HONDA Tohru

School of Advanced Engineering Department of Applied PhysicsProfessor

Career

  • Apr. 2007 - Present
    Kogakuin University, Faculty of Engineering, Department of Information and Communications Engineering
  • Apr. 2006 - Mar. 2007
    Kogakuin University, Faculty of Engineering, Department of Information and Communications Engineering
  • Apr. 2000 - Mar. 2006
    Kogakuin University, Faculty of Engineering, Department of Electronic Engineering
  • Apr. 2001 - Present
    工学院大学工学研究科修士課程担当(半導体フォトニクスフォトニクス特論, 固体電子工学特論)
  • Apr. 1996 - Mar. 2000
    Kogakuin University, Faculty of Engineering, Department of Electronic Engineering
  • Sep. 1993 - Mar. 1996
    Tokyo University of Technology, School of Engineering, Electronics Department
  • Apr. 1993 - Mar. 1996
    Tokyo Institute of Technology, Precision and Intelligence Laboratory, Advanced Microdevices Division

Educational Background

  • Apr. 1990 - Mar. 1993
    Tokyo Institute of Technology, Graduate School, Division of Integrated Science and Engineering
  • Apr. 1988 - Mar. 1990
    Tokyo Institute of Technology, Graduate School, Division of Integrated Science and Engineering
  • Apr. 1984 - Mar. 1988
    Science University of Tokyo, Faculty of Science and Engineering, Physics

Degree

  • Mar. 1983
    理学士, Science University of Tokyo
  • Mar. 1990
    工学修士, Tokyo Institute of Technology
  • Mar. 1993
    博士(工学), Tokyo Institute of Technology

Affiliated academic society

  • 応用物理学会
  • 電子通信情報学会
  • 照明学会
  • Marerials Research Society
  • 5th International conference on nitrode semiconductors
  • International conference on molecular beam epitaxy
  • 5th International conference on nitrode semiconductors
  • International conference on molecular beam epitaxy

IDs

  • Identifiers

    研究者番号:20251671
    researchmap会員ID:1000260070
    J-Global ID:200901048194827882

Research Field

  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electric/electronic material engineering, electronic materials
  • Natural sciences, Mathematical physics and basic theory, electron transport
  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electronic devices and equipment, LED displays
  • Natural sciences, Semiconductors, optical and atomic physics, Light-emitting diodes

Books and other publications

  • Basic and Applied Electron Devices
    Fumio Hasegawa and Tohru Honda, Joint work
    09 Sep. 2011
    9784782855553
  • 半導体デバイスの基礎と応用
    2011
    9784782855553
  • 次世代光記録技術と材料
    Others
    Jan. 2004
  • 面発光レーザの基礎と応用
    Joint work
    Jun. 1999
  • Properties, Processing and Application of Gallium Nitride and Related Semiconductors
    K. Iga and T. Honda, Joint work
    emis DATAREVIEWS SERIES NO. 23, INSPEC publications, The Institution of Electrical Engineers, London, United Kingdom, Apr. 1999
  • Properties, Processing and Application of Gallium Nitride and Related Semiconductors
    1999

Paper

MISC

Lectures, oral presentations, etc.

