ナノコラムLEDにおける連続的なITO電極形成技術
22 Sep. 2023
(10-11)上GaInN/GaInN MQWs成長による高効率赤色発光
21 Sep. 2023
その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長-GaInNの成長温度依存性-
21 Sep. 2023
各種In系材料を出発原料に用いたMist CVD成長におけるα-In2O3薄膜の電気的特性に関する評価
21 Sep. 2023
高Mg組成岩塩構造MgZnO薄膜のミストCVD成長
21 Sep. 2023
Mist CVD法によるα-GIO混晶成長とα線検出応用に向けた検討
21 Sep. 2023
Mist CVD法Sn-doped α-Ga2O3薄膜成長におけるSn溶液の静置時間変化
21 Sep. 2023
III族不純物ドープMgO薄膜の正孔捕獲中心
20 Sep. 2023
Growth of AZO thin films from pressed-sintered powder targets under subatmospheric conditions
R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr.
20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 03 Aug. 2023
Growth of GaInN/GaInN MQWs on nanocolumns with thick GaInN buffer layer using RF-MBE
H. Akagawa; J. Yamada; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; K. Kishino
20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 31 Jul. 2023
発光径Φ5μmのナノコラム発光デバイスの作製
17 Mar. 2023
N2 および Ar/H2 アニールによる SnOx 薄膜の還元状態の比較
17 Mar. 2023
Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
17 Mar. 2023
Mist CVD法による各種In系粉末を出発原料に用いたα-In2O3の成長機構に関する検討
16 Mar. 2023
Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
16 Mar. 2023
窒素RFパワー変化によるナノコラム結晶のGaInNバッファ層形状均一化の検討
15 Mar. 2023
その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長における格子緩和過程観察
15 Mar. 2023
岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル(II)
15 Mar. 2023
ミストCVD法によるIII族ドープ岩塩構造MgZnO薄膜成長
15 Mar. 2023
Crystal growth of Cu3N by mist CVD with ethylenediamine
S. Yoshida; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Growth of ZnO thin films via magnetron sputtering using a custom-made sintered target
R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Study for composition control in mist CVD growth of α-GIO alloys
K. Yamada; T. Yamaguchi; T. Onuma; T. Honda
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Investigation on the stability of source solution for the α-In2O3 growth by mist CVD
T. Yamamoto; A. Taguchi; R. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Roles of In doping in rocksalt-structured MgZnO films grown by mist CVD method
M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Realization of high mobility in α-In2O3 film grown by mist CVD with different concentration of In2O3 powder as source precursor
A. Taguchi; T. Onuma; T. Honda; T. Yamaguchi
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
TEM evaluation of in-situ nitrogen plasma irradiated GaInN
A. Tokushige; S. Ohno; Y. Hayakawa; T. Honda; T. Onuma; T. Yamaguchi
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Electrical property and valence band offset in conductive MgNiO on sapphire substrates
M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Growth and characterization of AlGaN and multiple quantum wells with varying III/V ratios by RF-MBE
M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Structural analysis in epitaxial growth of GaInN by RF-MBE using XRD-RSM
J. Takeuchi; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; T. Yamaguchi
The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
Twin-free α-Ga2O3 films grown by mist CVD on (0001) α-Al2O3 substrates
R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
The 21st International Symposium on Advanced Technology (ISAT-21), 24 Nov. 2022
Fabrication of monolithic blue micro-LED pixels and investigation of full colorization
H. Chikui; S. Takeda; T Onuma; T. Yamaguchi; T. Honda
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 17 Nov. 2022
Roles of In doped in MgZnO films grown by mist CVD method
M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
Photocurrent spectra of rocksalt-structured MgZnO films in vacuum UV spectral range
H. Kusaka; W. Kosaka; K. Ogawa; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
Realization of near-band-edge cathodoluminescence in 190 nm wavelength range by rocksalt-structured MgZnO epitaxial films
T. Onuma; K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
Impact of gas type on formation of twin structure in the growth of a-Ga2O3 by mist chemical vapor deposition
R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
Growth and optical characteristics of high-Al content AlGaN on AlN templates by RF-MBE,under metal-rich conditions
M. Hayasaki; N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
Local composition distribution in high Al content AlGaN/AlN quantum wells grown by RF-MBE
M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
Mist CVD 法により成長した酸化インジウムの高移動度化に伴う新機能開拓
12 Nov. 2022
Mist CVD 法 α-Ga2O3成長時に形成される双晶抑制に関する研究
12 Nov. 2022
Mist CVD 法 α-In2O3 成長における原料溶液中の反応に関する検討
12 Nov. 2022
RF-MBE による GaInN 成長における歪み緩和制御
12 Nov. 2022
岩塩構造 MgZnO/MgO ヘテロ接合の製作とバンドアライメント解析
12 Nov. 2022
RF-MBE による β-Ga2O3(-201)基板上への AlN 及び GaN 成長において成長前処理が成長層に及ぼす影響
12 Nov. 2022
Mist CVD 法を用いた Cu3N 成長における原料溶液の検討
12 Nov. 2022
顕微フォトルミネッセンス分光による β-Ga2O3 結晶の微細構造の可視化検討
12 Nov. 2022
in-situ 窒素プラズマ照射された MBE 成長 GaInN の TEM 評価
12 Nov. 2022
RF-MBE 成長した Ga 極性及び N 極性 GaN 薄膜の比較検討
12 Nov. 2022
Microstructural characterization of β-Ga2O3,crystals by photoluminescence mapping measurements
K. Shoji; M. Nakanishi; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
Impact of RF power on electrical property of NiO films grown by RF magnetron spattering
Akito Ishikawa; M. Murayama; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
RF-MBE growth of Mg doped GaN on β-Ga2O3,(-201) substrates
T. Yamaguchi; M. Hayasaki; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
P-type conductivity in MgxNi1-xO films deposited on sapphire substrates by RF magnetron sputtering
M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
Growth of α-In2O3 films with different concentrations of In2O3 powder used as source precursor by mist CVD
A. Taguchi; K. Kaneko; K. Goto; T. Onuma; T. Honda; Y. Kumagai; S. Fujita; T. Yamaguchi
The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
Temperature dependence of carrier concentration and Hall mobility in alpha-In2O3 films grown by mist CVD method
A. Taguchi; T. Onuma; K. Goto; K. Kaneko; Y. Kumagai; T. Honda; S. Fujita; T. Yamaguchi
41st Electronic Materials Symposium, 19 Oct. 2022
Analyses of Band Alignment in Rocksalt-structured MgZnO/MgO Interface Grown by Mist CVD
M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
