Onuma Takeyoshi

School of Advanced Engineering Department of Applied PhysicsProfessor

Career

  • Apr. 2019 - Present
    工学院大学
  • Nov. 2012 - Present
    独立行政法人 情報通信研究機構 未来ICT研究所 特別研究員(併任)(2013年 4月 協力研究員に改称)
  • Apr. 2015 - Mar. 2019
    工学院大学
  • Apr. 2012 - Mar. 2015
    東京工業高等専門学校 一般教育科 准教授
  • Apr. 2011 - Mar. 2015
    工学院大学 工学部 情報通信工学科 客員研究員(併任)
  • Apr. 2010 - Mar. 2012
    東京工業高等専門学校 一般教育科 講師
  • Mar. 2007 - Mar. 2010
    東北大学多元物質科学研究所 助手 (2007年 4月 助教に改称)
  • Apr. 2004 - Feb. 2007
    独立行政法人 科学技術振興機構 創造科学技術推進事業 中村不均一結晶プロジェクト 研究員

Educational Background

  • Apr. 2001 - Mar. 2004
    University of Tsukuba, Graduate School, Division of Engineering
  • Apr. 1997 - Mar. 2001
    University of Tsukuba, Graduate School, Division of Physics
  • Apr. 1993 - Mar. 1997
    University of Tsukuba, First Cluster of College
  • Apr. 1989 - Mar. 1992
    長野県野沢北高等学校

Degree

  • Mar. 1997
    学士(理学)
  • Mar. 1999
    修士(理学)
  • Mar. 2004
    博士(工学)

Licence qualification

  • 01 Feb. 2020
    第二種電気工事士

Affiliated academic society

  • Jan. 2024 - Present
    日本結晶成長学会
  • Apr. 2001 - Present
    応用物理学会
  • Apr. 1996 - Present
    日本物理学会

IDs

  • Identifiers

    研究者番号:10375420
    researchmap会員ID:R000075860
    J-Global ID:202401008829677802

Research Field

  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electric/electronic material engineering, Electronic materials/Electric materials
  • Nanotechnology/Materials, Crystal engineering, Crystal engineering
  • Nanotechnology/Materials, Applied materials, Applied materials

Research theme

  • 01 Apr. 2015 - Present
  • 01 Apr. 2017 - Present
  • 01 Apr. 2017 - Present
  • 01 Apr. 2015 - Present

Books and other publications

Paper

  • Homoepitaxial growth of thick Si-doped β-Ga2O3 layers using tetramethylsilane as a dopant source by low-pressure hot-wall metalorganic vapor phase epitaxy
    Junya Yoshinaga; Yoshiki Iba; Kakeru Kubota; Yuma Terauchi; Takahito Okuyama; Shogo Sasaki; Kazutada Ikenaga; Takeyoshi ONUMA; Masataka Higashiwaki; Kazushige Shiina; Shuichi Koseki; Yuzaburo Ban; Yoshinao Kumagai
    Applied Physics Express, 23 Apr. 2025, [Reviewed]
  • Strain-induced band-gap widening in (100) β-Ga2O3 thin films grown on θ−Al2O3 buffer layers
    Kazuki Koreishi; Takeyoshi Onuma; Takuto Soma; Akira Ohtomo
    Physical Review Materials, 10 Mar. 2025, [Reviewed]
  • Deposition of ZnO and Al-doped ZnO thin films using pressed-sintered targets
    Rozen Grace B. Madera; Hiroki Nagai; Takeyoshi Onuma; Tohru Honda; Tomohiro Yamaguchi; Magdaleno R. Vasquez
    Physica B: Condensed Matter, 01 Feb. 2025, [Reviewed]
  • Rocksalt-structured MgZnO-based UV-C lamp emitting in 190–220 nm spectral range using 146 nm line of Kr2* generated by dielectric barrier discharge
    Kotaro Ogawa; Toshiki Mitomi; Hideki Yajima; Wataru Kosaka; Hiroya Kusaka; Go Kobayashi; Tomohiro Yamaguchi; Tohru Honda; Kentaro Kaneko; Shizuo Fujita; Izumi Serizawa; Takeyoshi Onuma
    Applied Physics Express, 01 Dec. 2024, [Reviewed]
    Corresponding
  • Adsorption-controlled growth of homoepitaxial <i>c-plane sapphire films
    Lena N. Majer; Tolga Acartürk; Peter A. van Aken; Wolfgang Braun; Luca Camuti; Johan Eckl-Haese; Jochen Mannhart; Takeyoshi Onuma; Ksenia S. Rabinovich; Darrell G. Schlom; Sander Smink; Ulrich Starke; Jacob Steele; Patrick Vogt; Hongguang Wang; Felix V. E. Hensling
    APL Materials, 01 Sep. 2024, [Reviewed]
  • Epitaxial growth of α-(Al<i>xGa1−<i>x)2O3 by suboxide molecular-beam epitaxy at 1 µm/h
    Jacob Steele; Kathy Azizie; Naomi Pieczulewski; Yunjo Kim; Shin Mou; Thaddeus J. Asel; Adam T. Neal; Debdeep Jena; Huili G. Xing; David A. Muller; Takeyoshi Onuma; Darrell G. Schlom
    APL Materials, 01 Apr. 2024, [Reviewed]
  • Realization of cathodoluminescence in the 180 nm spectral range by suppressing thermal stress in mist chemical vapor deposition of rocksalt-structured MgZnO films
    Kotaro Ogawa; Wataru Kosaka; Hiroya Kusaka; Kanta Kudo; Soichiro Ohno; Izumi Serizawa; Yuichi Ota; Tomohiro Yamaguchi; Tohru Honda; Kentaro Kaneko; Shizuo Fujita; Takeyoshi Onuma
    Japanese Journal of Applied Physics, 04 Jan. 2024, [Reviewed]
    Corresponding
  • Steady-state and dynamic characteristics of deep UV luminescence in rocksalt-structured MgxZn1-xO
    T. Onuma; K. Kudo; M. Ono; W. Kosaka; K. Shima; K. Ishii; K. Kaneko; Y. Ota; T. Yamaguchi; K. Kojima; S. Fujita; S. F. Chichibu; and T. Honda
    Journal of Applied Physics, 13 Jul. 2023, [Reviewed]
    Lead, Corresponding
  • Natural band alignment of MgO1−xSx alloys
    Y. Ota; K. Kaneko; T. Onuma; and S. Fujita
    AIP Advances, 02 May 2023, [Reviewed]
  • Growth of α-In2O3 films with different concentrations of In2O3 powder used as source precursor by mist chemical vapor deposition
    A. Taguchi; T. Yamamoto; K. Kaneko; K. Goto; T. Onuma; T. Honda; Y. Kumagai; S. Fujita; and T. Yamaguchi
    Japanese Journal of Applied Physics, 19 Apr. 2023, [Reviewed]
  • Fabrication of Transparent and Conductive SWCNT/SiO2 Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
    N. Ogawa; H. Nagai; Y. Kudoh; T. Onuma; T. Murayama; A. Nojima; and M. Sato
    Nanomaterials, 16 Dec. 2021, [Reviewed]
  • Mist Chemical Vapor Deposition Growth of alfa-In2O3 Films Using Indium Oxide Powder as Source Precursor
    A. Taguchi; S. Takahashi; A. Sekiguchi; K. Kaneko; S. Fujita; T. Onuma; T. Honda; and T. Yamaguchi
    Physica Status Solidi (b), 20 Oct. 2021, [Reviewed]
  • Identification of free and bound exciton emission of MgO single crystal in vacuum ultraviolet spectral range
    T. Onuma; W. Kosaka; K. Kudo; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; and T. Honda
    Applied Physics Letters, 30 Sep. 2021, [Reviewed]
    Lead, Corresponding
  • Selective observation of transverse optical phonons of Au modes to evaluate free charge carrier parameters in beta-Ga2O3 substrate and homoepitaxial film
    T. Onuma; K. Sasaki; T. Yamaguchi; T. Honda; A. Kuramata; S. Yamakoshi; and M. Higashiwaki
    Applied Physics Letters, 21 Jun. 2021, [Reviewed]
    Lead, Corresponding
  • Effect of thermal annealing on photoexcited carriers in nitrogen-ion-implanted beta-Ga2O3 crystals detected by photocurrent measurement
    M. Nakanishi; M. H. Wong; T. Yamaguchi; T. Honda; M. Higashiwaki; and T. Onuma
    AIP Advances, 25 Mar. 2021, [Reviewed]
    Last, Corresponding
  • Crystal orientation dictated epitaxy of ultrawide-bandgap 5.4- to 8.6-eV alfa-(AlGa)2O3 on m-plane sapphire
    R. Jinno; C. S. Chang; T. Onuma; Y. Cho; S.-T. Ho; D. Rowe; M. C. Cao; K. Lee; V. Protasenko; D. G. Schlom; D. A. Muller; H. G. Xing; D. Jena
    Science Advances, 08 Jan. 2021, [Reviewed]
  • Hydrophilic titania thin films from a molecular precursor film formed via electrospray deposition on a quartz glass substrate precoated with carbon nanotubes
    Natangue Heita Shafudah; Hiroki Nagai; Yutaka Suwazono; Ryuhei Ozawa; Yukihiro Kudoh; Taiju Takahashi; Takeyoshi Onuma; and Mitsunobu Sato
    Coatings, 29 Oct. 2020, [Reviewed]
  • Impact of hydrochloric acid on the epitaxial growth of In2O3 films on (0001)α-Al2O3 substrates by mist CVD
    T. Yamaguchi; S. Takahashi; T. Kiguchi; A. Sekiguchi; K. Kaneko; S. Fujita; H. Nagai; M. Sato; T. Onuma; and T. Honda
    Applied Physics Express, 18 Jun. 2020, [Reviewed]
  • Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates
    T. Yamaguchi; H. Nagai; T. Kiguchi; N. Wakabayashi; T. Igawa; T. Hitora; T. Onuma; T. Honda; and M. Sato
    Applied Physics Express, 18 Jun. 2020, [Reviewed]
  • Electroreflectance study on optical anisotropy in beta-Ga2O3
    T.Onuma; K.Tanaka; K.Sasaki; T.Yamaguchi; T.Honda; A.Kuramata; S.Yamakoshi; and M.Higashiwaki
    Applied Physics Letters, 02 Dec. 2019, [Reviewed]
    Lead, Corresponding
  • Excitation-current-density and temperature dependences of deep UV cathodoluminescence in rocksalt-structured MgxZn1-xO films
    M.Ono; K.Ishii; K.Kaneko; T.Yamaguchi; T.Honda; S.Fujita; and T.Onuma
    Journal of Applied Physics, 13 Jun. 2019, [Reviewed]
    Last, Corresponding
  • Pure deep-ultraviolet cathodoluminescence from rocksalt-structured MgZnO grown with carbon-free precursors
    K.Ishii; M.Ono; K.Kaneko; T.Onuma; T.Honda; and S.Fujita
    Applied Physics Express, 11 Apr. 2019, [Reviewed]
  • Modeling and interpretation of UV and blue luminescence intensity in beta-Ga2O3 by silicon and nitrogen doping
    T.Onuma; Y.Nakata; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; S.Yamakoshi; M.Higashiwaki
    Journal of Applied Physics, 20 Aug. 2018, [Reviewed]
  • Impact of local arrangement of Mg and Zn atoms in rocksalt-structured MgxZn1-xO alloys on bandgap and deep UV cathodoluminescence peak energies
    T.Onuma; M.Ono; K.Ishii; K.Kaneko; T.Yamaguchi; S.Fujita; and T.Honda
    Applied Physics Letters, 10 Aug. 2018, [Reviewed]
  • Deep-ultraviolet luminescence of rocksalt-structured MgxZn1−xO (x>0.5) films on MgO substrates
    K.Kaneko; K.Tsumura; K.Ishii; T.Onuma; T.Honda; and S.Fujita
    Journal of Electronic Materials, 25 Apr. 2018, [Reviewed], [Invited]
  • Relation between electrical and optical properties of p-type NiO films
    M.Ono; K.Sasaki; H.Nagai; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; M.Sato; T.Honda; and T.Onuma
    Physica Status Solidi (b), 14 Apr. 2018, [Reviewed]
  • Valence band edge tail states and band gap defect levels of GaN bulk and InxGa1-xN films detected by hard X-ray photoemission and photothermal deflection spectroscopy
    M.Sumiya; S.Ueda; K.Fukuda; Y.Asai; Y.Cho; L.Sang; A.Uedono; T.Sekiguchi; T.Onuma; and T.Honda
    Applied Physics Express, 25 Jan. 2018, [Reviewed]
  • Fabrication of Ag dispersed ZnO films by molecular precursor method and application in GaInN blue LED
    D.Taka; T.Onuma; T.Shibukawa; H.Nagai; T.Yamaguchi; J.-S. Jang; M.Sato; and T.Honda
    Physica Status Solidi (a), 13 Mar. 2017, [Reviewed]
  • Growth of rocksalt-structured MgxZn1-xO (x > 0.5) films on MgO substrates and their deep-ultraviolet luminescence
    K.Kaneko; T.Onuma; K.Tsumura; T.Uchida; R.Jinno; T.Yamaguchi; T.Honda; and S.Fujita
    Applied Physics Express, 18 Oct. 2016, [Reviewed]
  • Spectroscopic ellipsometry studies on β-Ga2O3 films and single crystal
    T.Onuma; S.Saito; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki:
    Japanese Journal of Applied Physics, 21 Sep. 2016, [Reviewed]
  • Surface plasmon resonant emission from Ag dispersed ZnO films fabricated by molecular precursor method
    Daichi Taka; Takeyoshi Onuma; Takashi Shibukawa; Hiroki Nagai; Tomohiro Yamaguchi; Ja Soon Jang; Mitsunobu Sato; Tohru Honda
    2016 Compound Semiconductor Week, CSW 2016 - Includes 28th International Conference on Indium Phosphide and Related Materials, IPRM and 43rd International Symposium on Compound Semiconductors, ISCS 2016, 01 Aug. 2016, [Reviewed]
  • Temperature-dependent exciton resonance energies and their correlation with IR-active optical phonon modes in beta-Ga2O3 single crystals
    T.Onuma; S.Saito; K.Sasaki; K.Goto; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki
    Applied Physics Letters, 07 Mar. 2016, [Reviewed]
  • Valence band ordering in beta-Ga2O3 studied by polarized transmittance and reflectance spectroscopy
    T.Onuma; S.Saito; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; and M.Higashiwaki
    Japanese Journal of Applied Physics, 14 Oct. 2015, [Reviewed]
  • Optical properties of Ga0.82In0.18N p-n homojunction blue-green light-emitting-diode grown by radio-frequency plasma-assisted molecular beam epitaxy
    T.Onuma; K.Narutani; S.Fujioka; T.Yamaguchi; K.Wang; T.Araki; Y.Nanishi; L.Sang; M.Sumiya; and T.Honda
    Trans. Mat. Res. Soc. Japan, 01 Jun. 2015, [Reviewed]
  • Impacts of AlOx formation on emission properties of AlN/GaN heterostructures
    T.Onuma; Y.Sugiura; T.Yamaguchi; T.Honda; and M.Higashiwaki
    Applied Physics Express, 07 Apr. 2015, [Reviewed]
  • High internal quantum efficiency ultraviolet to green luminescence peaks from pseudomorphic m-plane Al1-xInxN epilayers grown on a low defect density m-plane freestanding GaN substrate
    S.F.Chichibu; K.Hazu; K.Furusawa; Y.Ishikawa; T.Onuma; T.Ohtomo; H.Ikeda; and K.Fujito
    Journal of Applied Physics, 02 Dec. 2014, [Reviewed]
  • Polarized Raman spectra in beta-Ga2O3 single crystals
    T.Onuma; S.Fujioka; T.Yamaguchi; Y.Itoh; M.Higashiwaki; K.Sasaki; T.Masui; and T.Honda
    Journal of Crystal Growth, 01 Sep. 2014, [Reviewed]
  • Cathodoluminescence spectra of Ga-In-O polycrystalline films fabricated by molecular precursor method
    T.Onuma; T.Yasuno; S.Takano; R.Goto; S.Fujioka; T.Hatakeyama; T.Oda; H.Hara; C.Mochizuki; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    Japanese Journal of Applied Physics, 20 Mar. 2014, [Reviewed]
  • Correlation between blue luminescence intensity and resistivity in beta-Ga2O3 single crystals
    T.Onuma; S.Fujioka; T.Yamaguchi; M.Higashiwaki; K.Sasaki; T.Masui; and T.Honda
    Applied Physics Letters, 24 Jul. 2013, [Reviewed]
  • Electron-beam incident-angle-resolved cathodoluminescence studies on bulk ZnO crystals
    T.Onuma; T.Yamaguchi; and T.Honda
    Physica Status Solidi (c), 21 May 2013, [Reviewed]
  • Time-resolved luminescence studies on AlN and high AlN mole fraction AlGaN alloy
    S.F.Chichibu; T.Onuma; K.Hazu; and A.Uedono
    Physica Status Solidi (c), 08 Mar. 2013, [Reviewed]
  • Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
    T.Onuma; N.Sakai; T.Igaki; T.Yamaguchi; A.A.Yamaguchi; and T.Honda
    Journal of Applied Physics, 18 Sep. 2012, [Reviewed]
  • Femtosecond-laser-driven photoelectron-gun for time-resolved cathodoluminescence measurement of GaN
    T.Onuma; Y.Kagamitani; K.Hazu; T.Ishiguro; T.Fukuda; and S.F.Chichibu
    Review of Scientific Instruments, 11 Apr. 2012, [Reviewed]
  • Collateral evidence for an excellent radiative performance of AlxGa1-xN alloy films of high AlN mole fractions
    S.F.Chichibu; K.Hazu; T.Onuma; and A.Uedono
    Applied Physics Letters, 01 Aug. 2011, [Reviewed]
  • Surface recombination of hexagonal GaN crystals
    T.Onuma; N.Sakai; T.Okuhata; A.A.Yamaguchi; and T.Honda
    Physica Status Solidi (c), 22 Jul. 2011, [Reviewed]
  • Time-resolved photoluminescence of a two-dimensional electron gas in an Al0.2Ga0.8N/GaN heterostructure fabricated on ammonothermal GaN substrates
    S.F.Chichibu; K.Hazu; Y.Kagamitani; T.Onuma; D.Ehrentraut; T.Fukuda; and T.Ishiguro
    Applied Physics Express, 18 Mar. 2011, [Reviewed]
  • Impacts of anisotropic tilt mosaics of state-of-the-art m-plane freestanding GaN substrates on the structural and luminescent properties of m-plane AlxGa1−xN epilayers
    K.Hazu; M.Kagaya; T.Hoshi; T.Onuma; and S.F.Chichibu
    Journal of Vacuum Science and Technology B, 16 Mar. 2011, [Reviewed]
  • Major impacts of point defects and impurities on the carrier recombination dynamics in AlN
    S.F.Chichibu; T.Onuma; K.Hazu; and A.Uedono
    Applied Physics Letters, 17 Nov. 2010, [Reviewed]
  • Ammonothermal epitaxy of wurtzite GaN using an NH4I mineralizer
    Y.Kagamitani; T.Kuribayashi; K.Hazu; T.Onuma; D.Tomida; R.Simura; S.F.Chichibu; K.Sugiyama; C.Yokoyama; T.Ishiguro; and T.Fukuda
    Journal of Crystal Growth, 01 Nov. 2010, [Reviewed]
  • Optimization of the growth conditions for molecular beam epitaxy of MgxZn1-xO (0=
    H.Yuji; K.Nakahara; K.Tamura; S.Akasaka; Y.Nishimoto; D.Takamizu; T.Onuma; S.F.Chichibu; A.Tsukazaki; A.Ohtomo; and M.Kawasaki
    Japanese Journal of Applied Physics, 20 Jul. 2010, [Reviewed]
  • Nitrogen doped MgxZn1−xO/ZnO single heterostructure ultraviolet light-emitting diodes on ZnO substrates
    K.Nakahara; S.Akasaka; H.Yuji; K.Tamura; T.Fujii; Y.Nishimoto; D.Takamizu; A.Sasaki; T.Tanabe; H.Takasu; H.Amaike; T.Onuma; S.F.Chichibu; A.Tsukazaki; A.Ohtomo; and M.Kawasaki
    Applied Physics Letters, 06 Jul. 2010, [Reviewed]
  • Photoluminescence and positron annihilation studies on Mg-doped nitrogen-polarity semipolar (10-1-1) GaN heteroepitaxial layers grown by metalorganic vapor phase epitaxy
    T.Onuma; A.Uedono; H.Asamizu; H.Sato; J.F.Kaeding; M.Iza; S.P.DenBaars; S.Nakamura; and S.F.Chichibu
    Applied Physics Letters, 04 Mar. 2010, [Reviewed]
  • Identification of extremely radiative nature of AlN by time-resolved photoluminescence
    T.Onuma; K.Hazu; A.Uedono; T.Sota; and S.F.Chichibu
    Applied Physics Letters, 09 Feb. 2010, [Reviewed]
  • Light polarization characteristics of m-plane AlxGa1-xN films suffering from in-plane anisotropic tensile stresses
    K.Hazu; T.Hoshi; M.Kagaya; T.Onuma; and S.F.Chichibu
    Journal of Applied Physics, 01 Feb. 2010, [Reviewed]
  • Structural, optical, and homoepitaxial studies on the bulk GaN single crystals spontaneously nucleated by the Na-flux method
    T.Onuma; T.Yamada; H.Yamane; and S.F.Chichibu
    Applied Physics Express, 11 Sep. 2009, [Reviewed]
  • Synthesis, crystal structure and characterization of iron pyroborate (Fe_2B_2O_5) single crystals
    T. Kawano; H. Morito; T. Yamada; T. Onuma; S. F. Chichibu; H. Yamane
    Journal of Solid State Chemistry, 14 May 2009, [Reviewed]
  • Thermal stability of semi-insulating property of Fe-doped GaN bulk films studied by photoluminescence and monoenergetic positron annihilation techniques
    M.Kubota; T.Onuma; Y.Ishihara; A.Usui; A.Uedono; and S.F.Chichibu
    Journal of Applied Physics, 28 Apr. 2009, [Reviewed]
  • Vacancy-oxygen complexes and their optical properties in AlN epitaxial films studied by positron annihilation
    A.Uedono; S.Ishibashi; S.Keller; C.Moe; P.Cantu; T.M.Katona; D.S. Kamber; Y.Wu; E.Letts; S.A.Newman; S.Nakamura; J.S.Speck; U.K.Mishra; S.P.DenBaars; T.Onuma; and S.F.Chichibu
    Journal of Applied Physics, 03 Mar. 2009, [Reviewed]
  • Impacts of anisotropic lattice relaxation on crystal mosaicity and luminescence spectra of m-plane AlxGa1−xN films grown on m-plane freestanding GaN substrates by NH3 source molecular beam epitaxy
    T.Hoshi; K.Hazu; K.Ohshita; M.Kagaya; T.Onuma; K.Fujito; H.Namita; and S.F.Chichibu
    Applied Physics Letters, 20 Feb. 2009, [Reviewed]
  • Free and bound exciton fine structures in AlN epilayers grown by low-pressure metalorganic vapor phase epitaxy
    T.Onuma; T.Shibata; K.Kosaka; K.Asai; S.Sumiya; M.Tanaka; T.Sota; A.Uedono; and S.F.Chichibu
    Journal of Applied Physics, 30 Jan. 2009, [Reviewed]
  • Improved characteristics and issues of m-plane InGaN films grown on low defect density m-plane freestanding GaN substrates by metalorganic vapor phase epitaxy
    S.F.Chichibu; H.Yamaguchi; L.Zhao; M.Kubota; T.Onuma; K.Okamoto; and H.Ohta
    Applied Physics Letters, 14 Oct. 2008, [Reviewed]
  • Anisotropic optical gain in m-plane InxGa1−xN/GaN multiple quantum well laser diode wafers fabricated on the low defect density freestanding GaN substrates
    T.Onuma; K.Okamoto; H.Ohta; and S.F.Chichibu
    Applied Physics Letters, 04 Sep. 2008, [Reviewed]
  • Plasma-assisted molecular beam epitaxy of high optical quality MgZnO films on Zn-polar ZnO substrates
    Y.Nishimoto; K.Nakahara; D.Takamizu; A.Sasaki; K.Tamura; S.Akasaka; H.Yuji; T.Fujii; T.Tanabe; H.Takasu; A.Tsukazaki; A.Ohtomo; T.Onuma; S.F.Chichibu; and M.Kawasaki
    Applied Physics Express, 29 Aug. 2008, [Reviewed]
  • Impact of point defects on the luminescence properties of (Al,Ga)N
    S.F.Chichibu; A.Uedono; T.Onuma; S.P.DenBaars; U.K.Mishra; J.S.Speck; and S.Nakamura
    Materials Science Forum, 19 Aug. 2008, [Reviewed]
  • Direct correlation between the internal quantum efficiency and photoluminescence lifetime in undoped ZnO epilayers grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy
    D.Takamizu; Y.Nishimoto; S.Akasaka; H.Yuji; K.Tamura; K.Nakahara; T.Onuma; T.Tanabe; H.Takasu; M.Kawasaki; and S.F.Chichibu
    Journal of Applied Physics, 17 Mar. 2008, [Reviewed]
  • Microstructural evolution in m-plane GaN growth on m-plane SiC
    Q.Sun; S.-Y.Kwon; Z.Ren; J.Han; T.Onuma; S.F.Chichibu; and S.Wang
    Applied Physics Letters, 07 Feb. 2008, [Reviewed]
  • Impact of strain on free-exciton resonance energies in wurtzite AlN
    H.Ikeda; T.Okamura; K.Matsukawa; T.Sota; M.Sugawara; T.Hoshi; P.Cantu; R.Sharma; J.F.Kaeding; S.Keller; U.K.Mishra; K.Kosaka; K.Asai; S.Sumiya; T.Shibata; M.Tanaka; J.S.Speck; S.P.DenBaars; S.Nakamura; T.Koyama; T.Onuma; and S.F.Chichibu
    Journal of Applied Physics, 27 Dec. 2007, [Reviewed]
  • Impacts of dislocation bending and impurity incorporation on the local cathodoluminescence spectra of GaN grown by ammonothermal method
    S.F.Chichibu; T.Onuma; T.Hashimoto; K.Fujito; F.Wu; J.S.Speck; and S.Nakamura
    Applied Physics Letters, 20 Dec. 2007, [Reviewed]
  • Quantum-confined Stark effects in the m-plane In0.15Ga0.85N / GaN multiple quantum well blue light-emitting diode fabricated on low defect density free-standing GaN substrate
    T.Onuma; H.Amaike; M.Kubota; K.Okamoto; H.Ohta; J.Ichihara; H.Takasu; and S.F.Chichibu
    Applied Physics Letters, 29 Oct. 2007, [Reviewed]
  • Radiative and nonradiative lifetimes in nonpolar m-plane InxGa1-xN / GaN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; T.Koyama; A.Chakraborty; M.McLaurin; B.A.Haskell; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    Journal of Vacuum Science and Technology B, 31 Jul. 2007, [Reviewed]
  • Origin of localized excitons in In-containing three-dimensional bulk (Al,In,Ga)N alloy films probed by,time-resolved photoluminescence and monoenergetic positron annihilation techniques
    S.F.Chichibu; A.Uedono; T.Onuma; B.A.Haskell; A.Chakraborty; T.Koyama; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; U.K.Mishra; S.Nakamura; S.Yamaguchi; S.Kamiyama; H.Amano; I.Akasaki; J.Han; and T.Sota
    Philosophical Magazine, 17 May 2007, [Reviewed]
  • Recombination dynamics of excitons in Mg0.11Zn0.89O alloy films grown using the high-temperature-annealed self-buffer layer by laser-assisted molecular-beam epitaxy
    M.Kubota; T.Onuma; A.Tsukazaki; A.Ohtomo; M.Kawasaki; T.Sota; and S.F.Chichibu
    Applied Physics Letters, 04 Apr. 2007, [Reviewed]
  • Increased power from deep ultraviolet LEDs via precursor selection
    C.Moe; T.Onuma; K.Vampola; N.Fellows; H.Masui; S.Newman; S.Keller; S.F.Chichibu; S.P.DenBaas; and D.Emerson
    Journal of Crystal Growth, 01 Dec. 2006, [Reviewed]
  • Cross-sectional spatially-resolved cathodoluminescence study of cubic GaN films grown by metalorganic vapor phase epitaxy on free-standing (001) 3C-SiC and GaAs substrates
    T.Onuma; T.Nozaka; H.Yamaguchi; T.Suzuki; and S.F.Chichibu
    Journal of Crystal Growth, 17 Nov. 2006, [Reviewed]
  • Origin of defect-insensitive emission probability in In-containing (Al,In,Ga)N alloy semiconductors
    S.F.Chichibu; A.Uedono; T.Onuma; B.A.Haskell; A.Chakraborty; T.Koyama; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; U.K.Mishra; S.Nakamura; S.Yamaguchi; S.Kamiyama; H.Amano; I.Akasaki; J.Han; and T.Sota
    Nature Materials, 03 Sep. 2006, [Reviewed]
  • Prospective emission efficiency and in-plane light polarization of nonpolar m-plane InxGa1-xN / GaN blue light emitting diodes fabricated on free-standing GaN substrates
    T.Koyama; T.Onuma; H.Masui; A.Chakraborty; B.A.Haskell; S.Keller; U.K.Mishra; J.S.Speck; S.Nakamura; S.P.DenBaars; T.Sota; and S.F.Chichibu
    Applied Physics Letters, 28 Aug. 2006, [Reviewed]
  • Exciton dynamics in nonpolar (11_20) InGaN/GaN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T. Onuma; A. Chakraborty; B. A. Haskell; S. Keller; T. Sota; U. K. Mishra; S. P. DenBaars; J. S. Speck; S. Nakamura; S. F. Chichibu
    Physica Status Solidi (C), 12 Jun. 2006, [Reviewed]
  • Strain-relaxation in NH3-source molecular beam epitaxy of AlN epilayers on GaN epitaxial templates
    T.Koyama; M.Sugawara; Y.Uchinuma; J.F.Kaeding; R.Sharma; T.Onuma; S.Nakamura; and S.F.Chichibu
    Physica Status Solidi (a), 18 May 2006, [Reviewed]
  • Extremely high quantum efficiency of donor-acceptor-pair emission in N-and-B-doped 6H-SiC
    S.Kamiyama; T.Maeda; Y.Nakamura; M.Iwaya; H.Amano; I.Akasaki; H.Kinoshita; T.Furusho; M.Yoshimoto; T.Kimoto; J.Suda; A.Henry; I.G.Ivanov; J.P.Bergman; B.Monemar; T.Onuma; and S.F.Chichibu
    Journal of Applied Physics, 15 May 2006, [Reviewed]
  • Improvements in quantum efficiency of excitonic emissions in ZnO epilayers by intentional point-defect elimination
    S.F.Chichibu; T.Onuma; M.Kubota; A.Uedono; T.Sota; A.Tsukuazaki; A.Ohtomo; and M.Kawasaki
    Journal of Applied Physics, 12 May 2006, [Reviewed]
  • Recombination dynamics of a 268-nm emission peak in Al0.53In0.11Ga0.36N / Al0.58In0.02Ga0.40N multiple quantum wells
    T.Onuma; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    Applied Physics Letters, 17 Mar. 2006, [Reviewed]
  • Fabrication of p-CuGaS2/n-ZnO:Al heterojunction light-emitting diode grown by metalorganic vapor phase epitaxy and helicon-wave-excited-plasma sputtering methods
    S.F.Chichibu; T.Ohmori; N.Shibata; T.Koyama; and T.Onuma
    Journal of Physics and Chemistry of Solids, 17 Nov. 2005, [Reviewed]
  • Growth of AlGaN nanowires by metalorganic chemical vapor deposition
    J.Su; M.Gherasimova; G.Cui; H.Tsukamoto; J.Han; T.Onuma; M.Kurimoto; S.F.Chichibu; C.Broadbridge; Y.He; and A.V.Nurmikko
    Applied Physics Letters, 27 Oct. 2005, [Reviewed]
  • Blue light-emitting diode based on ZnO
    A.Tsukazaki; M.Kubota; A.Ohtomo; T.Onuma; K.Ohtani; H.Ohno; S.F.Chichibu; and M.Kawasaki
    Japanese Journal of Applied Physics, 11 May 2005, [Reviewed]
  • Localized exciton dynamics in nonpolar (11-20) InxGa1-xN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; A.Chakraborty; B.A.Haskell; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    Applied Physics Letters, 08 Apr. 2005, [Reviewed]
  • Exciton-polariton spectra and limiting factors for the room-temperature photoluminescence efficiency in ZnO
    S.F.Chichibu; A.Uedono; A.Tsukazaki; T.Onuma; M.Zamfirescu; A.Ohtomo; A.Kavokin; G.Cantwell; C.W.Litton; T.Sota; and M.Kawasaki
    Semiconductor Science and Technology, 15 Mar. 2005, [Reviewed]
  • Limiting factors of room-temperature nonradiative photoluminescence lifetime in polar and nonpolar GaN studied by time-resolved photoluminescence and slow positron annihilation techniques
    S.F.Chichibu; A.Uedono; T.Onuma; T.Sota; B.A.Haskell; S.P.DenBaars; J.S.Speck; and S.Nakamura
    Applied Physics Letters, 05 Jan. 2005, [Reviewed]
  • Repeated temperature modulation epitaxy for p-type doping and light emitting diode based on ZnO
    A.Tsukazki; A.Ohtomo; T.Onuma; M.Ohtani; T.Makino; M.Sumiya; K.Ohtani; S.F.Chichibu; S.Fuke; Y.Segawa; H.Ohno; H.Koinuma; and M.Kawasaki
    Nature Materials, 19 Dec. 2004, [Reviewed]
  • Reduced defect densities in the ZnO epilayer grown on Si substrates by laser-assisted molecular-beam epitaxy using a ZnS epitaxial buffer layer
    T.Onuma; S.F.Chichibu; A.Uedono; Y.-Z.Yoo; T.Chikyow; T.Sota; M.Kawasaki; and H.Koinuma
    Applied Physics Letters, 08 Dec. 2004, [Reviewed]
  • Greenish-white electroluminescence from p-type CuGaS2 heterojunction diodes using n-type ZnO as an electron injector
    S.F.Chichibu; T.Ohmori; N.Shibata; T.Koyama; and T.Onuma
    Applied Physics Letters, 08 Nov. 2004, [Reviewed]
  • Reduction of point defect in cubic GaN epilayers on (001) GaAs substrates using AlxGa1-xN/GaN superlattice underlayers
    S.F.Chicihbu; M.Sugiyama; T.Nozaka; T.Suzuki; T.Onuma; K.Nakajima; T.Aoyama; M.Sumiya; T.Chikyow; and A.Uedono
    Journal of Crystal Growth, 12 Oct. 2004, [Reviewed]
  • Improved surface morphology in GaN homoepitaxy by NH3-source molecular beam epitaxy
    T.Koida; Y.Uchinuma; J.Kikuchi; K.R.Wang; M.Terazaki; T.Onuma; J.F.Kaeding; R.Sharma; S.Nakamura; and S.F.Chichibu
    Journal of Vacuum Science and Technology B, 20 Aug. 2004, [Reviewed]
  • In situ monitoring of Zn* and Mg* species during helicon-wave-excited-plasma sputtering epitaxy of ZnO and Mg0.06Zn0.94O films
    T.Koyama; T.Ohmori; N.Shibata; T.Onuma; and S.F.Chichibu
    Journal of Vacuum Science and Technology B, 20 Aug. 2004, [Reviewed]
  • Radiative and nonradiative processes in strain-free AlxGa1-xN films studied by time-resolved photoluminescence and positron annihilation techniques
    T.Onuma; SF.Chichibu; A.Uedono; T.Sota; P.Cantu; T.M.Katona; J.F.Kaeding; S.Keller; U.K.Mishra; S.Nakamura; and S.P.DenBaars
    Journal of Applied Physics, 19 Feb. 2004, [Reviewed]
  • V-defect of ZnO thin films grown on Si as an ultraviolet optical path
    Y-Z.Yoo; T.Sekiguchi; T.Chikyow; M.Kawasaki; T.Onuma; S.F.Chichibu; H.K.Song; and H.Koinuma
    Applied Physics Letters, 21 Jan. 2004, [Reviewed]
  • Critical roles of decomposition-shielding layer deposited at low-temperature governing the structural and photoluminescence properties of cubic GaN epilayers grown on (001) GaAs by metalorganic vapor phase epitaxy
    M.Sugiyama; T.Nosaka; T.Onuma; K.Nakajima; P.Ahmet; T.Aoyama; T.Chikyow; and SF.Chichibu
    Japanese Journal of Applied Physics, 13 Jan. 2004, [Reviewed]
  • Influence of internal electric field on the recombination dynamics of localized excitons in an InGaN double-quantum-well laser diode wafer operated at 450nm
    T.Onuma; SF.Chichibu; T.Aoyama; K.Nakajima; P.Ahmet; T.Azuhata; T.Chikyow; T.Sota; S.Nagahama; and T.Mukai
    Japanese Journal of Applied Physics, 10 Dec. 2003, [Reviewed]
  • Anomalous pressure dependence of light emission in cubic InGaN
    S. P. Lepkowski; T. Suski; H. Teisseyre; T. Kitamura; Y. Ishida; H. Okumura; T. Onuma; T. Koida; S. F. Chichibu
    Physica Status Solidi (C), 24 Nov. 2003, [Reviewed]
  • Heteroepitaxy of hexagonal ZnS thin films directly on Si(111)
    Y-Z.Yoo; T.Chikyow; M.Kawasaki; T.Onuma; S.F.Chichibu; and H.Koinuma
    Japanese Journal of Applied Physics, 10 Nov. 2003, [Reviewed]
  • Improved emission efficiency in InGaN / GaN quantum wells with compositionally-graded barriers studied by time-resolved photoluminescence spectroscopy
    T.Onuma; M.Uchinuma; E.-K.Suh; H.J.Lee; T.Sota; and SF.Chichibu
    Japanese Journal of Applied Physics, 05 Nov. 2003, [Reviewed]
  • In situ spectral control of Zn species during helicon-wave-excited-plasma sputtering epitaxy of ZnO
    T.Koyama; T.Onuma; and SF.Chichibu
    Applied Physics Letters, 30 Sep. 2003, [Reviewed]
  • Recombination dynamics of localized excitons in cubic InxGa1-xN/GaN multiple quantum wells grown by radio frequency molecular beam epitaxy on 3C-SiC substrate
    SF.Chichibu; T.Onuma; T.Aoyama; K.Nakajima; P.Ahmet; T.Chikyow; T.Sota; S.P.DenBaars; S.Nakamura; T.Kitamura; Y.Ishida; and H.Okumura
    Journal of Vacuum Science and Technology B, 05 Aug. 2003, [Reviewed]
  • Recombination dynamics of localized excitons in Al1-xInxN epitaxial films on GaN templates grown by metalorganic vapor phase epitaxy
    T.Onuma; SF.Chichibu; Y.Uchinuma; T.Sota; S.Yamaguchi; S.Kamiyama; H.Amano; and I.Akasaki
    Journal of Applied Physics, 29 Jul. 2003, [Reviewed]
  • Influence of InN mole fraction on the recombination processes of localized excitons in strained cubic InxGa1-xN/GaN multiple quantum wells
    SF.Chichibu; T.Onuma; T.Sota; S.P.DenBaars; S.Nakamura; T.Kitamura; Y.Ishida; and H.Okumura
    Journal of Applied Physics, 30 Jan. 2003, [Reviewed]
  • Recombination dynamics of localized excitons in cubic phase InxGa1-xN/GaN multiple quantum wells on 3C-SiC/Si (001)
    S.F.Chichibu; T.Onuma; T.Kitamura; T.Sota; S.P.DenBaars; S.Nakamura; and H.Okumura
    Physica Status Solidi (b), 03 Dec. 2002, [Reviewed]
  • Exciton spectra of an AlN epitaxial film on (0001) sapphire substrate grown by low-pressure metalorganic vapor phase epitaxy
    T.Onuma; S.F.Chichibu; T.Sota; K.Asai; S.Sumiya; T.Shibata; and M.Tanaka
    Applied Physics Letters, 16 Jul. 2002, [Reviewed]
  • Decay processes of the C2 2Pai1/2u states of Ar2+, Kr2+, and Xe2+
    H.Yoshii; T.Hayaishi; T.Onuma; T.Aoto; Y.Morioka; and K.Ito
    Journal of Chemical Physics, 11 Jul. 2002, [Reviewed]
  • Cascade processes after 3p-shell threshold photoionization of Kr
    T.Matsui; H.Yoshii; A.Higurashi; E.Murakami; T.Aoto; T.Onuma; Y.Morioka; A.Yagishita; and T.Hayaishi
    Journal of Physics B: At. Mol. Opt. Phys., 03 Jul. 2002, [Reviewed]
  • Vibrationally resolved threshold photoelectron--photoion coincidence spectra of ArXe
    H.Yoshii; T.Hayaishi; T.Onuma; T.Aoto; Y.Morioka; and K.Ito
    Journal of Chemical Physics, 15 Apr. 2002, [Reviewed]
  • Helicon-wave-excited-plasma sputtering epitaxy of ZnO on sapphire (0001) substrates
    S.F.Chichibu; T.Yoshida; T.Onuma; and H.Nakanishi
    Journal of Applied Physics, 28 Dec. 2001, [Reviewed]
  • Localized exciton dynamics in strained cubic In0.1Ga0.9N/GaN multiple quantum wells
    S.F.Chichibu; M.Sugiyama; T.Onuma; T.Kitamura; H.Nakanishi; T.Kuroda; A.Tackeuchi; T.Sota; Y.Ishida; and H.Okumura
    Applied Physics Letters, 19 Dec. 2001, [Reviewed]
  • Post-collision interaction effects following 4p-shell ionization of Xe
    T.Hayaishi; T.Matsui; H.Yoshii; A.Higurashi; E.Murakami; A.Yagishita; T.Aoto; T.Onuma; and Y.Morioka
    Journal of Physics B: At. Mol. Opt. Phys., 19 Dec. 2001, [Reviewed]
  • Formation of a hydrogen plasma from an incandescently heated hydrogen-catalyst gas mixture with an anomalous afterglow duration
    R.L.Mills; T.Onuma; and Y.Lu
    International Journal of Hydrogen Energy, 28 Jun. 2001, [Reviewed]
  • Pulsed-Field Ionization Zero-Kinetic-Energy Photoelectron Spectra of Ar2
    T.Onuma; H.Yoshii; H.Ishijima; Y.Itou; T.Hayaishi; and Y.Morioka
    Journal of Molecular Spectroscopy, 30 Jul. 1999, [Reviewed]