  • ナノコラムLEDにおける連続的なITO電極形成技術
    22 Sep. 2023
  • (10-11)上GaInN/GaInN MQWs成長による高効率赤色発光
    21 Sep. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長-GaInNの成長温度依存性-
    21 Sep. 2023
  • 各種In系材料を出発原料に用いたMist CVD成長におけるα-In2O3薄膜の電気的特性に関する評価
    21 Sep. 2023
  • 高Mg組成岩塩構造MgZnO薄膜のミストCVD成長
    21 Sep. 2023
  • Mist CVD法によるα-GIO混晶成長とα線検出応用に向けた検討
    21 Sep. 2023
  • Mist CVD法Sn-doped α-Ga2O3薄膜成長におけるSn溶液の静置時間変化
    21 Sep. 2023
  • III族不純物ドープMgO薄膜の正孔捕獲中心
    20 Sep. 2023
  • Growth of AZO thin films from pressed-sintered powder targets under subatmospheric conditions
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr.
    20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 03 Aug. 2023
  • Growth of GaInN/GaInN MQWs on nanocolumns with thick GaInN buffer layer using RF-MBE
    H. Akagawa; J. Yamada; T. Yamaguchi; R. Togashi; T. Onuma; I. Nomura; T. Honda; K. Kishino
    20th International Conference on Crystal Growth and Epitaxy (ICCGE20), 31 Jul. 2023
  • 発光径Φ5μmのナノコラム発光デバイスの作製
    17 Mar. 2023
  • N2 および Ar/H2 アニールによる SnOx 薄膜の還元状態の比較
    17 Mar. 2023
  • Ar/N2混合ガス中スパッタリングで堆積したSnOx薄膜におけるN2濃度の影響
    17 Mar. 2023
  • Mist CVD法による各種In系粉末を出発原料に用いたα-In2O3の成長機構に関する検討
    16 Mar. 2023
  • Mist CVD法により成長したα-In2O3薄膜の低キャリア濃度化とMOSFET製作
    16 Mar. 2023
  • 窒素RFパワー変化によるナノコラム結晶のGaInNバッファ層形状均一化の検討
    15 Mar. 2023
  • その場XRD-RSMを用いたGaN上GaInN Buffer層挿入GaInN RF-MBE成長における格子緩和過程観察
    15 Mar. 2023
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル(II)
    15 Mar. 2023
  • ミストCVD法によるIII族ドープ岩塩構造MgZnO薄膜成長
    15 Mar. 2023
  • Crystal growth of Cu3N by mist CVD with ethylenediamine
    S. Yoshida; H. Nagai; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth of ZnO thin films via magnetron sputtering using a custom-made sintered target
    R. G. B. Madera; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi; M. R. Vasquez Jr
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Study for composition control in mist CVD growth of α-GIO alloys
    K. Yamada; T. Yamaguchi; T. Onuma; T. Honda
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Investigation on the stability of source solution for the α-In2O3 growth by mist CVD
    T. Yamamoto; A. Taguchi; R. Yamada; H. Nagai; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Roles of In doping in rocksalt-structured MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Realization of high mobility in α-In2O3 film grown by mist CVD with different concentration of In2O3 powder as source precursor
    A. Taguchi; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • TEM evaluation of in-situ nitrogen plasma irradiated GaInN
    A. Tokushige; S. Ohno; Y. Hayakawa; T. Honda; T. Onuma; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Electrical property and valence band offset in conductive MgNiO on sapphire substrates
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Growth and characterization of AlGaN and multiple quantum wells with varying III/V ratios by RF-MBE
    M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Structural analysis in epitaxial growth of GaInN by RF-MBE using XRD-RSM
    J. Takeuchi; T. Sasaki; H. Yokoyama; T. Onuma; T. Honda; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 25 Nov. 2022
  • Twin-free α-Ga2O3 films grown by mist CVD on (0001) α-Al2O3 substrates
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 21st International Symposium on Advanced Technology (ISAT-21), 24 Nov. 2022
  • Fabrication of monolithic blue micro-LED pixels and investigation of full colorization
    H. Chikui; S. Takeda; T Onuma; T. Yamaguchi; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 17 Nov. 2022
  • Roles of In doped in MgZnO films grown by mist CVD method
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Photocurrent spectra of rocksalt-structured MgZnO films in vacuum UV spectral range
    H. Kusaka; W. Kosaka; K. Ogawa; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 15 Nov. 2022
  • Realization of near-band-edge cathodoluminescence in 190 nm wavelength range by rocksalt-structured MgZnO epitaxial films
    T. Onuma; K. Ogawa; W. Kosaka; H. Kusaka; Y. Ota; K. Kaneko; T. Yamaguchi; S. Fujita; T. Honda
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Impact of gas type on formation of twin structure in the growth of a-Ga2O3 by mist chemical vapor deposition
    R. Yamada; A. Kobayashi; K. Ueno; A. Sekiguchi; T. Onuma; T. Honda; H. Fujioka; T. Yamaguchi
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Growth and optical characteristics of high-Al content AlGaN on AlN templates by RF-MBE,under metal-rich conditions
    M. Hayasaki; N. Tachibana; M. Hashimoto; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Local composition distribution in high Al content AlGaN/AlN quantum wells grown by RF-MBE
    M. Hayasaki; T. Yamaguchi; T. Yamaguchi; T. Honda; T. Onuma
    The 10th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2022), 14 Nov. 2022
  • Mist CVD 法により成長した酸化インジウムの高移動度化に伴う新機能開拓
    12 Nov. 2022
  • Mist CVD 法 α-Ga2O3成長時に形成される双晶抑制に関する研究
    12 Nov. 2022
  • Mist CVD 法 α-In2O3 成長における原料溶液中の反応に関する検討
    12 Nov. 2022
  • RF-MBE による GaInN 成長における歪み緩和制御
    12 Nov. 2022
  • 岩塩構造 MgZnO/MgO ヘテロ接合の製作とバンドアライメント解析
    12 Nov. 2022
  • RF-MBE による β-Ga2O3(-201)基板上への AlN 及び GaN 成長において成長前処理が成長層に及ぼす影響
    12 Nov. 2022
  • Mist CVD 法を用いた Cu3N 成長における原料溶液の検討
    12 Nov. 2022
  • 顕微フォトルミネッセンス分光による β-Ga2O3 結晶の微細構造の可視化検討
    12 Nov. 2022
  • in-situ 窒素プラズマ照射された MBE 成長 GaInN の TEM 評価
    12 Nov. 2022
  • RF-MBE 成長した Ga 極性及び N 極性 GaN 薄膜の比較検討
    12 Nov. 2022
  • Microstructural characterization of β-Ga2O3,crystals by photoluminescence mapping measurements
    K. Shoji; M. Nakanishi; M. Kasu; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • Impact of RF power on electrical property of NiO films grown by RF magnetron spattering
    Akito Ishikawa; M. Murayama; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 25 Oct. 2022
  • RF-MBE growth of Mg doped GaN on β-Ga2O3,(-201) substrates
    T. Yamaguchi; M. Hayasaki; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • P-type conductivity in MgxNi1-xO films deposited on sapphire substrates by RF magnetron sputtering
    M. Murayama; A. Ishikawa; T. Yamaguchi; T. Honda; K. Sasaki; A. Kuramata; T. Onuma
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • Growth of α-In2O3 films with different concentrations of In2O3 powder used as source precursor by mist CVD
    A. Taguchi; K. Kaneko; K. Goto; T. Onuma; T. Honda; Y. Kumagai; S. Fujita; T. Yamaguchi
    The 4th International Workshop on Gallium Oxide and Related Materials (IWGO2022), 24 Oct. 2022
  • Temperature dependence of carrier concentration and Hall mobility in alpha-In2O3 films grown by mist CVD method
    A. Taguchi; T. Onuma; K. Goto; K. Kaneko; Y. Kumagai; T. Honda; S. Fujita; T. Yamaguchi
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Analyses of Band Alignment in Rocksalt-structured MgZnO/MgO Interface Grown by Mist CVD
    M. Matsuda; K. Ogawa; Y. Ota; T. Yamaguchi; K. Kaneko; S. Fujita; T. Honda; T. Onuma
    41st Electronic Materials Symposium, 19 Oct. 2022
  • Importance of dissolving source precursor of Ga(C5H7O2)3 with HCl in mist CVD for α-Ga2O3 growth
    R. Yamada; A. Sekiguchi; T. Onuma; T. Honda; T. Yamaguchi
    2022 International Conference on Solid State Devices and Materials (SSDM202), 27 Sep. 2022
  • ナノコラム形状制御技術を用いた赤色発光ナノコラムμ-LED構造の成長と作製
    23 Sep. 2022
  • ミスト化学気相成長法コランダム構造酸化ガリウム薄膜のガス種による双晶形成への影響
    23 Sep. 2022
  • ミストCVD法によるInドープMgZnO薄膜の成長
    23 Sep. 2022
  • 岩塩構造酸化マグネシウム亜鉛薄膜の真空紫外領域での光電流スペクトル
    23 Sep. 2022
  • InドープMgO薄膜の発光特性
    23 Sep. 2022
  • その場XRD-RSM を用いたRF-MBE GaInNヘテロエピタキシャル成長における緩和過程観察
    22 Sep. 2022
  • RF-MBEによるInN緩衝層を用いたGaInNの格子緩和制御
    22 Sep. 2022
  • Mist CVD法を用いたCu3N成長における安定した原料供給の検討
    21 Sep. 2022
  • 窒素アニール還元反応によるSnOx薄膜の局所結合状態
    21 Sep. 2022
  • Ar/N2混合雰囲気でスパッタ成膜した部分窒化SnOx­­­の特性評価
    21 Sep. 2022
  • Mist CVD法により成長したα-In2O3薄膜のキャリア濃度とホール移動度の温度依存性
    21 Sep. 2022
  • RF-MBE成長赤色発光MQWにおけるGaInN下地層挿入の効果
    20 Sep. 2022
  • 赤色ナノコラム成長におけるGaInNバッファ層のⅤ/Ⅲ族比依存性