41st Electronic Materials Symposium, 19 Oct. 2022
Importance of dissolving source precursor of Ga(C5H7O2)3 with HCl in mist CVD for α-Ga2O3 growth
R. Yamada; A. Sekiguchi; T. Onuma; T. Honda; T. Yamaguchi
2022 International Conference on Solid State Devices and Materials (SSDM202), 27 Sep. 2022
ナノコラム形状制御技術を用いた赤色発光ナノコラムμ-LED構造の成長と作製
23 Sep. 2022
ミスト化学気相成長法コランダム構造酸化ガリウム薄膜のガス種による双晶形成への影響
23 Sep. 2022
ミストCVD法によるInドープMgZnO薄膜の成長
23 Sep. 2022
岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル
23 Sep. 2022
InドープMgO薄膜の発光特性
23 Sep. 2022
その場XRD-RSM を用いたRF-MBE GaInNヘテロエピタキシャル成長における緩和過程観察
22 Sep. 2022
RF-MBEによるInN緩衝層を用いたGaInNの格子緩和制御
22 Sep. 2022
Mist CVD法を用いたCu3N成長における安定した原料供給の検討
21 Sep. 2022
窒素アニール還元反応によるSnOx薄膜の局所結合状態
21 Sep. 2022
Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOxの特性評価
21 Sep. 2022
Mist CVD法により成長したα-In2O3薄膜のキャリア濃度とホール移動度の温度依存性
21 Sep. 2022
RF-MBE成長赤色発光MQWにおけるGaInN下地層挿入の効果
20 Sep. 2022
赤色ナノコラム成長におけるGaInNバッファ層のⅤ/Ⅲ族比依存性
20 Sep. 2022
Mist CVD法による(Ga1-xInx)2O3混晶成長の組成制御に向けた検討
20 Sep. 2022
Mist CVD 法における原料溶液中の反応がα-In2O3成長に与える影響
20 Sep. 2022
Mist CVDを用いたGTO薄膜成長におけるSnドープ量変化の影響
03 Dec. 2022
Mist CVDβ型酸化ガリウム成長に塩酸が与える影響
03 Dec. 2022
RF-MBE法によるAlGaN/AlNヘテロ構造と量子井戸構造の成長と評価
03 Dec. 2022
ミストCVD法により成膜したInドープMgO薄膜の発光特性
03 Dec. 2022
RF-MBEによるβ-Ga2O3(-201)基板へのMgドープGaNヘテロ構造の製作
03 Dec. 2022
InドープMgZnO薄膜のミストCVD成長
03 Dec. 2022
micro-LED集積化における側面の制御による電極の形成
03 Dec. 2022
岩塩構造酸化マグネシウム亜鉛MSM型真空紫外センサーの受光感度の温度依存性
03 Dec. 2022
放射光X線回折測定を用いたGaInN/InN成長のその場観察~InN解離温度領域での振る舞い~
Mar. 2018
alpha-Ga2O3を用いたダブルショットキー型光検出器の製作
Mar. 2018
III-V族窒化物の価電子帯構造およびギャップ内準位の評価
Mar. 2018
岩塩構造MgxZn1-xOの吸収端の観測と電子状態計算
Mar. 2018
イオン注入したGaNの光熱偏向分光法による評価
Mar. 2018
岩塩構造MgxZn1-xOにおける深紫外線カソードルミネセンスの温度および励起密度依存性
Mar. 2018
窒素ドープ酸化ガリウム薄膜における青色発光の強度変化
Mar. 2018
Influence of interface state and band bending on In and N polar InN from Angle-resolved XPS
Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
45th Conference on the Physics & Chemistry of Surfaces & Interfaces (PCSI 45), Jan. 2018, American Vacuum Society
ミストCVD法により成長したIn2O3薄膜を用いたTFT製作検討
Dec. 2017
コランダム構造酸化ガリウムソーラーブラインド光検出器の開発
Dec. 2017
Near surface band bending in InN films grown by DERI method
Y. Nakajima; K. Uehara; T. Onuma; T. Yamaguchi and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Fabrication of Si micro-cup substrate and its application for integration of μ-LEDs
R. Nawa; T. Onuma; T. Yamaguchi and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Origin of free holes and visible light absorption in p-type NiO films
M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Bandgap Engineering of α-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Fabrication of TFT using amorphous In2O3 thin film by mist CVD
T. Kobayashi; K. Sawamoto; S. Aikawa; T. Yamaguchi; T. Onuma; and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Formation of Black Matrix for Realization of Micro-LED Display
Y. Chunobayashi; R. Nawa; Y. Takahashi; H. Matsuura; T. Yamaguchi; T. Onuma and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Unintentionally Doped Impurities in GaN Layer Grown by RF-MBE
D. Taka; T. Yamaguchi; T. Onuma and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Photothermal Deflection Spectra of Gallium indium nitride layers grown by MOVPE
K. Fukuda; T. Onuma; L. Sang; T. Yamaguchi; T. Honda and M. Sumiya
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Impact of mask materials on dry etching of GaN using ICP-RIE
H. Matsuura; T. Onuma; T. Honda and T. Yamaguchi
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
Near-the surface Fermi level measured In2O3 and Ga2O3 thin films by molecular precursor method
Y. Takahashi; T. Onuma; H. Nagai; T. Yamaguchi and T. Honda
The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
MSM-type solar-blind photodetector with alpha-Ga2O3 film grown by mist CVD
K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
36th Electronic Materials Symposium, Nov. 2017
Effect of low temperature buffer layer in mist CVD growth of In2O3 on alfa-Al2O3 substrate
T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
36th Electronic Materials Symposium, Nov. 2017
Deep-UV emission properties of rocksalt-structured MgxZn1-xO Films Grown on MgO (001) Substrates
M. Ono; K. Ishii; T. Uchida; R. Jinno; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
36th Electronic Materials Symposium, Nov. 2017
Angle-resolved XPS spectra of InN/GaN grown by DERI method
Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
36th Electronic Materials Symposium, Nov. 2017
Relationship between Temperature and Growth Rate of Ga2O3, In2O3 and Their Alloys in the Growth of Mist CVD
T. Yamaguchi; K. Tanuma; T. Kobayashi; H. Nagai; M. Sato; T. Onuma and T. Honda
th International Conference on Advanced Electromaterials (ICAE2017), Nov. 2017, [Invited]
XPS spectra of Ga2O3, In2O3 and their alloys fabricated by molecular precursor method
T. Honda; Y. Takahashi; T. Onuma; T. Yamaguchi; H. Nagai and M. Sato
24th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 24), Nov. 2017
Growth of Ga2-xSnxO3 films by mist chemical vapor deposition
K.Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
Materials Research Society, 2017 Fall Meeting & Exhibit, Nov. 2017, Materials Research Society
Crystal Structure Control in Epitaxial Growth of In2O3 by Mist CVD
T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
Materials Research Society, 2017 Fall Meeting & Exhibit, Nov. 2017, Materials Research Society
GaN growth on Al template by MBE for the fabrication of micro displays
T. Honda; Y. Hoshikawa; K. Uehara; T. Onuma and T. Yamaguchi
11th International Symposium on Semiconductor Light Emitting Devices (ISSLED2017), Oct. 2017
Outstanding capability of In-situ Monitoring Techniques in RF-MBE Growth of InN and GaInN
T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
2017 International Symposium on Novel and Sustainable Technology (ISNST2017), Oct. 2017, [Invited]
光熱偏向分光法によるGa1-xInxN薄膜の評価
Sep. 2017
GaN上およびInN上GaInN成長における成長初期過程の観察
Sep. 2017
SiドープとSiイオン注入単結晶酸化ガリウム結晶の光学的特性
Sep. 2017, [Invited]
低温In2O3バッファ層を用いたa-Al2O3基板上In2O3のミストCVD成長
Sep. 2017
Ga2-xSnxO膜のミストCVD成長
Sep. 2017
シリコンマイクロカップ基板の製作とµ-LEDの集積化の検討
Sep. 2017
Photoresponsivity of alpha-Ga2O3-based deep UV photodetector grown by mist CVD