MISC

  • 放射線教育の充実に向けた取り組み
    Dec. 2014
  • サイズ・面方位の異なるGaN結晶における表面再結合過程
    Mar. 2011
  • AlNエピタキシャル薄膜における励起子発光機構
    Oct. 2009
  • 非極性面窒化物半導体発光素子の最近の動向
    Dec. 2008

Lectures, oral presentations, etc.

  • ScAlMgO4基板上RF-MBE法GaInN成長におけるその場XRD-RSMを用いた成長初期過程観察
    17 Mar. 2025
  • ミストCVD 法による岩塩構造MgZnO 多重量子井戸の製作と井戸層薄層化による量子効果の観測
    16 Mar. 2025
  • Mist CVD法によるα-Cr2O3テンプレート上α-Ga2O3成長と結晶評価
    16 Mar. 2025
  • 準安定組成域における岩塩構造MgZnO混晶のミストCVD成長
    16 Mar. 2025
  • InCl3を用いたMist CVD法による極薄膜In2O3成膜
    16 Mar. 2025
  • In-situ monitoring using reflection high-energy electron diffraction and X-ray diffraction in RF molecular beam epitaxy growth of GaInN
    T. Yamaguchi; T. Sasaki; M. Moriya; T. Onuma; T. Honda; M. Takahasi; Y. Nanishi
    The Society of Photo-Optical Instrumentation Engineers (SPIE) Photonics West 2025, 27 Jan. 2025, [Invited]
  • Realization of Smooth Surface and Interface in Mist CVD Growth of Rocksalt structured-MgZnO/MgO MQWs
    H. Aichi; K. Ogawa; T. Mitomi; K. Tanaka; Y. Ota; T. Yamaguchi; T. Honda; T. Onuma
    50th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-50), 21 Jan. 2025
  • Si Diffusion Into Self-Organized GaN Nanocolumns Grown on Si(111) by RF-MBE
    T. Honda; N. Goto; Y. Hosoya; T. Onuma; T. Yamaguchi
    50th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-50), 21 Jan. 2025
  • ミストCVD法による低Mg組成RS-MgZnO薄膜成長における成長温度依存性
    08 Dec. 2024
  • RFマグネトロンスパッタリング法で成膜したNiO薄膜の電気的特性のアニール温度依存性
    08 Dec. 2024
  • Ⅲ族酸化物を原料に用いたMist CVD 法によるα-Ga2O3成長検討
    08 Dec. 2024
  • 大面積成膜に向けたMist CVD法によるα-Al2O3基板上α-Ga2O3成長の成長温度依存性
    08 Dec. 2024
  • 赤色発光ナノコラムLEDにおけるブルーシフトの抑制
    23 Nov. 2024
  • 岩塩構造酸化マグネシウム亜鉛薄膜の深紫外・真空紫外発光に関与する裾状態とトラップ状態の温度変化
    22 Nov. 2024
  • ミストCVD法で成長した岩塩構造MgZnO/MgO多重量子井戸の製作および構造評価
    22 Nov. 2024
  • 原料交互供給式ミストCVD法によるRS-MgZnO/MgOの急峻なヘテロ界面の実現
    22 Nov. 2024
  • Stability of Source Solution with Ethylenediamine in Cu3N Growth by Mist CVD
    C. Tsukioka; S. Yoshida; N. Sugita; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • Toward thin In2O3 film growth on SiO2/Si substrate by Mist CVD method
    R. Ishikawa; T. Yamamoto; Y. Hayashi; S. Aikawa; T. Onuma; T. Honda; T. Yamaguchi
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • Epitaxial mist CVD growth of oxide and nitride crystal films
    T. Yamaguchi; H. Nagai; T. Onuma; T. Honda
    The 23rd International Symposium on Advanced Technology (ISAT-23), 22 Nov. 2024
  • α-In2O3のMistCVD結晶成長とMOSFET製作時におけるチャネル層膜厚調整方法の検討
    18 Nov. 2024
  • Ga2O3パウダーを用いたβ-Ga2O3薄膜のMist CVD成長における原料濃度依存性
    18 Nov. 2024
  • ミストCVD法による界面平坦な岩塩構造MgZnO/MgO 超格子構造の実現
    18 Nov. 2024
  • ミストCVD成長した岩塩構造MgZnO混晶薄膜のバンド端付近の光学スペクトル
    18 Nov. 2024
  • MgNiO薄膜のRFマグネトロトンスパッタ成長とアニール処理によるPt/MgNiO界面の接触抵抗低減の検討
    18 Nov. 2024
  • Red-emission nanocolumn LEDs with semi-polar {10-11} InGaN/InGaN MQW grown on underlying bulk InGaN buffer
    R. Shindo; H. Akagawa; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; K. Kishino
    International Workshop on Nitride Semiconductors (IWN 2024), 05 Nov. 2024
  • モノリシック集積m-LED におけるNi マスクを用いた高アスペクト比エッチングの検討
    05 Nov. 2024
  • エチレンジアミンを用いたMist CVD 法によるCu3N 成長と銅粉末濃度の影響
    05 Nov. 2024
  • 新たな深紫外・真空紫外光源開発に向けた岩塩構造MgZnO/MgO 多重量子井戸の製作
    05 Nov. 2024
  • RF-MBE Growth of GaInN Film and Nanocolumn Array on GaN
    Y. Yamaguchi; T. Sasaki; H. Akagawa; J. Takeuchi; R. Shindo; T. Onuma; T. Honda; R. Togashi; Y. Nanishi; K. Kishino
    2024 International Symposium on Novel and Sustainable Technology (ISNST2024), 17 Oct. 2024, [Invited]
  • Dependence of Hydrochloric Acid Concentration Adding to Source Solution in Mist CVD Growth of In2O3 Films on Amorphous SiO2
    R. Ishikawa; T. Yamamoto; Y. Hayashi; S. Aikawa; T. Onuma; T. Honda; T. Yamaguchi
    43rd Electronic Materials Symposium, 03 Oct. 2024
  • Impact of Condition for Alternating-Precursor Supply in Mist CVD Growths of RS-MgZnO/MgO Heterostructures and Superlattices
    K. Ogawa; H. Aichi; T. Mitomi; K. Tanaka; T. Yamaguchi; T. Honda; T. Onuma
    43rd Electronic Materials Symposium, 03 Oct. 2024
  • Characterization of in-gap emission in carbon and oxygen ion implanted GaN films by photothermal deflection spectroscopy
    T. Saito; Y. Arai; I. Sakaguchi; T. Onuma; T. Honda; M. Sumiya
    43rd Electronic Materials Symposium, 03 Oct. 2024
  • Growth of GaInN thin film by MOVPE in He ambient
    Y. Arai; T. Saito; T. Onuma; T. Honda; M. Sumiya
    43rd Electronic Materials Symposium, 02 Oct. 2024
  • Mist CVD Growth of α-Ga2O3 Films Using Ga(C5H7O2)3-Containing Source Solution with Different Incubation Times
    K. Yamada; T. Yamamoto; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    43rd Electronic Materials Symposium, 02 Oct. 2024
  • Distinct Satellite Observation in X-ray Diffraction Patterns for Rocksalt-Structured MgZnO/MgO Quantum Wells Grown by Mist CVD Method
    H. Aichi; K. Ogawa; T. Mitomi; K. Tanaka; T. Yamaguchi; T. Honda; T. Onuma
    43rd Electronic Materials Symposium, 02 Oct. 2024
  • 岩塩構造MgZnO混晶のバンド端付近における光学特性
    20 Sep. 2024
  • α-Al2O3上及びアモルファスSiO2上へのMist CVD法In2O3成膜における原料溶液添加塩酸濃度依存性
    19 Sep. 2024
  • Mist CVD法におけるα-Ga2O3成長用Ga(C5H7O2)3水溶液の静置時間変化
    19 Sep. 2024
  • Mist CVD法β-Ga2O3成膜における不純物取り込みの検討
    19 Sep. 2024
  • ミストCVD法による岩塩構造MgZnO/MgO量子井戸の井戸層組成依存性
    18 Sep. 2024
  • ミストCVD法による岩塩構造MgZnO/MgOダブルヘテロ及び超格子構造の製作検討
    18 Sep. 2024
  • ナノコラム結晶成長におけるGaInN/GaInN MQWへのAlN 中間層の挿入効果
    18 Sep. 2024
  • 光熱偏向分光法によるGaN/GaInN量子井戸構造の評価
    18 Sep. 2024
  • MOVPEによるGaInN混晶薄膜成長におけるHeキャリアガスの効果
    18 Sep. 2024
  • (10-11)ファセットを有するGaInN系ナノコラム上MQWの検討
    17 Sep. 2024
  • Mist CVD法を用いた(001)SrTiO3基板上Cu3N成長
    17 Sep. 2024
  • Stability of Copper Complex in Ammonia Aqueous Solution Adding Ethylenediamine for Growth by Mist CVD
    C. Tsukioka; S. Yoshida; N. Sugita; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    29th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 29), 06 Sep. 2024
  • Effect of incubation time on Ga(C5H7O2)3-containing source solutions for growth of alfa-Ga2O3 by Mist CVD
    K. Yamada; T. Yamamoto; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    29th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 29), 06 Sep. 2024
  • Correlation Between Growth Conditions in Mist CVD Growth of Copper Nitride and Copper Oxides
    N. Sugita; H. Nagai; T. Onuma; T. Honda; M. Sato; T. Yamaguchi
    29th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 29), 06 Sep. 2024
  • 真空紫外分光による岩塩構造MgZnOの吸収端と励起子遷移の測定
    31 Aug. 2024
  • Mist CVD法サファイア基板上α-Ga2O3, β-Ga2O3薄膜の電気的特性基礎検討
    31 Aug. 2024
  • 集積化マイクロ LEDの光アイソレーション評価
    31 Aug. 2024
  • 集積化マイクロ LEDのモノリシック製作検討
    31 Aug. 2024
  • Mist CVD法を用いたMgO(100)基板上への岩塩構造MgZnO/MgO多重量子井戸構造の結晶成長
    30 Aug. 2024
  • その場XRD-RSM測定を用いたScAlMgO4基板上GaInN成長の可能性探索
    30 Aug. 2024
  • 光熱偏向分光法による炭素、酸素イオン注入GaN薄膜における輻射・非輻射再結合の評価
    30 Aug. 2024
  • GaInN系ナノコラムを用いた赤色 LEDの製作
    30 Aug. 2024
  • Na2O-Y2O3-ZrO2-Sm2O3-P2O5-SiO2系結晶化ガラスの合成と発光特性の評価
    29 Aug. 2024
  • Impacts of growth temperature on electrical properties of Mg-doped AlGaN films grown by RF-MBE under nitrogen-rich conditions
    K. Shida; R. Nakamura; K. Mizumura; M. Hayasaki; Y. Itoh; T. Yamaguchi; T. Honda; T. Onuma
    Compound Semiconductor Week 2024 (CSW 2024), 05 Jun. 2024
  • Relation between Absorption Edge and Exciton Transition in Rocksalt-structured MgZnO Films
    R. Nemoto; K. Ogawa; H. Kusaka; T. Mitomi; Y. Ota; T. Yamaguchi; T. Honda; T. Onuma
    Compound Semiconductor Week 2024 (CSW 2024), 05 Jun. 2024
  • Development of Rocksalt-structured-MgZnO-based UV-C Lamp Emitting in 190-220 nm Spectral Range
    K. Ogawa; H. Yajima; G. Kobayashi; W. Kosaka; H. Kusaka; T. Mitomi; T. Yamaguchi; T. Honda; K. Kaneko; S. Fujita; I. Serizawa; T. Onuma
    Compound Semiconductor Week 2024 (CSW 2024), 04 Jun. 2024
  • Impact of ZnO alloying on electrical and optical properties of MgNiZnO alloy films prepared by RF magnetron sputtering
    T. Onuma; A. Ishikawa; M. Murayama; T. Akiba; T. Yamaguchi; K. Sasaki; A. Kuramata; T. Honda
    The 5th International Workshop on Gallium Oxide and Related Materials (IWGO5), 28 May 2024
  • Optical Isolation in Integrated Micro-LEDs
    Julian Keller; Haruto Fujii; Yamato Yamazaki; Takeyoshi Onuma; Tomohiro Yamaguchi; Tohru Honda
    International Conference on Light-Emitting Devices and Their Industrial Applications ’24 (LEDIA ’24), 24 Apr. 2024
  • Demonstration of high aspect ratio etching by Ni mask process for m-LED monolithic integration
    Haruto Fujii; Takeyoshi Onuma; Tomohiro Yamaguchi; Tohru Honda
    International Conference on Light-Emitting Devices and Their Industrial Applications ’24 (LEDIA ’24), 24 Apr. 2024
  • (ScxGa1−x)2O3薄膜の偏光反射分光とバンド端構造の異方性
    25 Mar. 2024
  • 酸化マグネシウム(MgO)結晶多形のバンドアライメント
    23 Mar. 2024
  • 190-220 nmで蛍光するKr2エキシマ励起岩塩構造MgZnOランプの開発
    23 Mar. 2024
  • 無添加岩塩構造MgxZn1-xO薄膜の正孔捕獲中心
    23 Mar. 2024
  • 岩塩構造MgxZn1-xO薄膜における吸収端と励起子遷移の関係
    23 Mar. 2024
  • 遷移金属イオンの添加がNa2O-Y2O3-Sm2O3-P2O5-SiO2系結晶化ガラスの発光特性に与える影響
    16 Mar. 2024
  • 可視光LEDの開発の歴史と発光メカニズム・深紫外から真空紫外LEDへの展開
    19 Feb. 2024, [Invited]
  • 光無線給電可変焦点レンズ応用の基礎検討
    19 Jan. 2024
  • 酸化ガリウムとその関連材料の物性に関する基礎研究
    19 Jan. 2024
  • Growth of ZnO thin films via sputtering of pressed targets in sub-atmospheric conditions
    R. G. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. Vasquez Jr
    5th International Symposium of the Vacuum Society of the Philippines (ISVSP 2024), 18 Jan. 2024
  • Impact of Unintentional Boron Supply on Sapphire Nitridation Process for GaN Growth by Rf-MBE
    T. Honda; K. Yajima; T. Yayama; T. Onuma; T. Yamaguchi
    49th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-49), 18 Jan. 2024
  • In Situ Observation Using Synchrotron XRD-RSM in RF-MBE Growth of GaInN/GaN inserting LT-GaInN Buffer Layer
    T. Yamaguchi; T. Sasaki; J. Takeuchi; T. Onuma; T. Honda; Y. Nanishi
    5th International Symposium of the Vacuum Society of the Philippines (ISVSP 2024), 18 Jan. 2024, [Invited]
  • MgNiO薄膜の抵抗率及び金属電極との接触抵抗に熱アニール処理が及ぼす影響
    16 Dec. 2023
  • ミストCVD成長した岩塩構造MgZnO薄膜における180 nm帯室温発光の実現
    16 Dec. 2023
  • CTLM測定によるMgNiO薄膜と金属電極の接触抵抗に熱アニールが及ぼす影響の検討
    09 Dec. 2023
  • Al、Ga、In添加MgO薄膜における欠陥形成が発光特性に与える影響
    09 Dec. 2023
  • 炭素フリー原料を用いたMist CVD成長Ga2O3の成長温度依存性
    09 Dec. 2023
  • Mist CVD法によるアモルファスSiO2/Si基板上へのIn2O3成長
    09 Dec. 2023
  • Mist CVD法α-Ga2O3成長における成長機構の検討
    09 Dec. 2023
  • Mist CVD法によるSrTiO3基板上Cu3N成長の成長温度依存性
    09 Dec. 2023
  • Mist CVD法を用いたCu3N成長におけるエチレンジアミン添加の効果
    06 Dec. 2023
  • Mist CVD法によるβ-Ga2O3の高速成長への試み
    06 Dec. 2023
  • HCl援用Mist CVD法α-In2O3成長における成長機構に関する検討
    05 Dec. 2023
  • Growth of Cu3N Films by Mist CVD with Ethylenediamine
    S. Yoshida; K. Omura; H. Nagai; T. Onuma; T. Yamaguchi; T. Honda
    Summit of Materials Science 2023 and GIMRT User Meeting 2023, 21 Nov. 2023
  • Fabrication on GaInN nanocolumns LEDs on the underlying bulk GaInN
    H. Akagawa; R. Shindo; J. Yamada; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; K. Kishino
    14th International Conference On Nitride Semiconductors (ICNS-14), 14 Nov. 2023
  • Study on the in gap emissions form C, O ion implanted GaN films by photothermal deflection sp ectroscopy and photoluminescence
    M. Sumiya; T. Saito; Y. Arai; I. Sakaguchi; T. Onuma; T. Honda
    14th International Conference On Nitride Semiconductors (ICNS-14), 14 Nov. 2023
  • Impact of In irradiation on RF MBE growths of high Al content AlGaN films on AlN templates
    R. Nakamura; M. Hayasaki; Tomoya Yamaguchi; Tomohiro Yamaguchi; T. Honda; T. Onuma
    14th International Conference On Nitride Semiconductors (ICNS-14), 14 Nov. 2023
  • Growth temperature dependence of lattice relaxation process in RF MBE growth of GaInN with insertion of GaInN buffer layer on GaN
    J. Takeuchi; T. Sasaki; G. Okuma; T. Onuma; T. Honda; T. Yamaguchi; Y. Nanishi
    14th International Conference On Nitride Semiconductors (ICNS-14), 14 Nov. 2023
  • エチレンジアミンを加えたMist CVD 法によるCu3N薄膜の成長温度変化
    04 Nov. 2023
  • Structural, electrical and optical properties of alfa-In2O3 grown by mist chemical vapor deposition on (0001) alfa-Al2O3 substrate
    T. Yamaguchi; A. Taguchi; K. Shima; T. Nagata; T. Yamamoto; Y. Hayakawa; M. Matsuda; T. Konno; T. Onuma; S. F. Chichibu; H. Honda
    The 7th International Conference on Advanced Electromaterials (ICAE 2023), 02 Nov. 2023
  • Phase Control of Copper Oxides by Changing Temperatures and Gas Types in Growth of Mist CVD
    N. Sugita; S. Yoshida; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 22th International Symposium on Advanced Technology (ISAT-22), 20 Oct. 2023
  • Fabrication of top-down and bottom-up MOSFET using α-In2O3 films grown by Mist CVD
    Y. Hayashi; A. Taguchi; S. Yamadera; T. Yamamoto; S. Aikawa; T. Onuma; H. Honda; T. Yamaguchi
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Formation of ITO electrodes on InGaN-based p-n junction ordered nanocolumn arrays with different column periods
    R. Shindo; H. Akagawa; T. Yamaguchi; R. Togashi; I. Nomura; T. Onuma; T. Honda; K. Kishino
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Comparison of α-particle Detection Property of α-Ga2O3 and α-GIO Alloys Grown by Mist CVD
    Ka. Yamada; Ko. Yamada; Ri. Yamada; T. Yamamoto; T. Sakurai; R. Kudo; T. Onuma; T. Yamaguchi; T. Aoki; T. Nakano; T. Honda
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Realization of Cathodoluminescence in 190 nm Wavelength Range in Rocksalt-Structured MgZnO Films Grown by Mist Chemical Vapor Deposition
    K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; T. Yamaguchi; T. Honda; K. Kaneko; S. Fujita; T. Onuma
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Study on high-speed growth of β-Ga2O3 by Mist CVD method
    M. Sugitani; T. Yamaguchi; K. Sasaki; A. Kuramata; T. Honda; T. Onuma
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Sn-doped α-Ga2O3 Films Grown Using Sn Source Solutions with Different Aging Times and Their Electrical Properties
    Ko. Yamada; T. Yamamoto; R. Yamada; Ka. Yamada; H. Nagai; S. Aikawa; T. Onuma; T. Honda; T. Yamaguchi
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • HCl-assisted Mist CVD Growth and Electrical Properties of α-In2O3 Films Using Various In-based Materials
    T. Yamamoto; A. Taguchi; R. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Optical transitions in rocksalt-structured MgZnO based metal-semiconductor-metal-type VUV sensor
    H. Kusaka; K. Ogawa; T. Mitomi; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Relation between composition ratio and electrical properties in MgNiZnO films prepared by RF magnetron sputtering
    A. Ishikawa; M. Murayama; T. Akiba; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 22th International Symposium on Advanced Technology (ISAT-22), 19 Oct. 2023
  • Impact of Thermal Annealing on Contact Resistance in MgxNi1-xO Films Studied by CTLM Measurements
    T. Akiba; A. Ishikawa; M. Murayama; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    42th Electronic Materials Symposium, 13 Oct. 2023
  • Impact of Aging Variation of Source Precursor Solution in Mist CVD Growth of alpha-In2O3
    T. Yamamoto; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    42th Electronic Materials Symposium, 13 Oct. 2023
  • Impact of Aging Variation of Sn Solution in Mist CVD Growth of Sn-doped alpha-Ga2O3 Thin Film
    Ko. Yamada; T. Yamamoto; R. Yamada; Ka. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    42th Electronic Materials Symposium, 12 Oct. 2023
  • Study on the radiative and non-radiative recombination form C, O ion-implanted GaN films by photothermal deflection spectroscopy
    T. Saito; Y. Arai; M. Sumiya; I. Sakaguchi; T. Onuma; T. Honda
    42th Electronic Materials Symposium, 11 Oct. 2023
  • alpha-GIO Alloy Growth by Mist CVD and its Application for Gamma-ray Detector
    Ka. Yamada; Ko. Yamada; R. Yamada; T. Yamamoto; T. Sakurai; T. Onuma; T. Yamaguchi; T. Aoki; T. Nakano; T. Honda
    42th Electronic Materials Symposium, 11 Oct. 2023
  • ナノコラムLEDにおける連続的なITO電極形成技術
    22 Sep. 2023
  • (10-11)上GaInN/GaInN MQWs成長による高効率赤色発光
    21 Sep. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長-GaInNの成長温度依存性-
    21 Sep. 2023
  • 各種In系材料を出発原料に用いたMist CVD成長におけるα-In2O3薄膜の電気的特性に関する評価
    21 Sep. 2023
  • 高Mg組成岩塩構造MgZnO薄膜のミストCVD成長
    21 Sep. 2023
  • Mist CVD法によるα-GIO混晶成長とα線検出応用に向けた検討
    21 Sep. 2023
  • Mist CVD法Sn-doped α-Ga2O3薄膜成長におけるSn溶液の静置時間変化
    21 Sep. 2023
  • III族不純物ドープMgO薄膜の正孔捕獲中心
    20 Sep. 2023
  • 光熱偏向分光法によるC, Oイオン注入したGaNの評価
    22 Sep. 2023
  • エチレンジアミンを加えたMist CVD法によるCu3N薄膜成長
    20 Sep. 2023
  • 各種In系材料を出発原料に用いたMist CVD成長におけるα-In2O3薄膜の電気的特性に関する評価
    20 Sep. 2023
  • Growth of ⍺-(AlxGa1-x)2O3 by Suboxide Molecular-Beam Epitaxy
    J. Steele; K. Azizie; N. Pieczulewski; J. McCandless; I. M. Kankanamge; M. D. Williams; H. Xing; D. Jena; D. Muller; T. Onuma; D. Schlom
    The 37th North American Conference on Molecular Beam Epitaxy (NAMBE 2023), 18 Sep. 2023
  • Impact of Post-growth Slow-cooling Process on the Growth of Rocksalt-structured MgZnO Films by Mist CVD
    K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; T. Yamaguchi; T. Honda; K. Kaneko; S. Fujita; T. Onuma
    International Conference on Solid State Devices and Materials (SSDM2023), 07 Sep. 2023
  • micro-LEDの電流拡散層形成に向けたITO薄膜のドライエッチングの検討
    24 Aug. 2023
  • 光無線給電における可変焦点レンズ利用の可能性
    24 Aug. 2023
  • Mist CVD法α-GTO薄膜におけるSn溶液静置時間変化の影響
    24 Aug. 2023
  • RF-MBE法によりAlN基板上に成長した高Al組成AlGaN薄膜に及ぼすIn照射の効果
    24 Aug. 2023
  • GaまたはInドナー不純物添加によるMgO薄膜の発光特性への影響
    24 Aug. 2023
  • ツインソースミストCVD法によるα-GIO混晶成長
    24 Aug. 2023
  • ナノコラムLEDにおける電極形成技術
    24 Aug. 2023
  • ミストCVD法による岩塩構造MgZnO薄膜の結晶成長と室温真空紫外線発光の観測
    23 Aug. 2023
  • Mist CVD法酸化銅成長におけるガス種と成長温度が与える影響
    23 Aug. 2023
  • モノリシック集積-LEDにおける下部電極の電気的分離
    23 Aug. 2023
  • RFマグネトロンスパッタ法により成膜したNiZnOの電気的特性評価
    23 Aug. 2023
  • RF-MBE成長赤色発光MQWにおける下地層構造変更の効果
    23 Aug. 2023
  • In2O3薄膜を用いたMOSFET製作検討
    22 Aug. 2023
  • RFマグネトロンスパッタ法により成膜したp型MgxNi1-xOと金属電極のCTLM法による接触抵抗評価
    22 Aug. 2023
  • MistCVD法α-In2O3成長における原料溶液中のIn原料の状態に関する検討
    22 Aug. 2023
  • Mist CVD法を用いたCu3N薄膜の光吸収係数の膜厚依存性
    22 Aug. 2023
  • 岩塩構造MgZnO薄膜を用いたMSM型光センサーの受光感度特性
    22 Aug. 2023
  • MistCVD法によるβ-Ga2O3成長の検討
    22 Aug. 2023
  • GaNのギャップ内準位における発光、非発光遷移に関する基礎検討
    22 Aug. 2023
  • Growth of ⍺-(AlxGa1-x)2O3 by Suboxide Molecular-Beam Epitaxy
    J. Steele; K. Azizie; N. Pieczulewski; J. McCandless; D. A. Muller; H. G. Xing; D. Jena; T. Onuma; D. G. Schlom
    The 6th U.S. Workshop on Gallium Oxide (GOX 2023), 16 Aug. 2023
  • Growth of AZO thin films from pressed-sintered powder targets under subatmospheric conditions
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr.
    The 20th International Conference on Crystal Growth and Epitaxy (ICCGE-20), 03 Aug. 2023
  • Growth of GaInN/GaInN MQWs on nanocolumns with thick GaInN buffer layer using RF-MBE
    H. Akagawa; J. Yamada; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; and K. Kishino
    The 20th International Conference on Crystal Growth and Epitaxy (ICCGE-20), 31 Jul. 2023
  • Epitaxial Growth of a-(AlxGa1-x)2O3 by Suboxide Molecular-Beam Epitaxy at 1 μm/h
    J. Steele; K. Azizie; J. McCandless; H. G. Xing; D. Jena; T. Onuma; and D. G. Schlom
    65th Electronic Materials Conference (EMC-65), 29 Jun. 2023
  • Far UV optical properties of MgO homoepitaxial and Zn doped MgO films prepared by mist chemical vapor deposition method
    T. Onuma; W. Kosaka; H. Kusaka; K. Ogawa; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    The 6th International Workshop on Ultraviolet Materials and Devices (IWUMD6), 06 Jun. 2023, [Invited]
  • Sub-bandgap transition in β-Ga2O3 crystals measured by photoluminescence excitation spectroscopy
    T. Onuma; R. Adachi; K. Shoji; T. Yamaguchi; K. Sasaki; A. Kuramata; T. Honda; and M. Higashiwaki
    Compound Semiconductor Week 2023 (CSW 2023), 01 Jun. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
    17 Mar. 2023
  • N2 および Ar/H2 アニールによる SnOx 薄膜の還元状態の比較
    17 Mar. 2023
  • 超ワイドバンドギャップ酸化物混晶のバリガ性能指数の評価
    16 Mar. 2023
  • Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
    16 Mar. 2023
  • Mist CVD法による各種In系粉末を出発原料に用いたα-In2O3の成長機構に関する検討
    16 Mar. 2023
  • ミストCVD法によるIII族ドープ岩塩構造MgZnO薄膜成長
    15 Mar. 2023
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル(II)
    15 Mar. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長における格子緩和過程観察
    15 Mar. 2023
  • 窒素RFパワー変化によるナノコラム結晶のGaInNバッファ層形状均一化の検討
    15 Mar. 2023
  • Sub-200 nm far-UV emission characteristics in rocksalt-structured MgZnO epitaxial films
    T. Onuma; W. Kosaka; H. Kusaka; K. Ogawa; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; and T. Honda
    15th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2023), 07 Mar. 2023, [Invited]
  • Mist CVD成長a-Ga2O3薄膜の放射線検出応用に向けた基礎検討
    03 Mar. 2023
  • 酸化ガリウムとその関連材料の物性に関する基礎研究 ~熱処理が発光特性に与える影響の調査~
    21 Feb. 2023
  • Control of Mesa Shape by ICP-RIE Condition to Fabricate Monolithically Integrated Micro-LEDs
    Y. Yamazaki; T. Onuma; T. Yamaguchi; and T. Honda
    International Display Workshops ‘22 (IDW ’22), 16 Dec. 2022
  • Structural analysis in epitaxial growth of GaInN by RF-MBE using XRD-RSM
    J. Takeuchi; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth and characterization of AlGaN and multiple quantum wells with varying III/V ratios by RF-MBE
    M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Electrical property and valence band offset in conductive MgNiO on sapphire substrates
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • TEM evaluation of in-situ nitrogen plasma irradiated GaInN
    A. Tokushige; S. Ohno; Y. Hayakawa; T. Honda; T. Onuma; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Realization of high mobility in α-In2O3 film grown by mist CVD with different concentration of In2O3 powder as source precursor
    A. Taguchi; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Roles of In doping in rocksalt-structured MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Investigation on the stability of source solution for the α-In2O3 growth by mist CVD
    T. Yamamoto; A. Taguchi; R. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Study for composition control in mist CVD growth of α-GIO alloys
    K. Yamada; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth of ZnO thin films via magnetron sputtering using a custom-made sintered target