    20 Sep. 2022
  • Mist CVD法による(Ga1-xInx)2O3混晶成長の組成制御に向けた検討
    20 Sep. 2022
  • Mist CVD 法における原料溶液中の反応がα-In2O3成長に与える影響
    20 Sep. 2022
  • Mist CVDを用いたGTO薄膜成長におけるSnドープ量変化の影響
    03 Dec. 2022
  • Mist CVDβ型酸化ガリウム成長に塩酸が与える影響
    03 Dec. 2022
  • RF-MBE法によるAlGaN/AlNヘテロ構造と量子井戸構造の成長と評価
    03 Dec. 2022
  • ミストCVD法により成膜したInドープMgO薄膜の発光特性
    03 Dec. 2022
  • RF-MBEによるβ-Ga2O3(-201)基板へのMgドープGaNヘテロ構造の製作
    03 Dec. 2022
  • InドープMgZnO薄膜のミストCVD成長
    03 Dec. 2022
  • micro-LED集積化における側面の制御による電極の形成
    03 Dec. 2022
  • 岩塩構造酸化マグネシウム亜鉛MSM型真空紫外センサーの受光感度の温度依存性
    03 Dec. 2022
  • 放射光X線回折測定を用いたGaInN/InN成長のその場観察~InN解離温度領域での振る舞い~
    Mar. 2018
  • alpha-Ga2O3を用いたダブルショットキー型光検出器の製作
    Mar. 2018
  • III-V族窒化物の価電子帯構造およびギャップ内準位の評価
    Mar. 2018
  • 岩塩構造MgxZn1-xOの吸収端の観測と電子状態計算
    Mar. 2018
  • イオン注入したGaNの光熱偏向分光法による評価
    Mar. 2018
  • 岩塩構造MgxZn1-xOにおける深紫外線カソードルミネセンスの温度および励起密度依存性
    Mar. 2018
  • 窒素ドープ酸化ガリウム薄膜における青色発光の強度変化
    Mar. 2018
  • Influence of interface state and band bending on In and N polar InN from Angle-resolved XPS
    Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
    45th Conference on the Physics & Chemistry of Surfaces & Interfaces (PCSI 45), Jan. 2018, American Vacuum Society
  • ミストCVD法により成長したIn2O3薄膜を用いたTFT製作検討
    Dec. 2017
  • コランダム構造酸化ガリウムソーラーブラインド光検出器の開発
    Dec. 2017
  • Near surface band bending in InN films grown by DERI method
    Y. Nakajima; K. Uehara; T. Onuma; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Fabrication of Si micro-cup substrate and its application for integration of μ-LEDs
    R. Nawa; T. Onuma; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Origin of free holes and visible light absorption in p-type NiO films
    M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Bandgap Engineering of α-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Fabrication of TFT using amorphous In2O3 thin film by mist CVD
    T. Kobayashi; K. Sawamoto; S. Aikawa; T. Yamaguchi; T. Onuma; and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Formation of Black Matrix for Realization of Micro-LED Display
    Y. Chunobayashi; R. Nawa; Y. Takahashi; H. Matsuura; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Unintentionally Doped Impurities in GaN Layer Grown by RF-MBE
    D. Taka; T. Yamaguchi; T. Onuma and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Photothermal Deflection Spectra of Gallium indium nitride layers grown by MOVPE
    K. Fukuda; T. Onuma; L. Sang; T. Yamaguchi; T. Honda and M. Sumiya
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Impact of mask materials on dry etching of GaN using ICP-RIE
    H. Matsuura; T. Onuma; T. Honda and T. Yamaguchi
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • Near-the surface Fermi level measured In2O3 and Ga2O3 thin films by molecular precursor method
    Y. Takahashi; T. Onuma; H. Nagai; T. Yamaguchi and T. Honda
    The 16th International Symposium on Advanced Technology (ISAT-16), Nov. 2017, Kogakuin Univ.
  • MSM-type solar-blind photodetector with alpha-Ga2O3 film grown by mist CVD
    K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    36th Electronic Materials Symposium, Nov. 2017
  • Effect of low temperature buffer layer in mist CVD growth of In2O3 on alfa-Al2O3 substrate
    T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    36th Electronic Materials Symposium, Nov. 2017
  • Deep-UV emission properties of rocksalt-structured MgxZn1-xO Films Grown on MgO (001) Substrates
    M. Ono; K. Ishii; T. Uchida; R. Jinno; K. Kaneko; T. Yamaguchi; T. Honda; S. Fujita and T. Onuma
    36th Electronic Materials Symposium, Nov. 2017
  • Angle-resolved XPS spectra of InN/GaN grown by DERI method
    Y. Nakajima; T. Onuma; T. Yamaguchi and T. Honda
    36th Electronic Materials Symposium, Nov. 2017
  • Relationship between Temperature and Growth Rate of Ga2O3, In2O3 and Their Alloys in the Growth of Mist CVD
    T. Yamaguchi; K. Tanuma; T. Kobayashi; H. Nagai; M. Sato; T. Onuma and T. Honda
    th International Conference on Advanced Electromaterials (ICAE2017), Nov. 2017, [Invited]
  • XPS spectra of Ga2O3, In2O3 and their alloys fabricated by molecular precursor method
    T. Honda; Y. Takahashi; T. Onuma; T. Yamaguchi; H. Nagai and M. Sato
    24th International Society of Pure & Applied Coordination Chemistry Symposium (SPACC 24), Nov. 2017
  • Growth of Ga2-xSnxO3 films by mist chemical vapor deposition
    K.Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma and T. Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, Nov. 2017, Materials Research Society
  • Crystal Structure Control in Epitaxial Growth of In2O3 by Mist CVD
    T. Kobayashi; K. Tanuma; T. Yamaguchi; T. Onuma and T. Honda
    Materials Research Society, 2017 Fall Meeting & Exhibit, Nov. 2017, Materials Research Society
  • GaN growth on Al template by MBE for the fabrication of micro displays
    T. Honda; Y. Hoshikawa; K. Uehara; T. Onuma and T. Yamaguchi
    11th International Symposium on Semiconductor Light Emitting Devices (ISSLED2017), Oct. 2017
  • Outstanding capability of In-situ Monitoring Techniques in RF-MBE Growth of InN and GaInN
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
    2017 International Symposium on Novel and Sustainable Technology (ISNST2017), Oct. 2017, [Invited]
  • 光熱偏向分光法によるGa1-xInxN薄膜の評価
    Sep. 2017
  • GaN上およびInN上GaInN成長における成長初期過程の観察
    Sep. 2017
  • SiドープとSiイオン注入単結晶酸化ガリウム結晶の光学的特性
    Sep. 2017, [Invited]
  • 低温In2O3バッファ層を用いたa-Al2O3基板上In2O3のミストCVD成長
    Sep. 2017
  • Ga2-xSnxO膜のミストCVD成長
    Sep. 2017
  • シリコンマイクロカップ基板の製作とµ-LEDの集積化の検討
    Sep. 2017
  • Photoresponsivity of alpha-Ga2O3-based deep UV photodetector grown by mist CVD
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    2nd International Workshop on Gallium Oxide and Related Materials, Sep. 2017
  • Cathodoluminescence spectra of Si-doped and Si-implanted β-Ga2O3 single crystals
    T. Onuma; K. Sasaki; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
    2nd International Workshop on Gallium Oxide and Related Materials, Sep. 2017, [Invited]
  • Fabrication of MSM-Type Photodetector Using Sn-Doped alpha-Ga2O3 Films Grown by Mist Chemical Vapor Deposition
    K. Rikitake; T. Yamaguchi; T. Onuma and T. Honda
    International Conference on Solid State Devices and Materials (SSDM2017), Sep. 2017
  • Compositional Pulling Effect in Epitaxial Growth of GaInN by RF-MBE
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Araki; T. Onuma; T. Honda and Y. Nanishi
    International Conference on Solid State Devices and Materials (SSDM2017), Sep. 2017, [Invited]
  • ミストCVD法によるSn添加Ga2O3成長とそのデバイス応用
    Aug. 2017
  • ミストCVD法によるIn2O3薄膜の結晶構造制御
    Aug. 2017
  • 第一原理計算とX線光電子分光法によるp形NiO薄膜の電子構造の解析
    Aug. 2017
  • 赤色LEDに向けたDERI法によるGaInN薄膜のRF-MBE成長検討
    Aug. 2017
  • RF-MBE法により成長したGaN薄膜中の不純物に関する考察
    Aug. 2017
  • 分子プレカーサー法により形成した金属酸化物薄膜の表面近傍フェルミ準位の測定
    Aug. 2017
  • 光熱偏向分光法を用いたGa1-xInxN薄膜における非発光再結合の検討
    Aug. 2017
  • RF-MBE法を用いたDERI法によるInN薄膜成長における極性が与える影響
    Aug. 2017
  • 素子分離のためのICP-RIEによるエッチング垂直性の検討
    Aug. 2017
  • ICP-RIEによるGaNテンプレートのアレイエッチングの製作検討
    Aug. 2017
  • In-situ X-ray Reciprocal Space Mapping Measurements in GaInN growth on GaN and InN by RF-MBE
    T. Yamaguchi; T. Sasaki; M. Takahasi; T. Onuma; T. Honda and Y. Nanishi
    12th International Conference On Nitride Semiconductors (ICNS-12), Jul. 2017
  • Optical Properties of Ga2O3 Films and Crystals
    T. Onuma; S. Saito; K. Sasaki; K. Goto; T. Masui; T. Yamaguchi; T. Honda; A. Kuramata and M. Higashiwaki
    Compund Semiconductor Week 2017 (CSW 2017), May 2017
  • Relation between electrical and optical properties of p-type NiO films
    M. Ono; T. Onuma; R. Goto; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato and T. Honda
    Compund Semiconductor Week 2017 (CSW 2017), May 2017
  • Mist CVD growth of Sn-doped Ga2O3 thin films and its device application
    K. Rikitake; T. Kobayashi; T. Yamaguchi; T. Onuma; T.Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki memorial research center, Nagoya Univ.