K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
2nd International Workshop on Gallium Oxide and Related Materials, Sep. 2017
Cathodoluminescence spectra of Si-doped and Si-implanted β-Ga2O3 single crystals
T. Onuma; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
2nd International Workshop on Gallium Oxide and Related Materials, Sep. 2017, [Invited]
Fabrication of MSM-Type Photodetector Using Sn-Doped alpha-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
International Conference on Solid State Devices and Materials (SSDM2017), Sep. 2017
Compositional Pulling Effect in Epitaxial Growth of GaInN by RF-MBE
T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
International Conference on Solid State Devices and Materials (SSDM2017), Sep. 2017, [Invited]
ミストCVD法によるSn添加Ga2O3成長とそのデバイス応用
Aug. 2017
ミストCVD法によるIn2O3薄膜の結晶構造制御
Aug. 2017
第一原理計算とX線光電子分光法によるp形NiO薄膜の電子構造の解析
Aug. 2017
赤色LEDに向けたDERI法によるGaInN薄膜のRF-MBE成長検討
Aug. 2017
RF-MBE法により成長したGaN薄膜中の不純物に関する考察
Aug. 2017
分子プレカーサー法により形成した金属酸化物薄膜の表面近傍フェルミ準位の測定
Aug. 2017
光熱偏向分光法を用いたGa1-xInxN薄膜における非発光再結合の検討
Aug. 2017
RF-MBE法を用いたDERI法によるInN薄膜成長における極性が与える影響
Aug. 2017
素子分離のためのICP-RIEによるエッチング垂直性の検討
Aug. 2017
ICP-RIEによるGaNテンプレートのアレイエッチングの製作検討
Aug. 2017
In-situ X-ray Reciprocal Space Mapping Measurements in GaInN growth on GaN and InN by RF-MBE
T. Yamaguchi; T. Sasaki; M. Takahasi; T. Onuma; T. Honda and Y. Nanishi
12th International Conference On Nitride Semiconductors (ICNS-12), Jul. 2017
Optical Properties of Ga2O3 Films and Crystals
T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
Compund Semiconductor Week 2017 (CSW 2017), May 2017
Relation between electrical and optical properties of p-type NiO films
M. Ono; T. Onuma; R. Goto; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
Compund Semiconductor Week 2017 (CSW 2017), May 2017
Mist CVD growth of Sn-doped Ga2O3 thin films and its device application
K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma; T.Honda
International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki memorial research center, Nagoya Univ.
Charge transfer transitions in p-type NiO films studied by optical measurements and X-ray photoelectron spectroscopy
M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato; T. Honda
International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki Memorial Research Center, Nagoya Univ,
Comparison of III-polar and N-polar GaInN films grown by RF-MBE
Y. Nakajima; K. Uehara; T. Honda; T. Yamaguchi; T. Onuma
International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki Memorial Research Center, Nagoya Univ.
Fabrication of µ-LED array structures using ICP dry-etching
R. Nawa; T. Onuma; T. Yamaguchi; J. -S. Jang; T. Honda
International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017
GaInNのRF-MBE成長とpn ホモ接合型青緑色LEDの製作
20 Mar. 2014
ミストCVD法を用いたGa2O3結晶成長における成長速度の温度依存性
18 Mar. 2014
分子プリカーサー法で製作したGa-In-O多結晶薄膜の発光特性
17 Mar. 2014
分子プレカーサー法を用いたIn添加ZnO薄膜製作検討
17 Mar. 2014
蛍光顕微鏡と2次イオン質量分析を用いたGaInN薄膜の不均一評価
17 Mar. 2014
RF-MBE growth of GaN on alpha-Ga2O3 and mist-CVD growth of Ga2O3 on GaN
T. Honda; T. Yamaguchi; T. Hatakeyama; D. Tajimi and Y. Sugiura
SPIE Photonic West 2014 OPTO conference, 04 Feb. 2014, SPIE
RF-MBE growth of GaN on alpha-Ga2O3 and mist-CVD growth of Ga2O3 on GaN
2014
Mist CVD growth of α-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on α-Ga2O3/sapphire templetes
T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; R. Amiya; T. Onuma and T. Honda
The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013, Southern Taiwan University of Science and Technology (STUST)
Ga2O3 and In2O3 growth by mist CVD
K. Tanuma; T. Yamaguchi; T. Hatakeyama; T. Onuma and T. Honda
The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013, Southern Taiwan University of Science and Technology (STUST)
Growth of InN and related alloys using DERI method toward fabrication of optoelectronics devices
T. Yamaguchi; K. Wang; T. Honda; E. Yoon; T. Araki and Y. Nanishi
The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi; T. Honda
The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
S. Ohsawa; D. Tajimi; T. Yamaguchi and T. Honda
The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
Characterization of fabricated Ga-In-O films by molecular precursor method and their future application of UV transparent electrodes
T. Yasuno; R. Goto; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
The 20th International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium, 12 Nov. 2013, The Society of Pure and Applied Coordination Chemistry
GaN系ショットキー型発光ダイオードにおける(Al,Ga)Ox/GaN界面準位の影響
17 Sep. 2013
Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
2013 JSPS-MRS Joint Symposia, 17 Sep. 2013, Materials Research Society, Japanese Society of Applied Physics
4H-SiC上の疑似Al基板製作と疑似基板上へのGaN RF-MBE成長
16 Sep. 2013
In-situ RF-MBEによるAlN/GaNヘテロ構造上へのAlOx薄膜成長
16 Sep. 2013
β-Ga2O3結晶における青色発光強度と抵抗率の相関
16 Sep. 2013
表面酸化物のGaN表面フェルミ準位と表面バンド曲がりに及ぼす影響
16 Sep. 2013
ミストCVD法を用いたGaN基板上へのGa2O3成長
16 Sep. 2013
Fabrication of Ga-In-O films by molecular precursor method and their future application of transparent electrodes
T. Yasuno; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
The 16th International Conference on II-VI Compounds and Related Materials (II-VI 2013), 10 Sep. 2013, The 125th Committee on , Conversion between Light and Electricity, Japan Society for the Promotion of Science
Impact of the surface modification of the Ga- and N-face n-GaN Schottky diodes with low reverse-bias leakage current
T. Honda; T. Yamaguchi; N. Sakai; S. Fujioka; R. Amiya and Y. Sugiura
The 10th International Conference on Nitride Semiconductors, 28 Aug. 2013, Materials Research Society
Crystallized AlOx/AlN/GaN heterostructures grown by Plasma-assisted molecular beam epitaxy
Y. Sugiura; T. Honda and M. Higashiwaki
The 10th International Conference on Nitride Semiconductors, 28 Aug. 2013, Materials Research Society
RF-MBE growth and characterization of GaN films on α-Ga2O3/sapphire template
T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y.Sugiura and T. Honda
The 10th International Conference on Nitride Semiconductors, 27 Aug. 2013, Materials Research Society