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Crystal growth of Cu3N by mist CVD with ethylenediamine
    S. Yoshida; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Deposition Of Nitrogen-Doped Titanium Dioxide Thin Films Via Rf Magnetron Sputtering
    M. M. Martinez; T. Onuma; H. Nagai; T. Honda; S. Aikawa; T. Yamaguchi; and M. R. Vasquez Jr
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Twin-free α-Ga2O3 films grown by mist CVD on (0001) α-Al2O3 substrates
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 24 Nov. 2022
  • Toward application of radiation detection in mist CVD growth of a-Ga2O3
    R. Yamada; H. Nakagawa; T. Yamamoto; R. Hashimoto; T. Onuma; T. Honda; T. Aoki; T. Nakano; and T. Yamaguchi
    The 7th International Symposium on Biomedical Engineering (ISBE2022), 25 Nov. 2022
  • GaInN 系ナノコラム結晶におけるGaInN バッファ層上GaInN/GaInN MQWs 成長
    24 Nov. 2022
  • Mist CVD法により成長したα-In2O3薄膜における高移動度の実現
    18 Nov. 2022
  • RFマグネトロンスパッタ法によるサファイア基板上に成膜したp形MgNiOの電気的特性及び価電子帯バンドオフセットの評価
    18 Nov. 2022
  • MgO薄膜へのInドーピングが発光特性に与える影響
    18 Nov. 2022
  • テーパーメサ構造μ-LEDの製作とアレイ構造への応用
    18 Nov. 2022
  • Fabrication of monolithic blue micro-LED pixels and formation of line electrodes on oblique surface of micro-LED pixels
    H. Chikui; S. Takeda; T Onuma; T. Yamaguchi; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 17 Nov. 2022
  • Photocurrent spectra of rocksalt-structured MgZnO films in vacuum UV spectral range
    H. Kusaka; W. Kosaka; K. Ogawa; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Roles of In doped in MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Local composition distribution in high Al content AlGaN/AlN quantum wells grown by RF-MBE
    M. Hayasaki; Tomoya Yamaguchi; M. Hashimoto; Tomohiro Yamaguchi; T. Honda; and T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Impact of change in V/III supply ratio on crystallinity and optical property in RF-MBE growth of High-Al Content AlGaN Under Metal-rich Conditions
    M. Hayasaki; N. Tachibana; M. Hashimoto; Tomoya Yamaguchi; Tomohiro Yamaguchi; T. Honda; and T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Impact of gas type on formation of twin structure in the growth of a-Ga2O3 by mist chemical vapor deposition
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Realization of near-band-edge cathodoluminescence in 190 nm wavelength range by rocksalt-structured MgZnO epitaxial films
    T. Onuma; K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Mist CVD 法 α-In2O3 成長における原料溶液中の反応に関する検討
    12 Nov. 2022
  • RF-MBE 成長した Ga 極性及び N 極性 GaN 薄膜の比較検討
    12 Nov. 2022
  • in-situ 窒素プラズマ照射された MBE 成長 GaInN の TEM 評価
    12 Nov. 2022
  • 顕微フォトルミネッセンス分光による β-Ga2O3 結晶の微細構造の可視化検討
    12 Nov. 2022
  • Mist CVD 法を用いた Cu3N 成長における原料溶液の検討
    12 Nov. 2022
  • RF-MBE による β-Ga2O3(-201)基板上への AlN 及び GaN 成長において成長前処理が成長層に及ぼす影響
    12 Nov. 2022
  • 岩塩構造 MgZnO/MgO ヘテロ接合の製作とバンドアライメント解析
    12 Nov. 2022
  • RF-MBE による GaInN 成長における歪み緩和制御
    12 Nov. 2022
  • Mist CVD 法 α-Ga2O3成長時に形成される双晶抑制に関する研究
    12 Nov. 2022
  • Mist CVD 法により成長した酸化インジウムの高移動度化に伴う新機能開拓
    12 Nov. 2022
  • Impact of RF power on electrical property of NiO films grown by RF magnetron spattering
    Akito Ishikawa; M. Murayama; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • Microstructural characterization of β-Ga2O3,crystals by photoluminescence mapping measurements
    K. Shoji; M. Nakanishi; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • Growth of α-In2O3 films with different concentrations of In2O3 powder used as source precursor by mist CVD
    A. Taguchi; K. Kaneko; K. Goto; T. Onuma; T. Honda; Y. Kumagai; S. Fujita; T. Yamaguchi
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • P-type conductivity in MgxNi1-xO films deposited on sapphire substrates by RF magnetron sputtering
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • RF-MBE growth of Mg doped GaN on β-Ga2O3,(-201) substrates
    T. Yamaguchi; M. Hayasaki; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • Strain engineering of β-Ga2O3: Pulsed-laser deposition on (100) θ-Al2O3 templates and,impacts of compressive strain on physical properties
    K. Koreishi; T. Soma; M. Kado; T. Onuma; and A. Ohtomo
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO4), 24 Oct. 2022
  • Schottky barrier height for Ga2O3 polymorphs: A simple estimation
    Y. Ota; K. Kaneko; T. Onuma; and S. Fujita
    41st Electronic Materials Symposium, 20 Oct. 2022
  • Analyses of Band Alignment in Rocksalt-structured MgZnO/MgO Interface Grown by Mist CVD
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Temperature dependence of carrier concentration and Hall mobility in alpha-In2O3 films grown by mist CVD method
    A. Taguchi; T. Onuma; K. Goto; K. Kaneko; Y. Kumagai; T. Honda; S. Fujita; T. Yamaguchi
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Importance of dissolving source precursor of Ga(C5H7O2)3 with HCl in mist CVD for α-Ga2O3 growth
    R. Yamada; A. Sekiguchi; T. Onuma; T. Honda; T. Yamaguchi
    2022 International Conference on Solid State Devices and Materials (SSDM202), 27 Sep. 2022
  • InドープMgO薄膜の発光特性
    23 Sep. 2022
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル
    23 Sep. 2022
  • ミストCVD法によるInドープMgZnO薄膜の成長
    23 Sep. 2022
  • ミスト化学気相成長法コランダム構造酸化ガリウム薄膜のガス種による双晶形成への影響
    23 Sep. 2022
  • RF-MBEによるInN緩衝層を用いたGaInNの格子緩和制御
    22 Sep. 2022
  • その場XRD-RSM を用いたRF-MBE GaInNヘテロエピタキシャル成長における緩和過程観察
    22 Sep. 2022
  • Mist CVD法により成長したα-In2O3薄膜のキャリア濃度とホール移動度の温度依存性
    21 Sep. 2022
  • Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOx­­­の特性評価
    21 Sep. 2022
  • 窒素アニール還元反応によるSnOx薄膜の局所結合状態
    21 Sep. 2022
  • 岩塩型MgZnO混晶のドーピング傾向の予測
    21 Sep. 2022
  • Mist CVD法を用いたCu3N成長における安定した原料供給の検討
    21 Sep. 2022
  • Mist CVD 法における原料溶液中の反応がα-In2O3成長に与える影響
    20 Sep. 2022
  • Mist CVD法による(Ga1-xInx)2O3混晶成長の組成制御に向けた検討
    20 Sep. 2022
  • 赤色ナノコラム成長におけるGaInNバッファ層のⅤ/Ⅲ族比依存性
    20 Sep. 2022
  • RF-MBE成長赤色発光MQWにおけるGaInN下地層挿入の効果
    20 Sep. 2022
  • RF-MBEによる低転位密度GaInNへ向けた多層膜緩衝層の製作
    23 Aug. 2022
  • Mist CVD法によるα-In2O3薄膜成長において出発原料種がキャリア濃度とホール移動度に与える影響
    23 Aug. 2022
  • ZnドープMgO薄膜におけるVUV発光の観測
    23 Aug. 2022
  • Mist CVD法による高塩酸濃度領域におけるGIO混晶成長と構造評価
    23 Aug. 2022
  • その場 XRD-RSM測定によるGaInNヘテロエピタキシャル成長
    23 Aug. 2022
  • RFマグネトロンスパッタによるサファイア基板上p形MgNiOの成膜と電気的特性の評価
    23 Aug. 2022
  • 岩塩構造MgZnO/MgOヘテロ接合界面におけるバンドアライメント評価
    23 Aug. 2022
  • Mist CVD法α-Ga2O3成長における出発原料の溶解法に関する研究
    23 Aug. 2022
  • 顕微フォトルミネッセンス分光によるβ-Ga2O3結晶の微細構造評価
    23 Aug. 2022
  • Mist CVD 法を用いたCu3N成長における原料濃度依存性
    23 Aug. 2022
  • in-situ 窒素プラズマ照射GaInN表面上MBE再成長GaInNのTEM評価
    23 Aug. 2022
  • β-Ga2O3(-201)基板へのAlNとGaNのRF-MBE成長
    23 Aug. 2022
  • マイクロLED集積化におけるメサ側面の制御
    23 Aug. 2022
  • ナノコラム成長におけるGaInNバッファ層のRFパワー依存性
    23 Aug. 2022
  • 高Al組成AlGaN薄膜とAlGaN/AlN量子井戸のRF-MBE成長と光学特性評価
    23 Aug. 2022
  • Mist CVD法における原料溶液の加熱がα-In2O3成長に与える影響
    23 Aug. 2022
  • RFマグネトロンスパッタ法により成長したNiO薄膜の電気的特性にRF出力が与える影響
    23 Aug. 2022
  • Mist CVD法によるIn2O3成長において成長温度が相制御に与える影響
    23 Aug. 2022
  • 岩塩構造酸化マグネシウム亜鉛薄膜のVUV領域での光電流スペクトル測定
    23 Aug. 2022
  • Vacuum UV Emission Property of Zn-doped MgO films Grown by Mist Chemical Vapor Deposition Method
    W. Kosaka; K. Ogawa; K. Kusaka; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    Compound Semiconductor Week 2022 (CSW 2022), 03 Jun. 2022
  • 岩塩構造MgZnOの結晶成長とサブ200 nmの発光特性評価
    03 Jun. 2022, [Invited]
  • Analyses of Band Alignment in Rocksalt-structured MgZnO/MgO Interface
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; and T. Onuma
    The 5th International Workshop on Ultraviolet Materials and Devices (IWUMD5), 26 May 2022
  • Potentials of Future Ultra-Wide Bandgap Oxide Semiconductors
    S. Fujita; K. Kaneko; and T. Onuma
    The 5th International Workshop on Ultraviolet Materials and Devices (IWUMD5), 25 May 2022, [Invited]
  • Electrical Property and Band-offset in MgxNi1-xO Films Deposited on Sapphire Substrates by RF Magnetron Sputtering
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    International Conference on Light-Emitting Devices and Their Industrial Applications ’22 (LEDIA ’22), 21 Apr. 2022
  • Vacuum UV Emission Property of Zn-doped MgO films
    W. Kosaka; K. Ogawa; H. Kusaka; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda; and T. Onuma
    International Conference on Light-Emitting Devices and Their Industrial Applications ’22 (LEDIA ’22), 21 Apr. 2022
  • 岩塩構造MgZnO/MgO界面におけるバンドアライメント解析
    26 Mar. 2022
  • ミストCVD成長した岩塩構造MgZnO薄膜の室温真空紫外線発光
    26 Mar. 2022
  • 時間分解PL測定による岩塩構造MgZnOの発光特性の評価
    26 Mar. 2022
  • β-Ga2O3(-201)基板へのAlNとGaNのRF-MBE成長
    25 Mar. 2022
  • TEMによるMist CVD法α-Al2O3基板上α-In2O3の結晶構造解析
    25 Mar. 2022
  • 出発原料にIn2O3パウダーおよびIn(acac)3を用いたMist CVD法によるα-In2O3成長と電気的特性評価
    25 Mar. 2022
  • RF-MBEによる多層膜緩衝層を⽤いた低転位密度GaInNの製作
    24 Mar. 2022
  • RF-MBE法による高Al組成AlGaN/AlN量子井戸成長と発光特性の評価
    24 Mar. 2022
  • スピネル構造MgX2O4(X=Al,Ga,In)混晶のバンドエンジニアリング
    23 Mar. 2022
  • Fabrication of far-UV emitter around 200 nm using ultrawide bandgap semiconductors
    T. Onuma; W. Kosaka; M. Hashimoto; M. Hayasaki; T. Yamaguchi; and T. Honda
    The 9th Advanced Functional Materials & Devices & The 4th Symposium for Collaborative Research on Energy Science and Technology (9thAFMD&4thSCREST2022), 05 Mar. 2022, [Invited]
  • Impact of Ga1-xInxN underlayer for growth of Ga1-yInyN/Ga1-xInxN MQW structure
    T. Yamaguchi; K. Tahara; J. Yamada; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; Y. Nanishi; and K. Kishino
    The 9th Advanced Functional Materials & Devices & The 4th Symposium for Collaborative Research on Energy Science and Technology (9thAFMD&4thSCREST2022), 05 Mar. 2022, [Invited]
  • Spatially resolved cathodoluminescence studies on α-In2O3 films grown by mist CVD method
    A. Taguchi; K. Shima; M. Matsuda; T. Onuma; T. Honda; S. F. Chichibu; and T. Yamaguchi
    The 9th Advanced Functional Materials & Devices & The 4th Symposium for Collaborative Research on Energy Science and Technology (9thAFMD&4thSCREST2022), 05 Mar. 2022
  • RF-MBEによる格子緩和制御層上高In組成GaInN MQWの成長と評価
    23 Dec. 2021
  • ミストCVD法におけるGa2O3薄膜成長の塩酸濃度とガス種依存性
    23 Dec. 2021
  • Mist CVD成長α-In2O3薄膜の電気的特性評価
    23 Dec. 2021
  • 真空紫外域で発光する岩塩構造MgZnO薄膜のミストCVD成長
    23 Dec. 2021
  • RFマグネトロンスパッタ中の酸素プラズマの状態が酸化ニッケルの抵抗率に与える影響
    23 Dec. 2021
  • Oxygen vacancy generation in CaF2-doped In2O3 transparent conductive film in terms of bond-dissociation energy
    K. Oe; S. Mori; K. Watanabe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; and S. Aikawa
    Material Research Meeting 2021 (MRM2021), 16 Dec. 2021
  • p-type conversion of n-type SnOx thin-films by post-deposition N2 annealing
    K. Watanabe; T. Kawaguchi; N. Wakabayashi; T. Yamaguchi; T. Onuma; T. Honda; and S. Aikawa
    Material Research Meeting 2021 (MRM2021), 14 Dec. 2021
  • 岩塩構造MgZnOの200nm発光、Far-UVへの展望
    10 Dec. 2021, [Invited]
  • Growth and Optical Characteristics of High-AlN Content AlGaN on AlN Templates by RF-MBE Under Metal-rich Conditions
    M. Hayasaki; N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Yamaguchi; T. Honda; and T. Onuma
    Materials Research Society, 2021 Fall Meeting & Exhibit, 09 Dec. 2021
  • Al flux control in growth of AlN on AlN templates by RF-MBE
    T. Yamaguchi; N. Tachibana; M. Hashimoto; M. Hayasaki; T. Yamaguchi; T. Honda; and T. Onuma
    Materials Research Society, 2021 Fall Meeting & Exhibit, 09 Dec. 2021
  • ミストCVD法により成長したRS-MgZnOにおける深紫外PL寿命の評価
    09 Dec. 2021
  • 岩塩構造酸化マグネシウム亜鉛MSM型真空紫外センサーの受光感度の温度依存性
    03 Dec. 2022
  • micro-LED集積化における側面の制御による電極の形成
    03 Dec. 2022
  • InドープMgZnO薄膜のミストCVD成長
    03 Dec. 2022
  • RF-MBEによるβ-Ga2O3(-201)基板へのMgドープGaNヘテロ構造の製作
    03 Dec. 2022
  • ミストCVD法により成膜したInドープMgO薄膜の発光特性
    03 Dec. 2022
  • RF-MBE法によるAlGaN/AlNヘテロ構造と量子井戸構造の成長と評価
    03 Dec. 2022
  • Mist CVDβ型酸化ガリウム成長に塩酸が与える影響
    03 Dec. 2022
  • Mist CVDを用いたGTO薄膜成長におけるSnドープ量変化の影響
    03 Dec. 2022
  • ミストCVDにおけるGa2O3薄膜の成長特性
    03 Dec. 2021
  • 出発原料に酸化インジウムパウダーを用いたMist CVD法による酸化インジウム薄膜成長
    03 Dec. 2021
  • Mist CVD 法によるα-In2O3成長に及ぼす原料溶液混合経過時間の影響
    03 Dec. 2021
  • 石英ガラス基板上岩塩構造MgZnOにおける殺菌用UVC発光
    03 Dec. 2021
  • 赤色発光LEDの製作に向けたRF-MBEによる緩和制御層上GaInN周期構造の成長と評価
    03 Dec. 2021
  • Fabrication of Line Electrodes on Oblique Surface of Micro-LED Pixels and Impact on Their Characteristics
    H. Chikui; T. Onuma; T. Yamaguchi; and T. Honda
    International Display Workshops ‘21 (IDW ’21), 02 Dec. 2021
  • Carrier gas type dependence of Ga2O3 thin film grown by mist Chemical Vapor Deposition
    R. Yamada; S. Takahashi; A. Sekiguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 20th International Symposium on Advanced Technology (ISAT-20), 24 Nov. 2021
  • Growth of GaInN multi quantum well on strain controlled layer by RF-MBE toward realization of light emitting diodes operating in red spectral region
    M. Matsuda; R. Yoshida; K. Tahara; T. Yamaguchi; T. Onuma; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 24 Nov. 2021
  • Improvement of Electrical Property of α-In2O3 Films Grown by Mist Chemical Vapor Deposition Using In2O3 Powder as Source Precursor
    A. Taguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Residual strain in GaN nanocolumns grown on Si(111)
    N. Goto; Y. Hosoya; T. Onuma; T. Yamaguchi; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Identification of Killer Defects in β-Ga2O3 Schottky Barrier Diodes by Raman Mapping Measurements
    M. Nakanishi; K. Shoji; S. Masuya; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Relationship between resistivity of NiO thin films and oxygen plasma condition at different deposition pressures
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Well width dependence on residual strain in high In composition GaInN/GaInN MQW by RF-MBE
    K. Tahara; J. Yamada; T. Yamaguchi; Y. Nanishi; T. Onuma; T. Honda; and K. Kishino
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Emission Properties of Rocksalt-structured MgZnO Microcrystals for VUV Light Emitter
    W. Kosaka; S. Hoshi; K. Kanta; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Impact on InN Buffer Layer Inserted into GaInN/GaN Interfaces By RF-MBE
    D. Itabashi; R. Yoshida; T. Yamaguchi; T. Onuma; and T. Honda
    The 20th International Symposium on Advanced Technology (ISAT-20), 23 Nov. 2021
  • Impacts of hydrochloric acid concentration and growth temperature on mist chemical vapor deposition growth of Ga2O3
    R. Yamada; S. Takahashi; A. Sekiguchi; T. Onuma; T. Honda; and T. Yamaguchi
    The 6th International Conference on Advanced Electromaterials (ICAE 2021), 11 Nov. 2021
  • Role of Ca in CaF2 incorporated In2O3 transparent conductive films
    K. Oe; S. Mori; K. Watanabe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Demonstration of flexible transparent conductive film using B-doped In2O3
    S. Mori; Y. Ichinoseki; K. Watanabe; K. Murano; K. Oe; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda; and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 29 Oct. 2021
  • Charge transfer and conduction type conversion in n-type SnO2 thin films by nitrogen annealing
    K. Watanabe; T. Kawaguchi; T. Yamaguchi; T. Onuma; T. Honda; and S. Aikawa
    34th International Microprocesses and Nanotechnology Conference (MNC 2021), 26 Oct. 2021
  • Evaluation of radiation detection characteristics by alfa-Ga2O3
    H. Nakagawa; R. Yamada; M. Hashimoto; T. Yamaguchi; T. Onuma; T. Honda; T. Nakano; and T. Aoki
    The 19th International Conference on Global Research and Education inter-Academia 2021, 21 Oct. 2021
  • Valence band modulation in MgO1-xYx (Y = S, Se) alloys
    Y. Ota; K. Kaneko; T. Onuma; and S. Fujita
    40th Electronic Materials Symposium, 11 Oct. 2021
  • Impact of oxygen plasma condition on resistivity of RF magnetron sputtered NiO thin films
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    40th Electronic Materials Symposium, 11 Oct. 2021
  • Evaluation of Microstructures in β-Ga2O3 Crystals Using Raman Mapping
    M. Nakanishi; K. Shoji; S. Masuya; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; and T. Onuma
    40th Electronic Materials Symposium, 11 Oct. 2021
  • 緩和制御層上GaInN周期構造のRF-MBE成長と評価
    23 Sep. 2021
  • 緑色発光を用いたβ-Ga2O3結晶の微細構造評価
    21 Sep. 2021
  • MgSxO1-x混晶のバンドアライメント
    13 Sep. 2021
  • ミスト化学気相成長法における塩酸と成長温度が酸化ガリウム成長に与える影響
    13 Sep. 2021
  • Mist CVD法による酸化インジウムパウダーを用いたα-In2O3成長
    13 Sep. 2021
  • CaF2ドープIn2O3透明導電膜における表面ラフネスおよび導電率のドーパント濃度依存性
    12 Sep. 2021
  • 窒素アニールによるn型SnO2薄膜の電荷移動と伝導型変換
    12 Sep. 2021
  • MgO単結晶の真空紫外励起子スペクトル
    12 Sep. 2021
  • 195 nmで発光する岩塩構造MgZnO薄膜のミストCVD成長
    12 Sep. 2021
  • ZnドープMgO薄膜の発光特性
    12 Sep. 2021
  • BドープIn2O3透明導電膜における微量不純物濃度での移動度向上
    12 Sep. 2021
  • RF-MBE法によるGaInN/GaInN多重量子井戸成長と評価
    10 Sep. 2021
  • CaF2ドープIn2O3透明導電膜におけるCaとFの効果
    03 Sep. 2021
  • 窒素アニールによるn型SnOx薄膜の伝導型変換
    03 Sep. 2021
  • BドープIn2O3透明導電膜におけるドーパント濃度の依存性
    02 Sep. 2021
  • 成長初期にSi層を挿入したGaInN膜のin-situおよびex-situ構造観察
    11 Aug. 2021
  • フォトルミネッセンスマッピングによる酸化ガリウム結晶の構造欠陥評価
    11 Aug. 2021
  • RF-MBEによるInN緩衝層を用いた高In組成GaInN薄膜の格子緩和制御
    11 Aug. 2021
  • MgOとAlNの放射パターンの比較
    11 Aug. 2021
  • 岩塩構造MgZnO微結晶におけるVUV発光の観測
    11 Aug. 2021
  • Mist CVD法による原料溶液中の塩酸濃度がGa2O3成長に与える影響
    11 Aug. 2021
  • 赤色発光をめざしたRF-MBEによる緩和制御層上GaInN周期構造の成長と評価
    11 Aug. 2021
  • RF-MBEによるAlN ホモエピタキシャル成長におけるAlフラックス制御
    11 Aug. 2021
  • NiO薄膜のRFマグネトロンスパッタ成膜における酸素ラジカル発光強度と抵抗率の関係
    11 Aug. 2021
  • 不均一Al組成AlGaNのRF-MBE成長過程の検討
    11 Aug. 2021
  • Mist CVD 成長α-In2O3における出発原料にIn2O3パウダーを用いた影響
    11 Aug. 2021
  • Mist CVD法(0001)α-Al2O3基板上α-In2O3の微細構造解析
    10 Aug. 2021
  • マイクロLEDディスプレイ応用のための透明ポリイミド薄膜の形成
    10 Aug. 2021
  • AlN/AlGaN深紫外線センサーの微細化と薄層化検討
    10 Aug. 2021
  • ラマンマッピング測定による酸化ガリウム結晶の微細構造の可視化
    10 Aug. 2021
  • 高In組成GaInN多重量子井戸構造の成長
    10 Aug. 2021
  • ライン電極を形成したμ-LEDピクセルの製作と評価
    10 Aug. 2021
  • Si基板を用いた自己形成GaNナノコラム構造の製作
    10 Aug. 2021
  • VUV Emission Properties Of Rocksalt-structured MgZnO Microcrystals Prepared On Quartz Glass Substrates
    W. Kosaka; K. Kudo; Y. Igari; T. Yamaguchi; T. Honda; T. Onuma; S. Hoshi; K. Kanako; and S. Fujita
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • Growth Of AlGaN On AlN Template By RF-MBE And Deep UV Sensor Characteristics
    M. Hashimoto; N. Tachibana; M. Nakanishi; T. Yamaguchi; T. Honda; T. Onuma; and J. Cho
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • Mist CVD Growth Of Alpha-In2O3 Films Using Indium Oxide Powder As Source Precursor
    A. Taguchi; S. Takahashi; T. Yamaguchi; T. Onuma; T. Honda; S. Fujita; and K. Kaneko
    Compound Semiconductor Week 2021 (CSW 2021), 11 May 2021
  • In situ XRD RSM measurements in MBE growth of GaInN film with low‐temperature GaInN buffer layer
    T. Yamaguchi; T. Sasaki; T. Kiguchi; S. Ohno; H. Hirukawa; R. Yoshida; T. Onuma; T. Honda; M. Takahasi; T. Araki; and Y. Nanishi
    The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8), 02 May 2021
  • Epitaxial mist chemical vapor deposition growth and characterization of α-In2O3 films on α-Al2O3 substrates
    T. Yamaguchi; T. Nagata; S. Takahashi; T. Kiguchi; A. Sekiguchi; T. Onuma; T. Honda; K. Goto; Y. Kumagai; K. Kaneko; and S. Fujita
    The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8), 02 May 2021
  • Energy conversion efficiency under different input electrical power conditions in visible-LED-based OWPT system
    H. Yokoyama; N. Yosuke; T. Yamaguchi; T. Miyamoto; T. Onuma; and T. Honda
    The 3rd Optical Wireless and Fiber Power Transmission Conference 2021 (OWPT2021), 20 Apr. 2021
  • Deep UV optical properties of high-Mg-content rocksalt-structured MgZnO
    T. Onuma; K. Kudo; K. Ishii; M. Ono; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
    Materials Research Society, 2021 Spring Meeting, 18 Apr. 2021, [Invited]
  • 顕微ラマンマッピング測定による酸化ガリウム結晶の微細構造評価
    19 Mar. 2021
  • GaN上GaInN膜成長初期のSi層挿入数に対する格子緩和過程の変化
    18 Mar. 2021
  • 合成石英基板上に成長した岩塩構造 MgZnO 微結晶の真空紫外域での発光特性
    18 Mar. 2021
  • モノリシック青色マイクロLEDピクセルの製作とフルカラー化の検討
    17 Mar. 2021
  • 岩塩構造MgZnO 混晶の電子有効質量の推定
    17 Mar. 2021
  • TEMによるMist CVD法 (0001)α-Al2O3基板上α-In2O3の欠陥解析
    16 Mar. 2021
  • Developments of Semiconductor-based UVC Emitters and Sensors for Sterilization
    T. Onuma; T. Yamaguchi; and T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021, [Invited]
  • Impact of hydrochloric acid on the Mist CVD growth of Ga2O3
    R. Yamada; S. Takahashi; T. Yamaguchi; T. Onuma; and T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • Impact of Indium Oxide Powder as Source Precursor on alfa-In2O3 Films Grown by Mist CVD
    A. Taguchi; S. Takahashi; T. Yamaguchi; T. Onuma; and T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • Characterization of GaInN multi-layers grown on strain-controlled layer by RF-MBE
    M. Matsuda; R. Yoshida; K. Tahara; T. Yamaguchi; T. Onuma; and T. Honda
    The 3rd Symposium for Collaborative Research on Energy Science and Technology (SCREST-3rd), 05 Mar. 2021
  • 殺菌応用を目指した真空・深紫外線半導体発光材料の開発
    27 Jan. 2021, [Invited]
  • Fabrication of monolithic blue μ-LED pixels and their color conversion by phosphors
    H. Chikui; S. Takeda; T. Abe; T. Onuma; T. Yamaguchi; T. Honda
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Radiation patterns of MgO and AlN evaluated by angle-resolved cathodoluminescence measurements
    Y. Igari; K. Kudo; W. Kosaka; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • Parametric study of fabrication processes of micro-LEDs array and characterization of emission properties
    S. Takeda; H. Chikui; T. Yamaguchi; T. Onuma; and T. Honda
    The 19th International Symposium on Advanced Technology (ISAT-19), 14 Jan. 2021
  • RF-MBE法による高In組成GaInN/GaInN周期構造の成長と評価
    23 Dec. 2020
  • Mist CVD法における(0001)α-Al2O3基板上In2O3成長に塩酸が与える影響
    23 Dec. 2020
  • 窒素イオン注入による酸化ガリウム結晶の光電流スペクトルの変化
    23 Dec. 2020
  • ICP-RIEによるモノリシック青色μ-LEDピクセルの製作
    23 Dec. 2020
  • AlNテンプレート上のAlGaNの分極電場と深紫外線センサー特性の関係
    23 Dec. 2020
  • Designing optically isolated LED arrays embedded in Si Micro-cup Substrates
    K. Sato; Y. Iwata; T. Onuma; T. Yamaguchi; T. Honda
    International Display Workshops ‘20 (IDW ’20), 10 Dec. 2020
  • マイクロLEDディスプレイ応用のための透明ポリイミド薄膜の形成
    05 Dec. 2020
  • 酸化物半導体MgZnOの結晶成長とサブ200 nmの発光特性
    19 Nov. 2020, [Invited]
  • 人にやさしい深紫外線光源の開発
    30 Oct. 2020
  • Comparison of Microstructures in alpha-Ga2O3 and alpha-In2O3 Films Grown on alpha-Al2O3 Substrates by Mist CVD
    Y. Hayakawa; S. Ohno; T. Yamaguchi; T. Kiguchi; S.Takahashi; H. Yokoo; T. Onuma; and T. Honda