  • Charge transfer transitions in p-type NiO films studied by optical measurements and X-ray photoelectron spectroscopy
    M. Ono; T. Onuma; K. Sasaki; H. Nagai; T. Yamaguchi; M. Higashiwaki; A. Kuramata; S. Yamakoshi; M. Sato; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki Memorial Research Center, Nagoya Univ,
  • Comparison of III-polar and N-polar GaInN films grown by RF-MBE
    Y. Nakajima; K. Uehara; T. Honda; T. Yamaguchi; T. Onuma
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017, Akasaki Memorial Research Center, Nagoya Univ.
  • Fabrication of µ-LED array structures using ICP dry-etching
    R. Nawa; T. Onuma; T. Yamaguchi; J. -S. Jang; T. Honda
    International Conference on Light-Emitting Devices and Thier Industrial Applications ’17 (LEDIA ’17), Apr. 2017
  • GaInNのRF-MBE成長とpn ホモ接合型青緑色LEDの製作
    20 Mar. 2014
  • ミストCVD法を用いたGa2O3結晶成長における成長速度の温度依存性
    18 Mar. 2014
  • 分子プリカーサー法で製作したGa-In-O多結晶薄膜の発光特性
    17 Mar. 2014
  • 分子プレカーサー法を用いたIn添加ZnO薄膜製作検討
    17 Mar. 2014
  • 蛍光顕微鏡と2次イオン質量分析を用いたGaInN薄膜の不均一評価
    17 Mar. 2014
  • RF-MBE growth of GaN on alpha-Ga2O3 and mist-CVD growth of Ga2O3 on GaN
    T. Honda; T. Yamaguchi; T. Hatakeyama; D. Tajimi and Y. Sugiura
    SPIE Photonic West 2014 OPTO conference, 04 Feb. 2014, SPIE
  • RF-MBE growth of GaN on alpha-Ga2O3 and mist-CVD growth of Ga2O3 on GaN
    2014
  • Mist CVD growth of α-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on α-Ga2O3/sapphire templetes
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; R. Amiya; T. Onuma and T. Honda
    The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013, Southern Taiwan University of Science and Technology (STUST)
  • Ga2O3 and In2O3 growth by mist CVD
    K. Tanuma; T. Yamaguchi; T. Hatakeyama; T. Onuma and T. Honda
    The 12th International Symposium on Advanced Technology (ISAT-12), 14 Nov. 2013, Southern Taiwan University of Science and Technology (STUST)
  • Growth of InN and related alloys using DERI method toward fabrication of optoelectronics devices
    T. Yamaguchi; K. Wang; T. Honda; E. Yoon; T. Araki and Y. Nanishi
    The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
  • Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
  • Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
    R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi; T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
  • RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
    S. Ohsawa; D. Tajimi; T. Yamaguchi and T. Honda
    The 2nd International Conference on Advanced Electromaterials (ICAE 2013), 13 Nov. 2013, The Korean Institute of Electrical and Electronic Material Engineers
  • Characterization of fabricated Ga-In-O films by molecular precursor method and their future application of UV transparent electrodes
    T. Yasuno; R. Goto; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
    The 20th International SPACC (The Society of Pure and Applied Coordination Chemistry) Symposium, 12 Nov. 2013, The Society of Pure and Applied Coordination Chemistry
  • GaN系ショットキー型発光ダイオードにおける(Al,Ga)Ox/GaN界面準位の影響
    17 Sep. 2013
  • Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura; T. Honda
    2013 JSPS-MRS Joint Symposia, 17 Sep. 2013, Materials Research Society, Japanese Society of Applied Physics
  • 4H-SiC上の疑似Al基板製作と疑似基板上へのGaN RF-MBE成長
    16 Sep. 2013
  • In-situ RF-MBEによるAlN/GaNヘテロ構造上へのAlOx薄膜成長
    16 Sep. 2013
  • β-Ga2O3結晶における青色発光強度と抵抗率の相関
    16 Sep. 2013
  • 表面酸化物のGaN表面フェルミ準位と表面バンド曲がりに及ぼす影響
    16 Sep. 2013
  • ミストCVD法を用いたGaN基板上へのGa2O3成長
    16 Sep. 2013
  • Fabrication of Ga-In-O films by molecular precursor method and their future application of transparent electrodes
    T. Yasuno; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
    The 16th International Conference on II-VI Compounds and Related Materials (II-VI 2013), 10 Sep. 2013, The 125th Committee on , Conversion between Light and Electricity, Japan Society for the Promotion of Science
  • Impact of the surface modification of the Ga- and N-face n-GaN Schottky diodes with low reverse-bias leakage current
    T. Honda; T. Yamaguchi; N. Sakai; S. Fujioka; R. Amiya and Y. Sugiura
    The 10th International Conference on Nitride Semiconductors, 28 Aug. 2013, Materials Research Society
  • Crystallized AlOx/AlN/GaN heterostructures grown by Plasma-assisted molecular beam epitaxy
    Y. Sugiura; T. Honda and M. Higashiwaki
    The 10th International Conference on Nitride Semiconductors, 28 Aug. 2013, Materials Research Society
  • RF-MBE growth and characterization of GaN films on α-Ga2O3/sapphire template
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y.Sugiura and T. Honda
    The 10th International Conference on Nitride Semiconductors, 27 Aug. 2013, Materials Research Society
  • RF-MBE growth of GaN films on nitridated α-Ga2O3 buffer layer
    T. Yamaguchi; T. Hatakeyama; D. Tajimi; Y. Sugiura; T. Onuma and T. Honda
    The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 14 Aug. 2013, Polish Society for Crystal Growth (PTWK) German Association for Crystal Growth (DGKK) University of Warsaw (UW) Institute of High Pressure Physics of the Polish Academy of Sciences (IHPP PAS) Institute of Physics of the Polish Academy of Sciences (IP PAS) Institute of Electronic Materials Technology (ITME)
  • Polarized Raman spectra in β-Ga2O3 crystals
    T. Onuma1; T. Yasuno; S. Takano; R. Goto; S. Fujioka; T. Hatakeyama; T. Oda; H. Hara; C. Mochizuki; H. Nagai; T. Yamaguchi; M. Sato; T. Honda
    The 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), 13 Aug. 2013, Polish Society for Crystal Growth (PTWK) ,German Association for Crystal Growth (DGKK) ,University of Warsaw (UW) ,Institute of High Pressure Physics of the Polish Academy of Sciences (IHPP PAS) ,Institute of Physics of the Polish Academy of Sciences (IP PAS) ,Institute of Electronic Materials Technology (ITME)
  • Influence of native surface oxide on GaN surface band bending
    R. Amiya; Y. Sugiura; D. Tajimi; T. Yamaguchi and T. Honda
    32th Electronic Materials Symposium, 11 Jul. 2013
  • Effects of surface modification on emission property of GaN Schottky diodes
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
    32th Electronic Materials Symposium, 11 Jul. 2013
  • RF-MBE growth of GaN films on α-Ga2O3/sapphire template
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura and T. Honda
    32th Electronic Materials Symposium, 11 Jul. 2013
  • The GaN growth on pseudo aluminum templates by molecular beam epitaxy
    S. Osawa; T. Hatakeyama; D. Tajimi; T. Yamaguchi and T. Honda
    32th Electronic Materials Symposium, 11 Jul. 2013
  • Characterization of Ga-In-O films fabricated by molecular precursor method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi and T. Honda
    32th Electronic Materials Symposium, 11 Jul. 2013
  • Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
    D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    32th Electronic Materials Symposium, 10 Jul. 2013
  • RF-MBE growth of AlOx/AlN/GaN heterostructures
    Y. Sugiura; T. Yamaguchi; T. Honda and M. Higashiwaki
    32th Electronic Materials Symposium, 10 Jul. 2013
  • Chemical fabrication of transparent Cu metal thin film for infrared reflective thin film
    H. Nagai; T. Okada; T. Honda and M. Sato
    32th Electronic Materials Symposium, 10 Jul. 2013
  • RF-MBE法による疑似Al基板上へのGaN成長
    22 Jun. 2013
  • 表面酸化物によるGaN表面フェルミ準位に及ぼす影響
    22 Jun. 2013
  • n-situ RF-MBE法による窒化物構造上AlOx薄膜の結晶成長
    21 Jun. 2013
  • Compressively strained GaN growth on (0001)4H-SiC with Al buffer by MBE
    T. Honda; T. Yamaguchi; D. Tajimi; S. Osawa; M. Hayashi
    European Materials Research Society 2013 Spring Meeting (E-MRS 2013 Sprong Meeting), 28 May 2013, European Materials Research Society
  • In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
    (11)Y. Sugiura; T. Yamaguchi; T. Honda and M. Higashiwaki
    The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
  • Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