RF-MBE growth of GaN films on nitridated α-Ga2O3 buffer layer
T. Yamaguchi; T. Hatakeyama; D. Tajimi; Y. Sugiura; T. Onuma and T. Honda
The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 14 Aug. 2013, Polish Society for Crystal Growth (PTWK) German Association for Crystal Growth (DGKK) University of Warsaw (UW) Institute of High Pressure Physics of the Polish Academy of Sciences (IHPP PAS) Institute of Physics of the Polish Academy of Sciences (IP PAS) Institute of Electronic Materials Technology (ITME)
Polarized Raman spectra in β-Ga2O3 crystals
T. Onuma1; T. Yasuno; S. Takano; R. Goto; S. Fujioka; T. Hatakeyama; T. Oda; H. Hara; C. Mochizuki; H. Nagai; T. Yamaguchi; M. Sato; T. Honda
The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 13 Aug. 2013, Polish Society for Crystal Growth (PTWK) ,German Association for Crystal Growth (DGKK) ,University of Warsaw (UW) ,Institute of High Pressure Physics of the Polish Academy of Sciences (IHPP PAS) ,Institute of Physics of the Polish Academy of Sciences (IP PAS) ,Institute of Electronic Materials Technology (ITME)
Influence of native surface oxide on GaN surface band bending
R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi and T. Honda
32th Electronic Materials Symposium, 11 Jul. 2013
Effects of surface modification on emission property of GaN Schottky diodes
S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
32th Electronic Materials Symposium, 11 Jul. 2013
RF-MBE growth of GaN films on α-Ga2O3/sapphire template
T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura and T. Honda
32th Electronic Materials Symposium, 11 Jul. 2013
The GaN growth on pseudo aluminum templates by molecular beam epitaxy
S. Osawa; T. Hatakeyama; D. Tajimi; T. Yamaguchi and T. Honda
32th Electronic Materials Symposium, 11 Jul. 2013
Characterization of Ga-In-O films fabricated by molecular precursor method
T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi and T. Honda
32th Electronic Materials Symposium, 11 Jul. 2013
Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
32th Electronic Materials Symposium, 10 Jul. 2013
RF-MBE growth of AlOx/AlN/GaN heterostructures
Y. Sugiura; T. Yamaguchi; T. Honda and M. Higashiwaki
32th Electronic Materials Symposium, 10 Jul. 2013
Chemical fabrication of transparent Cu metal thin film for infrared reflective thin film
H. Nagai; T. Okada; T. Honda and M. Sato
32th Electronic Materials Symposium, 10 Jul. 2013
RF-MBE法による疑似Al基板上へのGaN成長
22 Jun. 2013
表面酸化物によるGaN表面フェルミ準位に及ぼす影響
22 Jun. 2013
n-situ RF-MBE法による窒化物構造上AlOx薄膜の結晶成長
21 Jun. 2013
Compressively strained GaN growth on (0001)4H-SiC with Al buffer by MBE
T. Honda; T. Yamaguchi; D. Tajimi; S. Osawa; M. Hayashi
European Materials Research Society 2013 Spring Meeting (E-MRS 2013 Sprong Meeting), 28 May 2013, European Materials Research Society
In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
(11)Y. Sugiura; T. Yamaguchi; T. Honda and M. Higashiwaki
The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
(12)T. Yamaguchi; D. Tajimi; M. Hayashi; T. Igaki; Y. Sugiura and T. Honda
The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
Aluminum layers grown on (0001)4H-SiC for the GaN growth by RF-MBE
(13)S. Osawa; D. Tajimi; T. Yamaguchi and T. Honda
The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
(14)D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
The 6th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2013), 14 May 2013, JSPS 162 commitee
Formation of aluminum template grown on (0001)4H-SiC for the GaN growth by RF-MBE
S. Osawa; D. Tajimi; T. Yamaguchi and T. Honda
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
Surface modification of GaN crystals and its effects on optical properties
S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
Fabrication of Ga-In-O films by molecular precursor method
T. Yasuno; T. Oda; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
Growth of GaN on α-Ga2O3/sapphire template by RF-MBE
T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura and T. Honda
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
Cathodoluminescence spectra of β-gallium oxide thin films fabricated by molecular precursor method
S. Takano; H. Nagai; H. Hara; C. Mochizuki; I. Takano; T. Onuma; T. Honda and M. Sato
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
Temperature dependent cathodoluminescent spectra of β-Ga2O3 crystals
T. Onuma; S. Fujioka; T. Yamaguchi; M. Higashiwaki; K. Sakai; T. Matsui and T. Honda
Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
10×10 Siマイクロカップ基板でのμ-LED集積化
Mar. 2013
Formation of aluminum template grown on (0001)4H-SiC for the GaN growth by RF-MBE
2013
Surface modification of GaN crystals and its effects on optical properties
2013
Fabrication of Ga-In-O films by molecular precursor method
2013
Growth of GaN on α-Ga2O3/sapphire template by RF-MBE
2013
Cathodoluminescence spectra of β-gallium oxide thin films fabricated by molecular precursor method
2013
Temperature dependent cathodoluminescent spectra of β-Ga2O3 crystals
2013
Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
2013
In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
2013
Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
2013
Aluminum layers grown on (0001)4H-SiC for the GaN growth by RF-MBE
2013
Compressively strained GaN growth on (0001)4H-SiC with Al buffer by MBE
2013
Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
2013
RF-MBE growth of AlOx/AlN/GaN heterostructures
2013
Chemical fabrication of transparent Cu metal thin film for infrared reflective thin film
2013
Influence of native surface oxide on GaN surface band bending
2013
Effects of surface modification on emission property of GaN Schottky diodes
2013
RF-MBE growth of GaN films on α-Ga2O3/sapphire template
2013
The GaN growth on pseudo aluminum templates by molecular beam epitaxy
2013
Characterization of Ga-In-O films fabricated by molecular precursor method
2013
Polarized Raman spectra in β-Ga2O3 crystals
2013
RF-MBE growth of GaN films on nitridated α-Ga2O3 buffer layer
2013
RF-MBE growth and characterization of GaN films on α-Ga2O3/sapphire template
2013
Impact of the surface modification of the Ga- and N-face n-GaN Schottky diodes with low reverse-bias leakage current