    39th Electronic Materials Symposium, 08 Oct. 2020
  • Band alignment of MgZnO alloys and the related band offset calculations
    Y. Ota; K. Kaneko; T. Onuma; and S. Fujita
    39th Electronic Materials Symposium, 08 Oct. 2020
  • Growth of AlGaN on AlN Template by RF-MBE and Their Spectral Responsivity in Deep UV Spectral Region
    M. Hashimoto; N. Tachibana; M. Nakanishi; T. Yamaguchi; T. Honda; and T. Onuma
    39th Electronic Materials Symposium, 08 Oct. 2020
  • Relationship between crystallinity and emission property in RF-MBE growth of GaN
    N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Honda; and T. Onuma
    39th Electronic Materials Symposium, 08 Oct. 2020
  • RF-MBE growth and characterization of high-In-content GaInN/GaInN multiple layers
    K. Tahara; R. Yoshida; H. Hirukawa; T. Yamaguchi; T. Onuma; and T. Honda
    39th Electronic Materials Symposium, 07 Oct. 2020
  • Deep and Vacuum UV Emission Properties in Rocksalt-structured MgZnO
    T.Onuma; K.Kudo; K.Ishii; M.Ono; Y.Ota; K.Kaneko; T.Yamaguchi; S.Fujita; and T.Honda
    39th Electronic Materials Symposium, 07 Oct. 2020, [Invited]
  • GaNのRF-MBE成長における結晶性と発光特性の関係
    11 Sep. 2020
  • RF-MBE成長した高In組成GaInN/ GaInN多重量子井戸における障壁層のIn組成と周期数が発光特性へ及ぼす影響
    11 Sep. 2020
  • GaInN/GaN成長時の格子緩和に対するSiアンチサーファクタントの効果
    11 Sep. 2020
  • 溶媒キャスト法を用いたLED素子分離用透明ポリイミド絶縁膜の形成
    11 Sep. 2020
  • 酸化ガリウム結晶への窒素イオン注入が分光感度特性に及ぼす影響
    09 Sep. 2020
  • 岩塩構造MgZnO薄膜における深紫外PL寿命の評価
    09 Sep. 2020
  • UVC~真空紫外発光を目指すMgZnOの研究
    01 Aug. 2020
  • Optical characteristics of high–indium–content GaInN MQWs grown on different templates by RF–MBE
    R. Yoshida; H. Hirukawa; K. Tahara; T. Yamaguchi; T. Onuma; T. Honda
    International Conference on Light-Emitting Devices and Their Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Structural analyses of α-In2O3 grown on α-Al2O3 substrates by mist CVD
    Y. Hayakawa; S. Ohno; T. Yamaguchi; T. Kiguchi; H. Yokoo; T. Onuma; T. Honda
    International Conference on Light-Emitting Devices and Their Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Fabrication of μ-LED pixels and evaluation of luminescent characteristics
    H. Chikui; S. Takeda; K. Sato; T. Onuma; T. Yamaguchi; M. Shimizu; T. Takahashi; T. Honda
    International Conference on Light-Emitting Devices and Their Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Growth of AlGaN films on AlN template by RF-plasma assisted molecular beam epitaxy
    M. Hashimoto; N. Tachibana; T. Honda; T. Yamaguchi; T. Onuma
    International Conference on Light-Emitting Devices and Their Industrial Applications ’20 (LEDIA ’20), 21 Apr. 2020
  • Power Supply Efficiency of Optical Wireless Power Transmission Systems Using Visible LEDs and Silicon Solar Cells
    H. Yokoyama; T. Yamaguchi; T. Onuma; R. Yoshida; Y. Ushida; T. Honda
    Optical Wireless and Fiber Power Transmission Conference 2020 (OWPT2020), 21 Apr. 2020
  • RF-MBEサファイア基板窒化時にPBN放電管が与える影響
    15 Mar. 2020
  • ポリイミド薄膜を用いたLED素子分離の検討
    14 Mar. 2020
  • 窒素イオン注入酸化ガリウム結晶の光電流スペクトル
    13 Mar. 2020
  • GaInN/GaN 規則配列ナノコラム結晶における活性層の構造と光学特性の関係
    13 Mar. 2020
  • RF-MBE法によるGaN及びAlNテンプレートへのGaN成長にV/III比が及ぼす影響
    13 Mar. 2020
  • 岩塩構造MgZnO薄膜の時間分解フォトルミネッセンス分光
    12 Mar. 2020
  • DUV cathodoluminescence in rocksalt-structured MgZnO films
    T. Onuma; M. Ono; K. Kudo; K. Ishii; K. Kaneko; S. Fujita; T. Honda
    The Society of Photo-Optical Instrumentation Engineers (SPIE) Photonics West 2020,,OPTO, the optoelectronics, photonic materials and devices conference, 05 Feb. 2020, [Invited]
  • Epitaxial relationship of Cu3N grown on YSZ(001) substrate by mist CVD method
    N. Wakabayashi; R. Takigasaki; T. Yamaguchi; T. Onuma; T. Honda
    47th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-47), 22 Jan. 2020
  • Optical characteristics of high-In-incorporated GaInN MQWs grown by RF-MBE
    R. Yoshida; Y. Nakajima; H. Hirukawa; S. Ohno; T. Yamaguchi; T. Onuma; T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • LED miniaturization for monolithic μ-LED using ICP etching
    S. Takeda; T. Yanaguchi; T. Onuma; T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Structural characterization of epitaxial GaInN films by X-ray diffraction
    H. Hirukawa; R. Yoshida; T. Yamaguchi; T. Onuma; T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Microstructural analysis using TEM in GaInN film grown by RF-MBE
    S. Ohno; H. Hirukawa; R. Yoshida; T. Yamaguchi; T. Kiguchi; H. Hashimoto; T. Onuma; T. Honda
    The 18th International Symposium on Advanced Technology (ISAT-18), 13 Dec. 2019
  • Toward the Realizaiton of Optical Wireless Power Transmission System Using Visible Light
    T. Yamaguchi; H. Hirukawa; H. Yokoyama; S. Ohno; Y. Ushida; T. Onuma; T. Honda
    2019 International Symposium on Novel and Sustainable Technology (ISNST2019), 12 Dec. 2019, [Invited]
  • Mist CVD法によるGa2O3成長に塩酸が与える影響
    07 Dec. 2019
  • Si基板上GaNナノコラム構造への低温層挿入による結晶品質向上の検討
    20 Nov. 2019
  • 高品質GaInN薄膜製作に向けたRF-MBE法により成長したGaN薄膜の不純物検討
    20 Nov. 2019
  • RF-MBE法によるGaNテンプレート上へのAlGaN成長におけるGaNバッファ層のV/III比依存性の検討
    20 Nov. 2019
  • 分子プレカーサー法を用いたスプレーコートによるZnO 薄膜形成の検討
    20 Nov. 2019
  • Deep UV cathodoluminescence properties of rocksalt-structured MgZnO alloys
    T.Onuma; M.Ono; K.Kudo; K.Ishii; K.Kaneko; S.Fujita; and T.Honda
    The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019), 13 Nov. 2019, [Invited]
  • VUV Exciton Emission Spectra of MgO Single Crystals
    K.Kudo; S.Hoshi; M.Ono; Y.Fujiwara; K.Kaneko; T.Yamaguchi; T.Honda; S.Fujita; and T.Onuma
    The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019), 12 Nov. 2019
  • Optical-isolation of micro-LED pixels integrated in Si micro-cup substrate
    K.Sato; Y.Kamei; R.Nawa; S.Aikawa; Y.Usida; T.Onuma; T.Yamaguchi; and T.Honda
    The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019), 11 Nov. 2019
  • Red Emitting InGaN-based Ordered Nanocolumns Exhibiting Photonic Crystal Effects at 671 nm
    K.Takimoto; K.Narita; K.Yoshida; T.Oto; T.Yamaguchi; T.Honda; T.Onuma; R.Togashi; I.Nomura; and K.Kishino
    The 9th Asia-Pacific Workshop on Widegap Semiconductors (APWS2019), 11 Nov. 2019
  • InGaN/GaNハニカム構造ナノコラム結晶の成長と評価
    31 Oct. 2019
  • Growth and optical characterization of ultra-wide bandgap semiconductors for solid-state DUV and VUV light emitters
    N.Tachibana; K.Kudo; T.Onuma
    The 6th Innovation Forum of Advanced Engineering and Education (IFAEE6), 30 Oct. 2019
  • RF-MBEによるGaInN薄膜の成長温度特性
    29 Oct. 2019
  • Optical characteristics of high In composition GaInN MQWs grown by RF-MBE
    R. Yoshida; Y. Nakajima; H. Hirukawa; S. Ohno; T. Yamaguchi; T. Onuma; T. Honda
    38th Electronic Materials Symposium, 10 Oct. 2019
  • Epitaxial relationship in Cu3N layer grown on c-plane sapphire substrate by Mist CVD
    N. Wakabayashi; M. Takahashi; T. Yamaguchi; T. Onuma; T. Honda
    38th Electronic Materials Symposium, 10 Oct. 2019
  • Impact of hydrochloric acid on mist CVD growth of GIO ternary alloys
    S. Takahashi; K. Rikitake; T. Yamaguchi; H. Nagai; M. Sato; T. Onuma; T. Honda
    38th Electronic Materials Symposium, 09 Oct. 2019
  • Comparative study on DUV emission properties of rocksalt-structured MgxZn1-xO alloys
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    38th Electronic Materials Symposium, 09 Oct. 2019
  • Characterization of MgZnO Thin Films for Deep Ultraviolet Light Emitters
    S. Fujita; S. Hoshi; K. Ishii; M. Ono; K. Kudo; T. Onuma; T. Honda; and K. Kaneko
    The 19th International Conference on II-VI Compounds and Related Materials, 02 Oct. 2019, [Invited]
  • MgO薄膜のホモエピタキシャル成長および光学特性
    20 Sep. 2019
  • RF-MBE成長した高In組成GaInN MQWsの光学特性
    18 Sep. 2019
  • MgO単結晶の真空紫外線領域のカソードルミネセンススペクトル
    18 Sep. 2019
  • Observation of deep UV cathodoluminescence from rocksalt-structured MgZnO alloys
    T. Onuma; M. Ono; K. Kudo; K. Ishii; K. Kaneko; S. Fujita; T. Hond
    The 4th International Workshop on Ultraviolet Materials and Devices (IWUMD4), 10 Sep. 2019, [Invited]
  • スプレー塗布によるMgZnO薄膜形成の検討
    28 Aug. 2019
  • 16x16array構造のSiマイクロカップ基板を用いたマイクロLEDディスプレイ実現に向けた製作検討
    28 Aug. 2019
  • RF-MBEによりGaN/alfa-Al2O3上に異なる温度で成長させたGaInNの構造解析
    28 Aug. 2019
  • ミストCVD法により成長した各種基板上In2O3の結晶構造と電気的特性評価
    28 Aug. 2019
  • 誘導結合プラズマを用いたモノリシック型-LEDの製作検討
    28 Aug. 2019
  • RF-MBE法により成長したN極性GaN薄膜の不純物検討
    28 Aug. 2019
  • RF-MBEにより成長させたInGaN/GaNハニカム構造ナノコラム結晶の光学特性評価
    28 Aug. 2019
  • RF-MBEにより成長したGa極性GaN薄膜の電気的特性評価
    28 Aug. 2019
  • Si基板上GaNナノコラム構造製作における低温層挿入による結晶形状への影響
    28 Aug. 2019
  • Sapphire基板上GaNのPDS測定による価電子帯構造及び透過率測定における相関性について
    28 Aug. 2019
  • AlGaN成長におけるバッファGaN成長条件の検討
    27 Aug. 2019
  • RF-MBE成長した高In組成GaInN周期構造の光学特性
    27 Aug. 2019
  • RS-MgZnO/MgOの量子閉じ込め効果の検討
    27 Aug. 2019
  • 可視光給電デバイスのためのMBEによるGaInN成長温度特性
    27 Aug. 2019
  • Mist CVD法により成長したGIO三元混晶の塩酸濃度依存特性
    27 Aug. 2019
  • ミストCVD法によるCu3Nエピタキシ成長と構造評価
    27 Aug. 2019
  • Optical Transitions in beta-Ga2O3 Single Crystal Studied by Electroreflectance Measurements
    T.Onuma; K.Tanaka; K.Sasaki; T.Yamaguchi; T.Honda; A.Kuramata; S.Yamakoshi; and M.Higashiwaki
    The 3rd International Workshop on Gallium Oxide and Related Materials, 15 Aug. 2019
  • In Situ XRD RSM Measurements in MBE Growth of GaInN at Different Temperatures
    T. Yamaguchi; T. Sasaki; M. Takahasi; S. Ohno; T. Araki; Y. Nanishi; T. Onuma; T. Honda
    13th International Conference On Nitride Semiconductors (ICNS-13), 11 Jul. 2019
  • Fabrication of LED Pixels of 16 × 16 Array Structure Using Si Micro-Cup Substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Usida; T. Onuma; T. Yamaguchi; T. Honda
    13th International Conference On Nitride Semiconductors (ICNS-13), 09 Jul. 2019
  • Strain Relaxation in Al-rich AlxGa1-xN Films Grown by RF Plasma-Assisted Molecular Beam Epitaxy
    N. Tachibana; T. Onuma; T. Honda; T. Yamaguchi
    13th International Conference On Nitride Semiconductors (ICNS-13), 09 Jul. 2019
  • Structural and electrical properties of In2O3 grown by mist CVD on various substrates
    H. Yokoo; T. Kobayashi; K. Rikitake; T. Yamaguchi; T. Onuma; T. Honda
    The 11th International Conference on the Science and Technology for Advanced Ceramics (STAC-11), 09 Jul. 2019
  • Structural Analyses of GaInN Films Grown at Different Temperatures on (0001)GaN/alfa-Al2O3 Templates by RF-MBE
    S. Ohno; T. Yamaguchi; T. Araki; T. Honda; T. Onuma; H. Hashimoto; Y. Nakajima; H. Hirukawa; R. Yoshida
    13th International Conference On Nitride Semiconductors (ICNS-13), 08 Jul. 2019
  • Growth and Structural Characterization of Cu3N by Mist CVD
    N. Wakabayashi; M. Takahashi; T. Yamaguchi; H. Nagai; M. Sato; T. Onuma; T. Honda
    The 2nd Symposium for Collaborative Research on Energy Science and Technology (SCREST-2nd), 05 Jul. 2019
  • XRD-RSM Measurements of GaInN Films Grown at Different Temperatures by RF-MBE
    H. Hirukawa; R. Yoshida; T. Yamaguchi; T. Onuma; T. Honda
    The 2nd Symposium for Collaborative Research on Energy Science and Technology (SCREST-2nd), 05 Jul. 2019
  • Vacuum Ultraviolet Light Emission from MgZnO-Based Thin Films and Quantum Wells
    K. Kaneko; K. Ishii; M. Ono; K. Kudo; T. Onuma; T. Honda; S. Fujita
    61th Electronic Materials Conference (EMC-61), 27 Jun. 2019
  • ミストCVD法によるCu3Nエピタキシャル成長
    14 Jun. 2019
  • Mist CVD法によるGIO混晶成長に塩酸が与える影響
    14 Jun. 2019
  • 規則配列InGaNナノコラムを用いた赤色域発光結晶
    14 Jun. 2019
  • Observation of Electroreflectance Spectra of beta-Ga2O3 Single Crystal
    T. Onuma; K. Tanaka; K. Sasaki; T. Yamaguchi; T. Honda; A. Kuramata; S. Yamakoshi; and M. Higashiwaki
    Compound Semiconductor Week 2019 (CSW 2019), 21 May 2019
  • Growth and Deep UV Luminescent Properties of Rocksalt-Structured Ultra-Wide Bandgap MgZnO on MgO Substrates
    K. Kaneko; K. Ishii; M. Ono; K. Kudo; T. Onuma; T. Honda; and S. Fujita
    Compound Semiconductor Week 2019 (CSW 2019), 21 May 2019
  • Electrical and structural properties of Sn-doped alfa-Ga2O3 thin films grown by mist chemical vapor deposition
    S. Mochizuki; T. Yamaguchi; K. Rikitake; T. Onuma; and T. Honda
    Compound Semiconductor Week 2019 (CSW 2019), 21 May 2019
  • VUV Cathodoluminescence Spectra of Rocksalt-structured MgZnO/MgO Quantum Wells
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    Compound Semiconductor Week 2019 (CSW 2019), 20 May 2019
  • Cathodoluminescence properties of Rocksalt-structured MgZnO/MgO Quantum Wells for VUV Light Emitter
    K. Kudo; K. Ishii; M. Ono; Y. Fujiwara; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; and T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Fabrication of micro-LED display of 16 × 16 array structure using Si micro-cup substrate
    K. Sato; Y. Kamei; R. Nawa; S. Aikawa; Y. Ushida; T. Onuma; T. Yamaguchi; and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Fabrication of monolithic micro-LED using inductively coupled plasma etching
    S. Takeda; T. Yamaguchi; T. Onuma; T. Takahashi; M. Shimizu; and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Growth of AlxGa1-xN Films by RF Plasma-assisted Molecular Beam Epitaxy for Deep UV Optical Devices
    N. Tachibana; T. Yamaguchi; T. Honda; and T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Structural analyses using TEM and XRD of GaInN films grown on GaN templates by RF-MBE
    S. Ohno; T. Yamaguchi; H. Hirukawa; T. Araki; H. Hashimoto; T. Onuma; and T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’19 (LEDIA ’19), 24 Apr. 2019
  • Prototype optical wireless power teansmission system using bule LD as light source and LED as photovoltaic receiver
    H. Hirukawa; T. Yamaguchi; Y. Ushida; T. Onuma; and T. Honda
    Optical Wireless and Fiber Power Transmission Conference 2019 (OWPT2019), 24 Apr. 2019
  • 光熱偏向分光法によるGaN自立基板上ホモエピタキシャル層の評価
    12 Mar. 2019
  • RF-MBE法GaInNヘテロエピタキシャル成長における放射光その場X線回折測定
    11 Mar. 2019
  • RF-MBEより成長した高In組成GaInNの成長温度特性
    11 Mar. 2019
  • 酸化ガリウム結晶における電界変調反射スペクトルの観測
    11 Mar. 2019
  • 岩塩構造MgZnO/MgO量子井戸における量子閉じ込め効果
    11 Mar. 2019
  • マイクロLEDチップの集積化技術の検討と技術課題
    29 Jan. 2019
  • Toward fabrication of GaInN-based devices: Epitaxial growth and characterization of GaInN by RF-MBE
    T.Yamaguchi; Y.Nakajima; H.Hirukawa; R.Yoshida; T.Onuma; and T.Honda
    The 1st Symposium for Collaborative Research on Energy Science and Technology (SCREST-1st), 10 Jan. 2019, [Invited]
  • Efficient 210-250 nm Deep UV Near-Band-Edge Emission from Rocksalt-Structured MgxZn1-xO Films
    T.Onuma; M.Ono; K.Ishii; K.Kaneko; S.Fujita; and T.Honda
    28th Annual Meeting of MRS-J, 19 Dec. 2018
  • マイクロLEDディスプレイの実現のためのブラックマトリクス原料の比較検討
    08 Dec. 2018
  • Relationship between Relaxation ratio and growth temperature of GaInN by RF-MBE
    Y. Nakajima; T.Honda; T.Yamaguchi; and T.Onuma
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 05 Dec. 2018
  • Effect of alfa-(AlxGa1-x)2O3 Overgrowth on MSM-Type alfa-Ga2O3 Ultraviolet Photodetectors Grown by Mist CVD
    K.Rikitake; T.Yamaguchi; T.Onuma; and T.Honda
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 05 Dec. 2018
  • Carbon-nanotube Dispersed Ga2O3 Films for UV Transparent Electrodes Fabricated by Molecular Precursor Method
    T.Honda; Y.Takahashi; R.Yoshida; C.Mochizuki; H.Nagai; T.Onuma; T.Yamaguchi; and M.Sato
    Pacific Rim Symposium on Surfaces, Coatings and Interfaces (Pacsurf2018), 03 Dec. 2018
  • Fabrication of rocksalt-structured MgZnO/MgO layered structures and their DUV light emission properties
    K.Ishii; M.Ono; T.Onuma; K.Kaneko; and S.Fujita
    Materials Research Society, 2018 Fall Meeting & Exhibit, 29 Nov. 2018
  • μ-LEDディスプレイの実現に向けたμ-LEDアレイ構造の製作
    29 Nov. 2018
  • 岩塩構造MgxZn1-xO薄膜における深紫外線NBE発光特性の解析
    29 Nov. 2018
  • 各種基板上に成長したIn2O3の結晶構造と電気的特性評価
    29 Nov. 2018
  • Epitaxial Growth of Cu3N Films on (0001)Al2O3 Substrates by Mist Chemical Vapor Deposition
    T.Yamaguchi; H.Itoh; M.Takahashi; H.Nagai; T.Onuma; T.Honda; and M.Sato
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Fabrication of µ-LED arrays toward future realization of µ-LED display
    R.Nawa; STakeda; Y.Kamei; T.Onuma; T.Yamaguchi; and T.Honda
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Analysis of Deep Ultraviolet Emission Properties in Rocksalt-structured MgxZn1-xO Films
    M.Ono; K.Ishii; K.Kaneko; T.Yamaguchi; T.Honda; S.Fujita; and T.Onuma
    The 17th International Symposium on Advanced Technology (ISAT-17), 14 Nov. 2018
  • Evaluation of Al2O3 /n-, p-GaN samples by photothermal deflection spectroscopy
    K.Fukuda; Y.Asai; L.Sang; A.Yoshigoe; A.Uedono; T.Onuma; T.Yamaguchi; T.Honda; and M.Sumiya
    International Workshop on Nitride Semiconductors (IWN 2018), 13 Nov. 2018
  • GaInN growth by RF-MBE for underlying layers in red LEDs
    Y.Nakajima; K.Uehara; T.Yamaguchi; T.Onuma; and T.Honda
    International Workshop on Nitride Semiconductors (IWN 2018), 13 Nov. 2018
  • Recent Progress in solid state physics Onuma labratory
    Y.Kamei; K.Kudo; N.Tachibana; K.Tanaka; Y.Fujiwara; Y.Chunobayashi; R.Nawa; M.Ono; and T.Onuma
    The 5th Innovation Forum of Advanced Engineering and Education (IFAEE5), 01 Nov. 2018
  • マイクロLEDチップの集積化技術の検討と技術課題
    15 Oct. 2018
  • PDS measurement for III-V nitride samples ~InxGa1-xN, ion-implanted GaN and MOS structure~
    K.Fukuda; T.Onuma; T.Yamaguchi; T.Honda; and M.Sumiya
    37th Electronic Materials Symposium, 12 Oct. 2018
  • Fabrication of double Schottky type photodetector using corundum-structured gallium oxide
    K.Rikitake; T.Yamaguchi; T.Onuma; and T.Honda
    37th Electronic Materials Symposium, 11 Oct. 2018
  • Fabrication of rocksalt-MgZnO/MgO layered structure and the characteristic of DUV light emission
    K.Ishii; M.Ono; T.Onuma; K.Kaneko; and S.Fujita
    37th Electronic Materials Symposium, 10 Oct. 2018
  • Growth of Cu3N Films by mist Chemical Vapor Deposition
    T.Yamaguchi; H.Itoh; M.Takahashi; T.Onuma; H.Nagai; T.Honda; M.Sato
    2018 International Symposium on Novel and Sustainable Technology (ISNST2018), 05 Oct. 2018, [Invited]
  • 岩塩構造MgZnO/MgO積層構造の作製と深紫外発光
    20 Sep. 2018
  • 光熱偏向分光法によるMgイオン注入GaN層の評価
    19 Sep. 2018
  • Al2O3/n-, p-GaN構造の光熱偏向分光法による評価
    19 Sep. 2018
  • Bandgap fluctuation in rocksalt-structured MgxZn1-xO alloys
    T.Onuma; M.Ono; K.Ishii; K.Kaneko; T.Yamaguchi; S.Fujita; and T.Honda
    The 10th International Workshop on ZnO and Related Materials (IWZnO 2018), 13 Sep. 2018
  • Excitation density and temperature dependence of deep ultraviolet cathodoluminescence in rocksalt-structured MgxZn1-xO
    M.Ono; K.Ishii; K.Kaneko; T.Yamaguchi; T.Honda; S.Fujita; and T.Onuma
    The 10th International Workshop on ZnO and Related Materials (IWZnO 2018), 11 Sep. 2018
  • In situ XRD RSM Measurements in MBE Growth of GaInN on InN
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Onuma; T.Honda; T.Araki; Y. Nanishi
    20th International Conference on Molecular Beam Epitaxy (ICMBE 2018), 04 Sep. 2018
  • 光熱偏向分光法によるイオン注入したGaNの評価
    30 Aug. 2018
  • 岩塩構造MgxZn1-xO薄膜における深紫外線発光メカニズム
    29 Aug. 2018
  • 水溶液スプレー法によるZnO薄膜製作検討
    29 Aug. 2018
  • 赤色LED製作に向けたRF-MBE法によるSi基板上自己形成GaNナノコラム構造の製作検討
    29 Aug. 2018
  • 10×10アレイ構造Siマイクロカップ基板を用いたμ-LEDディスプレイの製作
    29 Aug. 2018
  • ミストCVD法によるα-In2O3の結晶成長と電気的特性評価
    29 Aug. 2018
  • RF-MBE法を用いたGaInNの成長温度と緩和率の関係検討
    28 Aug. 2018
  • 深紫外光検出器のためのGa2O3薄膜のミストCVD成長
    28 Aug. 2018
  • Evaluation of Structural Disorder and In-Gap States of III-V nitrides by Photothermal Deflection Spectroscopy
    M.Sumiya; K.Fukuda; Y.Nakano; S.Ueda; L.Sang; H.Iwai; T.Yamaguchi; T.Onuma; T.Honda
    The 7th International Symposium on Growth of III-Nitrides (ISGN-7), 09 Aug. 2018, [Invited]
  • 酸化ガリウム結晶の光学評価とデバイス応用
    25 Jul. 2018, [Invited]
  • Growth of Rocksalt-Structured MgZnO Thin-Films and Their Optical Properties
    K.Ishii; M.Ono; T.Onuma; K.Kaneko; S.Fujita
    60th Electronic Materials Conference (EMC-60), 28 Jun. 2018
  • Structural disorder and in-gap states of Mg-implanted GaN films evaluated by photothermal deflection spectroscopy
    M.Sumiya; K.Fukuda; S.Takashima; T.Yamaguchi; T.Onuma; T.Honda; A.Uedono:
    The 19th International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE-19), 07 Jun. 2018
  • Blue Luminescence Quenching in beta-Ga2O3 Epitaxial Films by Nitrogen Doping
    T.Onuma; Y.Nakata; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; S.Yamakoshi; M.Higashiwaki
    Compound Semiconductor Week 2018 (CSW 2018), 01 Jun. 2018
  • Spectroscopic ellipsometry study on p-type NiO films
    M.Ono; K.Sasaki; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; T.Honda; T.Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’18 (LEDIA ’18), 27 Apr. 2018
  • Fabrication of 10x10 array structure of micro-LED display using Si micro-cup substrate
    R.Nawa; T.Onuma; T.Yamaguchi; T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’18 (LEDIA ’18), 26 Apr. 2018
  • 岩塩構造MgxZn1-xOの吸収端の観測と電子状態計算
    20 Mar. 2018
  • 岩塩構造MgxZn1-xOにおける深紫外線カソードルミネセンスの温度および励起密度依存性
    20 Mar. 2018
  • III-V族窒化物の価電子帯構造およびギャップ内準位の評価
    20 Mar. 2018
  • イオン注入したGaNの光熱偏向分光法による評価
    20 Mar. 2018
  • 10×10 Siマイクロカップ基板でのμ-LED集積化
    20 Mar. 2018
  • 窒素ドープ酸化ガリウム薄膜における青色発光の強度変化
    20 Mar. 2018
  • alfa-Ga2O3を用いたダブルショットキー型光検出器の製作
    19 Mar. 2018
  • 放射光X線回折測定を用いたGaInN/InN成長のその場観察~InN解離温度領域での振る舞い~
    18 Mar. 2018
  • 岩塩構造MgZnO薄膜の成長と光物性
    18 Mar. 2018
  • 放射光を活用したIn 系窒化物半導体成長中のその場観察
    12 Mar. 2018
  • Influence of interface state and band bending on In and N polar InN from Angle-resolved XPS
    Y.Nakajima; T.Onuma; T.Yamaguchi; T.Honda
    45th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-45), 14 Jan. 2018
  • コランダム構造酸化ガリウムソーラーブラインド光検出器の開発
    09 Dec. 2017
  • ミストCVD法により成長したIn2O3薄膜を用いたTFT製作検討
    09 Dec. 2017
  • Growth of Ga2-xSnxO3 Films by Mist Chemical Vapor Deposition
    K.Rikitake; T.Kobayashi; T.Yamaguchi; T.Onuma; T.Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, 30 Nov. 2017
  • Crystal Structure Control in Epitaxial Growth of In2O3 by Mist CVD
    T.Kobayashi; T.Yamaguchi; T.Onuma; T.Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, 30 Nov. 2017
  • XPS spectra of Ga2O3, In2O3 and their alloys fabricated by molecular precursor method
    T.Honda; Y.Takahashi; T.Onuma; T.Yamaguchi; H.Nagai; and M.Sato
    24th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 24), 24 Nov. 2017, [Invited]
  • Relationship between Temperature and Growth Rate of Ga2O3, In2O3 and Their Alloys in the Growth of Mist CVD