    (12)T. Yamaguchi; D. Tajimi; M. Hayashi; T. Igaki; Y. Sugiura and T. Honda
    The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
  • Aluminum layers grown on (0001)4H-SiC for the GaN growth by RF-MBE
    (13)S. Osawa; D. Tajimi; T. Yamaguchi and T. Honda
    The 40th Internaional Symposum on Compound Semiconductors (ISCS 2013), 20 May 2013
  • Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
    (14)D. Tajimi; Y. Sugiura; T. Hatakeyama; T. Onuma; T. Yamaguchi and T. Honda
    The 6th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2013), 14 May 2013, JSPS 162 commitee
  • Formation of aluminum template grown on (0001)4H-SiC for the GaN growth by RF-MBE
    S. Osawa; D. Tajimi; T. Yamaguchi and T. Honda
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • Surface modification of GaN crystals and its effects on optical properties
    S. Fujioka; R. Amiya; T. Onuma; T. Yamaguchi and T. Honda
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • Fabrication of Ga-In-O films by molecular precursor method
    T. Yasuno; T. Oda; H. Nagai; T. Yamaguchi; M. Sato and T. Honda
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • Growth of GaN on α-Ga2O3/sapphire template by RF-MBE
    T. Hatakeyama; T. Yamaguchi; D. Tajimi; Y. Sugiura and T. Honda
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • Cathodoluminescence spectra of β-gallium oxide thin films fabricated by molecular precursor method
    S. Takano; H. Nagai; H. Hara; C. Mochizuki; I. Takano; T. Onuma; T. Honda and M. Sato
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • Temperature dependent cathodoluminescent spectra of β-Ga2O3 crystals
    T. Onuma; S. Fujioka; T. Yamaguchi; M. Higashiwaki; K. Sakai; T. Matsui and T. Honda
    Conference on LED and Its Industrial Application 2013 (LEDIA’13), 24 Apr. 2013, ARC, Nagoya Univ.
  • 10×10 Siマイクロカップ基板でのμ-LED集積化
    Mar. 2013
  • Formation of aluminum template grown on (0001)4H-SiC for the GaN growth by RF-MBE
    2013
  • Surface modification of GaN crystals and its effects on optical properties
    2013
  • Fabrication of Ga-In-O films by molecular precursor method
    2013
  • Growth of GaN on α-Ga2O3/sapphire template by RF-MBE
    2013
  • Cathodoluminescence spectra of β-gallium oxide thin films fabricated by molecular precursor method
    2013
  • Temperature dependent cathodoluminescent spectra of β-Ga2O3 crystals
    2013
  • Growth of ultra-thin InN layers in GaN matrix for super weak waveguides
    2013
  • In-situ RF-MBE growth of AlOx/AlN/GaN heterostructures
    2013
  • Effect of (GaN/AlN) ASF buffer layer in GaN growth on Al2O3 and silicon by RF-MBE
    2013
  • Aluminum layers grown on (0001)4H-SiC for the GaN growth by RF-MBE
    2013
  • Compressively strained GaN growth on (0001)4H-SiC with Al buffer by MBE
    2013
  • Impact of ultra-thin InN layers in GaN matrix for light-emitting diodes with super weak waveguides
    2013
  • RF-MBE growth of AlOx/AlN/GaN heterostructures
    2013
  • Chemical fabrication of transparent Cu metal thin film for infrared reflective thin film
    2013
  • Influence of native surface oxide on GaN surface band bending
    2013
  • Effects of surface modification on emission property of GaN Schottky diodes
    2013
  • RF-MBE growth of GaN films on α-Ga2O3/sapphire template
    2013
  • The GaN growth on pseudo aluminum templates by molecular beam epitaxy
    2013
  • Characterization of Ga-In-O films fabricated by molecular precursor method
    2013
  • Polarized Raman spectra in β-Ga2O3 crystals
    2013
  • RF-MBE growth of GaN films on nitridated α-Ga2O3 buffer layer
    2013
  • RF-MBE growth and characterization of GaN films on α-Ga2O3/sapphire template
    2013
  • Impact of the surface modification of the Ga- and N-face n-GaN Schottky diodes with low reverse-bias leakage current
    2013
  • Crystallized AlOx/AlN/GaN heterostructures grown by Plasma-assisted molecular beam epitaxy
    2013
  • Fabrication of Ga-In-O films by molecular precursor method and their future application of transparent electrodes
    2013
  • Use of alpha-Ga2O3/alpha-Al2O3 template in GaN film growth
    2013
  • Characterization of fabricated Ga-In-O films by molecular precursor method and their future application of UV transparent electrodes
    2013
  • Growth of InN and related alloys using DERI method toward fabrication of optoelectronics devices
    2013
  • Effects of (Al,Ga)Ox/GaN Interface States on GaN-based Schottky-type Light-emitting Diodes
    2013
  • Impact of Native Surface Oxide on GaN Layers for their Surface Band Bending
    2013
  • RF-MBE Growth of GaN/Al Heterostructures on 4H-SiC
    2013
  • Mist CVD growth of α-Ga2O3 on sapphire substrates and RF-MBE growth of GaN on α-Ga2O3/sapphire templetes
    2013
  • Ga2O3 and In2O3 growth by mist CVD
    2013
  • GaNの表面処理による表面フェルミ準位変化の推定
    29 Nov. 2012
  • Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
    T. Honda; T. Onuma; Y. Sugiura and T. Yamaguchi
    Materials Research Society 2012 Fall Meeting (MRS 2012F), 29 Nov. 2012, Materials Research Society
  • Fabrication of Ga2O3 films by molecular precursor method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
    Materials Research Society 2012 Fall Meeting (MRS 2012F), 28 Nov. 2012, Materials Research Society
  • Fabrication of GaN-based Schottky-type Light-emitting Diodes for Integrated RGB Pixels
    T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Growth and Characterization of InN-based materials
    T. Yamaguchi; T. Araki; T. Honda and Y. Nanishi
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
    T. Onuma; S. Fujioka; F. Tomori; T. Yamaguchi and T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
    (39)T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; T. Yamaguchi; M. Sato and T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
    Y. Sugiura; R. Amiya; D. Tajimi; T. Onuma; T. Yamaguchi and T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Introduction of Ultra-thin InN Layer in GaN-based Light-emitting Diodes for the Reduction of Crosstalk
    D. Tajimi; M. Hayashi; Y. Sugiura; T. Onuma and T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
    R. Amiya; T. Yamaguchi; D. Tajimi; Y. Sugiura; J. Sakaguchi; T. Araki; Y. Nanishi and T. Honda
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Structure and Optical Properties of Transparent Ga2O3-x Thin Films Fabricated by the Molecular Precursor Method
    H. Nagai; S. Takano; H. Hara; C. Mochizuki; I. Takano; T. Onuma; T. Honda and M. Sato
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Fabrication of the Transparent Conducting ZnO Thin Film by the Molecular Precursor Method
    H. Nagai; T. Shibukawa; S. Takano; T. Honda and M. Sato
    11th International Symposium on Advanced Technology (ISAT-S), 30 Oct. 2012, Kogakuin University
  • Angled-resolved XPS measurements of InN films grown by RF-MBE
    R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki and Y. Nanishi
    The 7th International Workshop on Nitride Semiconductors (IWN 2012), 18 Oct. 2012
  • Fabrication of RGB pixels using integrated GaN- based Schottky-type light-emitting diodes
    T. Honda; T. Yamaguchi; N. Sakai; S. Fujioka; and Y. Sugiura
    The 7th International Workshop on Nitride Semiconductors (IWN 2012), 15 Oct. 2012
  • GaN growth on (111)Al by molecular beam epitaxy
    T. Honda; D. Tajimi; N. Shinohara; Y. Sugiura; M. Hayashi and T. Yamaguchi
    17th International Conference on Molecular Beam Epitaxy (MBE 2012), 28 Sep. 2012
  • Growth of thick InGaN films with entire alloy composition using DERI method
    T. Yamaguchi; N. Uematsu; T. Araki; T. Honda; E. Yoon and Y. Nanishi
    17th International Conference on Molecular Beam Epitaxy (MBE 2012), 28 Sep. 2012
  • 酸化ガリウムのCLスペクトルの温度依存性
    13 Sep. 2012
  • ZnO単結晶の電子線入射角度依存カソードルミネセンス測定
    13 Sep. 2012
  • 集積化GaN系発光素子のための超薄膜InNを挿入した弱導波路発光層の検討
    12 Sep. 2012
  • Angle-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