2013
Crystallized AlOx/AlN/GaN heterostructures grown by Plasma-assisted molecular beam epitaxy
2013
Fabrication of Ga-In-O films by molecular precursor method and their future application of transparent electrodes
2013
Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
2013
Characterization of fabricated Ga-In-O films by molecular precursor method and their future application of UV transparent electrodes
2013
Growth of InN and related alloys using DERI method toward fabrication of optoelectronics devices
2013
Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
2013
Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
2013
RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
2013
Mist CVD growth of α-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on α-Ga2O3/sapphire templetes
2013
Ga2O3 and In2O3 growth by mist CVD
2013
GaNの表面処理による表面フェルミ準位変化の推定
29 Nov. 2012
Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
T. Honda; T. Onuma; Y. Sugiura and T. Yamaguchi
Materials Research Society 2012 Fall Meeting (MRS 2012F), 29 Nov. 2012, Materials Research Society
Fabrication of Ga2O3 films by molecular precursor method
T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
Materials Research Society 2012 Fall Meeting (MRS 2012F), 28 Nov. 2012, Materials Research Society
Fabrication of GaN-based Schottky-type Light-emitting Diodes for Integrated RGB Pixels
T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Growth and Characterization of InN-based materials
T. Yamaguchi; T. Araki; T. Honda and Y. Nanishi
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
T. Onuma; S. Fujioka; F. Tomori; T. Yamaguchi and T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
(39)T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
Y. Sugiura; R. Amiya; D. Tajimi; T. Onuma; T. Yamaguchi and T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Introduction of Ultra-thin InN Layer in GaN-based Light-emitting Diodes for the Reduction of Crosstalk
D. Tajimi; M. Hayashi; Y. Sugiura; T. Onuma and T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
R. Amiya; T. Yamaguchi; D. Tajimi; Y. Sugiura; J. Sakaguchi; T. Araki; Y. Nanishi and T. Honda
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Structure and Optical Properties of Transparent Ga2O3-x Thin Films Fabricated by the Molecular Precursor Method
H. Nagai; S. Takano; H. Hara; C. Mochizuki; I. Takano; T. Onuma; T. Honda and M. Sato
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Fabrication of the Transparent Conducting ZnO Thin Film by the Molecular Precursor Method
H. Nagai; T. Shibukawa; S. Takano; T. Honda and M. Sato
11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
Angled-resolved XPS measurements of InN films grown by RF-MBE
R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki and Y. Nanishi
The 7th International Workshop on Nitride Semiconductors (IWN 2012), 18 Oct. 2012
Fabrication of RGB pixels using integrated GaN- based Schottky-type light-emitting diodes
T. Honda; T. Yamaguchi; N. Sakai; S. Fujioka; and Y. Sugiura
The 7th International Workshop on Nitride Semiconductors (IWN 2012), 15 Oct. 2012
GaN growth on (111)Al by molecular beam epitaxy
T. Honda; D. Tajimi; N. Shinohara; Y. Sugiura; M. Hayashi and T. Yamaguchi
17th International Conference on Molecular Beam Epitaxy (MBE 2012), 28 Sep. 2012
Growth of thick InGaN films with entire alloy composition using DERI method
T. Yamaguchi; N. Uematsu; T. Araki; T. Honda; E. Yoon and Y. Nanishi
17th International Conference on Molecular Beam Epitaxy (MBE 2012), 28 Sep. 2012
酸化ガリウムのCLスペクトルの温度依存性
13 Sep. 2012
ZnO単結晶の電子線入射角度依存カソードルミネセンス測定
13 Sep. 2012
集積化GaN系発光素子のための超薄膜InNを挿入した弱導波路発光層の検討
12 Sep. 2012
Angle-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
R. Amiya,T. Yamaguchi,D. Tajimi,Y. Sugiura,T. Araki,Y. Nanishi and T. Honda
第73回応用物理学会学術講演会, 11 Sep. 2012
X-Ray Photoelectron Spectroscopy Measurements around the Valence-Band of Ga- and N-face (0001)GaN
Y. Sugiura; D. Tajimi; R. Amiya; T. Yamaguchi and T. Honda
39th International Symposium on Compound Semiconductors, 27 Aug. 2012
Toward strain control of GaN grown on Si by RF-MBE
T. Yamaguchi; D. Tajimi; T. Igaki; Y. Sugiura and T. Honda
9th International Symposium on Semiconductor Light Emitting Devices (ISSLED2012), 24 Jul. 2012
In-situ RF-MBE growth of AlOx/n-GaN composite structures
M. Higashiwaki; T. Igaki; T. Yamaguchi; and T. Honda
4th International Symposium on Growth of III-Nitrides (ISGN4), 17 Jul. 2012
Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
T. Yamaguchi; N. Uematsu; K. Wang; T. Araki; T. Honda; E. Yoon and Y. Nanishi
31th Electronic Materials Symposium, 12 Jul. 2012
Angle-resolved XPS measurements of In-polar and N-polar InN films
R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki; and Y. Nanishi
31th Electronic Materials Symposium, 12 Jul. 2012
Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
D. Tajimi; T. Igaki; Y. Sugiura; T. Yamaguchi and T. Honda
31th Electronic Materials Symposium, 11 Jul. 2012
Ozone treatment of oxide surface for the fabrication of MgZnO films by molecular precursor method
T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; M. Sato; and T. Honda
31th Electronic Materials Symposium, 11 Jul. 2012
n-GaN上へのAlOx薄膜のin-situ RF-MBE成長
Mar. 2012
AlおよびAlOx膜堆積が極性GaNのPL強度に与える影響
Mar. 2012
Al緩衝層を用いた化合物原料MBE法による(0001)4H-SiC上GaN薄膜の製作
Mar. 2012
RF-MBE法による(GaN/AlN)交互供給緩衝層上GaN薄膜のx線回折測定
Mar. 2012
極性・非極性バルクZnO表面におけるCLスペクトルの比較
Mar. 2012
分子プレカーサー法によるZnO系透明電極製作におけるオゾン洗浄の効果
Mar. 2012
Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
2012
Ozone treatment of oxide surface for the fabrication of MgZnO films by molecular precursor method
2012
Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
2012
Angle-resolved XPS measurements of In-polar and N-polar InN films
2012
In-situ RF-MBE growth of AlOx/n-GaN composite structures
2012
Toward strain control of GaN grown on Si by RF-MBE
2012
X-Ray Photoelectron Spectroscopy Measurements around the Valence-Band of Ga- and N-face (0001)GaN
2012
Angle-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
2012
GaN growth on (111)Al by molecular beam epitaxy
2012
Growth of thick InGaN films with entire alloy composition using DERI method
2012
