Committee, The 1st Oprical Wireless and Fiber Transmission Conference
  • Jan. 2018 - Dec. 2018
    Program Committee, 2018 International Conference on Solid State Devices and Materials
  • Jul. 2018 - Present
    先進フォトニクス技術研究会 幹事
  • May 2017 - May 2018
    Program Committee, The 6th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'18)
  • May 2017 - May 2018
    Local Arrangement Committee, The 6th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'18)
  • Apr. 2018 - Present
    企画運営委員
  • Mar. 2018 - Present
    実行委員
  • Jan. 2017 - Dec. 2017
    Program Committee, 2017 International Conference on Solid State Devices and Materials
  • May 2016 - May 2017
    Local Arrangement Committee, The 5h International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'17)
  • May 2016 - May 2017
    Finance Committee, The 5th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'17)
  • May 2016 - May 2017
    Program Committee, The 5th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'17)
  • Sep. 2014 - Sep. 2016
    Finance Committee, The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)
  • May 2015 - May 2016
    Finance Committee, The 4th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'16)
  • May 2015 - May 2016
    Local Arrangement Committee, The 4th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'16)
  • May 2015 - May 2016
    Program Committee, The 4th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'16)
  • Apr. 2013 - Mar. 2016
    プログラム編集委員
  • May 2014 - May 2015
    member, LEDIA'15 program committee
  • May 2014 - May 2015
    member, LEDIA '15 finance committee
  • May 2014 - May 2015
    member, LEDIA'15 local aggangement committee
  • May 2013 - May 2014
    member, LEDIA'14 local aggangement committee
  • May 2013 - May 2014
    member, LEDIA '14 finance committee
  • May 2013 - May 2014
    member, LEDIA'14 program committee
  • May 2013 - May 2014
    LEDIA '14 finance committee
  • May 2013 - May 2014
    LEDIA'14 program committee
  • May 2013 - May 2014
    LEDIA'14 local aggangement committee
  • May 2013 - May 2014
    LEDIA '14 finance committee
  • May 2013 - May 2014
    LEDIA'14 program committee
  • May 2013 - May 2014
    LEDIA'14 local aggangement committee
  • Nov. 2012 - Aug. 2013
    member, ISCS2013 program committee
  • Nov. 2012 - Aug. 2013
    ISCS2013 program committee
  • Nov. 2012 - Aug. 2013
    ISCS2013 program committee
  • Aug. 2011 - Aug. 2013
    総務委員
  • Aug. 2011 - Aug. 2013
    電子材料シンポジウム総務委員
  • Nov. 2012 - May 2013
    Secretary, LEDIA'13 steering commettee
  • Nov. 2012 - May 2013
    member, LEDIA'13 program committee
  • Nov. 2012 - May 2013
    member, LEDIA'13 local arrangement committee
  • Nov. 2012 - May 2013
    LEDIA'13 local arrangement committee
  • Nov. 2012 - May 2013
    LEDIA'13 local arrangement committee
  • Nov. 2012 - May 2013
    LEDIA'13 steering commettee
  • Nov. 2012 - May 2013
    LEDIA'13 steering commettee
  • Nov. 2012 - May 2013
    LEDIA'13 program committee
  • Nov. 2012 - May 2013
    LEDIA'13 program committee