    R. Amiya,T. Yamaguchi,D. Tajimi,Y. Sugiura,T. Araki,Y. Nanishi and T. Honda
    第73回応用物理学会学術講演会, 11 Sep. 2012
  • X-Ray Photoelectron Spectroscopy Measurements around the Valence-Band of Ga- and N-face (0001)GaN
    Y. Sugiura; D. Tajimi; R. Amiya; T. Yamaguchi and T. Honda
    39th International Symposium on Compound Semiconductors, 27 Aug. 2012
  • Toward strain control of GaN grown on Si by RF-MBE
    T. Yamaguchi; D. Tajimi; T. Igaki; Y. Sugiura and T. Honda
    9th International Symposium on Semiconductor Light Emitting Devices (ISSLED2012), 24 Jul. 2012
  • In-situ RF-MBE growth of AlOx/n-GaN composite structures
    M. Higashiwaki; T. Igaki; T. Yamaguchi; and T. Honda
    4th International Symposium on Growth of III-Nitrides (ISGN4), 17 Jul. 2012
  • Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
    T. Yamaguchi; N. Uematsu; K. Wang; T. Araki; T. Honda; E. Yoon and Y. Nanishi
    31th Electronic Materials Symposium, 12 Jul. 2012
  • Angle-resolved XPS measurements of In-polar and N-polar InN films
    R. Amiya; T. Yamaguchi; D. Tajimi; M. Hayashi; Y. Sugiura; T. Honda; T. Araki; and Y. Nanishi
    31th Electronic Materials Symposium, 12 Jul. 2012
  • Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
    D. Tajimi; T. Igaki; Y. Sugiura; T. Yamaguchi and T. Honda
    31th Electronic Materials Symposium, 11 Jul. 2012
  • Ozone treatment of oxide surface for the fabrication of MgZnO films by molecular precursor method
    T. Yasuno; T. Oda; H. Nagai; H. Hara; Y. Sugiura; M. Sato; and T. Honda
    31th Electronic Materials Symposium, 11 Jul. 2012
  • n-GaN上へのAlOx薄膜のin-situ RF-MBE成長
    Mar. 2012
  • AlおよびAlOx膜堆積が極性GaNのPL強度に与える影響
    Mar. 2012
  • Al緩衝層を用いた化合物原料MBE法による(0001)4H-SiC上GaN薄膜の製作
    Mar. 2012
  • RF-MBE法による(GaN/AlN)交互供給緩衝層上GaN薄膜のx線回折測定
    Mar. 2012
  • 極性・非極性バルクZnO表面におけるCLスペクトルの比較
    Mar. 2012
  • 分子プレカーサー法によるZnO系透明電極製作におけるオゾン洗浄の効果
    Mar. 2012
  • Impact of (GaN/AlN) alternating-source-feeding layer for the GaN growth on (111)Si substrates by RF-MBE
    2012
  • Ozone treatment of oxide surface for the fabrication of MgZnO films by molecular precursor method
    2012
  • Growth of InGaN film and InGaN/InGaN periodic structure using DERI method
    2012
  • Angle-resolved XPS measurements of In-polar and N-polar InN films
    2012
  • In-situ RF-MBE growth of AlOx/n-GaN composite structures
    2012
  • Toward strain control of GaN grown on Si by RF-MBE
    2012
  • X-Ray Photoelectron Spectroscopy Measurements around the Valence-Band of Ga- and N-face (0001)GaN
    2012
  • Angle-resolved X-ray photoelectron spectroscopy of c-plane InN grown by RF-MBE
    2012
  • GaN growth on (111)Al by molecular beam epitaxy
    2012
  • Growth of thick InGaN films with entire alloy composition using DERI method
    2012
  • Fabrication of RGB pixels using integrated GaN- based Schottky-type light-emitting diodes
    2012
  • Angled-resolved XPS measurements of InN films grown by RF-MBE
    2012
  • Fabrication of GaN-based Schottky-type Light-emitting Diodes for Integrated RGB Pixels
    2012
  • Growth and Characterization of InN-based materials
    2012
  • Electron-beam Incident-angle-resolved Cathodoluminescence Studies on Bulk ZnO Crystals
    2012
  • Characterization of Fabricated Ga2O3 Thin Films on (0001) Sapphire Substrate by Molecular Precursor Method
    2012
  • Estimation of Surface States of Ga- and N-face GaN Measurement Near the Valence-band Maximum by X-ray Photoelectron Spectroscopy
    2012
  • Introduction of Ultra-thin InN Layer in GaN-based Light-emitting Diodes for the Reduction of Crosstalk
    2012
  • Angle-resolved X-ray Photoelectron Spectroscopy Measurements of InN Grown by RF-MBE
    2012
  • Structure and Optical Properties of Transparent Ga2O3-x Thin Films Fabricated by the Molecular Precursor Method
    2012
  • Fabrication of the Transparent Conducting ZnO Thin Film by the Molecular Precursor Method
    2012
  • Fabrication of Ga2O3 films by molecular precursor method
    2012
  • Band-bending around the Surface of Zn and O-polarity Hexagonal ZnO Crystals
    2012
  • (GaN/AlN)多重緩衝層を用いたRF-MBE法によるSi基板上GaN薄膜成長
    Dec. 2011
  • InNおよびGaN成長における原子脱離過程その場観察
    Dec. 2011
  • In-plane epitaxial relationship of (0001)sapphire grown by compound-source MBE
    Y. Sugiura; T. Oda; T. Onuma; T. Yamaguchi and T. Honda
    Materials Research Society 2011 Fall Meeting (MRS 2011F), Dec. 2011, Materials Research Society
  • Low temperature growth of GaN on pseudo (111)Al substrates by RF-MBE
    M. Hayashi; T. Goto; T. Yamaguchi; T. Igaki and T. Honda
    Materials Research Society 2011 Fall Meeting (MRS 2011F), Dec. 2011
  • XPS spectra of c-face GaN and ZnO crystals
    T. Honda
    The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
  • X-ray diffraction of ZnO layer grown by compound-source MBE
    R. Amiya; Y. Sugiura; T. Yamaguchi and T. Honda
    The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
  • Ozone treatment of the substrates for ZnO deposition by molecular precursor method
    T. Oda; H. Hara; Y. Sugiura; T. Yasuno; T. Yamaguchi and T. Honda
    The 10th International symposium on advanced Technology (ISAT-10), Nov. 2011
  • RF-MBE法による(GaN/AlN)交互供給緩衝層上GaN薄膜成長
    Aug. 2011
  • 極性および非極性GaN表面における表面再結合過程
    Aug. 2011
  • 六方晶GaNとZnOにおける表面再結合の比較
    Aug. 2011
  • 化合物原料MBE法を用いたZnO薄膜の結晶成長とその評価
    Aug. 2011
  • Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
    T. Onuma; N. Sakai; T. Igaki; T. Yamaguchi; A. A. Yamaguchi and T. Honda
    The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
  • Growths of InN/InGaN periodic structure and thick InGaN film using dropment elimination process by radical-beam irradiation
    T. Yamaguchi; T. Araki; T. Honda; E. Yoon and Y. Nanishi
    The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
  • Built-in potential along the c-axis in MBE-grown GaN layers observed by angle resolved x-ray photoelectron spectroscopy
    T. Honda; T. Igaki; T. Yamaguchi; Y. Kumagai and A. Kokitu
    The 28th North America Conference on Molecular Beam Epitaxy (NAMBE 2011), Aug. 2011
  • Low temperature growth of GaN on pseudo (111)Al substrates by RF-molecular beam epitaxy
    M. Hayashi and T. Honda
    The 34th International Symposium on Optical Communications, Aug. 2011
  • Surface Recombination in GaN crystals by surface modification
    N.Sakai and T. Honda
    The 34th International Symposium on Optical Communications, Aug. 2011
  • X-ray diffraction characterization of ZnO layer grown by compound-source molecular beam epitaxy
    Y. Sugiura and T. Honda
    The 34th International Symposium on Optical Communications, Aug. 2011
  • DERI法によるIn窒化物半導体の結晶成長
    Jul. 2011
  • Reduction of reverse-bias leakage current in GaN-based Schottky-type light-emitting diodes by a surface modification
    T. Honda; N. Sakai; S. Komiyama; M. Hayashi and T. Igaki
    9th International Conference on Nitride Semiconductors (ICNS-2011), Jul. 2011
  • Recombination dynamics in polar and nonpolar GaN substrates
    N. Sakai; T. Igaki; T. Onuma; A. A. Yamaguchi; T. Yamaguchi and T. Honda
    30th Electronic Materials Symposium (EMS-30), Jul. 2011
  • In situ monitoring techniques by DERI method
    T. Yamaguchi; K.Wang; T. Araki; T. Honda; E. Yoon and Y.Nanishi
    30th Electronic Materials Symposium (EMS-30), Jul. 2011
  • Polarity control of MgZnO transparent electrodes by molesular precursor method
    T. Oda; T. Kibu; H. Hara; Y. Sugiura; M. Sato and T. Honda
    30th Electronic Materials Symposium (EMS-30), Jul. 2011
  • GaN growth on pseudo (111)Al substrates by RF-MBE
    T. Honda; M. Hayashi; T. Goto and T. Igaki
    Europe Materials Research Society 2011 Spring Meeting (E-MRS), May 2011, Europe Materials Research Society
  • Surface Recombination in polar and nonpolar GaN surfaces
    N. Sakai; T. Onuma; A. A. Yamaguchi and T. Honda
    5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
  • ZnO growth for transparent electrodes by compound-source MBE
    Y. Sugiura; T. Oda; S. Obata; Y. Yoshihawa; T. Onuma and T. Honda