    T.Yamaguchi; K.Tanuma; T.Kobayashi; H.Nagai; M.Sato; T.Onuma; T.Honda
    4th International Conference on Advanced Electromaterials (ICAE2017), 24 Nov. 2017
  • Deep-UV emission properties of rocksalt-structured MgxZn1-xO Films Grown on MgO (001) Substrates
    M.Ono; K.Ishii; T.Uchida; R.Jinno; K.Kaneko; T.Yamaguchi; T.Honda; S.Fujita; and T.Onuma
    36th Electronic Materials Symposium, 09 Nov. 2017
  • Study on growth of high quality MgZnO films on MgO substrates for DUV light emission
    K.Ishii; T.Onuma; T.Uchida; R.Jinno; K.Kaneko; and S.Fujita
    36th Electronic Materials Symposium, 09 Nov. 2017
  • Angle-resolved XPS spectra of InN/GaN grown by DERI method
    Y.Nakajima; T.Onuma; T.Yamaguchi; and T.Honda
    36th Electronic Materials Symposium, 09 Nov. 2017
  • MSM-type solar-blind photodetector with alfa-Ga2O3 film grown by mist CVD
    K.Rikitake; T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    36th Electronic Materials Symposium, 08 Nov. 2017
  • Effect of low temperature buffer layer in mist CVD growth of In2O3 on alfa-Al2O3 substrate
    T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    36th Electronic Materials Symposium, 08 Nov. 2017
  • Near surface band bending in InN films grown by DERI method
    Y.Nakajima; K.Uehara; T.Onuma; T.Yamaguchi; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Fabrication of Si micro-cup substrate and its application for integration of micro-LEDs
    R.Nawa; T.Onuma; T.Yamaguchi; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Origin of free holes and visible light absorption in p-type NiO films
    M.Ono; T.Onuma; K.Sasaki; H.Nagai; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; M.Sato; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Bandgap Engineering of α-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
    K.Rikitake; T.Yamaguchi; T.Onuma; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Fabrication of TFT using amorphous In2O3 thin film by mist CVD
    T.Kobayashi; K.Sawamoto; S.Aikawa; T.Yamaguchi; T.Onuma; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Formation of Black Matrix for Realization of Micro-LED Display
    Y.Chunobayashi; R.Nawa; Y.Takahashi; H.Matsuura; T.Yamaguchi; T.Onuma; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Unintentionally Doped Impurities in GaN Layer Grown by RF-MBE
    D.Taka; T.Yamaguchi; T.Onuma; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Photothermal Deflection Spectra of Gallium indium nitride layers grown by MOVPE
    K.Fukuda; T.Onuma; L.Sang; T.Yamaguchi; T.Honda; and M.Sumiya
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Impact of mask materials on dry etching of GaN using ICP-RIE
    H.Matsuura; T.Onuma; T.Honda; and T.Yamaguchi
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Near-the surface Fermi level measured In2O3 and Ga2O3 thin films by molecular precursor method
    Y.Takahashi; T.Onuma; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), 02 Nov. 2017
  • Outstanding capability of In-situ Monitoring Techniques in RF-MBE Growth of InN and GaInN
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Araki; T.Onuma; T.Honda; and Y.Nanishi
    2017 International Symposium on Novel and Sustainable Technology (ISNST2017), 19 Oct. 2017, [Invited]
  • GaN growth on Al template by MBE for the fabrication of micro displays
    T.Honda; Y.Hoshikawa; K.Uehara; T.Onuma and T.Yamaguchi
    11th International Symposium on Semiconductor Light Emitting Devices (ISSLED2017), 12 Oct. 2017
  • 深紫外発光受光デバイスの現状と酸化ガリウム系材料受光デバイスの可能性
    26 Sep. 2017, [Invited]
  • Compositional Pulling Effect in Epitaxial Growth of GaInN by RF-MBE
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Araki; T.Onuma; T.Honda; and Y.Nanishi
    International Conference on Solid State Devices and Materials (SSDM2017), 21 Sep. 2017
  • Fabrication of MSM-Type Photodetector Using Sn-Doped α-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
    K.Rikitake; T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    International Conference on Solid State Devices and Materials (SSDM2017), 20 Sep. 2017
  • Cathodoluminescence spectra of Si-doped and Si-implanted β-Ga2O3 single crystals
    T.Onuma; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki
    2nd International Workshop on Gallium Oxide and Related Materials, 14 Sep. 2017
  • Photoresponsivity of alfa-Ga2O3-based deep UV photodetector grown by mist CVD
    K.Rikitake; T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    2nd International Workshop on Gallium Oxide and Related Materials, 14 Sep. 2017
  • 低温In2O3バッファ層を用いたalfa-Al2O3基板上In2O3のミストCVD成長
    08 Sep. 2017
  • Ga2-xSnxO膜のミストCVD成長
    08 Sep. 2017
  • シリコンマイクロカップ基板の製作とµ-LEDの集積化の検討
    08 Sep. 2017
  • GaN上およびInN上GaInN成長における成長初期過程の観察
    07 Sep. 2017
  • SiドープとSiイオン注入単結晶酸化ガリウム結晶の光学的特性
    07 Sep. 2017
  • 光熱偏向分光法によるGa1-xInxN薄膜の評価
    06 Sep. 2017
  • 高品質MgZnO薄膜の成長と深紫外発光に関する研究
    05 Sep. 2017
  • 分子プレカーサー法により形成した金属酸化物薄膜の表面近傍フェルミ準位の測定
    09 Aug. 2017
  • RF-MBE法により成長したGaN薄膜中の不純物に関する考察
    09 Aug. 2017
  • 赤色LEDに向けたDERI法によるGaInN薄膜のRF-MBE成長検討
    09 Aug. 2017
  • 第一原理計算とX線光電子分光法によるp形NiO薄膜の電子構造の解析
    09 Aug. 2017
  • ミストCVD法によるIn2O3薄膜の結晶構造制御
    09 Aug. 2017
  • ミストCVD法によるSn添加Ga2O3成長とそのデバイス応用
    09 Aug. 2017
  • ICP-RIEによるGaNテンプレートのアレイエッチングの製作検討
    08 Aug. 2017
  • 素子分離のためのICP-RIEによるエッチング垂直性の検討
    08 Aug. 2017
  • RF-MBE法を用いたDERI法によるInN薄膜成長における極性が与える影響
    08 Aug. 2017
  • 光熱偏向分光法を用いたGa1-xInxN薄膜における非発光再結合の検討
    08 Aug. 2017
  • In-situ X-ray Reciprocal Space Mapping Measurements in GaInN growth on GaN and InN by RF-MBE
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Onuma; T.Honda; and Y.Nanishi
    12th International Conference On Nitride Semiconductors (ICNS-12), 26 Jul. 2017
  • MgO基板上MgZnOの断面TEM観察とその発光
    15 Jul. 2017
  • Optical Properties of Ga2O3 Films and Crystals
    T.Onuma; S.Saito; K.Sasaki; K.Goto; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki
    Compund Semiconductor Week 2017 (CSW 2017), 16 May 2017, [Invited]
  • Relation between electrical and optical properties of p-type NiO films
    M.Ono; T.Onuma; R.Goto; K.Sasaki; H.Nagai; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; M.Sato; and T.Honda
    Compund Semiconductor Week 2017 (CSW 2017), 16 May 2017
  • Fabrication of µ-LED array structures using ICP dry-etching
    R.Nawa; T.Onuma; T.Yamaguchi; J.-S. Jang; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Comparison of III-polar and N-polar GaInN films grown by RF-MBE
    Y.Nakajima; K.Uehara; T.Yamaguchi; T.Onuma; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Charge transfer transitions in p-type NiO films studied by optical measurements and X-ray photoelectron spectroscopy
    M.Ono; T.Onuma; K.Sasaki; H.Nagai; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; M.Sato; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • Mist CVD growth of Sn-doped Ga2O3 thin films and its device application
    K.Rikitake; T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), 20 Apr. 2017
  • 単斜晶酸化ガリウム結晶における光学遷移過程
    15 Mar. 2017
  • p形NiO薄膜における電気的特性と光学的特性の関係
    14 Mar. 2017
  • ワイドギャップ半導体の魅力 ~物性物理からデバイス工学まで~
    24 Jan. 2017
  • b-Ga2O3結晶における光学的異方性の解析
    13 Jan. 2017
  • ミストCVD法を用いたCu3N成長
    03 Dec. 2016
  • ミストCVD法を用いたNiO結晶成長
    03 Dec. 2016
  • (0001)a-Al2O3基板上へのGa2-xSnxO3薄膜のミストCVD成長
    03 Dec. 2016
  • Growth and characterization of In2O3 on various substrates by mist CVD
    T.Kobayashi; K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    Materials Research Society, 2016 Fall Meeting & Exhibit, Symposium, 30 Nov. 2016
  • Characterization of GaN layers grown on Al templates by RF-MBE
    K.Uehara; Y.Hoshikawa; T.Yamaguchi; T.Onuma; and T.Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Growth and characterization of bixbite-type In2O3 thin films by mist CVD
    T.Kobayashi; K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Fabrication of CNT-doped Ga2O3 Thin Films by Molecular Precursor Method
    Y.Takahashi; T.Onuma; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Demonstration of monolithic GaN Based UV MOS-LEDs for Flat-Panel Display
    H.Matsuura; K.Serizawa; T.Onuma; T.Yamaguchi; and T.Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • In-situ monitoring in RF-MBE growth of In-based nitrides
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Araki; T.Onuma; T.Honda; and Y.Nanishi
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Toward the Growth of Cu3N by mist CVD
    M.Takahashi; H.Ito; T.Yamaguchi; H.Nagai; T.Onuma; M.Sato; and T.Honda
    The 15th International Symposium on Advanced Technology (ISAT-15), 10 Nov. 2016
  • Al薄膜上GaN成長における低温GaN緩衝層挿入の影響
    07 Nov. 2016
  • パルスインジェクショ法を用いたCu2O結晶成長
    07 Nov. 2016
  • Temperature-Dependent Cathodoluminescence Spectra of Rocksalt MgxZn1-xO films grown by Mist Chemical Vapor Deposition Method
    T.Onuma; K.Tsumura; K.Kaneko; R.Nawa; M.Ono; T.Uchida; R.Jinno; T.Yamaguchi; S.Fujita; and T.Honda
    The 9th International Workshop on ZnO and Related Materials (IWZnO 2016), 01 Nov. 2016
  • Relation between electrical and optical properties in p-type NiO
    M.Ono; T.Onuma; R.Goto; K.Sasaki; H.Nagai; T.Yamaguchi; M.Higashiwaki; A.Kuramata; S.Yamakoshi; M.Sato; and T.Honda
    The 3rd Innovation Forum of Advanced Engineering and Education (IFAEE3), 01 Nov. 2016
  • Fabrication of Vertical-Injection Type GaN-Based MIS Diodes with Near UV Transparent Oxide Electrodes
    T.Honda; S.Fujioka; T.Onuma; T.Yamaguchi; H.Nagai; and M.Sato
    International Workshop on Nitride Semiconductors (IWN 2016), 02 Oct. 2016
  • Local Structural Analysis around In Atoms in Al0.82In0.18N alloy by Using X-Ray Absorption Fine-Structure Measurements
    R.Seiki; D.Komori; K.Ikeyama; T.Ina; T.Onuma; T.Miyajima; T.Takeuchi; S.Kamiyama; M.Iwaya; and I.Akasaki
    International Workshop on Nitride Semiconductors (IWN 2016), 02 Oct. 2016
  • Deep-ultraviolet luminescence in rocksalt-structured Mg1-xZnxO thin films on MgO substrates
    K.Kaneko; K.Tsumura; T.Onuma; T.Uchida; R.Jinno; T.Yamaguchi; T.Honda; and S.Fujita
    European Materials Research Society, 2016 Fall Meeting, 19 Sep. 2016
  • RF-MBE法による低温GaN緩衝層を挿入したAl薄膜上GaN成長検討
    16 Sep. 2016
  • b-Ga2O3薄膜と単結晶の光学定数の比較
    16 Sep. 2016
  • 岩塩構造Mg1−xZnxO薄膜の深紫外発光
    15 Sep. 2016
  • X線吸収微細構造測定によるAl0.82In0.18Nの局所構造解析
    13 Sep. 2016
  • Observation of exciton-LO-phonon interaction in β-Ga2O3 single crystals
    T.Onuma; S.Saito; K.Sasaki; K.Goto; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki
    German-Japanese Gallium Oxide Technology Meeting 2016 (GJGOTM2016), 09 Sep. 2016
  • Impact of GaN low-temperature buffer layer on GaN growth on Al templates
    Y.Hoshikawa; Y.Suzuki; K.Uehara; T.Onuma; T.Yamaguchi; and T.Honda
    The 19th International Conference on Molecular Beam Epitaxy (MBE2016), 04 Sep. 2016
  • 窒化物系面発光レーザに用いられた混晶半導体Al0.82In0.18NにおけるIn原子近傍の局所構造と光学特性との関係
    03 Sep. 2016
  • Mist CVD法によるIn2O3薄膜の結晶成長
    09 Aug. 2016
  • ミストCVD法を用いたCu2O薄膜成長
    09 Aug. 2016
  • 銀分散亜鉛薄膜によるプラズモン共鳴放出
    09 Aug. 2016
  • RF-MBE法を用いたAl薄膜上GaN成長における低温GaNバッファ層挿入の影響
    09 Aug. 2016
  • MOVPE法で成長したGaN薄膜におけるバッファ層堆積後の昇温時間とバッファ層膜厚の影響
    09 Aug. 2016
  • 分子プレカーサー法を用いたMgO添加GIO薄膜製作検討
    09 Aug. 2016
  • プラズマ生成条件を考慮したRF-MBE法によるAlInN薄膜成長
    09 Aug. 2016
  • Strain Relaxation Analysis Using In-situ X-ray Reciprocal Space Mapping Measurements in RF-MBE Growth of GaInN
    T.Yamaguchi; T.Sasaki; M.Takahasi; T.Onuma; T.Honda; and Y.Nanishi
    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18), 07 Aug. 2016
  • Mist-CVD-Grown Crystalline In2O3 Thin-Film Transistors with Low Off-State Current
    S.Aikawa; K.Tanuma; T.Kobayashi; T.Yamaguchi; T.Onuma; and T.Honda
    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18), 07 Aug. 2016
  • Rock salt型MgZnO薄膜の成長とその深紫外発光特性
    30 Jul. 2016
  • Effects of GaN low-temperature buffer layer on GaN surface flatness grown on Al templates
    Y.Hoshikawa; Y.Suzuki; K.Uehara; T.Onuma; T.Yamaguchi; and T.Honda
    35th Electronic Materials Symposium, Moriyama, 06 Jul. 2016
  • Mist CVD growth of In2O3 on various substrates
    T.Kobayashi; K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    35th Electronic Materials Symposium, Moriyama, 06 Jul. 2016
  • Deep-ultraviolet luminescence in rocksalt- structured Mg1-xZnxO thin films
    K.Kaneko; K.Tsumura; T.Onuma; T.Uchida; R.Jinno; T.Yamaguchi; T.Honda; and S.Fujita
    35th Electronic Materials Symposium, 06 Jul. 2016
  • Surface plasmon resonant emission from Ag dispersed ZnO films fabricated by molecular precursor method
    D.Taka; T.Onuma; T.Shibukawa; H.Nagai; T.Yamaguchi; J-.S.Jang; M.Sato; and T.Honda
    The 43rd International Symposium on Compound Semiconductors (ISCS 2016), 26 Jun. 2016
  • Anisotropic optical constants in b-Ga2O3 single crystal
    T.Onuma; S.Saito; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; A.Kuramata; and M.Higashiwaki
    58th Electronic Materials Conference (EMC-58), 23 Jun. 2016
  • Optical properties of ZnO films dispersed with Ag nanocrystals fabricated by molecular precursor method
    D.Taka; T.Onuma; T.Shibukawa; H.Nagai; T.Yamaguchi; J-.S.Jang; M.Sato; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’16 (LEDIA ’16), 19 May 2016
  • Mist CVD growth of In2O3 films on (0001)alfa-Al2O3 substrates and (0001)GaN templates
    T.Kobayashi; K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’16 (LEDIA ’16), 19 May 2016
  • β-Ga2O3結晶における励起子-LOフォノン相互作用
    21 Mar. 2016
  • (0001)α-Al2O3基板上および(0001)GaNテンプレート上へのIn2O3膜のミストCVD成長
    19 Mar. 2016
  • 分子プレカーサー法を用いたIn-Ga-Mg-O薄膜製作検討
    19 Mar. 2016
  • 分子プレカーサー法で製作した銀分散ZnO薄膜の光学的特性
    19 Mar. 2016
  • Valence band structure of monoclinic gallium oxide studied by polarized optical measurements
    T.Onuma; S.Saito; K.Sasaki; K.Goto; T.Masui; T.Yamaguchi; T.Honda; and M.Higashiwaki
    The Collaborative Conference on Crystal Growth 2015 (3CG 2015), 15 Dec. 2015
  • Technical issues of GaInN growth with high indium composition for LEDs
    T.Honda; T.Yamaguchi; and T.Onuma
    The Collaborative Conference on Crystal Growth 2015 (3CG 2015), 15 Dec. 2015
  • Epitaxial growth of GaInN by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy
    T.Yamaguchi; T.Honda; T.Onuma; T.Sasaki; M.Takahasi; T.Araki and Y.Nanishi
    第25回日本MRS年次大会, 09 Dec. 2015
  • Study of nitridation conditions of Al layer for GaN growth by RF-MBE
    Y.Hoshikawa; T.Onuma; T.Yamaguchi; and T.Honda
    Materials Research Society, 2015 Fall Meeting & Exhibit, 03 Dec. 2015
  • Growth temperature dependence of Ga2O3 and In2O3 growth rates in Mist CVD
    K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    Materials Research Society, 2015 Fall Meeting & Exhibit, 02 Dec. 2015
  • Impact of nitridation on GaN growth on (0001)sapphire with an Al layer as a release layer by RF-MBE
    Y.Hoshikawa; S.Osawa; Y.Matsumoto; T.Onuma; T.Yamaguchi; and T.Honda
    The 6th International Symposium on Growth of III-Nitrides (ISGN-6), 10 Nov. 2015
  • Optical Anisotropy in (010) Plane of beta-Ga2O3 Single Crystals
    T.Onuma; S.Saito; K.Sasaki; K.Goto; T.Masui; T.Yamaguchi; T.Honda; and M.Higashiwaki
    1st International Workshop on Gallium Oxide and Related Materials, 06 Nov. 2015
  • Measurements of Third-Order Nonlinear Optical Susceptibility of beta-Ga2O3 Single Crystals
    S.Saito; M.Ichida; T.Onuma; K.Sasaki; A.Kuramata; N.Sekine; A.Kasamatsu; and M.Higashiwaki
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Growth of alfa-(AlGa)2O3 by mist CVD and evaluation of its thermal stability
    M.Takahashi; T.Hatakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Growth temperature dependence of Ga2O3 growth rate by mist CVD
    K.Tanuma; T.Onuma; T.Yamaguchi; and T.Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Fabrication of p-type NiO thin films by molecular precursor method
    R.Goto; T.Onuma; T.Yamaguchi; H.Nagai; M.Sato; and T.Honda
    1st International Workshop on Gallium Oxide and Related Materials, 04 Nov. 2015
  • Investigation of in-situ X-ray reciprocal space mapping measurements in GaInN growth on GaN by RF-MBE
    M.Sawada; T.Yamaguchi; T.Sasaki; K.Narutani; R.Deki; T.Onuma; T.Honda; M.Takahashi; and Y. Nanishi
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Impact of nitridation on GaN growth on sapphire with an Al layer as a sacrifice layer by RF-MBE
    Y.Hoshikawa; S.Osawa; Y.Matsumoto; T.Onuma; T.Yamaguchi; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • AR-XPS measurement of AlOx/AlN/GaN heterostructures
    D.Isono; S.Takahashi; Y.Sugiura; T.Onuma; T.Yamaguchi; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Comprehensive study on GaN and InN etching by inductively coupled plasma reactive ion etching
    K.Narutani; T.Yamaguchi; T.Araki; Y.Nanishi; T.Onuma; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Fundamental Study on Local Surface Plasmons in Ag-nanocrystallites ZnO films toward Future Applications in Nitride-based LEDs
    D.Taka; T.Onuma; T.Shibukawa; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Mist-CVD Growth of In2O3
    T.Kobayashi; K.Tanuma; T.Yamaguchi; T.Onuma; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • Study on the Phase Transition Temperature of alfa-(AlGa)2O3 Grown by Mist CVD
    M.Takahashi; T.Hayakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    The 14th International Symposium on Advanced Technology (ISAT-14), 02 Nov. 2015
  • ICP-RIEによるGaN,GaInN,InNエッチングとGaInN系LED製作への応用
    29 Oct. 2015
  • In-situ X-ray Reciprocal Space Mapping Measurements in GaInN Growth on GaN by RF-MBE
    T.Yamaguchi; T.Sasaki; K.Narutani; M.Sawada; R.Deki; T.Onuma; T.Honda; M.Takahasi; and Y.Nanishi
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • Comprehensive study on inductively coupled plasma reactive ion etching of GaN and InN
    K.Narutani; T.Yamaguchi; T.Araki; Y.Nanishi; T.Onuma; and T.Honda
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • Thermal stability of alfa-(AlGa)2O3 grown by mist CVD
    M.Takahashi,T.Hatakeyama,T.Onuma,T.Yamaguchi,and T.Honda
    The 31st North American Conference on Molecular Beam Epitaxy (NAMBE 2015), 07 Oct. 2015
  • β-Ga2O3結晶の(010)面における光学的異方性
    15 Sep. 2015
  • MgZnO growth on (0001)sapphire by mist chemical vapor deposition
    R.Goto; H.Nagai; T.Yamaguchi; T.Onuma; M.Sato; and T.Honda
    17th International Conference on II-VI Compounds and Related Materials, 14 Sep. 2015
  • RF-MBE法によるGaN上GaInN成長におけるその場X線逆格子マッピング測定
    14 Sep. 2015
  • ミストCVD法により製作したα-(AlGa)2O3の熱的安定性
    13 Sep. 2015
  • β-Ga2O3単結晶の光学非線形屈折率測定
    13 Sep. 2015
  • alfa-Ga2O3 and alfa-(AlGa)2O3 Buffer Layers in Growth of GaN
    T.Yamaguchi; T.Hatakeyama; K.Tanuma; T.Hirasaki; H.Murakami; T.Onuma; and T.Honda
    11th International Conference On Nitride Semiconductors (ICNS-11), 01 Sep. 2015
  • Estimation of Carrier Density of Widegap Semiconductor β-Ga2O3 Single Crystals by THz Reflectance Measurement
    S.Saito; T.Onuma; K.Sasaki; A.Kuramata; N.Sekine; A.Kasamatsu; M.Higashiwaki
    40th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz 40), 23 Aug. 2015
  • Fabrication of (Ga, In)2O3-x films on GaN-based LED structures by molecular precursor method for near-UV transparent electrodes
    T.Honda; H.Nagai; S.Fujioka; R.Goto; T.Onuma; T.Yamaguchi; and M.Sato
    22nd International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 22), 14 Aug. 2015
  • Fabrication of copper thin films using the molecular precursor method
    H.Nagai; T.Yamaguchi; T.Onuma; I.Takano; and T.Honda
    22nd International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 22), 14 Aug. 2015
  • Study on spontaneous emission in nitride-based LEDs with Ag-nanocrystallites ZnO films fabricated by molecular precursor method
    T.Onuma; T.Shibukawa; D.Taka; K.Serizawa; E.Adachi; H.Nagai; T.Yamaguchi; J.-S.Jang; M.Sato; and T.Honda
    22nd International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 22), 14 Aug. 2015
  • Growth of Group-III Oxides by Mist Chemical Vapor Deposition and Discussion on Thier Growth Mechanisms
    T.Yamaguchi; K.Tanuma; H.Nagai; T.Onuma; T.Honda; and M.Sato
    22nd International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 22), 14 Aug. 2015
  • 分子プレカーサー水溶液を用いたミスト化学気相成長による酸化亜鉛薄膜製作
    09 Aug. 2015
  • ミストCVD法により製作したα-(AlGa)2O3の熱的安定性
    09 Aug. 2015
  • ICP-RIEによるInNおよびGaN温度依存性エッチング
    09 Aug. 2015
  • RF-MBE法によるSapphire基板上Al犠牲層の窒化処理によるGaN成長の影響
    09 Aug. 2015
  • ミストCVD法を用いたGa2O3成長における成長速度の温度依存性
    09 Aug. 2015
  • RF-MBE法を用いたSapphire基板上GaN成長
    09 Aug. 2015
  • MOCVD法を用いて成長したGaInN薄膜の欠陥評価
    08 Aug. 2015
  • AR-XPS法を用いたAlOX/AlN/GaN構造のバンド構造解析
    08 Aug. 2015
  • RF-MBE法によるGaN上GaInN成長におけるその場X線逆格子マッピング測定
    08 Aug. 2015
  • Growth condition dependence of Ga-In-O films by mist-CVD
    K.Tanuma; R.Goto; T.Onuma; T.Yamaguchi; and T.Honda
    34th Electronic Materials Symposium, 15 Jul. 2015
  • Inductively coupled plasma reactive ion etching of GaN and InN
    K.Narutani; T.Yamaguchi; T.Araki; Y.Nanishi; T.Onuma; and T.Honda
    34th Electronic Materials Symposium, 15 Jul. 2015
  • THz Time-domain Spectroscopy of Widegap Semiconductor β-Ga2O3 Single Crystals
    S.Saito; N.Sekine; A.Kasamatsu; M.Higashiwaki; T.Onuma; K.Sasaki; and A.Kuramata
    3rd International Symposium on Microwave/Terahertz Science and Applications (MTSA 2015), 30 Jun. 2015
  • Determination of Direct and Indirect Bandgap-Energies of beta-Ga2O3 by Polarized Transmittance and Reflectance Spectroscopy
    T.Onuma; S.Saito; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; and M.Higashiwaki
    57th Electronic Materials Conference (EMC-57), 24 Jun. 2015
  • Growth mechanisms of InN and its Alloys using droplet elimination by radical beam irradiation
    T.Yamaguchi; T.Araki; T.Onuma; T.Honda; and Y.Nanishi
    The Energy Materials Nanotechnology Meeting on Droplets 2015 (EMN 2015), 08 May 2015
  • Aluminum Growth on Sapphire Substrate with Surface Nitridation by RF-MBE
    Y.Hoshikawa; S.Osawa; Y.Matsumoto; T.Yamaguchi; T.Onuma; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’15 (LEDIA ’15), 22 Apr. 2015
  • Fundamental Study on Growth of alfa-(AlGa)2O3 Alloys by Mist CVD −A Study on Growth Rate of alfa-Al2O3 Compared with alfa-Ga2O3−
    M.Takahashi; T.Hatakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’15 (LEDIA ’15), 22 Apr. 2015