Fabrication of RGB pixels using integrated GaN- based Schottky-type light-emitting diodes
2012
Angled-resolved XPS measurements of InN films grown by RF-MBE
2012
Fabrication of GaN-based Schottky-type Light-emitting Diodes for Integrated RGB Pixels
2012
Growth and Characterization of InN-based materials
2012
Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
2012
Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
2012
Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
2012
Introduction of Ultra-thin InN Layer in GaN-based Light-emitting Diodes for the Reduction of Crosstalk
2012
Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
2012
Structure and Optical Properties of Transparent Ga2O3-x Thin Films Fabricated by the Molecular Precursor Method
2012
Fabrication of the Transparent Conducting ZnO Thin Film by the Molecular Precursor Method
2012
Fabrication of Ga2O3 films by molecular precursor method
2012
Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
2012
(GaN/AlN)多重緩衝層を用いたRF-MBE法によるSi基板上GaN薄膜成長
Dec. 2011
InNおよびGaN成長における原子脱離過程その場観察
Dec. 2011
In-plane epitaxial relationship of (0001)sapphire grown by compound-source MBE
Y. Sugiura; T. Oda; T. Onuma; T. Yamaguchi and T. Honda
Materials Research Society 2011 Fall Meeting (MRS 2011F), Dec. 2011, Materials Research Society
Low temperature growth of GaN on pseudo (111)Al substrates by RF-MBE
M. Hayashi; T. Goto; T. Yamaguchi; T. Igaki and T. Honda
Materials Research Society 2011 Fall Meeting (MRS 2011F), Dec. 2011
XPS spectra of c-face GaN and ZnO crystals
T. Honda
The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
X-ray diffraction of ZnO layer grown by compound-source MBE
R. Amiya; Y. Sugiura; T. Yamaguchi and T. Honda
The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
Ozone treatment of the substrates for ZnO deposition by molecular precursor method
T. Oda; H. Hara; Y. Sugiura; T. Yasuno; T. Yamaguchi and T. Honda
The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
RF-MBE法による(GaN/AlN)交互供給緩衝層上GaN薄膜成長
Aug. 2011
極性および非極性GaN表面における表面再結合過程
Aug. 2011
六方晶GaNとZnOにおける表面再結合の比較
Aug. 2011
化合物原料MBE法を用いたZnO薄膜の結晶成長とその評価
Aug. 2011
Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
T. Onuma; N. Sakai; T. Igaki; T. Yamaguchi; A. A. Yamaguchi and T. Honda
The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
Growths of InN/InGaN periodic structure and thick InGaN film using dropment elimination process by radical-beam irradiation
T. Yamaguchi; T. Araki; T. Honda; E. Yoon and Y. Nanishi
The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
Built-in potential along the c-axis in MBE-grown GaN layers observed by angle resolved x-ray photoelectron spectroscopy
T. Honda; T. Igaki; T. Yamaguchi; Y. Kumagai and A. Kokitu
The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
Low temperature growth of GaN on pseudo (111)Al substrates by RF-molecular beam epitaxy
M. Hayashi and T. Honda
The 34th International Symposium on Optical Communications, Aug. 2011
Surface Recombination in GaN crystals by surface modification
N.Sakai and T. Honda
The 34th International Symposium on Optical Communications, Aug. 2011
X-ray diffraction characterization of ZnO layer grown by compound-source molecular beam epitaxy
Y. Sugiura and T. Honda
The 34th International Symposium on Optical Communications, Aug. 2011
DERI法によるIn窒化物半導体の結晶成長
Jul. 2011
Reduction of reverse-bias leakage current in GaN-based Schottky-type light-emitting diodes by a surface modification
T. Honda; N. Sakai; S. Komiyama; M. Hayashi and T. Igaki
9th International Conference on Nitride Semiconductors (ICNS-2011), Jul. 2011
Recombination dynamics in polar and nonpolar GaN substrates
N. Sakai; T. Igaki; T. Onuma; A. A. Yamaguchi; T. Yamaguchi and T. Honda
30th Electronic Materials Symposium (EMS-30), Jul. 2011
In situ monitoring techniques by DERI method
T. Yamaguchi; K.Wang; T. Araki; T. Honda; E. Yoon and Y.Nanishi
30th Electronic Materials Symposium (EMS-30), Jul. 2011
Polarity control of MgZnO transparent electrodes by molesular precursor method
T. Oda; T. Kibu; H. Hara; Y. Sugiura; M. Sato and T. Honda
30th Electronic Materials Symposium (EMS-30), Jul. 2011
GaN growth on pseudo (111)Al substrates by RF-MBE
T. Honda; M. Hayashi; T. Goto and T. Igaki
Europe Materials Research Society 2011 Spring Meeting (E-MRS), May 2011, Europe Materials Research Society
Surface Recombination in polar and nonpolar GaN surfaces
N. Sakai; T. Onuma; A. A. Yamaguchi and T. Honda
5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
ZnO growth for transparent electrodes by compound-source MBE
Y. Sugiura; T. Oda; S. Obata; Y. Yoshihawa; T. Onuma and T. Honda
5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
Initial growth monitoring in GaN epitaxial growth on (GaN/AlN) buffer layer by RF-molecular beam epitaxy
M. Hayashi; T. Goto; T. Igaki; J. Sugawara; R.Yonezawa; Y. Sugiura and T. Honda
5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
RF-MBE法を用いた(GaN/AlN)交互供給緩衝層上GaN薄膜成長
Mar. 2011
化合物原料MBE法によるZnO薄膜の製作検討
杉浦洋平,小田拓人,小畑 聡,芳原義大,尾沼猛儀,本田 徹
第58回応用物理学関係連合講演会、神奈川工科大学、厚木、神奈川, 26p-BZ-7, Mar. 2011
分子プレカーサー法により形成したp型酸化銅(I)透明薄膜の半導体特性
Mar. 2011
銀ナノ粒子-チタニアアロイ薄膜の導電性と光電流密度
Mar. 2011
Built-in potential in GaN crystals by angle resolved X-ray photoelectron spectroscopy
2011
Fabrication of c-axis oriented MgZnO transparent electrodes by molecular precursor method
2011
GaN growth on pseudo (111)Al substrates by RF-MBE
2011
Surface Recombination in polar and nonpolar GaN surfaces
2011
ZnO growth for transparent electrodes by compound-source MBE
2011
Initial growth monitoring in GaN epitaxial growth on (GaN/AlN) buffer layer by RF-molecular beam epitaxy
2011
Reduction of reverse-bias leakage current in GaN-based Schottky-type light-emitting diodes by a surface modification
2011
Recombination dynamics in polar and nonpolar GaN substrates
2011
In situ monitoring techniques by DERI method
2011
Polarity control of MgZnO transparent electrodes by molesular precursor method
2011
Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
2011
Growths of InN/InGaN periodic structure and thick InGaN film using dropment elimination process by radical-beam irradiation
2011
Built-in potential along the c-axis in MBE-grown GaN layers observed by angle resolved x-ray photoelectron spectroscopy