    5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
  • Initial growth monitoring in GaN epitaxial growth on (GaN/AlN) buffer layer by RF-molecular beam epitaxy
    M. Hayashi; T. Goto; T. Igaki; J. Sugawara; R.Yonezawa; Y. Sugiura and T. Honda
    5th Asia-Pacific Workshop on Widegap Semiconductors (APWS 2011), May 2011
  • RF-MBE法を用いた(GaN/AlN)交互供給緩衝層上GaN薄膜成長
    Mar. 2011
  • 化合物原料MBE法によるZnO薄膜の製作検討
    杉浦洋平,小田拓人,小畑 聡,芳原義大,尾沼猛儀,本田 徹
    第58回応用物理学関係連合講演会、神奈川工科大学、厚木、神奈川, 26p-BZ-7, Mar. 2011
  • 分子プレカーサー法により形成したp型酸化銅(I)透明薄膜の半導体特性
    Mar. 2011
  • 銀ナノ粒子-チタニアアロイ薄膜の導電性と光電流密度
    Mar. 2011
  • Built-in potential in GaN crystals by angle resolved X-ray photoelectron spectroscopy
    2011
  • Fabrication of c-axis oriented MgZnO transparent electrodes by molecular precursor method
    2011
  • GaN growth on pseudo (111)Al substrates by RF-MBE
    2011
  • Surface Recombination in polar and nonpolar GaN surfaces
    2011
  • ZnO growth for transparent electrodes by compound-source MBE
    2011
  • Initial growth monitoring in GaN epitaxial growth on (GaN/AlN) buffer layer by RF-molecular beam epitaxy
    2011
  • Reduction of reverse-bias leakage current in GaN-based Schottky-type light-emitting diodes by a surface modification
    2011
  • Recombination dynamics in polar and nonpolar GaN substrates
    2011
  • In situ monitoring techniques by DERI method
    2011
  • Polarity control of MgZnO transparent electrodes by molesular precursor method
    2011
  • Comparative study of surface recombination in hexagonal GaN and ZnO surfaces
    2011
  • Growths of InN/InGaN periodic structure and thick InGaN film using dropment elimination process by radical-beam irradiation
    2011
  • Built-in potential along the c-axis in MBE-grown GaN layers observed by angle resolved x-ray photoelectron spectroscopy
    2011
  • Low temperature growth of GaN on pseudo (111)Al substrates by RF-molecular beam epitaxy
    2011
  • Surface Recombination in GaN crystals by surface modification
    2011
  • X-ray diffraction characterization of ZnO layer grown by compound-source molecular beam epitaxy
    2011
  • XPS spectra of c-face GaN and ZnO crystals
    2011
  • X-ray diffraction of ZnO layer grown by compound-source MBE
    2011
  • Ozone treatment of the substrates for ZnO deposition by molecular precursor method
    2011
  • In-plane epitaxial relationship of (0001)sapphire grown by compound-source MBE
    2011
  • Low temperature growth of GaN on pseudo (111)Al substrates by RF-MBE
    2011
  • Built-in potential in GaN crystals by angle resolved X-ray photoelectron spectroscopy
    T. Honda; T. Igaki; Y. Kumagai and A. Kokitu
    The 38th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-38), San Diego, California, USA, Mo 1220., Jan. 2011
  • Fabrication of c-axis oriented MgZnO transparent electrodes by molecular precursor method
    T. Oda; T. Kidu; H. Hara; Y. Sugiura; M. Sato and T. Honda
    The 38th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-38), San Diego, California, USA, We 1200., Jan. 2011
  • MBE法による交互供給バッファー層を用いたGaN薄膜の製作
    17 Dec. 2010
  • 化合物原料MBE法によるGaN/(111)Siの高品質化の検討
    17 Dec. 2010
  • 化合物原料MBE法によるZnO薄膜の低温堆積検討
    17 Dec. 2010
  • RF-MBE法による擬似Al基板上へのGaN薄膜の低温成長
    Nov. 2010
  • RF励起窒素を用いた化合物原料MBE法によるGaN/(111)Siの製作検討
    Nov. 2010
  • 疑似(111)Al基板上GaN薄膜のRF-MBE成長
    Nov. 2010
  • Fabrication of RGB pixels based on UV Schottky-type LEDs
    T.Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, IL-9., Nov. 2010
  • The Electrical and optical properties of p-type cuprous oxides transparent thin films by the molecular precursor method
    T. Suzuki; H. Nagai; C. Mochizuki; H. Hara; I. Takano; T. Honda and M. Sato
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-18., Nov. 2010
  • Fabrication of ZnO layers by compound source molecular beam epitaxy
    Y. Sugiura; T. Oda; S. Obata; Y. Yoshihara and T. Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-25., Nov. 2010
  • Polarity control of MgZnO thin films by molecular precursor method
    T. Oda; T. Kizu; Y. Sugiura; H. Hara; M. Sato and T. Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-26., Nov. 2010
  • GaN epitaxial growth on pseudo Al substrates by RF-MBE
    M. Hayashi; T. Goto; T. Igaki; J. Sugawara; R. Yonezawa; S. Taguchi and T. Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-27., Nov. 2010
  • Surface recombination mechanism in hexagonal GaN crystals
    N. Sakai; T. Onuma; T. Okuhata; A. A. Yamaguchi and T. Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-28., Nov. 2010
  • Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
    T. Igaki; M. Hayashi; T. Goto; S. Taguchi and T. Honda
    The 9th International Symposium on Advanced Technology (ISAT-9), Tokyo, Japan, P-29., Nov. 2010
  • 分子プレカーサー法によるp型酸化銅(I)透明薄膜の形成
    Sep. 2010
  • 分子プレカーサー法によるMgZnO薄膜の極性制御
    Sep. 2010
  • RF-MBE法を用いた疑似Al基板上GaN成長
    Sep. 2010
  • Surface recombination of hexagonal GaN crystals
    N. Sakai; T. Onuma; T. Okuhata; A. A. Yamaguchi and T. Honda
    The International Workshop on Nitride semiconductors (IWN2010), Marriott Tampa Waterside Hotel & Marina, Tampa Bay, Florida, USA, GP 1.20., Sep. 2010
  • MBE法による交互供給バッファ層を用いたGaN薄膜の製作検討
    T. Goto and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, E-2., Aug. 2010
  • 化合物原料MBE法によるZnO薄膜の製作検討
    Y. Sugiura and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P1-22., Aug. 2010
  • RF-MBE法による擬似Al基板上へのGaN成長
    M. Hayashi and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P2-15., Aug. 2010
  • GaN結晶における面方位とフォトルミネッセンスの発光寿命の関係
    N. Sakai and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P3-4., Aug. 2010
  • RF-MBE法によるGaN薄膜成長における極性制御の検討
    T. Igaki and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P3-12., Aug. 2010
  • 分子プレーカーサー法によるGa-doped MgZnO薄膜の配向性及び膜厚依存性の検討
    T. Oda and T. Honda
    The 33th International Symposium on Optical communications, Makuhari, Chiba, Japan, P2-29., Aug. 2010
  • GaN growth on pseudo Al substrates by molecular beam epitaxy at low temperatures
    T. Goto; M. Hayashi; T. Igaki; S. Taguchi and T. Honda
    16th International Conference on molecular beam epitaxy (ICMBE 2010), bcc Belriner congress center, Belrin, Germany,, Aug. 2010
  • XPS study on (0001) and (000-1)GaN layers on sapphire substrates grown by molecular beam epitaxy
    T. Honda; K. Noguchi; N. Sakai; S. Taguchi; T. Goto; T. Igaki and M. Hayashi
    The 3rd International Symposium on Growth of III-Nitrides, Montpellier Convention Center, Montpellier, France, MoP-38., Jul. 2010
  • III-N growth on pseudo Al substrates by MBE at low temperatures
    M. Hayashi; T. Goto; T. Igaki; S.Taguchi and T. Honda
    29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, Th6-12., Jul. 2010
  • Light propagation in GaN-based Schottky-type diodes using FDTD method
    N. Sakai; T. Kobayashi and T. Honda
    29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, Th2-4., Jul. 2010
  • Fabrication of c-axis oriented MgZnO films by molecular precursor method
    T. Oda; T. Kizu; H. Hara; Y. Sugiyama; M. Sato and T. Honda
    29th Electronic Materials Symposium (EMS-29), Laforet Shuzenji, Izu, Shizuoka, Japan, We2-6., Jul. 2010
  • 小型フラットディスプレイのための窒化ガリウム系集積化発光素子の製作
    04 Jun. 2010
  • Fabrication of c-axis oriented MgZnO transparent electrode by molecular precursor method
    T. Oda; H. Hara; C. Mochizuki; M. Sato and T. Honda
    8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010), Peking University, Beijing, China, P16., May 2010
  • Surface Modification of (0001)GaN and its application to RGB pixels based on UV Schottky-type LEDs
    T. Honda; N. Sakai and T. Nozaki
    8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010), Peking University, Beijing, China, L-3., May 2010
  • Fabrication of c-axis oriented MgZnO transparent electrode by molecular precursor method
    2010
  • Surface Modification of (0001)GaN and its application to RGB pixels based on UV Schottky-type LEDs
    2010
  • Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
    2010