  • Optical Anisotropy in beta-Ga2O3 Crystals Grown by Melt-Growth Methods
    T.Onuma; S.Saito; K.Sasaki; T.Masui; T.Yamaguchi; T.Honda; and M.Higashiwaki
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’15 (LEDIA ’15), 22 Apr. 2015
  • Ga-In-O薄膜のウェットエッチングプロセス検討
    13 Mar. 2015
  • ワイドギャップ半導体beta-Ga2O3単結晶のテラヘルツ波反射測定によるキャリア密度評価
    13 Mar. 2015
  • ミストCVDによるalfa-(AlGa)2O3混晶成長の基礎検討-alfa-Ga2O3と比較したalfa-Al2O3の成長速度の検討-
    13 Mar. 2015
  • RF-MBE法による窒化サファイア基板上アルミニウム薄膜成長
    12 Mar. 2015
  • beta-Ga2O3結晶の透過と反射スペクトルの偏光依存性
    12 Mar. 2015
  • Growth and doping of In-based nitride semiconductors using DERI method
    T.Yamaguchi; T.Araki; T.Onuma; T.Honda; and Y.Nanishi
    The 2015 Materials Challenges in Alternative and Renewable Energy Conference (MCARE 2015), 25 Feb. 2015
  • Fabrication of alfa-(AlGa)2O3 on sapphire substrate by mist CVD
    T.Hatakeyama; K.Tanuma; S.Osawa; Y.Sugiura; T.Onuma; T.Hirasaki; H.Murakami; T.Yamaguchi; and T.Honda
    10th International Symposium on Semiconductor Light Emitting Devices (ISSLED2014), 16 Dec. 2014
  • Properties of near-UV transparent Ga-In-O electrode in GaN-based MOS-LED
    S.Fujioka; T.Yasuno; T.Onuma; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    10th International Symposium on Semiconductor Light Emitting Devices (ISSLED2014), 15 Dec. 2014
  • AR-XPS spectra and band-bending properties of +c, -c and m-GaN surfaces
    D.Isono; S.Fujioka; Y.Sugiura; T.Onuma; T.Yamaguchi; and T.Honda
    Materials Research Society, 2014 Fall Meeting & Exhibit, 02 Dec. 2014
  • THz wave Absorption Spectra of Widegap Semiconductor beta-Ga2O3 Single Crystals
    S.Saito; T.Onuma; K.Sasaki; A.Kuramata; N.Sekine; A.Kasamatsu; and M.Higashiwaki
    Materials Research Society, 2014 Fall Meeting & Exhibit, 01 Dec. 2014
  • Growth of oxide thin films by mist chemical vapor deposition,-Application of corundum-structured oxides for growth of GaN-
    T.Hatakeyama; K.Tanuma; S.Osawa; Y.Sugiura; T.Onuma; T.Yamaguchi; and T.Honda
    The 13th International Symposium on Advanced Technology (ISAT13), 14 Nov. 2014
  • Growth and characterization of Ga-In-O by mist CVD
    K.Tanuma; T.Hatakeyama; R.Goto; T.Onuma; T.Yamaguchi; and T.Honda
    The 13th International Symposium on Advanced Technology (ISAT13), 14 Nov. 2014
  • 六方晶GaN中に挿入した一分子層InNの構造完全性による影響
    13 Nov. 2014
  • Mist Chemical Vapor Deposition Growth of Ga-In-O films
    K.Tanuma; T.Hatakeyama; R.Goto; T.Onuma; T.Yamaguchi; and T.Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE), 01 Nov. 2014
  • Optical characterization of gallium-indium-oxide wide bandgap semiconductors for future device applications
    T.Onuma; C.Mochizuki; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    The Joint symposia of the 1st Innovation Forum of Advanced Engineering and Education (IFAEE) and the 21st International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium, 01 Nov. 2014
  • Interface reaction between Al and N atoms in GaN growth on Al by RF-MBE
    S.Osawa; T.Yamaguchi; T.Onuma; and T.Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE), 01 Nov. 2014
  • Characterization of GaN thin film grown on pseudo Al template by radio-frequency plasma-assisted molecular beam epitaxy
    Y.Watanabe; S.Osawa; T.Onuma; T.Yamaguchi; and T.Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE), 01 Nov. 2014
  • Mist chemical vapor deposition growth of low Al-composition alfa-(AlGa)2O3
    T.Hatakeyama; K.Tanuma; S.Osawa; Y.Sugiura; T.Onuma; T.Hirasaki; H.Murakami; T.Yamaguchi; and T.Honda
    The 1st Innovation Forum of Advanced Engineering and Education (IFAEE), 01 Nov. 2014
  • Ga2O3基板の光学的特性評価
    26 Sep. 2014
  • AlOx/AlN/GaNヘテロ構造の発光特性
    20 Sep. 2014
  • 疑似Al基板上GaN薄膜のフォトルミネッセンス評価
    19 Sep. 2014
  • RF-MBE法を用いたGaN成長が疑似Al基板に与える影響
    19 Sep. 2014
  • Mist CVD法を用いて製作したalfa-Al2O3基板上Ga-In-O薄膜の評価
    18 Sep. 2014
  • ワイドギャップ半導体beta-Ga2O3単結晶のテラヘルツ波吸収測定
    17 Sep. 2014
  • Growth of alfa-Ga2O3 on alfa-Al2O3 substrate by mist CVD and growth of GaN on alfa-Ga2O3 buffer layer by RF-MBE
    T.Yamaguchi; T.Hatakeyama; Y.Sugiura; T.Onuma; and T.Honda
    18th International Conference on Molecular Beam Epitaxy (MBE2014), 07 Sep. 2014
  • Growth of pn-GaInN structures by RF-MBE and fabrication of homojunction-type light emitting diodes
    K.Narutani; T.Yamaguchi; K.Wang; T.Araki; Y.Nanishi; L.Sang; M.Sumiya; S.Fujioka; T.Onuma; and T. Honda
    18th International Conference on Molecular Beam Epitaxy (MBE2014), 07 Sep. 2014
  • Optical properties of GaInN p-n homojunction blue-green light-emitting-diodes
    T.Onuma; K.Narutani; S.Fujioka; T.Yamaguchi; K.Wang; T.Araki; Y.Nanishi; L.Sang; M.Sumiya; and T.Honda
    International Union of Materials Research Societies, International Conference in Asia 2014 (IUMRS-ICA 2014), 24 Aug. 2014
  • Thickness Dependence of Pseudo Aluminum Templates in Growth of GaN by RF-MBE
    S.Osawa; Y.Watanabe; T.Onuma; T.Yamaguchi; and T.Honda
    International Workshop on Nitride Semiconductors 2014 (IWN2014), 24 Aug. 2014
  • Study on structure perfection of one-monolayer thick InN in hexagonal GaN using XRD techniques
    N.Watanabe; D.Tajimi; N.Hashimoto; K.Kusakabe; K.Wang; T.Yamaguchi; T.Onuma; A.Yoshikawa; and T.Honda
    International Workshop on Nitride Semiconductors 2014 (IWN2014), 24 Aug. 2014
  • RF-MBE growth of group-III nitrides and mist CVD growth of group-III oxides
    T.Yamaguchi; T.Onuma; H.Nagai; C.Mochizuki; M.Sato; T.Honda; T.Araki; and Y.Nanishi
    6th International Conference on Mechanical and Electronics Engineering (ICMEE 2014), 16 Aug. 2014
  • RF-MBE法を用いた膜厚の異なるAlテンプレート上GaN 成長
    26 Jul. 2014
  • RF-MBE 法によるGaInN 厚膜成長とpn ホモ接合型青緑色LED の製作
    26 Jul. 2014
  • Impact of UV transparent Ga-In-O electrode in vertical-type GaN-based metal oxide semiconductor light-emitting diodes
    S.Fujioka; T.Yasuno; A.Sato; T.Onuma; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    33th Electronic Materials Symposium, 09 Jul. 2014
  • Blue-green light emitting diodes using pn-GaInN homojunction-type structure
    K.Narutani; T.Yamaguchi; K.Wang; T.Araki; Y.Nanishi; L.Sang; M.Sumiya; S.Fujioka; T.Onuma; and T. Honda
    33th Electronic Materials Symposium, 09 Jul. 2014
  • Investigation of Ga-In-O films grown on alfa-Al2O3 substrates by mist CVD
    K.Tanuma; T.Hatakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    33th Electronic Materials Symposium, 09 Jul. 2014
  • Impact of perfection on one-monolayer thick InN in hexagonal GaN
    N.Watanabe; D.Tajimi; T.Onuma; N.Hashimoto; K.Kusakabe; K.Wang; T.Yamaguchi; A.Yoshikawa; and T.Honda
    33th Electronic Materials Symposium, 09 Jul. 2014
  • Mist CVD growth of Ga-In-O films grown on alfa-Al2O3 substrates
    K.Tanuma; T.Hatakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    The International Union of Materials Research Societies - International Conference on Electronic Materials 2014 (IUMRS-ICEM 2014), 10 Jun. 2014
  • Mist Chemical Vapor Deposition Growth of Ga2O3, In2O3 and Their Alloys
    T.Yamaguchi; K.Tanuma; T.Hatakeyama; T.Onuma; and T.Honda
    The 39th International Symposium on Compound Semiconductors (ISCS 2012), 11 May 2014
  • RF-MBE growth of GaInN ternary alloys using DERI method and fabrication of pn-GaInN LEDs
    T.Yamaguchi; K.Narutani; T.Onuma; T.Honda; T.Araki; and Y.Nanishi
    2014 International Workshop on Future Energy Materials and Devices (IWFEMD 2014), 01 May 2014
  • Light emission properties of ultra thin InN in the GaN matrix
    T.Honda; T.Yamaguchi; T.Onuma; D.Tajimi; N.Watanabe; N.Hashimoto; K.Kusakabe; and A.Yoshikawa
    The International Conference on Metamaterials and Nanophysics 2014 (METANANO 2014), 22 Apr. 2014
  • Fabrication of Vertical-Type GaN-Based Metal Oxide Semiconductor Light-Emitting Diodes
    S.Fujioka; T.Yasuno; A.Sato; T.Onuma; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    Conference on LED and Its Industrial Application ’14 (LEDIA ’14), 22 Apr. 2014
  • RF-MBE Growth of pn-GaInN Structure and Fabrication of Blue-Green Homojunction-Type Light Emitting Diode
    K.Narutani; T.Yamaguchi; K.Wang; T.Araki; Y.Nanishi; L.Sang; M.Sumiya; S.Fujioka; T.Onuma; and T.Honda
    Conference on LED and Its Industrial Application ’14 (LEDIA ’14), 22 Apr. 2014
  • Optical Properties of Ga-In-O Polycrystalline Films Fabricated by Molecular Precursor Method
    T.Onuma; T.Yasuno; S.Takano; R.Goto; S.Fujioka; T.Hatakeyama; H.Hara; C.Mochizuki; H.Nagai; T.Yamaguchi; M.Sato; and T.Honda
    Conference on LED and Its Industrial Application ’14 (LEDIA ’14), 22 Apr. 2014
  • GaInNのRF-MBE成長とpn ホモ接合型青緑色LEDの製作
    20 Mar. 2014
  • 自立GaN基板上m面Al1-xInxNエピタキシャル薄膜の発光特性(I)
    19 Mar. 2014
  • ミストCVD法を用いたGa2O3結晶成長における成長速度の温度依存性
    18 Mar. 2014
  • 分子プリカーサー法で製作したGa-In-O多結晶薄膜の発光特性
    17 Mar. 2014
  • 光・電子線を用いたワイドギャップ窒化物・酸化物半導体の評価
    26 Nov. 2013
  • Mist CVD growth of alfa-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on alfa-Ga2O3/sapphire templetes
    T.Hatakeyama; T.Yamaguchi; D.Tajimi; Y.Sugiura; R.Amiya; T.Onuma; and T.Honda
    The 12th International Symposium on Advanced Technology (ISAT12), 13 Nov. 2013
  • Ga2O3 and In2O3 growth by mist CVD
    K.Tanuma; T.Yamaguchi; T.Hatakeyama; T.Onuma; and T.Honda
    The 12th International Symposium on Advanced Technology (ISAT12), 13 Nov. 2013
  • Effects of (Al,Ga)Ox/GaN interface states on GaN-based Schottky-type light-emitting diodes
    S.Fujioka; R.Amiya; T.Onuma; T.Yamaguchi; and T.Honda
    The 2nd International Conference on Advanced Electromaterials, 12 Nov. 2013
  • Ga2O3上GaN成長とGaN上Ga2O3成長
    06 Nov. 2013
  • ミストCVD 法を用いたGa2O3及びIn2O3成長
    06 Nov. 2013
  • GaN系ショットキー型発光ダイオードにおける(Al,Ga)Ox/GaN界面準位の影響
    17 Sep. 2013
  • Temperature dependent cathodoluminescence spectra of Ga-In-O films fabricated by molecular precursor method
    T.Onuma; T.Yasuno; S.Fujioka; S.Takano; T.Oda; H.Nagai; H.Hara; C.Mochizuki; M.Sato; and T.Hond
    The 2013 JSAP-MRS Joint Symposia, 16 Sep. 2013
  • ミストCVD法を用いたGaN基板上へのGa2O3成長
    16 Sep. 2013
  • beta-Ga2O3結晶における青色発光強度と抵抗率の相関
    16 Sep. 2013
  • RF-MBE growth of GaN films on nitridated alfa-Ga2O3 buffer layer
    T.Yamaguchi; T.Hatakeyama; D.Tajimi; Y.Sugiura; T.Onuma; and T.Honda
    The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 11 Aug. 2013
  • Polarized Raman Spectra in beta-Ga2O3 Crystals
    T.Onuma; S.Fujioka; T.Yamaguchi; M.Higashiwaki; K.Sasaki; T.Masui; and T.Honda
    The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 11 Aug. 2013
  • Effects of surface modification on emission property of GaN Schottky diodes
    S.Fujioka; R.Amiya; T.Onuma; T.Yamaguchi; and T.Honda
    32th Electronic Materials Symposium, 10 Jul. 2013
  • Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguide
    D.Tajimi; Y.Sugiura; T.Hatakeyama; T.Onuma; T.Yamaguchi; and T.Honda
    32th Electronic Materials Symposium, 10 Jul. 2013
  • Temperature Dependent Cathodoluminescence Spectra of beta-Ga2O3 Crystals
    T.Onuma; S.Fujioka; T.Yamaguchi; M.Higashiwaki; K.Sasaki; T.Masui; and T.Honda
    Conference on LED and Its Industrial Application ’13 (LEDIA ’13), 23 Apr. 2013
  • Surface Modification of GaN Crystals and Its Effects on Optical Properties
    S.Fujioka; R.Amiya; T.Onuma; T.Yamaguchi; and T.Honda
    Conference on LED and Its Industrial Application ’13 (LEDIA ’13), 23 Apr. 2013
  • Cathodoluminescence Spectra of beta-gallium Oxide Thin Film Fabricated by Molecular Precursor Method
    S.Takano; H.Nagai; H.Hara; C.Mochizuki; I.Takano; T.Onuma; T.Honda; and M.Sato
    Conference on LED and Its Industrial Application ’13 (LEDIA ’13), 23 Apr. 2013
  • beta-Ga2O3結晶の偏光ラマンスペクトル
    28 Mar. 2013
  • Growth of ultra-thin InN/GaN quantum well with super-weak waveguide by RF-MBE
    T.Honda; D.Tajimi; Y.Sugiura; T.Onuma; and T.Yamaguchi
    The 17th European Molecular Beam Epitaxy Workshop (Euro-MBE 2013), 10 Mar. 2013
  • Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
    T.Honda; T.Onuma; Y.Sugiura; and T.Yamaguchi
    Materials Research Society, 2012 Fall Meeting, 25 Nov. 2012
  • Structure and optical properties of transparent Ga2O3-x thin films fabricated by the molecular precursor method
    H.Nagai; S.Takano; H.Hara; C.Mochizuki; I.Takano; T.Onuma; T.Honda; and M.Sato
    The 11th International Symposium on Advanced Technology (ISAT-Special), 30 Oct. 2012
  • Electron-beam incident-angle-resolved cathodoluminescence studies on bulk ZnO crystals
    T.Onuma; S.Fujioka; F.Tomori; T.Yamaguchi; and T.Honda
    The 11th International Symposium on Advanced Technology (ISAT-Special), 30 Oct. 2012
  • ZnO単結晶の電子線入射角度依存カソードルミネセンス測定
    13 Sep. 2012
  • 酸化ガリウムのCLスペクトルの温度依存性
    13 Sep. 2012
  • 集積化GaN系発光素子のための超薄膜InNを挿入した弱導波路発光層の検討
    12 Sep. 2012
  • Incident Angle Resolved Cathodoluminescence Study of ZnO Single Crystals
    T.Onuma; T. Yamaguchi; and T. Honda
    The 39th International Symposium on Compound Semiconductors (ISCS 2012), 27 Aug. 2012
  • AlおよびAlOx膜堆積が極性GaNのPL強度に与える影響
    16 Mar. 2012
  • 高AlNモル分率AlGaN混晶薄膜の時間分解PL/CL評価
    16 Mar. 2012
  • 極性・非極性バルクZnO表面におけるCLスペクトルの比較
    15 Mar. 2012
  • アモノサーマルGaN基板上に形成したAlGaN/GaNの時間分解フォトルミネッセンス評価
    01 Sep. 2011
  • 六方晶GaNとZnOにおける表面再結合の比較
    01 Sep. 2011
  • 極性および非極性GaN表面における表面再結合過程
    01 Sep. 2011
  • 化合物原料MBE法を用いたZnO薄膜の結晶成長とその評価
    31 Aug. 2011
  • AlNエピタキシャル薄膜の発光寿命と点欠陥他の関係について
    31 Aug. 2011
  • Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
    T.Onuma; N.Sakai; T.Igaki; T.Yamaguchi; A.A.Yamaguchi; and T.Honda
    The 28th North American Conference on Molecular Beam Epitaxy (NAMBE 2011), 14 Aug. 2011
  • Ammonothermal growth of low oxygen concentration GaN using a dry acidic mineralizer and fabrication of an Al0.2Ga0.8N/GaN heterostructure
    S.F.Chichibu; K.Hazu; Y.Kagamitani; T.Onuma; D.Ehrentraut; T.Fukuda; and T.Ishiguro
    The 9th International Conference on Nitride Semiconductors (ICNS-9), 10 Jul. 2011
  • Time-resolved photoluminescence and time-resolved cathodoluminescence studies on AlN and high AlN mole fraction AlGaN alloys
    S.F.Chichibu; T.Onuma; K.Hazu; T.Sota; and A.Uedono
    The 9th International Conference on Nitride Semiconductors (ICNS-9), 10 Jul. 2011
  • Recombination dynamics in polar and nonpolar GaN surfaces
    N.Sakai; T.Igaki; T.Onuma; A.A.Yamaguchi; T.Yamaguchi; and T.Honda
    30th Electronic Materials Symposium, 29 Jun. 2011
  • Optical properties of GaN films and an AlGaN/GaN heterostructure fabricated on GaN substrates grown by the ammonothermal method using gas-phase synthesized NH4Cl mineralizer
    S.F.Chichibu; K.Hazu; Y.Kagamitani; T.Onuma; D.Ehrentraut; T.Fukuda; and T.Ishiguro
    The 5th Asia-Pacific Workshop on Widegap Semiconductors (APWS2011), 22 May 2011
  • ZnO growth for transparent electrodes by compound-source MBE
    Y.Sugiura; T.Oda; S.Obata; Y.Yoshihara; T.Onuma; and T.Honda
    The 5th Asia-Pacific Workshop on Widegap Semiconductors (APWS2011), 22 May 2011
  • Surface recombination in polar and nonpolar GaN surfaces
    N.Sakai; T.Onuma; A.A.Yamaguchi; and T.Honda
    The 5th Asia-Pacific Workshop on Widegap Semiconductors (APWS2011), 22 May 2011
  • Time-resolved photoluminescence of a two-dimentional electron gas in an Al0.2Ga0.8N/GaN heterostructure fabricated on GaN substrates grown by the ammonothermal method using acidic mineralizers
    K.Hazu; Y.Kagamitani; T.Onuma; D.Ehrentraut; T.Fukuda; T.Ishiguro; and S.F.Chichibu
    Eoropean Materials Research Society, 09 May 2011
  • Time-resolved photoluminescence and time-resolved cathodoluminescence studies on AlN and high AlN mole fraction AlGaN alloys
    S.F.Chichibu; T.Onuma; K.Hazu; T.Sota; and A.Uedono
    Eoropean Materials Research Society, 09 May 2011
  • m面自立GaN基板のチルトモゼイク異方性がNH3-MBE成長m面Al0.25Ga0.75N薄膜の発光特性に与える影響
    26 Mar. 2011
  • 極性・非極性(Al,In,Ga)N混晶薄膜における振動子強度の歪依存性
    26 Mar. 2011
  • 気相合成NH4Cl鉱化剤を用いて成長したアモノサーマルGaN基板上にMOVPE形成したAlGaN/GaNの時間分解フォトルミネッセンス評価
    26 Mar. 2011
  • MOVPE成長AlN薄膜の点欠陥・不純物が発光寿命に及ぼす影響
    25 Mar. 2011
  • 化合物原料MBE法によるZnO薄膜の製作検討
    25 Mar. 2011
  • Surface recombination mechanism in hexagonal GaN crystals
    N.Sakai; T.Onuma; T.Okuhata; A.A.Yamaguchi; and T.Honda
    The 9th International Symposium on Advanced Technology (ISAT9), 04 Nov. 2010
  • Time-resolved Photoluminescence and Time-resolved Cathodoluminescence Studies on AlN Epilayers Grown by Low-pressure Metalorganic Vapor Phase Epitaxy
    S.F.Chichibu; K.Hazu; T.Onuma; T.Sota; and A.Uedono
    International Workshop on Nitride Semiconductors 2010 (IWN2010), 19 Sep. 2010
  • Optical Properties of GaN Crystals Grown by Ammonothermal Method Using Acidic Mineralizers and Homoepitaxial Films Grown by Metalorganic Vapor Phase Epitaxy
    K.Hazu; Y.Kagamitani; T.Onuma; T.Ishiguro; T.Fukuda; and S.F.Chichibu
    International Workshop on Nitride Semiconductors 2010 (IWN2010), 19 Sep. 2010
  • Surface recombination of hexagonal GaN crystals
    N.Sakai; T.Okuhata; T.Onuma; A.A.Yamaguchi; and T.Honda
    International Workshop on Nitride Semiconductors 2010 (IWN2010), 19 Sep. 2010
  • 気相合成した酸性鉱化剤を用いて成長したアモノサーマルGaN及びMOVPEホモエピタキシャル層の評価
    14 Sep. 2010
  • ヨウ化アンモニウムを鉱化剤に用いたアモノサーマル法によるGaN育成
    14 Sep. 2010
  • Ammonothermal growth of GaN using a gas-phase synthesized acidic mineralizer and homoepitaxy by metalorganic vapor phase epitaxy
    S.F.Chichibu; Y.Kagamitani; K.Hazu; T.Onuma; T.Ishiguro; and T.Fukuda
    The Third International Symposium on Growth of III-Nitrides (ISGN-3), 04 Jul. 2010
  • Identification of cathodoluminescence peaks in m-plane AlxGa1-xN epilayers grown on freestanding GaN substrates prepared by halide vapor phase epitaxy
    K.Hazu; M.Kagaya; T.Hoshi; T.Onuma; and S.F.Chichibu
    The Third International Symposium on Growth of III-Nitrides (ISGN-3), 04 Jul. 2010
  • パルス電子線を用いた窒化物半導体のピコ秒時間分解分光計測(3) - MOVPE成長高AlNモル分率AlGaNの時間分解CL計測-
    18 Mar. 2010
  • パルス電子線を用いた窒化物半導体のピコ秒時間分解分光計測(2) - MOVPE成長AlNの時間分解PLとの比較 -
    18 Mar. 2010
  • パルス電子線を用いた窒化物半導体のピコ秒時間分解分光計測(1) -パルス電子線発生とGaN計測-
    18 Mar. 2010
  • 自立GaN基板へのm面Al1-xInxN薄膜のMOVPE成長
    17 Mar. 2010
  • アンモニアの相状態がアモノサーマル法GaN結晶作製に与える影響
    17 Mar. 2010
  • AlNエピタキシャル薄膜における励起子発光機構
    19 Nov. 2009
  • Capability of the bulk GaN single crystals spontaneously nucleated by the Na-flux method as an homoepitaxial substrate
    T.Onuma; T.Yamada; H.Yamane; and S.F.Chichibu
    The 8th International Conference on Nitride Semiconductors (ICNS-8), 18 Oct. 2009
  • Polarization properties of m-plane AlxGa1-xN films suffering from in-plane anisotropic stress
    K.Hazu; T.Hoshi; M.Kagaya; T.Onuma; and S.F.Chichibu
    The 8th International Conference on Nitride Semiconductors (ICNS-8), 18 Oct. 2009
  • Time-resolved photoluminescence study of AlN epilayers grown by low-pressure metalorganic vapor phase epitaxy
    T.Onuma; K.Hazu; T.Shibata; K.Kosaka; K.Asai; S.Sumiya; M.Tanaka; T.Sota; and S.F.Chichibu
    The 8th International Conference on Nitride Semiconductors (ICNS-8), 18 Oct. 2009
  • Spatially-resolved cathodoluminescence study on m-plane AlxGa1-xN films grown on m-plane free-standing GaN substrates
    S.F.Chichibu; K.Hazu; T.Hoshi; M.Kagaya; and T.Onuma
    The 8th International Conference on Nitride Semiconductors (ICNS-8), 18 Oct. 2009
  • AlN薄膜の時間分解フォトルミネッセンス
    10 Sep. 2009
  • m面AlxGa1-xN薄膜の偏光特性の面内異方性歪依存性
    10 Sep. 2009
  • NH3-MBE成長m面AlxGa1-xN薄膜の空間分解陰極線蛍光評価
    10 Sep. 2009
  • 陽電子消滅を用いたAlNの点欠陥と光学特性の研究
    08 Sep. 2009
  • アモノサーマル法による高純度GaN結晶育成
    08 Sep. 2009
  • Optical Properties of m-plane (In,Ga)N Films Grown by Metalorganic Vapor Phase Epitaxy
    T.Onuma; H.Yamaguchi; L.Zhao; M.Kubota; K.Okamoto; H.Ohta; and S.F.Chichibu
    International Symposium of post-silicon materials and devices research alliance project, 05 Sep. 2009
  • High purity GaN growth by the ammonothermal method using an acidic mineralizer
    Y.Kagamitani; S.F.Chichibu; T.Onuma; K.Hazu; T.Fukuda; and T.Ishiguro
    The 36th International Symposium on Compound Semiconductors (ISCS 2009), 30 Aug. 2009
  • Time-resolved photoluminescence studies of excitons in AlN epilayers grown by metalorganic vapor phase epitaxy
    T.Onuma; K.Hazu; T.Shibata; K.Kosaka; K.Asai; S.Sumiya; M.Tanaka; T.Sota; and S.F.Chichibu
    The 36th International Symposium on Compound Semiconductors (ISCS 2009), 30 Aug. 2009
  • Longitudinal-transverse splitting of A-excitons in ZnO homoepitaxial films grown by HWPSE method
    Y.Sawai; H.Amaike; T.Onuma; K.Hazu; and S.F.Chichibu
    9th International Conference on Physics of Light-Matter Coupling in Nanostructures (PLMCN9), 16 Apr. 2009
  • Polarization properties of m-plane AlxGa1-xN films suffering from in-plane anisotropic stress
    K.Hazu; T.Hoshi; M.Kagaya; T.Onuma; K.Fujito; H.Namita; and S.F.Chichibu
    9th International Conference on Physics of Light-Matter Coupling in Nanostructures (PLMCN9), 16 Apr. 2009
  • ヘリコン波励起プラズマスパッタ法成長ZnOエピタキシャル薄膜の励起子ポラリトン発光
    30 Mar. 2009
  • m面自立GaN基板上NH3-MBE成長ホモエピタキシャル薄膜の構造的・光学的特性のV/III比依存性
    30 Mar. 2009
  • Optical properties of nearly stacking-fault-free m-plane GaN and InGaN films grown by metalorganic vapor phase epitaxy on low defect density free-standing substrates
    S.F.Chichibu; H.Yamaguchi; L.Zhao; M.Kubota; T.Onuma; K.Okamoto; and H.Ohta
    International Workshop on Nitride Semiconductors 2008 (IWN2008), 06 Oct. 2008
  • Impacts of dislocation bending and growth polar direction on the local cathodoluminescence spectra of GaN prepared by seeded ammonothermal growth
    S.F.Chichibu; T.Onuma; T.Hashimoto; K.Fujito; F.Wu; J.S.Speck; and S.Nakamura
    International Workshop on Nitride Semiconductors 2008 (IWN2008), 06 Oct. 2008
  • Optical gain in low dislocation density nonpolar m-plane InGaN/GaN MQW LD wafers lased at 400 nm and 426 nm
    T.Onuma; K.Okamoto; H.Ohta; and S.F.Chichibu
    International Workshop on Nitride Semiconductors 2008 (IWN2008), 06 Oct. 2008
  • Ammonia source molecular beam epitaxy of m-plane AlxGa1-xN films exhibiting negligible deep emission bands on low defect density free-standing GaN substrates
    T.Hoshi; K.Oshita; M.Kagaya; K.Fujito; H.Namita; K.Hazu; T.Onuma; and S.F.Chichibu
    International Workshop on Nitride Semiconductors 2008 (IWN2008), 06 Oct. 2008
  • Helicon-wave-excited-plasma sputtering epitaxy of ZnO on GaN templates and bulk ZnO substrates
    H.Amaike; Y.Sawai; K.Hazu; T.Onuma; T.Koyama; and S.F.Chichibu
    The 5th International Workshop on ZnO and Related Materials, 22 Sep. 2008