2011
Low temperature growth of GaN on pseudo (111)Al substrates by RF-molecular beam epitaxy
2011
Surface Recombination in GaN crystals by surface modification
2011
X-ray diffraction characterization of ZnO layer grown by compound-source molecular beam epitaxy
2011
XPS spectra of c-face GaN and ZnO crystals
2011
X-ray diffraction of ZnO layer grown by compound-source MBE
2011
Ozone treatment of the substrates for ZnO deposition by molecular precursor method
2011
In-plane epitaxial relationship of (0001)sapphire grown by compound-source MBE
2011
Low temperature growth of GaN on pseudo (111)Al substrates by RF-MBE
2011
Built-in potential in GaN crystals by angle resolved X-ray photoelectron spectroscopy
T. Honda; T. Igaki; Y. Kumagai and A. Kokitu
The 38th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-38), San Diego, California, USA, Mo 1220., Jan. 2011
Fabrication of c-axis oriented MgZnO transparent electrodes by molecular precursor method
T. Oda; T. Kidu; H. Hara; Y. Sugiura; M. Sato and T. Honda
The 38th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-38), San Diego, California, USA, We 1200., Jan. 2011
MBE法による交互供給バッファー層を用いたGaN薄膜の製作
17 Dec. 2010
化合物原料MBE法によるGaN/(111)Siの高品質化の検討
17 Dec. 2010
化合物原料MBE法によるZnO薄膜の低温堆積検討
17 Dec. 2010
RF-MBE法による擬似Al基板上へのGaN薄膜の低温成長
Nov. 2010
RF励起窒素を用いた化合物原料MBE法によるGaN/(111)Siの製作検討
Nov. 2010
疑似(111)Al基板上GaN薄膜のRF-MBE成長
Nov. 2010
Fabrication of RGB pixels based on UV Schottky-type LEDs
T.Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, IL-9., Nov. 2010
The Electrical and optical properties of p-type cuprous oxides transparent thin films by the molecular precursor method
T. Suzuki; H. Nagai; C. Mochizuki; H. Hara; I. Takano; T. Honda and M. Sato
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-18., Nov. 2010
Fabrication of ZnO layers by compound source molecular beam epitaxy
Y. Sugiura; T. Oda; S. Obata; Y. Yoshihara and T. Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-25., Nov. 2010
Polarity control of MgZnO thin films by molecular precursor method
T. Oda; T. Kizu; Y. Sugiura; H. Hara; M. Sato and T. Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-26., Nov. 2010
GaN epitaxial growth on pseudo Al substrates by RF-MBE
M. Hayashi; T. Goto; T. Igaki; J. Sugawara; R. Yonezawa; S. Taguchi and T. Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-27., Nov. 2010
Surface recombination mechanism in hexagonal GaN crystals
N. Sakai; T. Onuma; T. Okuhata; A. A. Yamaguchi and T. Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-28., Nov. 2010
Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
T. Igaki; M. Hayashi; T. Goto; S. Taguchi and T. Honda
The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-29., Nov. 2010
分子プレカーサー法によるp型酸化銅(I)透明薄膜の形成
Sep. 2010
分子プレカーサー法によるMgZnO薄膜の極性制御
Sep. 2010
RF-MBE法を用いた疑似Al基板上GaN成長
Sep. 2010
Surface recombination of hexagonal GaN crystals
N. Sakai; T. Onuma; T. Okuhata; A. A. Yamaguchi and T. Honda
The International Workshop on Nitride semiconductors (IWN2010), Marriott Tampa Waterside Hotel & Marina, Tampa Bay, Florida, USA, GP 1.20., Sep. 2010
MBE法による交互供給バッファ層を用いたGaN薄膜の製作検討
T. Goto and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, E-2., Aug. 2010
化合物原料MBE法によるZnO薄膜の製作検討
Y. Sugiura and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P1-22., Aug. 2010
RF-MBE法による擬似Al基板上へのGaN成長
M. Hayashi and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P2-15., Aug. 2010
GaN結晶における面方位とフォトルミネッセンスの発光寿命の関係
N. Sakai and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P3-4., Aug. 2010
RF-MBE法によるGaN薄膜成長における極性制御の検討
T. Igaki and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P3-12., Aug. 2010
分子プレーカーサー法によるGa-doped MgZnO薄膜の配向性及び膜厚依存性の検討
T. Oda and T. Honda
The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P2-29., Aug. 2010
GaN growth on pseudo Al substrates by molecular beam epitaxy at low temperatures
T. Goto; M. Hayashi; T. Igaki; S. Taguchi and T. Honda
16th International Conference on molecular beam epitaxy (ICMBE 2010), bcc Belriner congress center, Belrin, Germany,, Aug. 2010
XPS study on (0001) and (000-1)GaN layers on sapphire substrates grown by molecular beam epitaxy
T. Honda; K. Noguchi; N. Sakai; S. Taguchi; T. Goto; T. Igaki and M. Hayashi
The 3rd International Symposium on Growth of III-Nitrides, Montpellier Convention Center, Montpellier, France, MoP-38., Jul. 2010
III-N growth on pseudo Al substrates by MBE at low temperatures
M. Hayashi; T. Goto; T. Igaki; S.Taguchi and T. Honda
29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, Th6-12., Jul. 2010
Light propagation in GaN-based Schottky-type diodes using FDTD method
N. Sakai; T. Kobayashi and T. Honda
29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, Th2-4., Jul. 2010
Fabrication of c-axis oriented MgZnO films by molecular precursor method
T. Oda; T. Kizu; H. Hara; Y. Sugiyama; M. Sato and T. Honda
29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, We2-6., Jul. 2010
小型フラットディスプレイのための窒化ガリウム系集積化発光素子の製作
04 Jun. 2010
Fabrication of c-axis oriented MgZnO transparent electrode by molecular precursor method
T. Oda; H. Hara; C. Mochizuki; M. Sato and T. Honda
8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010), Peking University, Beijing, China, P16., May 2010
Surface Modification of (0001)GaN and its application to RGB pixels based on UV Schottky-type LEDs
T. Honda; N. Sakai and T. Nozaki
8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010), Peking University, Beijing, China, L-3., May 2010
Fabrication of c-axis oriented MgZnO transparent electrode by molecular precursor method
2010
Surface Modification of (0001)GaN and its application to RGB pixels based on UV Schottky-type LEDs
2010
Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
2010
XPS study on (0001) and (000-1)GaN layers on sapphire substrates grown by molecular beam epitaxy
2010
III-N growth on pseudo Al substrates by MBE at low temperatures
2010
Light propagation in GaN-based Schottky-type diodes using FDTD method
2010
Fabrication of c-axis oriented MgZnO films by molecular precursor method
2010
GaN growth on pseudo Al substrates by molecular beam epitaxy at low temperatures
2010
Surface recombination of hexagonal GaN crystals