  • XPS study on (0001) and (000-1)GaN layers on sapphire substrates grown by molecular beam epitaxy
    2010
  • III-N growth on pseudo Al substrates by MBE at low temperatures
    2010
  • Light propagation in GaN-based Schottky-type diodes using FDTD method
    2010
  • Fabrication of c-axis oriented MgZnO films by molecular precursor method
    2010
  • GaN growth on pseudo Al substrates by molecular beam epitaxy at low temperatures
    2010
  • Surface recombination of hexagonal GaN crystals
    2010
  • Fabrication of RGB pixels based on UV Schottky-type LEDs
    2010
  • The Electrical and optical properties of p-type cuprous oxides transparent thin films by the molecular precursor method
    2010
  • Fabrication of ZnO layers by compound source molecular beam epitaxy
    2010
  • Polarity control of MgZnO thin films by molecular precursor method
    2010
  • GaN epitaxial growth on pseudo Al substrates by RF-MBE
    2010
  • Surface recombination mechanism in hexagonal GaN crystals
    2010
  • Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
    2010
  • Polarity control of (0001)GaN epitaxial layers grown by RF-MBE
    The 37th International Symposium on Compound Semiconductors (ISCS 2010), Takamatsu Symbol Tower, Kagawa, Japan, FrP-63., 2010
  • Fabrication of AlN films at low temperature by CS-MBE technique
    K. Watanabe; K. Sugimoto; M. Arai; K. Takeda and T. Honda
    34th International Symposium on Compound Semiconductors, Kyoto University, Kyoto, TuC-P23, Oct. 2007
  • Fabrication of GaN-based UV TF-ELDs by CS-MBE technique and their application to RGB Light-emitting Pixels
    M. Arai; K. Sugimoto; S. Egawa and T. Honda
    7th International Conference on Nitride Semiconductors, MGM Grand Hotel, Las Vegas, NV, USA, TuP53, Sep. 2007
  • Fabrication of GaN-based MOS LEDs for micro pixels in flat-panel displays
    T. Honda; T. Kobayashi; S. Komiyama; Y. Mashiyama; M. Arai and K. Yoshioka
    7th International Conference on Nitride Semiconductors, MGM Grand Hotel, Las Vegas, NV, USA, TuP52, Sep. 2007
  • Introduction of preheated ammonia during GaN growth on Si by compound-source MBE at low temperature
    T. Honda; M. Sawadaishi; H. Yamamoto; M. Arai; K. Yoshioka and T. Okuhata
    15th International Conference on Crystal Growth, Salt Lake City, UT, USA, wg29, Aug. 2007
  • Preheated Ammonia Supply during Compound-Source Molecular Beam Epitaxy of GaN
    M. Sawadaishi; M. Sawada; K. Sugimoto; T. Baba and T. Honda
    The 3rd Asia-Pacific Workshop on Widegap Semiconductors, Jeonju, Korea, 11 - 14 March, 2007., Mar. 2007
  • Fabrication of GaN-based MOS LEDs operating in UV spectral region
    2007
  • Preheated Ammonia Supply during Compound-Source Molecular Beam Epitaxy of GaN
    2007
  • Introduction of preheated ammonia during GaN growth on Si by compound-source MBE at low temperature
    2007
  • Fabrication of GaN-based UV TF-ELDs by CS-MBE technique and their application to RGB Light-emitting Pixels
    2007
  • Fabrication of GaN-based MOS LEDs for micro pixels in flat-panel displays
    2007
  • Fabrication of AlN films at low temperature by CS-MBE technique
    2007
  • Fabrication of GaN-based MOS LEDs operating in UV spectral region
    T. Honda; T. Kobayashi; S. Komiyama; Y. Mashiyama
    34th Conference on the physics and chemistry of semiconductor interfaces, Salt Lake City, Utah, U. S. A., 14 - 18 January, 2007, Mo1135, Jan. 2007
  • Integrated light-emitting diodes grown by MOCVD for flat display panels
    T. Honda; T. Kobayashi; S. Egawa; M. Sawada; K. Sugimoto; T. Baba and H. Kawanishi
    13th International Conference on Metal-organic Vapor Phase Epitaxy, Miyazaki, Japan, 2006, 22 - 26 May, TuP.64, Jun. 2006
  • Cathodoluminescence Spectra of Surface-oxidized GaN Crystallites
    2006
  • Integrated light-emitting diodes grown by MOCVD for flat display panels
    2006
  • Cathodoluminescence Spectra of Surface-oxidized GaN Crystallites
    T. Honda; M. Akiyama; T. Baba and H. Kawanishi
    33rd Conference on the Physics and Chemistry of Semiconductor Interfaces (2006). We1140, Jan. 2006
  • 減圧MO‐VPE法によるBGaNの結晶成長
    14 Nov. 1998
  • BGaN系紫外レーザの基礎検討
    Nov. 1998
  • 減圧MO‐VPE法によるBGaNのH. T.-AlNを介した(0001)6H‐SiC上への成長
    Sep. 1998
  • (0001)6H‐SiC基板上へのBxGa1‐xNの成長
    Sep. 1998
  • (0001)6H‐SiC上へのGaNの直接成長
    Sep. 1998
  • GaN系面発光レーザ用京新規構造の製作
    Sep. 1998
  • GaN系紫外発光素子の基礎検討
    Mar. 1998
  • アンモニアを用いたMO‐MBE法による(0001)6H‐SiC基板上GaNの直接成長
    Mar. 1998
  • BGaN系紫外レーザの基礎検討
    1998
  • BAlGaN格子整合系4元混晶半導体の基礎検討
    Dec. 1997
  • 有機金属気相成長法によるGaN/BAlNヘテロ構造の製作
    Nov. 1997
  • BxGa1-xNの有機金属気相成長における熱力学解析
    Oct. 1997
  • (0001)6H-SiC上に格子整合したBGaNの光学利得の見積もり
    Oct. 1997
  • (0001)6H-SiC上に格子整合したBx1Aly1Ga(1-x1-y1)N/Bx2Aly2Ga(1-x2-y2)N DH構造の基礎検討
    Oct. 1997
  • AlN/GaN交互供給バッファ層による(0001)6H‐SiC上GaNのクラック抑制
    Oct. 1997
  • (0001)6H‐SiC上に成長したDH構造におけるクラックの特徴
    Oct. 1997
  • 有機金属気相成長法による(0001)6H‐SiC基板上に成長したGaN/B(AlN)ヘテロ構造
    Oct. 1997
  • p型コンタクト抵抗のGaN面方位依存性
    Mar. 1997
  • MOVPE法によるGaN/AlGaN量子井戸構造の界面制御に関する検討
    Mar. 1997
  • MOVPE選択成長法によるGaN微細構造の形成
    Mar. 1997
  • GaN系面発光レーザのためのドライエッチングによる微細構造形成
    Mar. 1997
  • BAlGaN格子整合系4元混晶半導体の基礎検討
    1997
  • ZnSe系緑色/青色面発光レーザの基礎検討
    Sep. 1996
  • GaNエピタキシャル成長のためのSi基板上へのZnO形成
    Sep. 1996
  • サファイア基板上へのGaNのMOVPE成長におけるオゾン前処理
    Sep. 1996
  • 3フローMOVPE法によるGaNの成長と評価
    Sep. 1996
  • 光ウエットエッチング後のGaN膜のフォトルミネッセンス測定
    Sep. 1996
  • GaN/AlGaN量子井戸におけるピエゾ効果が発光に与える影響
    Sep. 1996
  • Light Emitting Materials in Green/Blue/UV Spectral Region and Its Application for Surface Emitting Lasers
    T. Honda; F. Koyama and K. Iga
    NEDO Frontier Technology Lecture, Sep. 1996
  • GaN系半導体レーザのドライエッチング反射鏡に関する検討
    Aug. 1996
  • ECR-RIBEによるGaNのエッチング
    Mar. 1996
  • 電子ビーム蒸着によるGaN系面発光レーザ用誘電体多層膜反射鏡
    Mar. 1996
  • GaN系面発光レーザの温度特性に関する検討
    Mar. 1996
  • Light Emitting Materials in Green/Blue/UV Spectral Region and Its Application for Surface Emitting Lasers
    1996
  • GaN系青色・紫外面発光レーザの基礎検討
    Mar. 1995
  • 量子井戸活性層を有するGaN系面発光レーザの検討
    Mar. 1995
  • バンド内緩和時間を考慮したGaNの線形利得の見積り
    Sep. 1994
  • In Situk光モニタを用いたII-VI族青色面発光レーザの反射鏡製作
    Sep. 1994
  • GaN系面発光レーザ用多層膜反射鏡の基礎設計
    Sep. 1994
  • Highly-Doped p-ZnSe Formation by Li3N Diffusion
    S. W. Lim; T. Honda; F. Koyama and K. Iga
    第55回応用物理学会学術講演会, Sep. 1994
  • Design of MQB for ZnCdSe/ZnSe Blue-Green Lasers
    K. Bousbahi; T. Honda; F. Koyama and K. Iga
    第55回応用物理学会学術講演会, Sep. 1994
  • 青色面発光レーザの高反射率反射鏡の基礎検討
    Mar. 1994
  • CuAlxGa1-x(SySe1-y)2積層構造のルミネッセンスとデバイス応用
    Mar. 1994
  • Highly-Doped p-ZnSe Formation by Li3N Diffusion
    1994
  • Design of MQB for ZnCdSe/ZnSe Blue-Green Lasers
    1994
  • II-VI族化合物を用いる短波長面発光レーザの基礎設計
    Sep. 1993
  • CuGaS2への不純物ドーピング(III)
    Mar. 1993
  • 有機金属気相成長法による銅カルコパイライトのヘテロ積層構造
    Sep. 1992
  • ワイドギャップカルコパイライト化合物のヘテロ接合
    Sep. 1992
  • CuGaS2への不純物ドーピング(II)
    Sep. 1992
  • CuGaS2への不純物ドーピング(I)
    Mar. 1992
  • 有機金属気相成長法によるI-III-V2族化合物のエピタキシャル成長
    Mar. 1992
  • CuGaS2/ CuAlS2/GaP(100)薄膜の励起スペクトル
    Nov. 1991
  • CuAlS2のPL評価
    Sep. 1991
  • 交互供給MOCVD法によるCuGaS2薄膜の成長(II)
    Mar. 1991
  • CuAl(SxSe1-x)2のMOVPE成長
    Mar. 1991
  • 交互供給MOCVD法によるCuGaS2薄膜の成長
    Sep. 1990
  • DTBSを用いたCuGa(SxSe1-x)2のMOVPE成長
    Sep. 1990
  • MOVPE法によるカルコパイライト薄膜の成長と評価
    Jul. 1990
  • CuGaS2,CuGaSe2の減圧MOVPE成長
    Mar. 1990
  • 銅カルコパイライトのMOVPE成長における原料系の検討
    Sep. 1989
  • 新しいS原料を用いたCuGaS2のMOVPE成長
    Apr. 1989
  • 銅カルコパイライトのMOVPE成長
    Jan. 1989
  • CuGaS2/ZnSのMOVPE成長
    Oct. 1988

Award

  • Jul. 1997
    Japan
  • Nov. 1996
    Japan
  • Mar. 1996
    Japan

Member History

  • Sep. 2005 - Sep. 2006
    program committee
  • Sep. 2005 - Sep. 2006
    program committee, International conference on molecular beam epitaxy
  • Sep. 2001 - Sep. 2002
    Steering committee
  • Sep. 2001 - Sep. 2002
    Steering committee, 5th International conference on nitrode semiconductors
  • Dec. 1996 - Dec. 2000
    MRS Internet Journal of Nitride Smiconductor, Japan News Coordinator, Marerials Research Society
  • Apr. 1999 - Mar. 2000
    応用物理学会欧文紙編集委員