  • GaNテンプレート及びバルクZnO基板上へのZnOのHWPSE成長
    04 Sep. 2008
  • Zn極性MgZnO/ZnOヘテロ接合の分子線エピタキシーとキャラクタリゼーション
    03 Sep. 2008
  • m面自立GaN基板上に成長したAlxGa1-xN薄膜の偏光・空間分解陰極線蛍光特性
    03 Sep. 2008
  • m面自立GaN基板上へのAlxGa1-xN薄膜のNH3ソースMBE成長
    03 Sep. 2008
  • Naフラックス法により成長したGaN単結晶の発光特性
    02 Sep. 2008
  • 酸性鉱化剤を用いた安熱合成GaNエピタキシャル層の陰極線蛍光特性
    02 Sep. 2008
  • Effects of dislocation bending and impurity incorporation on the local cathodoluminescence spectra of GaN prepared by seeded ammonothermal growth
    S.F.Chichibu; T.Onuma; T.Hashimoto; K.Fujito; F.Wu; J.S.Speck; and S.Nakamura
    The Second International Symposium on Growth of III-Nitrides (ISGN-2), 06 Jul. 2008
  • Optical properties of nearly stacking-fault-free m-plane (In,Ga)N films grown by metalorganic vapor phase epitaxy on low defect density free-standing substrates
    S.F.Chichibu; H.Yamaguchi; L.Zhao; M.Kubota; T.Onuma; K.Okamoto; and H.Ohta
    The Second International Symposium on Growth of III-Nitrides (ISGN-2), 06 Jul. 2008
  • Optical gain in low dislocation density nonpolar m-plane InGaN/GaN MQW LD wafers
    T.Onuma; K.Okamoto; H.Ohta; and S.F.Chichibu
    50th Electronic Materials Conference (EMC-50), 25 Jun. 2008
  • Optical properties of nearly stacking-fault-free m-plane (In,Ga)N films grown by metalorganic vapor phase epitaxy on low defect density free-standing substrates
    S.F.Chichibu; H.Yamaguchi; L.Zhao; M.Kubota; T.Onuma; K.Okamoto; and H.Ohta
    50th Electronic Materials Conference (EMC-50), 25 Jun. 2008
  • Effects of dislocation bending and impurity incorporation on the local cathodoluminescence spectra of GaN prepared by seeded ammonothermal growth
    S.F.Chichibu; T.Onuma; T.Hashimoto; K.Fujito; F.Wu; J.S.Speck; and S.Nakamura
    50th Electronic Materials Conference (EMC-50), 25 Jun. 2008
  • Impacts of point defects on the recombination dynamics and emission efficiency of (Al,Ga)N
    S.F.Chichibu; T.Onuma; and A.Uedono
    The Fourth Asian Conference on Crystal Growth and Crystal Technology (CGCT-4), 21 May 2008
  • Exciton fine structures in AlN epilayers grown by metalorganic vapor phase epitaxy
    T.Onuma; K.Kosaka; K.Asai; S.Sumiya; T.Shibata; M.Tanaka; T.Sota; A.Uedono; and S.F.Chichibu
    7th International Symposium on Semiconductor Light Emitting Devices (ISSLED 2008), 27 Apr. 2008
  • Built-in and external bias-induced quantum-confined Stark effects in a nonpolar m-plane In0.15Ga0.85N / GaN multiple quantum well light-emitting diode
    T.Onuma; H.Amaike; M.Kubota; K.Okamoto; H.Ohta; J.Ichihara; H.Takasu; and S.F.Chichibu
    7th International Symposium on Semiconductor Light Emitting Devices (ISSLED 2008), 27 Apr. 2008
  • 低転位非極性m面InGaN/GaN多重量子井戸LDの光学利得
    29 Mar. 2008
  • m面自立GaN基板上へのInGaN薄膜のMOVPE成長
    29 Mar. 2008
  • 分子線エピタキシー法(MBE)によるZn極性面ZnO 基板上MgZnO/ZnOヘテロ構造
    28 Mar. 2008
  • 分子線エピタキシー法で成長したZn極性ZnO基板上ZnO膜の時間分解フォトルミネッセンス
    27 Mar. 2008
  • 塩基性鉱化剤を用いた安熱合成GaNエピタキシャル層の構造および発光特性
    27 Mar. 2008
  • MgxZn1-xO epitaxial films grown on ZnO substrates by molecular beam epitaxy
    H.Yuji; K.Nakahara; K.Tamura; S.Akasaka; A.Sasaki; T.Tanabe; H.Takasu; T.Onuma; S.F.Chichibu; A.Tsukazaki; A.Ohtomo; and M.Kawasaki
    The Society of Photo-Optical Instrumentation Engineers (SPIE) Photonics West 2008, 20 Jan. 2008
  • Quantum-confined Stark effects in nonpolar m-plane InxGa1-xN/GaN multiple quantum well light-emitting diodes fabricated on low defect density free-standing substrates
    T.Onuma; H.Amaike; M.Kubota; K.Okamoto; H.Ohta; J.Ichihara; H.Takasu; and S.F.Chichibu
    The 7th International Conference on Nitride Semiconductors (ICNS-7), 16 Sep. 2007
  • Observation of well-resolved bound, free, and higher order excitons in AlN epilayers grown by metalorganic vapor phase epitaxy
    T.Onuma; T.Koyama; K.Kosaka; K.Asai; S.Sumiya; T.Shibata; M.Tanaka; T.Sota; A.Uedono; and S.F.Chichibu
    The 7th International Conference on Nitride Semiconductors (ICNS-7), 16 Sep. 2007
  • AlN,GaNにおける貫通転位密度と点欠陥密度の関係
    07 Sep. 2007
  • Microstructural Evolution in the Initial Growth Stage of m-Plane GaN on m-Plane SiC with a High-Temperature Grown AlN Buffer
    Q.Sun; S.-Y.Kwon; Z.Ren; J.Han; T.Onuma; and S.F.Chichibu
    49th Electronic Materials Conference (EMC-49), 20 Jun. 2007
  • 分子線エピタキシー法(MBE)による(Mg)ZnOホモエピタキシー技術
    29 Mar. 2007
  • 酸化亜鉛の非輻射過程と点欠陥の関係
    29 Mar. 2007
  • AlN価電子帯オーダリングの歪依存性
    28 Mar. 2007
  • MOVPE成長AlN薄膜の発光特性
    28 Mar. 2007
  • AlN薄膜におけるVL発光強度と欠陥密度の相関性
    28 Mar. 2007
  • Impacts of morphological features of GaN templates on the In-incorporation efficiency in nonpolar m-plane InxGa1-xN / GaN multiple quantum wells
    T.Onuma; A.Chakraborty; M.McLaurin; B.A.Haskell; T.Koyama; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    34th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-34), 14 Jan. 2007
  • Relation between the near-band-edge emission intensity and structural defects in AlN epilayers
    T.Koyama; M.Sugawara; T.Hoshi; P.Cantu; J.F.Kaeding; R.Sharma; T.Onuma; S.Keller; U.K.Mishra; S.P.DenBaars; S.Nakamura; T.Sota; A.Uedono; and S.F.Chichibu
    34th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-34), 14 Jan. 2007
  • Recombination dynamics and in-plane polarization of the emission in an m-plane InxGa1-xN/GaN blue light-emitting-diode fabricated on the free-standing GaN substrate
    S.F.Chichibu; T.Koyama; T.Onuma; H.Masui; A.Chakraborty; B.A.Haskell; S.Keller; T.Sota; U.K.Mishra; J.S.Speck; S.Nakamura; and S.P.DenBaars
    International Workshop on Nitride Semiconductors 2006 (IWN2006), 22 Oct. 2006
  • Effects of High-Temperature-Annealed self-Buffer layer (HITAB) insertion on the photoluminescence properties of Mg0.15Zn0.85O alloy films grown by laser-assisted molecular-beam epitaxy
    M.Kubota; A.Tsukazaki; T.Onuma; A.Ohtomo; T.Sota; M.Kawasaki; and S.F.Chichibu
    The 4th International Workshop on ZnO and Related Materials, 03 Oct. 2006
  • Inを含むIII族窒化物半導体混晶における局在励起子について
    30 Aug. 2006
  • ニオブ添加酸化チタン薄膜の抵抗率に対する熱処理効果
    30 Aug. 2006
  • NH3-MBE成長AlN薄膜の成長温度およびV/III比が光学的特性に与える影響
    30 Aug. 2006
  • MOVPE成長Mg添加p型半極性面(10-1-1)GaNのフォトルミネセンス評価
    30 Aug. 2006
  • Defect-insensitive emission probability in group-III nitride alloys containing In
    S.F.Chichibu; A.Uedono; T.Onuma; B.A.Haskell; A.Chakraborty; T.Koyama; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; U.K.Mishra; S.Nakamura; S.Yamaguchi; S.Kamiyama; H.Amano; I.Akasaki; J.Han; and T.Sota
    International Symposium on Compound Semiconductors 2006 (ISCS 2006), 13 Aug. 2006
  • Elimination of point defects as a principal way in improving quantum efficiency of excitonic emissions in ZnO epilayers
    M.Kubota; A.Tsukazaki; T.Onuma; A.Ohtomo; T.Sota; A.Uedono; M.Kawasaki; and S.F.Chichibu
    25th Electronic Materials Symposium, 05 Jul. 2006
  • Recombination dynamics in Mg0.15Zn0.85O alloy films grown by laser-assisted molecular-beam epitaxy using High-Temperature-Annealed self-Buffer layer (HITAB)
    M.Kubota; A.Tsukazaki; T.Onuma; A.Ohtomo; T.Sota; M.Kawasaki; and S.F.Chichibu
    25th Electronic Materials Symposium, 05 Jul. 2006
  • Recombination dynamics in nonpolar (1-100) InGaN/GaN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; A.Chakraborty; B.A.Haskell; T.Koyama; P.T.Fini; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    25th Electronic Materials Symposium, 05 Jul. 2006
  • Thermally stable semi-insulating properties of Fe-doped GaN grown by hydride vapor phase epitaxy characterized by photoluminescence and positron annihilation techniques
    M.Kubota; A.Uedono; Y.Ishihara; T.Onuma; A.Usui; and S.F.Chichibu
    The 13th International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE-13), 22 May 2006
  • Cross-sectional spatially-resolved cathodoluminescence study of cubic GaN grown by metalorganic vapor phase epitaxy on free-standing (001) 3C-SiC and GaAs substrates
    T.Onuma; T.Suzuki; T.Nozaka; H.Yamaguchi; and S.F.Chichibu
    The 13th International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE-13), 22 May 2006
  • Observation of a 208 nm emission at room temperature from AlN epilayers grown at high temperature by NH3-source molecular-beam epitaxy on GaN templates using low-temperature interlayers
    M.Sugawara; T.Koyama; J.F.Kaeding; R.Sharma; Y.Uchinuma; T.Araya; T.Onuma; S.Nakamura; and S.F.Chichibu
    6th International Symposium on Blue Laser and Light Emitting Diodes (ISBLLED 2006), 15 May 2006
  • Recombination dynamics of a 268 nm emission peak in strained Al0.53In0.11Ga0.36N multiple quantum wells grown on AlGaN templates on (0001) Al2O3
    T.Onuma; S.Keller; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; T.Sota; and S.F.Chichibu
    6th International Symposium on Blue Laser and Light Emitting Diodes (ISBLLED 2006), 15 May 2006
  • Prospective emission efficiency and in-plane light polarization of nonpolar (1-100) InxGa1-xN / GaN blue light-emitting-diodes fabricated on free-standing GaN substrates
    T.Koyama; T.Onuma; H.Masui; A.Chakraborty; B.A.Haskell; U.K.Mishra; J.S.Speck; S.Nakamura; S.P.DenBaars; T.Sota; and S.F.Chichibu
    6th International Symposium on Blue Laser and Light Emitting Diodes (ISBLLED 2006), 15 May 2006
  • 高温熱処理自己バッファ層(HITAB)を用いたL-MBE成長Mg0.15Zn0.85Oの室温発光寿命
    26 Mar. 2006
  • 自立GaN基板上非極性(1-100) InxGa1-xN/GaN量子井戸LEDの光学的特性
    25 Mar. 2006
  • LEO-GaN上非極性(1-100) InxGa1-xN/GaN量子井戸における発光ダイナミクス
    25 Mar. 2006
  • MOVPE成長3C-SiC基板上立方晶GaNの空間分解陰極線蛍光評価
    25 Mar. 2006
  • 低温中間層を用いたGaNテンプレート上へのNH3-MBE法AlN高温成長
    25 Mar. 2006
  • 窒素およびホウ素をドープした6H-SiC蛍光層の光学特性
    23 Mar. 2006
  • Growth and characterization of semipolar InGaN/GaN multiple quantum wells and light emitting diodes on (10-1-1) GaN templates
    A.Chakraborty; T.Onuma; T.J.Baker; S.Keller; S.F.Chichibu; S.P.DenBaars; S.Nakamura; J.S.Speck; and U.K.Mishra
    Materials Research Society, 2005 Fall Meeting, 28 Nov. 2005
  • LEO-GaN上無極性(11-20) InxGa1-xN / GaN量子井戸における励起子局在
    11 Sep. 2005
  • 発光波長265nmのAlxInyGa1-x-yN四元多重量子井戸における発光ダイナミクス
    11 Sep. 2005
  • HVPE成長Fe添加GaNの半絶縁性に熱処理が与える影響
    11 Sep. 2005
  • 窒化物半導体混晶中の点欠陥密度と室温発光寿命の関係
    11 Sep. 2005
  • 440nm帯ZnO青色発光ダイオード
    08 Sep. 2005
  • 安熱合成法によるGaNエピタキシャル層の空間分解陰極線蛍光評価
    07 Sep. 2005
  • Exciton dynamics in nonpolar (11-20) InGaN/GaN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; A.Chakraborty; B.A.Haskell; S.Keller; T.Sota; U.K.Mishra; S.P.DenBaars; J.S.Speck; S.Nakamura; and S.F.Chichibu
    The 6th International Conference on Nitride Semiconductors (ICNS-6), 28 Aug. 2005
  • Relation between the point defect density and quantum efficiency in (Al,In,Ga)N studied by time-resolved photoluminescence and slow positron annihilation techniques: defect-resistant emission of localized excitons in InGaN
    S.F.Chichibu; A.Uedono; T.Onuma; A.Chakraborty; B.A.Haskell; P.T.Fini; S.Keller; T.Sota; S.P.DenBaars; U.K.Mishra; J.S.Speck; and S.Nakamura
    The 6th International Conference on Nitride Semiconductors (ICNS-6), 28 Aug. 2005
  • High-temperature growth of AlN epilayers on the GaN epitaxial templates by NH3 source molecular beam epitaxy
    T.Koyama; M.Sugawara; Y.Uchinuma; J.F.Kaeding; R.Sharma; T.Onuma; S.Nakamura; and S.F.Chichibu
    The 6th International Conference on Nitride Semiconductors (ICNS-6), 28 Aug. 2005
  • NH3-source molecular beam epitaxy of AlN films on the GaN epitaxial templates
    T.Koyama; M.Sugawara; Y.Uchinuma; J.F.Kaeding; R.Sharma; T.Onuma; K.Nakajima; T.Aoyama; T.Chikyow; S.Nakamura; and S.F.Chichibu
    24th Electronic Materials Symposium, 04 Jul. 2005
  • Recombination dynamics in nonpolar (11-20) InxGa1-xN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; A.Chakraborty; B.A.Haskell; S.Keller; T.Sota; S.P.DenBaars; J.S.Speck; S.Nakamura; U.K.Mishra; and S.F.Chichibu
    47th Electronic Materials Conference (EMC-47), 22 Jun. 2005
  • Growth of atomically-flat ZnO and related alloy films by helicon-wave-excited-plasma sputtering epitaxy method
    N.Shibata; T.Ohmori; T.Koyama; T.Onuma; and S.F.Chichibu
    47th Electronic Materials Conference (EMC-47), 22 Jun. 2005
  • Characterization of GaN films grown on free-standing GaN seeds by ammonothermal growth
    T.Hashimoto; K.Fujito; F.Wu; B.A.Haskell; T.Onuma; S.F.Chichibu; J.S.Speck; and S.Nakamura
    47th Electronic Materials Conference (EMC-47), 22 Jun. 2005
  • Epitaxially aligned GaN nanowires and nanobridges by MOCVD
    J.Su; M.Gherasimova; G.Cui; J.Han; C.Broadbridge; A.Lehman; T.Onuma; S.F.Chichibu; Y.He; and A.V.Nurmikko
    47th Electronic Materials Conference (EMC-47), 22 Jun. 2005
  • Record long room-temperature spontaneous emission lifetime in ZnO epilayers grown by laser-assisted molecular beam epitaxy on ScAlMgO4 substrates using high-temperature-annealed self-buffer and proper defect management
    S.F.Chichibu; A.Tsukazaki; T.Onuma; A.Ohtomo; T.Sota; A.Uedono; and M.Kawasaki
    47th Electronic Materials Conference (EMC-47), 22 Jun. 2005
  • Epitaxially Aligned GaN Nanowires and Nanobridges by MOCVD
    J.Su; M.Gherasimova; G.Cui; J.Han; Y.He; A.V.Nurmikko; T.Onuma; S.F.Chichibu; C.Broadbridge; and A.Lehman
    CMOC Symposium, 17 May 2005
  • LEO-GaN上無極性(11-20) InxGa1-xN量子井戸における発光ダイナミクス
    31 Mar. 2005
  • NH3ガスソースMBE法によるGaNテンプレート上へのAlN薄膜成長
    30 Mar. 2005
  • レーザMBE成長ZnO薄膜の欠陥制御による高品質化(II)
    30 Mar. 2005
  • レーザMBE成長ZnO薄膜の欠陥制御による高品質化(I)
    30 Mar. 2005
  • Atomically-flat AlN epitaxial layers grown on MOVPE GaN templates by NH3-source molecular-beam epitaxy
    Y.Uchinuma; M.Sugawara; T.Koyama; J.F.Kaeding; R.Sharma; T.Onuma; S.Nakamura; and S.F.Chichibu
    32nd Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-32), 23 Jan. 2005
  • Emission mechanisms in nonpolar (11-20) InGaN/GaN multiple quantum wells grown on GaN templates prepared by lateral epitaxial overgrowth
    T.Onuma; A.Chakraborty; B.A.Haskell; S.Keller; T.Sota; U.K.Mishra; S.P.DenBaars; J.S.Speck; S.Nakamura; and S.F.Chichibu
    32nd Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-32), 23 Jan. 2005
  • A homoepitaxial ZnO p-i-n light emitting diode
    A.Tsukazki; A.Ohtomo; T.Onuma; M.Ohtani; T.Makino; M.Sumiya; K.Ohtani; S.F.Chichibu; S.Fuke; Y.Segawa; H.Ohno; H.Koinuma; and M.Kawasaki
    The 3rd International Workshop on ZnO and Related Materials, 05 Oct. 2004
  • Atomically flat ZnO and MgxZn1-xO epitaxial films prepared by helicon-wave-excited-plasma sputtering epitaxy
    T.Koyama; T.Ohmori; N.Shibata; T.Onuma; and S.F.Chichibu
    The 3rd International Workshop on ZnO and Related Materials, 05 Oct. 2004
  • Record long room-temperature photoluminescence lifetime in ZnO epilayers grown by laser-assisted MBE using appropriate defect management
    S.F.Chichibu; T.Onuma; A.Tsukazaki; M.Kubota; A.Ohtomo; A.Uedono; Y.Segawa; T.Sota; and M.Kawasaki
    The 3rd International Workshop on ZnO and Related Materials, 05 Oct. 2004
  • Reduction in the nonradiative defect density in ZnO films grown on Si substrates by the use of ZnS epitaxial buffer layers
    T.Onuma; S.F.Chichibu; A.Uedono; Y.-Z.Yoo; T.Chikyow; T.Sota; M.Kawasaki; and H.Koinuma
    The 3rd International Workshop on ZnO and Related Materials, 05 Oct. 2004
  • Electroluminescent ZnO p-i-n homostructural-junction
    A.Tsukazki; A.Ohtomo; T.Onuma; M.Ohtani; T.Makino; M.Sumiya; K.Ohtani; S.F.Chichibu; S.Fuke; Y.Segawa; H.Ohno; H.Koinuma; and M.Kawasaki
    11th International Workshop on Oxide Electronics (WOE11), 03 Oct. 2004
  • Fabrication of p-CuGaS2/n-ZnO:Al heterojunction light-emitting diode grown by metalorganic vapor phase epitaxy and helicon-wave-excited-plasma sputtering methods
    S.F.Chichibu; T.Ohmori; N.Shibata; T.Koyama; and T.Onuma
    The 14th International Conference on Ternary and Multinary Compounds (ICTMC-14), 27 Sep. 2004
  • HWPS堆積n-ZnO/MOVPE成長p-CuGaS2へテロ接合LEDの鶯色EL発光
    03 Sep. 2004
  • GaN中の非輻射再結合中心密度と点欠陥密度の相関関係
    03 Sep. 2004
  • NH3ガスソースMBE法によるGaNテンプレート上へのAlN高温成長
    02 Sep. 2004
  • ZnO p-n ホモ接合発光ダイオード
    02 Sep. 2004
  • Direct comparison of defect density and photoluminescence lifetime in polar and nonpolar wurtzite and zincblende GaN studied by time-resolved photoluminescence and slow positron annihilation techniques
    S.F.Chichibu; A.Uedono; T.Onuma; T.Koida; M.Sugiyama; B.A.Haskell; M.Sumiya; H.Okumura; T.Sota; J.S.Speck; S.P.DenBaars; and S.Nakamura
    International Workshop on Nitride Semiconductors 2004 (IWN2004), 19 Jul. 2004
  • Recombination mechanisms in strain-free AlxGa1-xN alloys studied by time-resolved photoluminescence and slow positron annihilation techniques
    T.Onuma; S.F.Chichibu; A.Uedono; T.Sota; P.Cantu; T.M.Katona; J.F.Kaeding; S.Keller; U.K.Mishra; S.Nakamura; and S.P.DenBaars
    23rd Electronic Materials Symposium, 07 Jul. 2004
  • Formation mechanisms of ZnO and Mg0.06Zn0.94O in helicon-wave-excited-plasma sputtering epitaxy
    T.Koyama; T.Ohmori; N.Shibata; T.Onuma; and S.F.Chichibu
    23rd Electronic Materials Symposium, 07 Jul. 2004
  • HWPSE法を用いたMg0.06Zn0.94O薄膜のエピタキシャル成長
    29 Mar. 2004
  • GaNテンプレート基板の熱分解がホモエピタキシャル薄膜に与える影響
    28 Mar. 2004
  • NH3ガスソースMBE法によるGaNテンプレート上へのホモエピタキシャル成長
    28 Mar. 2004
  • Improved surface morphology in GaN homoepitaxy by NH3-source molecular beam epitaxy
    T.Koida; Y.Uchinuma; J.Kikuchi; K.R.Wang; M.Terazaki; T.Onuma; J.F.Kaeding; R.Sharma; S.Nakamura; and S.F.Chichibu
    31st Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-31), 18 Jan. 2004
  • Position Controlled GaN Nano-Structures Fabricated by Low Energy Focused Ion Beam System
    T.Nagata; P.Ahmet; T.Onuma; T.Koida; S.F.Chichibu; and T.Chikyow
    Materials Research Society, 2003 Fall Meeting, 01 Dec. 2003
  • Recombination Dynamics in Strain-free AlxGa1-xN Alloys Studied by Time-Resolved Photoluminescence and Slow Positron Annihilation Techniques
    S.F.Chichibu; A.Uedono; T.Onuma; T.Sota; P.Cantu; T.M.Katona; J.F.Kaeding; S.Keller; U.K.Mishra; S.Nakamura; and S.P.DenBaars
    Materials Research Society, 2003 Fall Meeting, 01 Dec. 2003
  • 超格子中間層を用いた立方晶GaN薄膜のMOVPE成長
    01 Sep. 2003
  • 立方晶GaN/GaAs基板界面のvoidがMOVPE成長薄膜に及ぼす影響
    01 Sep. 2003
  • AlxGa1-xN混晶薄膜の発光寿命支配要因
    01 Sep. 2003
  • Si基板上ZnOエピタキシャル薄膜の光学特性
    31 Aug. 2003
  • HWPSE法におけるZnOエピタキシャル薄膜の成長メカニズム
    31 Aug. 2003
  • Anomalous pressure dependence of light emission in cubic InGaN
    S.P.Lepkowski; T.Suski; H.Teisseyre; T.Kitamura; Y.Ishida; H.Okumura; T.Onuma; T.Koida; and SF.Chichibu
    The 5th International Conference on Nitride Semiconductors (ICNS-5), 25 May 2003
  • Bandgap bowing and emission mechanisms in Al1-xInxN epitaxial films grown by metalorganic vapor phase epitaxy
    T.Onuma; SF.Chichibu; Y.Uchinuma; T.Sota; S.Yamaguchi; S.Kamiyama; H.Amano; and I.Akasaki
    The 5th International Conference on Nitride Semiconductors (ICNS-5), 25 May 2003
  • Emission mechanisms in AIxGa1-xN films grown on sapphire (0001) substrates by low-pressure metalorganic vapor phase epitaxy
    T.Onuma; T.Koida; P.Cantu; J.F.Kaeding; S.Keller; T.Sota; S.P.DenBaars; U.K.Mishra; S.Nakamura; and S.F.Chichibu
    The 5th International Conference on Nitride Semiconductors (ICNS-5), 25 May 2003
  • Recombination dynamics of localized excitons in cubic InxGa1-xN/GaN quantum wells grown on 3C-SiC (001) substrates by rf-MBE
    T.Onuma; SF.Chichibu; T.Kitamura; K.Nakajima; P.Ahmet; T.Aoyama; T.Chikyow; Y.Ishida; T.Sota; S.P.DenBaars; S.Nakamura; and H.Okumura
    The 5th International Conference on Nitride Semiconductors (ICNS-5), 25 May 2003
  • Carrier dynamics in InGaN/GaN quantum wells with composition-graded walls
    T.Onuma; Y.Uchinuma; E.-K.Suh; H.J.Lee; T.Sota; and SF.Chichibu
    The 5th International Conference on Nitride Semiconductors (ICNS-5), 25 May 2003
  • アンモニアガスソースMBE法による(0001)サファイア基板上GaN薄膜の成長
    29 Mar. 2003
  • Al1-xInxNエピタキシャル薄膜における発光ダイナミクス
    29 Mar. 2003
  • AlxGa1-xNエピタキシャル薄膜における発光ダイナミクス
    29 Mar. 2003
  • 組成傾斜障壁を持つInGaN/GaN量子井戸の発光ダイナミクス
    29 Mar. 2003
  • HWPSE法によるサファイアA面上へのZnOエピタキシャル成長
    27 Mar. 2003
  • Recombination dynamics of localized excitons in cubic InxGa1-xN/GaN multiple quantum wells grown by rf-MBE on 3C-SiC substrate
    SF.Chichibu; T.Onuma; T.Kitamura; Y.Ishida; T.Sota; S.P.DenBaars; S.Nakamura; and H.Okumura
    30th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-30), 19 Jan. 2003
  • 立方晶InxGa1-xN/GaN量子井戸における発光ダイナミクス
    24 Sep. 2002
  • InGaN MQW 450nm LDにおける局在励起子ダイナミクス
    24 Sep. 2002
  • Recombination dynamics of localized excitons in cubic phase InxGa1-xN/GaN multiple quantum wells on 3C-SiC/Si (001)
    S.F.Chichibu; T.Onuma; T.Kitamura; T.Sota; S.P.DenBaars; S.Nakamura; and H.Okumura
    International Workshop on Nitride Semiconductors 2002 (IWN2002), 22 Jul. 2002
  • Recombination dynamics of localized excitons in cubic InxGa1-xN/GaN multiple quantum wells on 3C-SiC/Si (001)
    S.F.Chichibu; T.Onuma; T.Kitamura; T.Sota; S.P.DenBaars; S.Nakamura; and H.Okumura
    44th Electronic Materials Conference (EMC-44), 26 Jun. 2002
  • Recombination mechanisms in strained cubic InxGa1-xN films grown on 3C-SiC (001) by rf molecular-beam epitaxy
    T.Onuma; T.Kitamura; T.Kuroda; S.F.Chichibu; A.Tackeuchi; T.Sota; S.P.DenBaars; S.Nakamura; Y.Ishida; and H.Okumura
    21th Electronic Materials Symposium, 19 Jun. 2002
  • 立方晶および六方晶InGaNの発光特性比較 -分極効果の有無と励起子局在効果-
    14 Jun. 2002
  • ZnO薄膜のヘリコン波励起プラズマスパッタエピタキシー
    28 Mar. 2002
  • Exciton Spectra of AlN Epitaxial Films
    T.Onuma; S.F.Chichibu; T.Sota; K.Asai; S.Sumiya; T.Shibata; and M. Tanaka
    Materials Research Society, 2001 Fall Meeting, 26 Nov. 2001
  • Similarities in the Optical Properties of hexagonal and cubic InGaN Quantum Wells
    S.F.Chichibu; M.Sugiyama; T.Onuma; T.Kuroda; A.Tackeuchi; T.Sota; T.Kitamura; H.Nakanishi; Y.Ishida; H.Okumura; S.Keller; S.P.DenBaars; U.K.Mishra; and S.Nakamura
    Materials Research Society, 2001 Fall Meeting, 26 Nov. 2001
  • 立方晶In0.1Ga0.9N量子井戸における励起子局在効果
    13 Sep. 2001
  • AlN薄膜の励起子スペクトル
    13 Sep. 2001
  • ArXeのTPEPICOスペクトル
    24 Mar. 2000
  • ZEKE分光によるN2+の回転準位の測定
    24 Mar. 2000
  • N2の励起状態の寿命測定
    24 Mar. 2000
  • 希ガス分子のZEKE光電子分光
    Sep. 1999
  • Kr2+とXe2+のC2状態の前期解離
    24 Aug. 1999
  • N2のVUV領域の発光スペクトル
    24 Aug. 1999
  • ArとKrのVUV発光の測定
    24 Aug. 1999
  • N2+の励起状態における高振動準位の測定
    24 Aug. 1999
  • Kr2+とXe2+のC21/2 stateの前期解離
    29 Mar. 1999
  • CO2のしきい光電子分光
    29 Mar. 1999
  • Ar2+のポテンシャル曲線
    Sep. 1998
  • H2とD2のしきい光電子分光
    25 Aug. 1998
  • しきい光電子--光イオンコインシデンス法によるKrXe+の振動準位の研究
    25 Aug. 1998
  • パルス電場を用いたAr2のZEKE光電子分光
    25 Aug. 1998