2010
Fabrication of RGB pixels based on UV Schottky-type LEDs
2010
The Electrical and optical properties of p-type cuprous oxides transparent thin films by the molecular precursor method
2010
Fabrication of ZnO layers by compound source molecular beam epitaxy
2010
Polarity control of MgZnO thin films by molecular precursor method
2010
GaN epitaxial growth on pseudo Al substrates by RF-MBE
2010
Surface recombination mechanism in hexagonal GaN crystals
2010
Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
2010
Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
The 37th International Symposium on Compound Semiconductors (ISCS 2010), Takamatsu Symbol Tower, Kagawa, Japan, FrP-63., 2010
Fabrication of AlN films at low temperature by CS-MBE technique
K. Watanabe; K. Sugimoto; M. Arai; K. Takeda and T. Honda
34th International Symposium on Compound Semiconductors, Kyoto University, Kyoto, TuC-P23, Oct. 2007
Fabrication of GaN-based UV TF-ELDs by CS-MBE technique and their application to RGB Light-emitting Pixels
M. Arai; K. Sugimoto; S. Egawa and T. Honda
7th International Conference on Nitride Semiconductors, MGM Grand Hotel, Las Vegas, NV, USA, TuP53, Sep. 2007
Fabrication of GaN-based MOS LEDs for micro pixels in flat-panel displays
T. Honda; T. Kobayashi; S. Komiyama; Y. Mashiyama; M. Arai and K. Yoshioka
7th International Conference on Nitride Semiconductors, MGM Grand Hotel, Las Vegas, NV, USA, TuP52, Sep. 2007
Introduction of preheated ammonia during GaN growth on Si by compound-source MBE at low temperature
T. Honda; M. Sawadaishi; H. Yamamoto; M. Arai; K. Yoshioka and T. Okuhata
15th International Conference on Crystal Growth, Salt Lake City, UT, USA, wg29, Aug. 2007
Preheated Ammonia Supply during Compound-Source Molecular Beam Epitaxy of GaN
M. Sawadaishi; M. Sawada; K. Sugimoto; T. Baba and T. Honda
The 3rd Asia-Pacific Workshop on Widegap Semiconductors, Jeonju, Korea, 11 - 14 March, 2007., Mar. 2007
Fabrication of GaN-based MOS LEDs operating in UV spectral region
2007
Preheated Ammonia Supply during Compound-Source Molecular Beam Epitaxy of GaN
2007
Introduction of preheated ammonia during GaN growth on Si by compound-source MBE at low temperature
2007
Fabrication of GaN-based UV TF-ELDs by CS-MBE technique and their application to RGB Light-emitting Pixels
2007
Fabrication of GaN-based MOS LEDs for micro pixels in flat-panel displays
2007
Fabrication of AlN films at low temperature by CS-MBE technique
2007
Fabrication of GaN-based MOS LEDs operating in UV spectral region
T. Honda; T. Kobayashi; S. Komiyama; Y. Mashiyama
34th Conference on the physics and chemistry of semiconductor interfaces, Salt Lake City, Utah, U. S. A., 14 - 18 January, 2007, Mo1135, Jan. 2007
Integrated light-emitting diodes grown by MOCVD for flat display panels
T. Honda; T. Kobayashi; S. Egawa; M. Sawada; K. Sugimoto; T. Baba and H. Kawanishi
13th International Conference on Metal-organic Vapor Phase Epitaxy, Miyazaki, Japan, 2006, 22 - 26 May, TuP.64, Jun. 2006
Cathodoluminescence Spectra of Surface-oxidized GaN Crystallites
2006
Integrated light-emitting diodes grown by MOCVD for flat display panels
2006
Cathodoluminescence Spectra of Surface-oxidized GaN Crystallites
T. Honda; M. Akiyama; T. Baba and H. Kawanishi
33rd Conference on the Physics and Chemistry of Semiconductor Interfaces (2006). We1140, Jan. 2006
減圧MO‐VPE法によるBGaNの結晶成長
14 Nov. 1998
BGaN系紫外レーザの基礎検討
Nov. 1998
減圧MO‐VPE法によるBGaNのH. T.-AlNを介した(0001)6H‐SiC上への成長
Sep. 1998
(0001)6H‐SiC基板上へのBxGa1‐xNの成長
Sep. 1998
(0001)6H‐SiC上へのGaNの直接成長
Sep. 1998
GaN系面発光レーザ用京新規構造の製作
Sep. 1998
GaN系紫外発光素子の基礎検討
Mar. 1998
アンモニアを用いたMO‐MBE法による(0001)6H‐SiC基板上GaNの直接成長
Mar. 1998
BGaN系紫外レーザの基礎検討
1998
BAlGaN格子整合系4元混晶半導体の基礎検討
Dec. 1997
有機金属気相成長法によるGaN/BAlNヘテロ構造の製作
Nov. 1997
BxGa1-xNの有機金属気相成長における熱力学解析
Oct. 1997
(0001)6H-SiC上に格子整合したBGaNの光学利得の見積もり
Oct. 1997
(0001)6H-SiC上に格子整合したBx1Aly1Ga(1-x1-y1)N/Bx2Aly2Ga(1-x2-y2)N DH構造の基礎検討
Oct. 1997
AlN/GaN交互供給バッファ層による(0001)6H‐SiC上GaNのクラック抑制
Oct. 1997
(0001)6H‐SiC上に成長したDH構造におけるクラックの特徴
Oct. 1997
有機金属気相成長法による(0001)6H‐SiC基板上に成長したGaN/B(AlN)ヘテロ構造
Oct. 1997
p型コンタクト抵抗のGaN面方位依存性
Mar. 1997
MOVPE法によるGaN/AlGaN量子井戸構造の界面制御に関する検討
Mar. 1997
MOVPE選択成長法によるGaN微細構造の形成
Mar. 1997
GaN系面発光レーザのためのドライエッチングによる微細構造形成
Mar. 1997
BAlGaN格子整合系4元混晶半導体の基礎検討
1997
ZnSe系緑色/青色面発光レーザの基礎検討
Sep. 1996
GaNエピタキシャル成長のためのSi基板上へのZnO形成
Sep. 1996
サファイア基板上へのGaNのMOVPE成長におけるオゾン前処理
Sep. 1996
3フローMOVPE法によるGaNの成長と評価
Sep. 1996
光ウエットエッチング後のGaN膜のフォトルミネッセンス測定
Sep. 1996
GaN/AlGaN量子井戸におけるピエゾ効果が発光に与える影響
Sep. 1996
Light Emitting Materials in Green/Blue/UV Spectral Region and Its Application for Surface Emitting Lasers
T. Honda; F. Koyama and K. Iga
NEDO Frontier Technology Lecture, Sep. 1996
GaN系半導体レーザのドライエッチング反射鏡に関する検討
Aug. 1996
ECR-RIBEによるGaNのエッチング
Mar. 1996
電子ビーム蒸着によるGaN系面発光レーザ用誘電体多層膜反射鏡
Mar. 1996
GaN系面発光レーザの温度特性に関する検討
Mar. 1996
Light Emitting Materials in Green/Blue/UV Spectral Region and Its Application for Surface Emitting Lasers
1996
GaN系青色・紫外面発光レーザの基礎検討
Mar. 1995
量子井戸活性層を有するGaN系面発光レーザの検討
Mar. 1995
バンド内緩和時間を考慮したGaNの線形利得の見積り
Sep. 1994
In Situk光モニタを用いたII-VI族青色面発光レーザの反射鏡製作
Sep. 1994
GaN系面発光レーザ用多層膜反射鏡の基礎設計
Sep. 1994
Highly-Doped p-ZnSe Formation by Li3N Diffusion
S. W. Lim; T. Honda; F. Koyama and K. Iga
第55回応用物理学会学術講演会, Sep. 1994
Design of MQB for ZnCdSe/ZnSe Blue-Green Lasers
K. Bousbahi; T. Honda; F. Koyama and K. Iga
第55回応用物理学会学術講演会, Sep. 1994
青色面発光レーザの高反射率反射鏡の基礎検討
Mar. 1994
CuAlxGa1-x(SySe1-y)2積層構造のルミネッセンスとデバイス応用
Mar. 1994
Highly-Doped p-ZnSe Formation by Li3N Diffusion
1994
Design of MQB for ZnCdSe/ZnSe Blue-Green Lasers
1994
II-VI族化合物を用いる短波長面発光レーザの基礎設計
Sep. 1993
CuGaS2への不純物ドーピング(III)
Mar. 1993
有機金属気相成長法による銅カルコパイライトのヘテロ積層構造
Sep. 1992
ワイドギャップカルコパイライト化合物のヘテロ接合
Sep. 1992
CuGaS2への不純物ドーピング(II)
Sep. 1992
CuGaS2への不純物ドーピング(I)
Mar. 1992
有機金属気相成長法によるI-III-V2族化合物のエピタキシャル成長
Mar. 1992
CuGaS2/ CuAlS2/GaP(100)薄膜の励起スペクトル
Nov. 1991
CuAlS2のPL評価
Sep. 1991
交互供給MOCVD法によるCuGaS2薄膜の成長(II)
Mar. 1991
CuAl(SxSe1-x)2のMOVPE成長
Mar. 1991
交互供給MOCVD法によるCuGaS2薄膜の成長
Sep. 1990
DTBSを用いたCuGa(SxSe1-x)2のMOVPE成長
Sep. 1990
MOVPE法によるカルコパイライト薄膜の成長と評価
Jul. 1990
CuGaS2,CuGaSe2の減圧MOVPE成長
Mar. 1990
銅カルコパイライトのMOVPE成長における原料系の検討
Sep. 1989
新しいS原料を用いたCuGaS2のMOVPE成長
Apr. 1989
銅カルコパイライトのMOVPE成長
Jan. 1989
CuGaS2/ZnSのMOVPE成長
Oct. 1988