Industrial Property Rights

  • 特願2025-119207, 原料供給装置、成膜装置、原料供給方法および成膜方法
  • 特願2025-119206, 原料供給装置、成膜装置、原料供給方法および成膜方法
  • 特開2023-55415, 特願2021-164777, 紫外線光源、オゾン発生装置、紫外線の放射方法
  • 特開2022-061885, 特願2020-170125, ショットキーダイオード
  • 特許第5608340号, 特開2010-272592, 特願2009-121308, 半導体発光素子
  • 特許第5294167号, 特開2010-56282, 特願2008-219525, 紫外線窒化物半導体発光素子およびその製造方法
  • 特許第5142371号, 特開2009-123969, 特願2007-297191, 紫外線窒化物半導体発光素子およびその製造方法

Award

  • Oct. 2012
    Electron-beam incident-angle-resolved cathodoluminescence studies on bulk ZnO crystals
    The 11th International Symposium on Advanced Technology (ISAT-Special), Best Poster Award
    Takeyoshi Onuma, International society
  • Dec. 2007
    非極性m面窒化物半導体青色発光ダイオードの発光メカニズムの解明
    Japan society
  • Mar. 2004
    Ⅲ族窒化物半導体薄膜における励起子ダイナミクスの研究
    Others

Research Themes

Foundation Grants

  • 一般財団法人キヤノン財団(その他雑収入)
    12 Apr. 2024
    10,500,000円
  • 公益財団法人高橋産業経済研究財団
    2,000,000円

Social Contribution Activities

  • 12 Dec. 2017 - 12 Dec. 2017
    結晶工学 × データサイエンス,- 最先端事例から学ぶクリスタルインフォマティクス -
  • 26 Sep. 2017 - 26 Sep. 2017
    深紫外発光受光デバイスの現状と酸化ガリウム系材料受光デバイスの可能性
    lecturer

Member History

  • Apr. 2024 - Present
    副委員長
  • Jan. 2024 - Present
    プログラム編集委員
  • Apr. 2016 - Present
    幹事
  • Nov. 2023 - Nov. 2024
    実行委員(会場係)
  • Apr. 2022 - Mar. 2024
    幹事長
  • Nov. 2021 - Mar. 2023
    副実行委員長、論文編集委員, The 4th International Workshop on Gallium Oxide and Related Materials (IWGO4)
  • Apr. 2020 - Mar. 2022
    副幹事長